JPH02248528A - Basement structure - Google Patents

Basement structure

Info

Publication number
JPH02248528A
JPH02248528A JP1073023A JP7302389A JPH02248528A JP H02248528 A JPH02248528 A JP H02248528A JP 1073023 A JP1073023 A JP 1073023A JP 7302389 A JP7302389 A JP 7302389A JP H02248528 A JPH02248528 A JP H02248528A
Authority
JP
Japan
Prior art keywords
foundation
basement
retaining wall
underground
excavating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1073023A
Other languages
Japanese (ja)
Other versions
JP2618033B2 (en
Inventor
Taira Nakai
中井 平
Kikuji Hoshino
星野 菊次
Tetsuo Shimizu
清水 哲穂
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sekisui Chemical Co Ltd
Original Assignee
Sekisui Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sekisui Chemical Co Ltd filed Critical Sekisui Chemical Co Ltd
Priority to JP1073023A priority Critical patent/JP2618033B2/en
Publication of JPH02248528A publication Critical patent/JPH02248528A/en
Application granted granted Critical
Publication of JP2618033B2 publication Critical patent/JP2618033B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PURPOSE:To contrive to shorten term or works by constructing a basement structure of an underground upper part formed by excavating the inside part of a foundation in a way that the foundation functions as a retaining wall and an underground lower part formed by excavating the ground at a position drawn near toward the inside from the foundation by specified width and in a depth depper than the foundation. CONSTITUTION:A basement structure is constructed of an upper underground part 1a formed by excavating the inside part of a foundation 2 in a way that the foundation 2 functions as a retaining wall and a lower underground part 1b formed by excavating the ground at a position drawn near toward the inside from the foundation 2 by specified widths and in a depth deeper than the foundation 2. The lower part 1b is provided with a bottom wall 3, retaining walls 4, and bottom boards 5 are installed between the foundation 2 and the retaining walls 4. At the same time, columns 6 are connected to the retaining walls 4 as extensions therefrom, making the columns 6 reinforcing members for the foundation 2. Then the foundation 2 and the retaining walls 4 are structured in lower perpendicular height than a conventional structure. Therefore term of works can be shortened and construction cost can be reduced too.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、建物の地下室構造に関する。[Detailed description of the invention] (Industrial application field) The present invention relates to basement structures for buildings.

(従来の技術) 従来、建物の地下室構造としては、例えば、実開昭57
−235号公報や実開昭61−37337号公報に記載
されているようなものが知られている。
(Prior art) Conventionally, as a basement structure of a building, for example,
Those described in Japanese Utility Model Publication No.-235 and Japanese Utility Model Application Publication No. 61-37337 are known.

これら従来の地下室構造は、建物の基礎が地下室の擁壁
を兼ねるように構成されており、地下室はほぼ均一の深
さに掘削されていた。
These conventional basement structures are constructed so that the foundation of the building also serves as a retaining wall for the basement, and the basement is excavated to a substantially uniform depth.

(発明が解決しようとする課題) しかしながら、このような従来の地下室構造にあっては
、地下室の擁壁は、その鉛直高さがかなり高いものにな
るので、擁壁にはかなり大きい土庄が作用することにな
る。ちなみに、擁壁01に作用する単位幅当りの水平合
力PAと、擁壁01の転倒モーメントMは下式で算出さ
れ、前記水平合力PAは擁壁O1の高さHの二乗に比例
し、転倒モーメントMは擁壁O1の高さHの三乗に比例
する(第4図参照)。
(Problem to be solved by the invention) However, in such a conventional basement structure, the retaining wall of the basement has a fairly high vertical height, so a fairly large earthen wall acts on the retaining wall. I will do it. Incidentally, the horizontal resultant force PA per unit width acting on the retaining wall 01 and the overturning moment M of the retaining wall 01 are calculated by the following formula, and the horizontal resultant force PA is proportional to the square of the height H of the retaining wall O1, and the overturning moment M of the retaining wall 01 is calculated by the following formula. The moment M is proportional to the cube of the height H of the retaining wall O1 (see FIG. 4).

KA:主動土庄係数 γ :土の単位体積当りの重量 従って、従来構造のように擁壁を高くする場合には、擁
壁の底板な支える地盤を強化する必要が生じ、更に地下
室の掘削深さが2m以上の場合には、山留めも必要にな
る。これらにより工期が長び(と共に、建設コストが高
くなるという問題があった。
KA: Active soil strength coefficient γ: Weight per unit volume of soil Therefore, when making a retaining wall higher like in a conventional structure, it becomes necessary to strengthen the supporting ground such as the bottom plate of the retaining wall, and the excavation depth of the basement also increases. If the height is 2m or more, a mountain retainer will also be required. These problems led to longer construction times (and higher construction costs).

本発明は、上記従来の問題に着目し、工期の短縮化及び
建設コストの削減を図ることができる地下室構造を提供
することを目的としている。
The present invention focuses on the above-mentioned conventional problems and aims to provide a basement structure that can shorten the construction period and reduce construction costs.

(課題を解決するための手段) 上記目的を達成するために1本発明の地下室構造は、基
礎が擁壁となるように基礎の内側の地盤を掘削して形成
された地下上層部と、前記基礎から所定幅内側の地盤を
基礎よりも深く掘削して形成された地下下層部と、で地
下室が構成されているものである。
(Means for Solving the Problems) In order to achieve the above object, the basement structure of the present invention includes: an upper underground portion formed by excavating the ground inside the foundation so that the foundation serves as a retaining wall; The basement consists of a lower underground layer formed by excavating the ground within a predetermined width from the foundation deeper than the foundation.

(作 用) 本発明の地下室構造では、地下室の擁壁を、地下上層部
の擁壁と地下下層部の擁壁とで分割構成できるので、そ
れぞれの擁壁の鉛直高さを従来構造の擁壁に比べて低く
することができる。従って、従来構造の場合と比較して
各擁壁に作用する土圧が極めて小さ(なる。
(Function) In the basement structure of the present invention, the retaining wall of the basement can be divided into a retaining wall in the upper part of the basement and a retaining wall in the lower part of the basement, so the vertical height of each retaining wall is equal to that of the retaining wall of the conventional structure. It can be lower than the wall. Therefore, compared to the conventional structure, the earth pressure acting on each retaining wall is extremely small.

(実施例) 以下、本発明の実施例を図面により詳述する。(Example) Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

まず、第1図〜第3図に基づいて実施例の構成を説明す
る。
First, the configuration of the embodiment will be explained based on FIGS. 1 to 3.

第1図は、本実施例の地下室構造を示した斜視図、第2
図及び第3図は前記地下室構造を示した縦断面図で、■
は地下室、2は基礎である。
Figure 1 is a perspective view showing the basement structure of this embodiment, Figure 2 is a perspective view showing the basement structure of this embodiment;
Figures 3 and 3 are vertical cross-sectional views showing the basement structure;
is the basement, and 2 is the foundation.

前記地下室lは、基礎2が擁壁となるように基礎2の内
側の地盤を掘削して形成された地下上層部1aと、前記
基礎2から所定幅内側の地盤を基礎2よりも深く掘削し
て形成された地下下層部lれている場合には、地下上層
部1aを深さ1.0mm削すると共に、地下下層部1b
を深さ0.8m掘削することで、最大深さ2mの地下空
間が得られることになる。
The basement 1 includes an upper underground part 1a formed by excavating the ground inside the foundation 2 so that the foundation 2 serves as a retaining wall, and an underground upper layer 1a formed by excavating the ground within a predetermined width from the foundation 2 deeper than the foundation 2. If the lower underground layer formed by
By excavating to a depth of 0.8m, an underground space with a maximum depth of 2m will be obtained.

また、前記地下下層部1bには、コンクリートによって
底壁3と擁壁4とが構築されており、地下上層部1aの
擁壁な兼ねる基礎2と、前記地下下層部1bの擁壁4と
の間には、地下上層部1aの底板5が張設されている。
In addition, a bottom wall 3 and a retaining wall 4 are constructed of concrete in the lower underground part 1b, and a foundation 2 which also serves as a retaining wall in the upper underground part 1a and a retaining wall 4 in the lower underground part 1b are connected to each other. A bottom plate 5 of the upper underground part 1a is stretched between them.

尚、前記地下下層部Ibの擁壁4には、部分的に基礎2
と同じ高さまで柱6が延設されており、該柱6が基礎2
の補強材となっている。
Note that the retaining wall 4 of the lower underground part Ib is partially covered with the foundation 2.
A column 6 is extended to the same height as the foundation 2.
It is a reinforcing material.

また前記地下室lは、物置として使用されるよう一面が
外に開口されており、この開口部7の下には、外の地面
と地下下層部ibの底壁3との段差間に1階段8と自転
車用傾斜路面9が形成されている。
Moreover, one side of the basement l is opened to the outside so that it can be used as a storeroom, and below this opening 7 there is a staircase 8 between the level difference between the outside ground and the bottom wall 3 of the lower basement part ib. A bicycle ramp surface 9 is formed.

次に実施例の作用を説明する。Next, the operation of the embodiment will be explained.

本発明の地下室構造では、地下室lの擁壁が、地下上層
部1aの擁壁(基礎2)と地下下層部1bの擁壁4とで
分割構成されているので、基礎2の鉛直高さと擁壁4の
鉛直高さを、従来構造の擁壁に比べて低(することがで
きる。従って、基礎2及び擁壁4に作用する土庄が極め
て小さくなる。即ち、地盤の強化を必要としないので、
工期の短縮化及び建設コストの削減を図ることができる
In the basement structure of the present invention, the retaining wall of the basement l is divided into the retaining wall (foundation 2) of the upper basement part 1a and the retaining wall 4 of the lower basement part 1b. The vertical height of the wall 4 can be made lower than that of a retaining wall with a conventional structure. Therefore, the amount of soil that acts on the foundation 2 and the retaining wall 4 is extremely small. In other words, there is no need to strengthen the ground. ,
It is possible to shorten the construction period and reduce construction costs.

尚、地下上層部1aの基礎2と地下下層部1bの擁壁4
との間隔Aと、前記基礎2と地下下層部tbの底壁3と
の間隔Bから得られる角度αは、土の内部摩擦角よりも
小さくすることが好ましい。即ち、基礎2と地下下層部
tbの擁壁4との間隔Aが広い程、基礎2の力が地下下
層部1bの擁壁4に加わらないし、基礎2周縁の地盤が
荒されず基礎2の沈下を防止できるので好ましい。
In addition, the foundation 2 of the upper underground part 1a and the retaining wall 4 of the lower underground part 1b
It is preferable that the angle α obtained from the distance A between the foundation 2 and the bottom wall 3 of the underground lower part tb be smaller than the internal friction angle of the soil. That is, the wider the distance A between the foundation 2 and the retaining wall 4 of the lower underground part tb, the less the force of the foundation 2 will be applied to the retaining wall 4 of the lower underground part 1b, and the ground around the edge of the foundation 2 will not be roughened. This is preferable because it can prevent subsidence.

以上、本発明の実施例を図面により詳述してきたが、具
体的な構成はこの実施例に限られるものではなく本発明
の要旨を逸脱しない範囲の設計変更等があっても本発明
に含まれる。
Although the embodiments of the present invention have been described above in detail with reference to the drawings, the specific configuration is not limited to these embodiments, and even if there are design changes within the scope of the gist of the present invention, they are included in the present invention. It will be done.

例えば、実施例では、物置として使用される地下室を例
にとって説明したが、居室として使用される地下室に適
用してもよい。
For example, in the embodiment, a basement used as a storeroom has been described as an example, but the present invention may also be applied to a basement used as a living room.

また、実施例では、地下下層部にコンクリートにより擁
壁を設けて山留めを施したが、地下下層部の深さが2m
に達しない場合は、山留めをしなくてもよい。即ち、山
留めを簡略化することにより、更に工期の短縮化及び建
設コストの削減を図ることができる。
In addition, in the example, a retaining wall was provided with concrete in the lower underground layer to provide mountain retaining, but the depth of the lower underground layer was 2 m.
If the height is not reached, there is no need to hold the pile. That is, by simplifying the pile retaining, it is possible to further shorten the construction period and reduce construction costs.

(発明の効果) 以上説明してきたように、本発明の地下室構造にあって
は、地盤の強化や山留めを必要としないので、工期の短
縮化及び建設コストの削減を図ることができる。
(Effects of the Invention) As described above, the basement structure of the present invention does not require ground reinforcement or mountain retaining, so it is possible to shorten the construction period and reduce construction costs.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明実施例の地下室構造を示す斜視図、第2
図は第1図のII −II断面図、第3図は第1図のI
II −III断面図、第4図は擁壁に作用する水平合
力及び転倒モーメントを説明するための縦断面図である
。 1・・・地下室 la−・・地下上層部 lb・・・地下下層部 2・・・基礎
Fig. 1 is a perspective view showing the basement structure of the embodiment of the present invention;
The figure is a cross-sectional view taken along line II-II in figure 1, and figure 3 is a cross-sectional view taken along line I in figure 1.
The II-III sectional view and FIG. 4 are vertical sectional views for explaining the horizontal resultant force and overturning moment acting on the retaining wall. 1...Basement la-...Upper basement lb...Lower underground 2...Foundation

Claims (1)

【特許請求の範囲】[Claims] 1)基礎が擁壁となるように基礎の内側の地盤を掘削し
て形成された地下上層部と、前記基礎から所定幅内側の
地盤を基礎よりも深く掘削して形成された地下下層部と
、で地下室が構成されていることを特徴とする地下室構
造。
1) An upper underground layer formed by excavating the ground inside the foundation so that the foundation serves as a retaining wall, and a lower underground layer formed by excavating the ground within a predetermined width from the foundation deeper than the foundation. A basement structure characterized in that the basement is made up of .
JP1073023A 1989-03-23 1989-03-23 Basement structure Expired - Lifetime JP2618033B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1073023A JP2618033B2 (en) 1989-03-23 1989-03-23 Basement structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1073023A JP2618033B2 (en) 1989-03-23 1989-03-23 Basement structure

Publications (2)

Publication Number Publication Date
JPH02248528A true JPH02248528A (en) 1990-10-04
JP2618033B2 JP2618033B2 (en) 1997-06-11

Family

ID=13506329

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1073023A Expired - Lifetime JP2618033B2 (en) 1989-03-23 1989-03-23 Basement structure

Country Status (1)

Country Link
JP (1) JP2618033B2 (en)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS576025A (en) * 1980-06-14 1982-01-12 Matsushita Electric Works Ltd Half-basement under floor
JPS576056A (en) * 1980-06-14 1982-01-12 Matsushita Electric Works Ltd Underground storage under floor
JPS5721632A (en) * 1980-07-15 1982-02-04 Matsushita Electric Works Ltd Structure of semiunderground depository
JPS5880456U (en) * 1981-11-25 1983-05-31 日立化成工業株式会社 underground structure
JPS5890248U (en) * 1981-12-15 1983-06-18 日立化成工業株式会社 underground structure
JPS5915170A (en) * 1982-07-13 1984-01-26 ミサワホ−ム株式会社 Under-floor storing structure

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS576025A (en) * 1980-06-14 1982-01-12 Matsushita Electric Works Ltd Half-basement under floor
JPS576056A (en) * 1980-06-14 1982-01-12 Matsushita Electric Works Ltd Underground storage under floor
JPS5721632A (en) * 1980-07-15 1982-02-04 Matsushita Electric Works Ltd Structure of semiunderground depository
JPS5880456U (en) * 1981-11-25 1983-05-31 日立化成工業株式会社 underground structure
JPS5890248U (en) * 1981-12-15 1983-06-18 日立化成工業株式会社 underground structure
JPS5915170A (en) * 1982-07-13 1984-01-26 ミサワホ−ム株式会社 Under-floor storing structure

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Publication number Publication date
JP2618033B2 (en) 1997-06-11

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