JPH02283969A - 'o' ring - Google Patents

'o' ring

Info

Publication number
JPH02283969A
JPH02283969A JP64000158A JP15889A JPH02283969A JP H02283969 A JPH02283969 A JP H02283969A JP 64000158 A JP64000158 A JP 64000158A JP 15889 A JP15889 A JP 15889A JP H02283969 A JPH02283969 A JP H02283969A
Authority
JP
Japan
Prior art keywords
ring
solid lubricant
vacuum
solid
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP64000158A
Other languages
Japanese (ja)
Inventor
Yasuo Tokunaga
徳永 康夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Heavy Industries Ltd
Original Assignee
Sumitomo Heavy Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Heavy Industries Ltd filed Critical Sumitomo Heavy Industries Ltd
Priority to JP64000158A priority Critical patent/JPH02283969A/en
Publication of JPH02283969A publication Critical patent/JPH02283969A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To make it possible to make up an 'O' ring lubricant applied on which will never be evaporated in a high vacuum by applying a solid lubricant by means of sputtering, ion plating, gaseous phase growing method or the like. CONSTITUTION:An 'O' ring is molded out of biton made of fluoro-rubber, nitro butadien rubber or the like, and is applied with a solid lubricating film 2 the surface of which is made up out of solid lubricant. As solid lubricant, a material is used, which has low vapor pressure, a low frictional coefficient, soft and slippery nature, and easily becomes familiar with the other parties. Coating is effected by means of sputtering, ion plating, gaseous phase growing method or the like so that its film is as thin as several mum to tens of mum. Then, when the 'O' ring 1 the surface of which is applied with the solid lubricating film, and each back-up ring 4 are fitted onto a vacuum container in interchangeable relation via a presser cap 5, which results in the presence of the solid lubricating film between a quartz reactor 3 and the 'O' ring 1 so that the quartz reactor 3 can be smoothly fitted onto the vacuum container.

Description

【発明の詳細な説明】 [産業上の利用分野コ 本考案は真空装置の密封手段に使用されるOリングに関
する。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to an O-ring used as a sealing means for a vacuum device.

[従来の技術] 従来、第3図に示すような真空蒸着装置において、真空
槽6と石英リアクタ3との容器内を超高真空にするため
に、前記真空槽6と石英リアクタ3との間にOリング1
を介在させている。そして、第4図に示すように石英リ
アクタ3を真空槽6にセットする際、0リング1と石英
リアクタ3との馴染みや滑りを良くするために、Oリン
グ1の表面にはグリースやオイル等の潤滑剤が塗布され
ていた。
[Prior Art] Conventionally, in a vacuum evaporation apparatus as shown in FIG. 3, in order to create an ultra-high vacuum inside the vacuum chamber 6 and the quartz reactor 3, a O-ring 1
is interposed. When setting the quartz reactor 3 in the vacuum chamber 6 as shown in FIG. lubricant was applied.

[考案が解決しようとする課題] しかしながら、グリースやオイル等の潤滑剤が塗布され
たOリングを真空蒸着装置の超高真空シール用に使用す
ると、そのグリースやオイル等が低真空の為に蒸発して
真空蒸着装置における成膜中にそれらのカーボン成分が
膜の中へ取込まれて膜の純度を低下させ、成膜の低下を
もたらすという欠点がある。
[Problem that the invention aims to solve] However, when an O-ring coated with lubricant such as grease or oil is used for an ultra-high vacuum seal in a vacuum evaporation device, the grease or oil evaporates due to the low vacuum. There is a drawback that these carbon components are incorporated into the film during film formation in a vacuum evaporation apparatus, reducing the purity of the film and resulting in a deterioration in film formation.

従って、高純度の成膜を必要とする装置の場合には、グ
リースやオイル等の潤滑剤が塗布されていないOリング
を使用している。このため、第4図に示すように、真空
槽6に石英リアクタ3をセットする際、Oリング1と石
英リアクタ3との沿り不良でOリング1が石英リアクタ
3により下方に押される等して、石英リアクタ3のOリ
ング1への挿入不良、及び石英リアクタやOリングの破
損等を起こすという欠点がある。
Therefore, in the case of an apparatus that requires high-purity film formation, an O-ring that is not coated with a lubricant such as grease or oil is used. For this reason, when setting the quartz reactor 3 in the vacuum chamber 6, as shown in FIG. Therefore, there are drawbacks such as improper insertion of the quartz reactor 3 into the O-ring 1 and damage to the quartz reactor and the O-ring.

本考案の目的は、上記欠点を除去し、Oリング表面の潤
滑剤が高真空下において蒸発しないようなOリングを提
供することにある。
An object of the present invention is to eliminate the above-mentioned drawbacks and provide an O-ring in which the lubricant on the O-ring surface does not evaporate under high vacuum.

[課題を解決するための手段] 上記目的を達成するために本考案におけるOリングは、
スパッタ・イオンブレーティング・気相成長法等の方法
により、表面に固体潤滑剤がコーティングされて成るも
のである。
[Means for solving the problem] In order to achieve the above object, the O-ring in the present invention has the following features:
The surface is coated with a solid lubricant using methods such as sputtering, ion blasting, and vapor phase growth.

[実施例] 次に本考案について図面を参照して説明する。[Example] Next, the present invention will be explained with reference to the drawings.

第1図は、本考案の一実施例を示すOリングである。FIG. 1 shows an O-ring showing an embodiment of the present invention.

第1図において、0リング1は、フッソゴムのパイトン
(商品名)又は、ニトリルブタジェンゴム(N B R
)等で成されており、その表面が固体潤滑剤から成る固
体潤滑膜2でコーティングされている。固体潤滑剤とし
ては、蒸気圧力及び摩擦係数が低く、軟らかい材料で相
手材との馴染み及び滑りが良いMo S2 、Au、A
g5P b、I n笠を用いる。このコーティングは、
例えば、スパッタ、イオンプレーテング、気相成長法(
CVD)等の方法で行われ、その膜厚は、例えば、数μ
mから数10μmで形成されている。
In FIG. 1, the O-ring 1 is made of fluoro rubber Paiton (trade name) or nitrile butadiene rubber (NBR
), the surface of which is coated with a solid lubricant film 2 made of a solid lubricant. Solid lubricants include MoS2, Au, and A, which have low vapor pressure and friction coefficient, and are soft materials that have good compatibility with and slip on the mating material.
g5P b, I n shade is used. This coating is
For example, sputtering, ion plating, vapor phase growth (
CVD), and the film thickness is, for example, several microns.
m to several tens of micrometers.

第2図は蒸発剤8をOリングlの表面にコーティングす
るための真空蒸着装置(実施例はイオンプレーテング装
置である。)の正面図である。
FIG. 2 is a front view of a vacuum evaporation device (the embodiment is an ion plating device) for coating the surface of the O-ring 1 with the evaporator 8.

第2図において、真空蒸着装置は、電子ビーム加熱を行
う電子銃7と、電子銃7によって加熱蒸発して、0リン
グ1の表面にコーテングされて固体潤滑膜となる蒸発材
8と、RF(高周波周波数)コイル9と 転動するメツ
シュ状のaioと、該メツシュ状の籠lOを乾乾させる
ためのモータ11と、RF(高周波周波数)コイル9の
高周波電源12と、基板電源13と、ガス導入口14と
で構成されている。
In FIG. 2, the vacuum evaporation apparatus includes an electron gun 7 that performs electron beam heating, an evaporation material 8 that is heated and evaporated by the electron gun 7 and coated on the surface of the O-ring 1 to form a solid lubricant film, and an RF ( a high frequency) coil 9, a rolling mesh-like AIO, a motor 11 for drying the mesh-like cage 1O, a high-frequency power source 12 for the RF (high frequency) coil 9, a substrate power source 13, a gas It is composed of an inlet 14.

上記真空蒸着装置を使ってOリングの表面に蒸発1イを
コーテングする作用について説明する。
The operation of coating the surface of the O-ring with evaporation 1a using the vacuum evaporation apparatus described above will be explained.

メツシュ状の籠10内にOリング1をセットし、モータ
11によって、0リング1を転動させる。
An O-ring 1 is set in a mesh-like cage 10, and the O-ring 1 is rolled by a motor 11.

蒸発材8を蒸発源12を用いて蒸発させて蒸発成分を生
ぜしめ、蒸発成分とガス導入口14からの特定のガスと
を混合して混合ガスを生ぜしめる。
The evaporation material 8 is evaporated using the evaporation source 12 to produce an evaporation component, and the evaporation component and a specific gas from the gas inlet 14 are mixed to produce a mixed gas.

混合ガスがRF(高周波周波数)コイル9と高周波型i
!’XI2によって放電させられた高周波放電空間を通
過することにより、混合ガスをイオン化させる。そのイ
オン化させられた蒸発ガスは基板電源13によって加速
させて、0リング1の表面に固体潤滑膜を形成する。
The mixed gas is connected to an RF (high frequency) coil 9 and a high frequency type i.
! 'The mixed gas is ionized by passing through the high frequency discharge space discharged by XI2. The ionized vaporized gas is accelerated by the substrate power supply 13 to form a solid lubricant film on the surface of the O-ring 1.

本実施例では、蒸発材8を0リングの表面にコーティン
グするために、イオンブレーティング法を用いたが、C
VD、スパッタ等の方法でも同様に行うことができる。
In this example, an ion blating method was used to coat the surface of the O-ring with the evaporation material 8.
The same method can be used such as VD and sputtering.

上記方法により、固体潤滑膜で表面がコーティングされ
たOリングとバックアップリング4とを交互に押えキャ
ブ5を介して真空槽に装着後、石英リアクタ3とOリン
グ1との間には固体潤滑膜が存在することになり、石英
リアクタ3はスムーズに真空槽に装着される。
By the above method, the O-ring whose surface is coated with a solid lubricant film and the backup ring 4 are alternately held and installed in a vacuum chamber via the cab 5, and then a solid lubricant film is formed between the quartz reactor 3 and the O-ring 1. exists, and the quartz reactor 3 is smoothly installed in the vacuum chamber.

[考案の効果] 以上説明したように本考案は、Oリングの表面に固体潤
滑剤をコーティングすることによって、石英リアクタの
0リングへの挿入不良による真空漏れや破損等を防止す
ることができると共に、超高真空下においても固体潤滑
剤が蒸発しないから高純度の成膜作業が可能となる等の
効果がある。
[Effects of the invention] As explained above, the present invention can prevent vacuum leakage and damage due to improper insertion of the quartz reactor into the O-ring by coating the surface of the O-ring with a solid lubricant. Since the solid lubricant does not evaporate even under ultra-high vacuum conditions, it is possible to form a film with high purity.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本考案の一実施例によるOリングの(1■造を
示す外観図、第2図は蒸発剤をOリング1の表向にコー
ティングするための真空蒸着装置の正面図、第3図は石
英リアクタを真空槽にセット完了した状態を示す真空装
置の縦断面図、第4図は従来の0リングを装着した真空
蒸着装置の部分縦断面図である。 図において 1・・0リング、2・・・固体潤滑膜、3・・・石英リ
アクタ、4・・バックアップリング、5・・押えキャッ
プ、6・・・真空槽、7・・・電子銃、8・・・蒸発材
料、9・・・RFコイル、10・・・メツシュ状の籠、
11・・・モータ、12・・高周波電源、13・・・基
板電源、14・ガス導入口。 第1図 第2図 手 続 :?rt3 正 書 (方式) %式% 発明の名称 Oリング 3゜ 補正をする者 事件との関係
Fig. 1 is an external view showing the construction of an O-ring according to an embodiment of the present invention; Fig. 2 is a front view of a vacuum evaporation device for coating the surface of the O-ring 1 with an evaporating agent; The figure is a vertical cross-sectional view of a vacuum apparatus showing a state in which a quartz reactor has been completely set in a vacuum chamber, and Figure 4 is a partial vertical cross-sectional view of a vacuum evaporation apparatus equipped with a conventional O-ring. , 2... Solid lubricant film, 3... Quartz reactor, 4... Backup ring, 5... Holder cap, 6... Vacuum chamber, 7... Electron gun, 8... Evaporation material, 9 ...RF coil, 10...mesh-like cage,
11... Motor, 12... High frequency power supply, 13... Board power supply, 14. Gas inlet. Figure 1 Figure 2 Procedure:? rt3 Ordinary text (method) % formula % Name of the invention O-ring 3゜Relationship with the person who makes the amendment

Claims (1)

【特許請求の範囲】[Claims] 1、スパッタ・イオンプレーティング・気相成長法等の
方法により、表面に固体潤滑剤がコーティングされてい
ることを特徴とするOリング。
1. An O-ring whose surface is coated with a solid lubricant by a method such as sputtering, ion plating, or vapor phase growth.
JP64000158A 1989-01-05 1989-01-05 'o' ring Pending JPH02283969A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP64000158A JPH02283969A (en) 1989-01-05 1989-01-05 'o' ring

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP64000158A JPH02283969A (en) 1989-01-05 1989-01-05 'o' ring

Publications (1)

Publication Number Publication Date
JPH02283969A true JPH02283969A (en) 1990-11-21

Family

ID=11466234

Family Applications (1)

Application Number Title Priority Date Filing Date
JP64000158A Pending JPH02283969A (en) 1989-01-05 1989-01-05 'o' ring

Country Status (1)

Country Link
JP (1) JPH02283969A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005326008A (en) * 2004-05-11 2005-11-24 Arkema Device for fixing pipe being sealed at position of entry into container

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005326008A (en) * 2004-05-11 2005-11-24 Arkema Device for fixing pipe being sealed at position of entry into container

Similar Documents

Publication Publication Date Title
US4468309A (en) Method for resisting galling
EP0838831A3 (en) Electron emissive film and method
KR850007987A (en) Thin Film Manufacturing Method
JPH02283969A (en) 'o' ring
KR950000311B1 (en) Vacuum evaporator
JPH01129958A (en) Formation of titanium nitride film having high adhesive strength
US4606929A (en) Method of ionized-plasma spraying and apparatus for performing same
RU154033U1 (en) DEVICE FOR APPLICATION OF THIN FILM COATINGS
JPS6320445A (en) Ion plating
Kennedy et al. TiN coating of the PEP-II low-energy aluminum arc vacuum chambers
JPH04276062A (en) Arc deposition device
JPH06207691A (en) Conflat flange for vacuum seal and manufacture thereof
JPS6027790A (en) Cryopump
JPH0428861A (en) Film forming device using hollow cathode electron gun
JPS5841351B2 (en) Katsuseikahannoujiyouchiyakuuchi
RU1808024C (en) Device for vacuum reactive magnetron application of coatings
JPS6179760A (en) Formation of aluminum oxide film by activated reactive ion plating
KR100362529B1 (en) Coating method
JPH0310061A (en) Formation of oxide film
GB1339565A (en) Method and apparatus for passivating a metallic surface
JPH04180551A (en) Formation of thin film of nitrogen-doped tantalum
EP0032709A3 (en) Apparatus and method for the (patterned) coating of a substrate by cathodic sputtering and use thereof
JPH0311226Y2 (en)
JPS62283258A (en) Piston ring
JPS63243265A (en) High-frequency type ion plating device