JP2618033B2 - Basement structure - Google Patents
Basement structureInfo
- Publication number
- JP2618033B2 JP2618033B2 JP1073023A JP7302389A JP2618033B2 JP 2618033 B2 JP2618033 B2 JP 2618033B2 JP 1073023 A JP1073023 A JP 1073023A JP 7302389 A JP7302389 A JP 7302389A JP 2618033 B2 JP2618033 B2 JP 2618033B2
- Authority
- JP
- Japan
- Prior art keywords
- basement
- foundation
- retaining wall
- wall
- present
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Description
【発明の詳細な説明】 （産業上の利用分野） 本発明は、建物の地下室構造に関する。Description: TECHNICAL FIELD The present invention relates to a basement structure of a building.
（従来の技術） 従来、建物の地下室構造としては、例えば、実開昭57
−235号公報や実開昭61−37337号公報に記載されている
ようなものが知られている。(Conventional technology) Conventionally, as a basement structure of a building, for example,
Japanese Unexamined Patent Application Publication No. 235/235 and Japanese Utility Model Application Laid-Open No. 61-37337 are known.
これら従来の地下室構造は、建物の基礎が地下室の擁
壁を兼ねるように構成されており、地下室はほぼ均一の
深さに掘削されていた。In these conventional basement structures, the foundation of the building also serves as a retaining wall of the basement, and the basement is excavated to a substantially uniform depth.
（発明が解決しようとする課題） しかしながら、このような従来の地下室構造にあって
は、地下室の擁壁は、その鉛直高さがかなり高いものに
なるので、擁壁にかなり大きい土圧が作用することにな
る。ちなみに、擁壁01に作用する単位幅当りの水平合力
PAと、擁壁01の転倒モーメントＭは下式で算出され、前
記水平合力PAは擁壁01の高さＨの二乗に比例し、転倒モ
ーメントＭは擁壁01の高さＨの三乗に比例する（第４図
参照）。(Problems to be Solved by the Invention) However, in such a conventional basement structure, since the vertical height of the retaining wall of the basement is considerably high, a considerably large earth pressure acts on the retaining wall. Will do. By the way, the horizontal resultant force per unit width acting on the retaining wall 01
And P A, overturning moment M of retaining wall 01 is calculated by the following equation, the horizontal force P A is proportional to the square of the height H of the retaining wall 01, the height H of the overturning moment M is retaining wall 01 three It is proportional to the power (see FIG. 4).
KA:主働土圧係数 γ：土の単位体積当りの重量 従って、従来構造のように擁壁を高くする場合には、
擁壁の底板を支える地盤を強化する必要が生じ、更に地
下室の掘削深さが2m以上の場合には、山留めも必要にな
る。これらにより工期が長びくと共に、建設コストが高
くなるという問題があった。 K A : Active earth pressure coefficient γ: Weight per unit volume of soil Therefore, when the retaining wall is made high as in the conventional structure,
If the ground supporting the bottom plate of the retaining wall needs to be strengthened, and if the excavation depth of the basement is more than 2 m, a pier is also required. As a result, there is a problem that the construction period is prolonged and the construction cost is increased.
本発明は、上記従来の問題に着目し、工期の短縮化及
び建設コストの削減を図ることができる地下室構造を提
供することを目的としている。SUMMARY OF THE INVENTION An object of the present invention is to provide a basement structure capable of shortening the construction period and reducing the construction cost, focusing on the above conventional problems.
（課題を解決するための手段） 上記目的を達成するために、本発明の地下室構造は、
基礎が擁壁となり、かつ基礎の内側面が地下室の内壁面
となるように基礎の内側の地盤を掘削して形成された上
層地下室部と、前記基礎から所定幅内側の地盤を基礎よ
りも深く掘削して形成された下層地下室部と、で地下室
が構成されているものである。(Means for Solving the Problems) In order to achieve the above object, the basement structure of the present invention comprises:
The foundation is a retaining wall, and the upper basement section formed by excavating the ground inside the foundation so that the inner surface of the foundation becomes the inner wall surface of the basement, and the ground within a predetermined width from the foundation deeper than the foundation The basement is composed of a lower basement formed by excavation.
（作 用） 本発明の地下室構造では、地下室の擁壁を、上層地下
室部の擁壁と下層地下室部の擁壁とで分割構成できるの
で、それぞれの擁壁の鉛直高さを従来構造の擁壁に比べ
て低くすることができる。従って、従来構造の場合と比
較して各擁壁に作用する土圧が極めて小さくなる。(Operation) In the basement structure of the present invention, the retaining wall of the basement can be divided into a retaining wall of the upper basement section and a retaining wall of the lower basement section. It can be lower than the wall. Therefore, the earth pressure acting on each retaining wall becomes extremely small as compared with the conventional structure.
（実施例） 以下、本発明の実施例を図面により詳述する。(Example) Hereinafter, an example of the present invention will be described in detail with reference to the drawings.
まず、第１図〜第３図に基づいて実施例の構成を説明
する。First, the configuration of the embodiment will be described based on FIG. 1 to FIG.
第１図は、本実施例の地下室構造を示した斜視図、第
２図及び第３図は前記地下室構造を示した縦断面図で、
１は地下室、２は基礎である。FIG. 1 is a perspective view showing the basement structure of the present embodiment, and FIGS. 2 and 3 are longitudinal sectional views showing the basement structure.
1 is a basement, 2 is a foundation.
前記地下室１は、基礎２が擁壁となり、か基礎の内側
面が地下室の内壁面となるように基礎２の内側の地盤を
掘削して形成された上層地下室部1aと、前記基礎２から
所定幅内側の地盤を基礎２よりも深く掘削して形成され
た下層地下室部1bと、で構成されている。例えば、高さ
1.4mの基礎２が地面から0.2m露出するように埋設されて
いる場合には、上層地下室部1aを深さ1.0m掘削すると共
に、下層地下室部1bを深さ0.8m掘削することで、最大深
さ2mの地下空間が得られることになる。The basement 1 includes an upper basement 1a formed by excavating the ground inside the foundation 2 so that the foundation 2 serves as a retaining wall and an inner surface of the foundation serves as an inner wall surface of the basement. And a lower basement 1b formed by excavating the ground inside the width deeper than the foundation 2. For example, height
When the 1.4m foundation 2 is buried so as to be exposed 0.2m from the ground, the excavation of the upper basement 1a to a depth of 1.0m and the excavation of the lower basement 1b to a depth of 0.8m will provide a maximum An underground space with a depth of 2m will be obtained.
また、前記下層地下室部1bには、コンクリートによっ
て底壁３と擁壁４とが構築されており、上層地下室部1a
の擁壁を兼ねる基礎２と、前記下層地下室部1bの擁壁４
との間には、上層地下室部1aの底板５が張設されてい
る。尚、前記下層地下室部1bの擁壁４には、部分的に基
礎２と同じ高さまで柱６が延設されており、該柱６が基
礎２の補強材となっている。In the lower basement 1b, a bottom wall 3 and a retaining wall 4 are constructed of concrete.
Foundation 2 which also serves as the retaining wall of the lower basement 1b
The bottom plate 5 of the upper basement 1a is stretched between them. A column 6 is partially extended from the retaining wall 4 of the lower basement 1b to the same height as the foundation 2, and the column 6 is a reinforcing material for the foundation 2.
また前記地下室１、物置として使用されるよう一面が
外に開口されており、この開口部７の下には、外の地面
と下層地下室部1bの底壁３との段差間に、階段８と自転
車用傾斜路面９が形成されている。The basement 1 has one side open so as to be used as a storeroom. Below this opening 7, a staircase 8 is provided between a step between the outside ground and the bottom wall 3 of the lower basement 1b. A bicycle slope 9 is formed.
次に実施例の作用を説明する。 Next, the operation of the embodiment will be described.
本発明の地下室構造では、地下室１の擁壁が、上層地
下室部1aの擁壁（基礎２）と下層地下室部1bの擁壁４と
で分割構成されているので、基礎２の鉛直高さと擁壁４
の鉛直高さを、従来構造の擁壁に比べて低くすることが
できる。従って、基礎２及び擁壁４に作用する土圧が極
めて小さくなる。即ち、地盤の強化を必要としないの
で、工期の短縮化及び建設コストの削減を図ることがで
きる。In the basement structure of the present invention, the retaining wall of the basement 1 is divided into the retaining wall (foundation 2) of the upper basement section 1a and the retaining wall 4 of the lower basement section 1b. Wall 4
Can be made lower than the retaining wall of the conventional structure. Therefore, the earth pressure acting on the foundation 2 and the retaining wall 4 becomes extremely small. That is, since it is not necessary to strengthen the ground, the construction period can be shortened and the construction cost can be reduced.
尚、上層地下室部1aの基礎２と下層地下室部1bの擁壁
４との間隔Ａと、前記基礎２と下層地下室部1bの底壁３
との間隔Ｂから得られる角度αは、土の内部摩擦角より
も小さくすることが好ましい。即ち、基礎２と下層地下
室部1bの基礎４との間隔Ａが広い程、基礎２の力が下層
地下室部1bの擁壁４に加わらないし、基礎２周縁の地盤
が荒されず基礎２の沈下を防止できるので好ましい。The distance A between the foundation 2 of the upper basement section 1a and the retaining wall 4 of the lower basement section 1b, and the bottom wall 3 of the base 2 and the lower basement section 1b.
Is preferably smaller than the internal friction angle of the soil. That is, as the distance A between the foundation 2 and the foundation 4 of the lower basement 1b is larger, the force of the foundation 2 is not applied to the retaining wall 4 of the lower basement 1b, and the ground around the periphery of the foundation 2 is not roughened and the settlement of the foundation 2 This is preferable because it can prevent
以上、本発明の実施例を図面により詳述してきたが、
具体的な構成はこの実施例に限られるものではなく本発
明の要旨を逸脱しない範囲の設計変更等があっても本発
明に含まれる。The embodiments of the present invention have been described in detail with reference to the drawings.
The specific configuration is not limited to this embodiment, and any change in the design without departing from the spirit of the present invention is included in the present invention.
例えば、実施例では、物置として使用される地下室を
例にとって説明したが、居室として使用される地下室に
適用してもよい。For example, in the embodiment, the basement used as a storage is described as an example, but the invention may be applied to a basement used as a living room.
また、実施例では、下層地下室部にコンクリートによ
り擁壁を設けて山留めを施したが、下層地下室部の深さ
が2mに達しない場合は、山留めをしなくてもよい。即
ち、山留めを簡略化することになり、更に工期の短縮化
及び建設コストの削減を図ることができる。In addition, in the embodiment, the retaining wall is made of concrete in the lower basement, and the mountain base is provided. However, if the depth of the lower basement does not reach 2 m, the mountain base may not be provided. That is, the stake is simplified, and the construction period can be further shortened and the construction cost can be reduced.
（発明の効果） 以上説明してきたように、本発明の地下室構造にあっ
ては、地盤の強化や山留めを必要としないので、工期の
短縮化及び建設コストの削減を図ることができる。(Effects of the Invention) As described above, the basement structure of the present invention does not require reinforcement of the ground or mountain retaining, so that the construction period can be shortened and the construction cost can be reduced.
第１図は本発明実施例の地下室構造を示す斜視図、第２
図は第１図のII−II断面図、第３図は第１図のIII−III
断面図、第４図は擁壁に作用する水平合力及び転倒モー
メントを説明するための縦断面図である。 １……地下室 1a……上層地下室部 1b……下層地下室部 ２……基礎FIG. 1 is a perspective view showing a basement structure according to an embodiment of the present invention, and FIG.
The figure is a sectional view taken along the line II-II in FIG. 1, and FIG. 3 is a sectional view taken along the line III-III in FIG.
FIG. 4 is a longitudinal sectional view for explaining the horizontal resultant force and the overturning moment acting on the retaining wall. 1 Basement 1a Upper basement 1b Lower basement 2 Foundation
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭57−21632（ＪＰ，Ａ) 特開 平２−125071（ＪＰ，Ａ) 実開 昭58−90248（ＪＰ，Ｕ) ──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-57-21632 (JP, A) JP-A-2-125071 (JP, A)
Claims (1)
下室の内壁面となるように基礎の内側の地盤を掘削して
形成された上層地下室部と、前記基礎から所定幅内側の
地盤を基礎よりも深く掘削して形成された下層地下室部
と、で地下室が構成されていることを特徴とする地下室
構造。An upper basement section formed by excavating the ground inside the foundation so that the foundation becomes a retaining wall and the inner side surface of the foundation becomes the inner wall surface of the basement, and a ground inside a predetermined width from the foundation. And a lower basement section formed by excavating the basement deeper than the foundation.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1073023A JP2618033B2 (en) | 1989-03-23 | 1989-03-23 | Basement structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1073023A JP2618033B2 (en) | 1989-03-23 | 1989-03-23 | Basement structure |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02248528A JPH02248528A (en) | 1990-10-04 |
| JP2618033B2 true JP2618033B2 (en) | 1997-06-11 |
Family
ID=13506329
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1073023A Expired - Lifetime JP2618033B2 (en) | 1989-03-23 | 1989-03-23 | Basement structure |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2618033B2 (en) |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS576025A (en) * | 1980-06-14 | 1982-01-12 | Matsushita Electric Works Ltd | Half-basement under floor |
| JPS576056A (en) * | 1980-06-14 | 1982-01-12 | Matsushita Electric Works Ltd | Underground storage under floor |
| JPS6043499B2 (en) * | 1980-07-15 | 1985-09-28 | 松下電工株式会社 | Installation structure of semi-underground storage |
| JPS5880456U (en) * | 1981-11-25 | 1983-05-31 | 日立化成工業株式会社 | underground structure |
| JPS6022114Y2 (en) * | 1981-12-15 | 1985-07-01 | 日立化成工業株式会社 | underground structure |
| JPS5915170A (en) * | 1982-07-13 | 1984-01-26 | ミサワホ−ム株式会社 | Under-floor storing structure |
-
1989
- 1989-03-23 JP JP1073023A patent/JP2618033B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH02248528A (en) | 1990-10-04 |
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