JPH02294007A - Formation of ceramic electronic component electrode - Google Patents
Formation of ceramic electronic component electrodeInfo
- Publication number
- JPH02294007A JPH02294007A JP1114754A JP11475489A JPH02294007A JP H02294007 A JPH02294007 A JP H02294007A JP 1114754 A JP1114754 A JP 1114754A JP 11475489 A JP11475489 A JP 11475489A JP H02294007 A JPH02294007 A JP H02294007A
- Authority
- JP
- Japan
- Prior art keywords
- plating
- ceramic
- ceramic laminated
- ceramic body
- electrodes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000919 ceramic Substances 0.000 title claims abstract description 45
- 230000015572 biosynthetic process Effects 0.000 title description 2
- 238000007747 plating Methods 0.000 claims abstract description 13
- 238000007772 electroless plating Methods 0.000 claims abstract description 6
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 4
- 229910052703 rhodium Inorganic materials 0.000 claims abstract description 4
- 238000000034 method Methods 0.000 claims description 26
- 229910052751 metal Inorganic materials 0.000 claims description 13
- 239000002184 metal Substances 0.000 claims description 13
- 238000010304 firing Methods 0.000 claims description 11
- 229910052770 Uranium Inorganic materials 0.000 claims 1
- 239000011521 glass Substances 0.000 abstract description 7
- 238000004519 manufacturing process Methods 0.000 abstract description 6
- 238000011282 treatment Methods 0.000 abstract description 6
- 229910052737 gold Inorganic materials 0.000 abstract description 3
- 229910052763 palladium Inorganic materials 0.000 abstract description 3
- 238000000151 deposition Methods 0.000 abstract description 2
- 230000006866 deterioration Effects 0.000 abstract description 2
- 239000003960 organic solvent Substances 0.000 abstract description 2
- 239000000126 substance Substances 0.000 abstract 4
- 230000035515 penetration Effects 0.000 abstract 1
- 239000003990 capacitor Substances 0.000 description 7
- 230000004913 activation Effects 0.000 description 3
- 238000009713 electroplating Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000002253 acid Substances 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 229910010293 ceramic material Inorganic materials 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229910052573 porcelain Inorganic materials 0.000 description 2
- 229910001252 Pd alloy Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000002003 electrode paste Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
Landscapes
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
- Ceramic Capacitors (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、積層コンデンサ等のセラミック電子部品を製
造するのに適用される電極の形成方法に関するものであ
る.
従来の技術
従来、セラミック電子部品の電極を形成するのにあたっ
ては銀ペーストの焼付け法を適用するよりも低庶なコス
トで済む電気メッキ法或いは無電解メッキ法が広く採用
されている.また、これらのメッキ法を適応するとき、
通常はメッキ膜が表面全面に形成されて事後にエッチン
グや研磨等で不要部分を除去しなければならないから、
電極層を形成する表面または両端部に金属の活性化ペー
ストを付着した後メッキ処理を施すことによりセラミッ
ク素体の表面または両端部のみに電極層を形成すること
が提案されている(特開昭63−246809号).
そのメッキ法による電極形成方法としては、まず、グリ
ーンのセラミック素体を所定の温度で焼成したセラミッ
ク素体を得た後、このセラミック素体の両端部にガラス
フリット含有のAg−Pd合金またはAg等の金属ペー
ストを付着させて焼付け処理を加えることにより活性皮
膜として形成し、この後にメッキ処理で電極層をラミネ
ート形成する工程を経るのが通常である.
発明が解決しようとする課題
然し、上述した方法では焼成処理後のセラミック素体に
活性化ペーストを付着するから電極ペースト中のガラス
フリットがセラミック素体に浸透することにより焼付け
処理に伴ってクラックを発生させ、しかもメッキ液中の
酸やアルカリでセラミック素体に浸透したガラス成分が
溶出して電極層の接着強度を低下する.また、上述した
工程ではセラミック素体の焼成以外に活性化ペーストの
焼付け処理も行なわなければならないから加熱処理に時
間がかかってコスト高を招くことも免れ得ない。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a method for forming electrodes that is applied to manufacturing ceramic electronic components such as multilayer capacitors. Conventional Technology Conventionally, electroplating or electroless plating methods, which are cheaper than silver paste baking methods, have been widely used to form electrodes for ceramic electronic components. Also, when applying these plating methods,
Normally, a plating film is formed on the entire surface and unnecessary parts must be removed by etching or polishing after the fact.
It has been proposed to form an electrode layer only on the surface or both ends of a ceramic body by applying a metal activation paste to the surface or both ends on which the electrode layer is to be formed and then plating it (Japanese Patent Application Laid-Open No. No. 63-246809). The electrode formation method using the plating method involves first obtaining a green ceramic body by firing it at a predetermined temperature, and then attaching an Ag-Pd alloy containing glass frit or Ag to both ends of the ceramic body. Usually, an active film is formed by attaching a metal paste such as and applying a baking process, followed by a process of laminating an electrode layer using a plating process. Problems to be Solved by the Invention However, in the method described above, since the activation paste is attached to the ceramic body after firing, the glass frit in the electrode paste penetrates into the ceramic body, causing cracks during the firing process. Furthermore, the glass components that have penetrated into the ceramic body due to the acid or alkali in the plating solution are eluted, reducing the adhesive strength of the electrode layer. Furthermore, in the above-mentioned process, in addition to firing the ceramic body, the activation paste must also be fired, so that the heat treatment takes time and inevitably increases costs.
蔵において、本発明は耐湿負荷等の信頼性を高め、しか
も相対的に簡略な工程で高い接着強度の電極層を安価に
形成することができるセラミック電子部品の電極形成方
法を提供することを目的とする.
課題を解決するための手段
本発明に係るセラミック電子部品の電極形成方法におい
ては、焼成前のセラミック素体の表面または両端部にP
d,Au,Pt,Rh等の耐熱性を有する金属レジネー
トを付着した後、そのセラミック素体に焼成処理を加え
て金属レジネートによる活性皮膜を表面または両端部に
焼付けたセラミック素体を得、この後に電気メッキ或い
は無電解メッキでセラミック素体の表面または両端部に
電極層を形成することが行なわれている。An object of the present invention is to provide a method for forming electrodes of ceramic electronic components, which improves reliability in terms of moisture resistance, etc., and can form electrode layers with high adhesive strength at low cost through relatively simple steps. Suppose that Means for Solving the Problems In the method for forming electrodes of ceramic electronic components according to the present invention, P is applied to the surface or both ends of the ceramic body before firing.
After attaching a heat-resistant metal resinate such as d, Au, Pt, Rh, etc., the ceramic body is subjected to firing treatment to obtain a ceramic body with an active film of metal resinate baked on the surface or both ends. Later, an electrode layer was formed on the surface or both ends of the ceramic body by electroplating or electroless plating.
作 用
このセラミック電子部品の電極形成方法では、セラミッ
ク素体の表面または両端部に金属レジネートを付着させ
てセラミック素体の焼成処理と共に活性皮膜として形成
するからクラックや電極強度の低下を招くガラス成分が
セラミック素体に浸透することがなく、また、工程的に
も金属レジネートの焼付け工程を省略できるところから
工程を簡略化させてコストの低減も図り得るようになる
。Function: In this method of forming electrodes for ceramic electronic components, metal resinate is attached to the surface or both ends of the ceramic body and formed as an active film during the firing process of the ceramic body, so glass components that can cause cracks and a decrease in electrode strength are removed. does not penetrate into the ceramic body, and the process of baking the metal resinate can be omitted, which simplifies the process and reduces costs.
実施例
この電極の形成方法は積層コンデンサ等のセラミック電
子部品を製造するのに適用できるものであり、それはB
aTiO.系,SrTi03C a T t O 3系
等の誘電体磁器材料を用いて製造することがでぎる.ま
ず、話電体磁器材料のグリーンシ一トにPd,Pd−A
g合金,Cu,Ni等で内部電極を形成し、そのグリー
ンシ一トを複数枚積層させて両端に並接続される内部電
極を有するグリーンのセラミック積層体を得る.次に、
このセラミック積層体の外部電極を形成する両端部には
Pd,Au.Pt,Rh等の高温で劣化しない耐熱性を
有する金属レジネートをジャブ付け等で付着する.その
後、グリーンのセラミック積層体に1300〜1400
℃程度で焼成処理を加えることにより有機溶剤を飛散す
ると同時に、金゛属レジネートを活性皮膜として形成す
る.この焼結されたセラミック積層体に電気メッキまた
は無電解メッキでメッキ処理を施せば、金属レジネート
による活性皮膜の形成部位にのみ両端部の外部電極とな
るメッキ膜を形成することができる。Example This electrode forming method can be applied to manufacturing ceramic electronic components such as multilayer capacitors, and it is
aTiO. It can be manufactured using dielectric ceramic materials such as SrTi03C a T t O 3 series. First, Pd, Pd-A was applied to the green sheet of the telephone porcelain material.
Internal electrodes are formed from g-alloy, Cu, Ni, etc., and a plurality of green sheets are laminated to obtain a green ceramic laminate having internal electrodes connected in parallel at both ends. next,
Both ends of the ceramic laminate forming external electrodes include Pd, Au. Attach a heat-resistant metal resinate such as Pt or Rh that does not deteriorate at high temperatures by jabbing or the like. After that, 1300 to 1400 was applied to the green ceramic laminate.
By applying a baking treatment at about ℃, the organic solvent is scattered and at the same time, the metal resinate is formed as an active film. If this sintered ceramic laminate is plated by electroplating or electroless plating, it is possible to form plating films that will serve as external electrodes at both ends only in the areas where the active film of metal resinate is to be formed.
このようにセラミック電子部品の端部電極を形成すれば
活性皮膜のガラス成分がセラミック素体に浸透すること
がないから端部電極層の成形下付近にクランクが生ずる
ことはなく、しかもそのガラス成分がメッキ液中の酸や
アルカリで電極層の形成下に溶出する事態も生じないた
めに電極の強度が低下することもない。これに加えて、
セラミック積層体の焼成処理で金属レジネートも焼付け
処理できるから製造工程も短縮することができる。If the end electrodes of ceramic electronic components are formed in this way, the glass component of the active film will not penetrate into the ceramic body, so cranks will not occur near the bottom of the molded end electrode layer, and moreover, the glass component will not penetrate into the ceramic body. There is no possibility that the electrode layer will be eluted due to acid or alkali in the plating solution, so the strength of the electrode will not be reduced. In addition to this,
Since the metal resinate can also be baked in the firing process of the ceramic laminate, the manufacturing process can also be shortened.
その工程に則って次の条件で積層コンデンサを製作し、
従来法による積層コンデンサと比較するべくクラックの
発生状況並びに耐湿負荷を確記したところ別表で示す結
果が得られた。A multilayer capacitor was manufactured according to the process under the following conditions,
In order to compare with conventional multilayer capacitors, we determined the occurrence of cracks and the moisture resistance load, and obtained the results shown in the attached table.
本発明の第1実施例として:
B a T 1 0 s系話電体磁器材料にグリーンシ
一トを用いてPdで内部電極を形成し、それを複数枚積
層させて内部電極を有するグリーンのセラミック積層体
を得、この両端部にPdレジネートをジャブ付けで付着
した後1300〜1400℃で焼成処理を加え、最後に
電気メッキでNi.Snを二層重ねたメッキ膜で端部電
極層を形成した.
本発明の第2実施例として:
セラミック積層体並びに金属レジネートには第1実施例
と同材料を用い、また、セラミック積層体の焼成工程ま
では同一の処理を行なった。As a first embodiment of the present invention: A green sheet is used to form an internal electrode of Pd on a B a T 10 s-based telephone porcelain material, and a plurality of sheets are laminated to form a green sheet with an internal electrode. A ceramic laminate was obtained, and after adhering Pd resinate to both ends by jabbing, it was fired at 1300 to 1400°C, and finally Ni. The end electrode layer was formed with a plating film consisting of two layers of Sn. As a second example of the present invention: The same materials as in the first example were used for the ceramic laminate and the metal resinate, and the same treatments were performed up to the firing process of the ceramic laminate.
端部電極層を形成するのにあたっては、Cuを無電解メ
ッキで付着することによりメッキ膜を形成した。In forming the end electrode layer, a plated film was formed by depositing Cu by electroless plating.
従来法として:
BaTi03系屈電体磁器材料のグリーンシ一トを用い
てPdで内部電極を形成し、それを複数枚積層させて内
部電極を有するグリーンのセラミック積層体を得た.こ
れに1 300〜1400℃で焼成処理を加えて両端部
にAg−Pd系ペーストを付着した後aOO℃で焼付処
理を施し、最後にNi,Snを二層重ねて電気メッキす
ることにより端部電極層を形成した.
その本発明の第1.2実施例並びに従来法で得た積層コ
ンデンサに対し、耐湿負荷は40℃95%RH 50
VDC印加で確認した。As a conventional method: Internal electrodes were formed using Pd using green sheets of BaTi03-based dielectric ceramic material, and a plurality of sheets were laminated to obtain a green ceramic laminate having internal electrodes. This is then fired at 1,300 to 1,400°C to adhere Ag-Pd paste to both ends, then baked at aOO°C, and finally two layers of Ni and Sn are electroplated to form the ends. An electrode layer was formed. For the multilayer capacitors obtained in Example 1.2 of the present invention and the conventional method, the humidity load was 40°C, 95% RH 50
Confirmed by applying VDC.
(表)
この試験結果から、本発明の実施例1.2による積層コ
ンデンサはクラツクが発生しないことは勿論、耐湿負荷
にも優れるものであることが分かる。(Table) From the test results, it can be seen that the multilayer capacitor according to Example 1.2 of the present invention not only does not generate cracks but also has excellent moisture load resistance.
なお、上述した実施例は積層コンデンサを製造する場合
を例示したが、抵抗やサーミスタ等のセラミック電子部
品を製造する場合にも適用することができる.
発明の効果
以上の如く、本発明に係るセラミック電子部品の電極形
成方法によれば、クラツクの発生や電極の接合強度を低
下する等を招かないところから歩留りを向上で籾、また
、工程を簡略化でぎることによりコストの低減を図るこ
とを可能にするものである.In addition, although the above-mentioned embodiment illustrated the case of manufacturing a multilayer capacitor, it can also be applied to the case of manufacturing ceramic electronic components such as resistors and thermistors. Effects of the Invention As described above, according to the method for forming electrodes of ceramic electronic components according to the present invention, the yield can be improved without causing cracks or deterioration of the bonding strength of the electrodes, and the process can be simplified. This makes it possible to reduce costs by making it possible to reduce costs.
Claims (1)
u,Pt,Rh等の耐熱性を有する金属レジネートを付
着した後、そのセラミック素体に焼成処理を加えて金属
レジネートによる活性皮膜を表面または両端部に焼付け
たセラミック素体を得、この後に電気メッキ或いは無電
解メッキでセラミック素体の表面または両端部に電極層
を形成することを特徴とするセラミック電子部品の電極
形成方法。Pd and A are applied to the surface or both ends of the ceramic body before firing.
After attaching a heat-resistant metal resinate such as U, Pt, Rh, etc., the ceramic body is subjected to a firing process to obtain a ceramic body with an active film of metal resinate baked on the surface or both ends. 1. A method for forming electrodes for ceramic electronic components, which comprises forming an electrode layer on the surface or both ends of a ceramic body by plating or electroless plating.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1114754A JPH02294007A (en) | 1989-05-08 | 1989-05-08 | Formation of ceramic electronic component electrode |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1114754A JPH02294007A (en) | 1989-05-08 | 1989-05-08 | Formation of ceramic electronic component electrode |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02294007A true JPH02294007A (en) | 1990-12-05 |
Family
ID=14645849
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1114754A Pending JPH02294007A (en) | 1989-05-08 | 1989-05-08 | Formation of ceramic electronic component electrode |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02294007A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004040084A (en) * | 2002-04-15 | 2004-02-05 | Avx Corp | Plated terminal |
JP2004040085A (en) * | 2002-04-15 | 2004-02-05 | Avx Corp | Component formation by plating technique |
JP2004312023A (en) * | 2003-04-08 | 2004-11-04 | Avx Corp | Plated termination |
JP2009224802A (en) * | 2003-04-08 | 2009-10-01 | Avx Corp | Method for forming electroless plating termination |
-
1989
- 1989-05-08 JP JP1114754A patent/JPH02294007A/en active Pending
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004040084A (en) * | 2002-04-15 | 2004-02-05 | Avx Corp | Plated terminal |
JP2004040085A (en) * | 2002-04-15 | 2004-02-05 | Avx Corp | Component formation by plating technique |
US9666366B2 (en) | 2002-04-15 | 2017-05-30 | Avx Corporation | Method of making multi-layer electronic components with plated terminations |
US10020116B2 (en) | 2002-04-15 | 2018-07-10 | Avx Corporation | Plated terminations |
US10366835B2 (en) | 2002-04-15 | 2019-07-30 | Avx Corporation | Plated terminations |
US11195659B2 (en) | 2002-04-15 | 2021-12-07 | Avx Corporation | Plated terminations |
JP2004312023A (en) * | 2003-04-08 | 2004-11-04 | Avx Corp | Plated termination |
JP2004327983A (en) * | 2003-04-08 | 2004-11-18 | Avx Corp | Plated termination |
JP2009224802A (en) * | 2003-04-08 | 2009-10-01 | Avx Corp | Method for forming electroless plating termination |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP3444826B2 (en) | Array type multi-chip device and method of manufacturing the same | |
JP3758293B2 (en) | Multilayer ceramic electronic component and manufacturing method thereof | |
JPH09180957A (en) | Multilayered ceramic capacitor | |
JPH0837127A (en) | Monolithic ceramic capacitor and its production | |
JP2992570B2 (en) | Ceramic multilayer capacitor and method of manufacturing the same | |
JPS63300507A (en) | Formation of electrode of laminated ceramic electronic component | |
JP4083971B2 (en) | Multilayer ceramic electronic component and manufacturing method thereof | |
JPH02294007A (en) | Formation of ceramic electronic component electrode | |
JP2000182883A (en) | Manufacture of laminated ceramic electronic component | |
JPH04188813A (en) | Composite ceramic capacitor and manufacture thereof | |
JPH097878A (en) | Ceramic electronic part and manufacture thereof | |
JPS6342879B2 (en) | ||
JPH097879A (en) | Ceramic electronic part and manufacture thereof | |
JPH0136243B2 (en) | ||
JPH0897075A (en) | Production of ceramic device | |
JPH0729773A (en) | Terminal electrode forming method of chip type electronic part | |
JPH08148371A (en) | Multilayer ceramic capacitor | |
JPH10163067A (en) | External electrode of chip electronic component | |
JP2996016B2 (en) | External electrodes for chip-type electronic components | |
JPS62242324A (en) | Chip capacitor | |
JP2000299243A (en) | Laminated chip type electronic component | |
JPH04154104A (en) | Laminated ceramic capacitor | |
JPS634332B2 (en) | ||
JPH04273418A (en) | Laminated ceramic capacitor | |
JPH0774445A (en) | Thick film conductor and manufacture thereof |