JPH02290061A - 半導体装置の作製方法 - Google Patents

半導体装置の作製方法

Info

Publication number
JPH02290061A
JPH02290061A JP2064882A JP6488290A JPH02290061A JP H02290061 A JPH02290061 A JP H02290061A JP 2064882 A JP2064882 A JP 2064882A JP 6488290 A JP6488290 A JP 6488290A JP H02290061 A JPH02290061 A JP H02290061A
Authority
JP
Japan
Prior art keywords
region
film
semiconductor
substrate
insulating film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2064882A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0532909B2 (enExample
Inventor
Shunpei Yamazaki
舜平 山崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semiconductor Energy Laboratory Co Ltd
Original Assignee
Semiconductor Energy Laboratory Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semiconductor Energy Laboratory Co Ltd filed Critical Semiconductor Energy Laboratory Co Ltd
Priority to JP2064882A priority Critical patent/JPH02290061A/ja
Publication of JPH02290061A publication Critical patent/JPH02290061A/ja
Publication of JPH0532909B2 publication Critical patent/JPH0532909B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Semiconductor Memories (AREA)
  • Semiconductor Integrated Circuits (AREA)
JP2064882A 1990-03-15 1990-03-15 半導体装置の作製方法 Granted JPH02290061A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2064882A JPH02290061A (ja) 1990-03-15 1990-03-15 半導体装置の作製方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2064882A JPH02290061A (ja) 1990-03-15 1990-03-15 半導体装置の作製方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP55141316A Division JPS5764965A (en) 1980-10-08 1980-10-08 Semiconductor device

Publications (2)

Publication Number Publication Date
JPH02290061A true JPH02290061A (ja) 1990-11-29
JPH0532909B2 JPH0532909B2 (enExample) 1993-05-18

Family

ID=13270924

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2064882A Granted JPH02290061A (ja) 1990-03-15 1990-03-15 半導体装置の作製方法

Country Status (1)

Country Link
JP (1) JPH02290061A (enExample)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5764965A (en) * 1980-10-08 1982-04-20 Semiconductor Energy Lab Co Ltd Semiconductor device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5764965A (en) * 1980-10-08 1982-04-20 Semiconductor Energy Lab Co Ltd Semiconductor device

Also Published As

Publication number Publication date
JPH0532909B2 (enExample) 1993-05-18

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