JPH02222495A - Chlorinated and fluorinated hydrocarbon based flux cleaning agent - Google Patents
Chlorinated and fluorinated hydrocarbon based flux cleaning agentInfo
- Publication number
- JPH02222495A JPH02222495A JP4157989A JP4157989A JPH02222495A JP H02222495 A JPH02222495 A JP H02222495A JP 4157989 A JP4157989 A JP 4157989A JP 4157989 A JP4157989 A JP 4157989A JP H02222495 A JPH02222495 A JP H02222495A
- Authority
- JP
- Japan
- Prior art keywords
- chloro
- cleaning agent
- flux cleaning
- fluorinated hydrocarbon
- chlorinated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000004907 flux Effects 0.000 title claims abstract description 25
- 239000012459 cleaning agent Substances 0.000 title claims abstract description 15
- 229930195733 hydrocarbon Natural products 0.000 title claims abstract description 12
- 150000002430 hydrocarbons Chemical class 0.000 title claims abstract description 12
- 239000004215 Carbon black (E152) Substances 0.000 title claims abstract description 7
- 239000004480 active ingredient Substances 0.000 claims abstract description 4
- BSERHUYXVAIRSG-UHFFFAOYSA-N 1-chloro-1,1,3,3-tetrafluorobutane Chemical compound CC(F)(F)CC(F)(F)Cl BSERHUYXVAIRSG-UHFFFAOYSA-N 0.000 claims abstract description 3
- XOSZOEXJQZFWKW-UHFFFAOYSA-N 1-chloro-1,1-difluorobutane Chemical compound CCCC(F)(F)Cl XOSZOEXJQZFWKW-UHFFFAOYSA-N 0.000 claims abstract description 3
- PREWBNUKNNTMHC-UHFFFAOYSA-N 2-chloro-1,1,1,4,4,4-hexafluorobutane Chemical compound FC(F)(F)CC(Cl)C(F)(F)F PREWBNUKNNTMHC-UHFFFAOYSA-N 0.000 claims abstract description 3
- PVAWBKMTZYLVNR-UHFFFAOYSA-N 3-chloro-1,1,1-trifluorobutane Chemical compound CC(Cl)CC(F)(F)F PVAWBKMTZYLVNR-UHFFFAOYSA-N 0.000 claims abstract description 3
- JZTOHBFNNYFPIP-UHFFFAOYSA-N 3-chloro-1,1,2,2-tetrafluorocyclobutane Chemical compound FC1(F)CC(Cl)C1(F)F JZTOHBFNNYFPIP-UHFFFAOYSA-N 0.000 claims abstract description 3
- IDWBKVPBXORSNS-UHFFFAOYSA-N 4-chloro-1,1,2,2,3,3-hexafluorocyclobutane Chemical compound FC1(F)C(Cl)C(F)(F)C1(F)F IDWBKVPBXORSNS-UHFFFAOYSA-N 0.000 claims abstract description 3
- QODDDPGGYAJEDT-UHFFFAOYSA-N 1,1-dichloro-2,2,3,3-tetrafluorocyclobutane Chemical compound FC1(F)CC(Cl)(Cl)C1(F)F QODDDPGGYAJEDT-UHFFFAOYSA-N 0.000 claims abstract 2
- SZBKCQKJQAYJJN-UHFFFAOYSA-N 4-chloro-1,1,1,2,2,3,3-heptafluorobutane Chemical compound FC(F)(F)C(F)(F)C(F)(F)CCl SZBKCQKJQAYJJN-UHFFFAOYSA-N 0.000 claims abstract 2
- 125000004432 carbon atom Chemical group C* 0.000 claims description 5
- 150000001298 alcohols Chemical class 0.000 claims description 4
- 150000008282 halocarbons Chemical class 0.000 claims description 3
- 150000002576 ketones Chemical class 0.000 claims description 2
- DRNMSWBRUAIIJO-UHFFFAOYSA-N 2,3-dichloro-1,1,1,4,4,4-hexafluorobutane Chemical compound FC(F)(F)C(Cl)C(Cl)C(F)(F)F DRNMSWBRUAIIJO-UHFFFAOYSA-N 0.000 claims 1
- MGFUNRHKNTXQRX-UHFFFAOYSA-N 3,4-dichloro-1,1,1,2,2,3-hexafluorobutane Chemical compound FC(F)(F)C(F)(F)C(F)(Cl)CCl MGFUNRHKNTXQRX-UHFFFAOYSA-N 0.000 claims 1
- FRAAFLQSUCATRS-UHFFFAOYSA-N 4,4-dichloro-1,1,1,2,2,3,3-heptafluorobutane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(Cl)Cl FRAAFLQSUCATRS-UHFFFAOYSA-N 0.000 claims 1
- 238000004140 cleaning Methods 0.000 abstract description 5
- 230000000694 effects Effects 0.000 abstract description 4
- 239000000806 elastomer Substances 0.000 abstract description 4
- 229920001971 elastomer Polymers 0.000 abstract description 4
- 239000002184 metal Substances 0.000 abstract description 4
- 229910052751 metal Inorganic materials 0.000 abstract description 4
- 239000004033 plastic Substances 0.000 abstract description 4
- 229920003023 plastic Polymers 0.000 abstract description 4
- 239000002131 composite material Substances 0.000 abstract description 2
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- -1 amidino, amylnaphthalene Chemical compound 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 5
- HNRMPXKDFBEGFZ-UHFFFAOYSA-N 2,2-dimethylbutane Chemical compound CCC(C)(C)C HNRMPXKDFBEGFZ-UHFFFAOYSA-N 0.000 description 4
- ZFFMLCVRJBZUDZ-UHFFFAOYSA-N 2,3-dimethylbutane Chemical compound CC(C)C(C)C ZFFMLCVRJBZUDZ-UHFFFAOYSA-N 0.000 description 4
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 4
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- 229920006395 saturated elastomer Polymers 0.000 description 4
- QQZOPKMRPOGIEB-UHFFFAOYSA-N 2-Oxohexane Chemical compound CCCCC(C)=O QQZOPKMRPOGIEB-UHFFFAOYSA-N 0.000 description 3
- QPRQEDXDYOZYLA-UHFFFAOYSA-N 2-methylbutan-1-ol Chemical compound CCC(C)CO QPRQEDXDYOZYLA-UHFFFAOYSA-N 0.000 description 3
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 3
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 3
- AFABGHUZZDYHJO-UHFFFAOYSA-N dimethyl butane Natural products CCCC(C)C AFABGHUZZDYHJO-UHFFFAOYSA-N 0.000 description 3
- JVSWJIKNEAIKJW-UHFFFAOYSA-N dimethyl-hexane Natural products CCCCCC(C)C JVSWJIKNEAIKJW-UHFFFAOYSA-N 0.000 description 3
- 239000002529 flux (metallurgy) Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 3
- CXWXQJXEFPUFDZ-UHFFFAOYSA-N tetralin Chemical compound C1=CC=C2CCCCC2=C1 CXWXQJXEFPUFDZ-UHFFFAOYSA-N 0.000 description 3
- GRWFGVWFFZKLTI-IUCAKERBSA-N (-)-α-pinene Chemical compound CC1=CC[C@@H]2C(C)(C)[C@H]1C2 GRWFGVWFFZKLTI-IUCAKERBSA-N 0.000 description 2
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 2
- LIKMAJRDDDTEIG-UHFFFAOYSA-N 1-hexene Chemical compound CCCCC=C LIKMAJRDDDTEIG-UHFFFAOYSA-N 0.000 description 2
- JRZJOMJEPLMPRA-UHFFFAOYSA-N 1-nonene Chemical compound CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 2
- KWKAKUADMBZCLK-UHFFFAOYSA-N 1-octene Chemical compound CCCCCCC=C KWKAKUADMBZCLK-UHFFFAOYSA-N 0.000 description 2
- OJVAMHKKJGICOG-UHFFFAOYSA-N 2,5-hexanedione Chemical compound CC(=O)CCC(C)=O OJVAMHKKJGICOG-UHFFFAOYSA-N 0.000 description 2
- NAMYKGVDVNBCFQ-UHFFFAOYSA-N 2-bromopropane Chemical compound CC(C)Br NAMYKGVDVNBCFQ-UHFFFAOYSA-N 0.000 description 2
- PFNHSEQQEPMLNI-UHFFFAOYSA-N 2-methyl-1-pentanol Chemical compound CCCC(C)CO PFNHSEQQEPMLNI-UHFFFAOYSA-N 0.000 description 2
- MSXVEPNJUHWQHW-UHFFFAOYSA-N 2-methylbutan-2-ol Chemical compound CCC(C)(C)O MSXVEPNJUHWQHW-UHFFFAOYSA-N 0.000 description 2
- ZPVFWPFBNIEHGJ-UHFFFAOYSA-N 2-octanone Chemical compound CCCCCCC(C)=O ZPVFWPFBNIEHGJ-UHFFFAOYSA-N 0.000 description 2
- DUPUVYJQZSLSJB-UHFFFAOYSA-N 3-ethyl-2-methylpentane Chemical compound CCC(CC)C(C)C DUPUVYJQZSLSJB-UHFFFAOYSA-N 0.000 description 2
- MXLMTQWGSQIYOW-UHFFFAOYSA-N 3-methyl-2-butanol Chemical compound CC(C)C(C)O MXLMTQWGSQIYOW-UHFFFAOYSA-N 0.000 description 2
- HTSABYAWKQAHBT-UHFFFAOYSA-N 3-methylcyclohexanol Chemical compound CC1CCCC(O)C1 HTSABYAWKQAHBT-UHFFFAOYSA-N 0.000 description 2
- VLJXXKKOSFGPHI-UHFFFAOYSA-N 3-methylhexane Chemical compound CCCC(C)CC VLJXXKKOSFGPHI-UHFFFAOYSA-N 0.000 description 2
- PFEOZHBOMNWTJB-UHFFFAOYSA-N 3-methylpentane Chemical compound CCC(C)CC PFEOZHBOMNWTJB-UHFFFAOYSA-N 0.000 description 2
- HCFAJYNVAYBARA-UHFFFAOYSA-N 4-heptanone Chemical compound CCCC(=O)CCC HCFAJYNVAYBARA-UHFFFAOYSA-N 0.000 description 2
- MQWCXKGKQLNYQG-UHFFFAOYSA-N 4-methylcyclohexan-1-ol Chemical compound CC1CCC(O)CC1 MQWCXKGKQLNYQG-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- CYTYCFOTNPOANT-UHFFFAOYSA-N Perchloroethylene Chemical group ClC(Cl)=C(Cl)Cl CYTYCFOTNPOANT-UHFFFAOYSA-N 0.000 description 2
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 2
- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- HGCIXCUEYOPUTN-UHFFFAOYSA-N cyclohexene Chemical compound C1CCC=CC1 HGCIXCUEYOPUTN-UHFFFAOYSA-N 0.000 description 2
- NNBZCPXTIHJBJL-UHFFFAOYSA-N decalin Chemical compound C1CCCC2CCCCC21 NNBZCPXTIHJBJL-UHFFFAOYSA-N 0.000 description 2
- MWKFXSUHUHTGQN-UHFFFAOYSA-N decan-1-ol Chemical compound CCCCCCCCCCO MWKFXSUHUHTGQN-UHFFFAOYSA-N 0.000 description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- LQZZUXJYWNFBMV-UHFFFAOYSA-N dodecan-1-ol Chemical compound CCCCCCCCCCCCO LQZZUXJYWNFBMV-UHFFFAOYSA-N 0.000 description 2
- SNRUBQQJIBEYMU-UHFFFAOYSA-N dodecane Chemical compound CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 2
- IIEWJVIFRVWJOD-UHFFFAOYSA-N ethylcyclohexane Chemical compound CCC1CCCCC1 IIEWJVIFRVWJOD-UHFFFAOYSA-N 0.000 description 2
- GOQYKNQRPGWPLP-UHFFFAOYSA-N heptadecan-1-ol Chemical compound CCCCCCCCCCCCCCCCCO GOQYKNQRPGWPLP-UHFFFAOYSA-N 0.000 description 2
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- PHTQWCKDNZKARW-UHFFFAOYSA-N isoamylol Chemical compound CC(C)CCO PHTQWCKDNZKARW-UHFFFAOYSA-N 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- QWTDNUCVQCZILF-UHFFFAOYSA-N isopentane Chemical compound CCC(C)C QWTDNUCVQCZILF-UHFFFAOYSA-N 0.000 description 2
- HJOVHMDZYOCNQW-UHFFFAOYSA-N isophorone Chemical compound CC1=CC(=O)CC(C)(C)C1 HJOVHMDZYOCNQW-UHFFFAOYSA-N 0.000 description 2
- XMGQYMWWDOXHJM-UHFFFAOYSA-N limonene Chemical compound CC(=C)C1CCC(C)=CC1 XMGQYMWWDOXHJM-UHFFFAOYSA-N 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- UAEPNZWRGJTJPN-UHFFFAOYSA-N methylcyclohexane Chemical compound CC1CCCCC1 UAEPNZWRGJTJPN-UHFFFAOYSA-N 0.000 description 2
- GDOPTJXRTPNYNR-UHFFFAOYSA-N methylcyclopentane Chemical compound CC1CCCC1 GDOPTJXRTPNYNR-UHFFFAOYSA-N 0.000 description 2
- KPSSIOMAKSHJJG-UHFFFAOYSA-N neopentyl alcohol Chemical compound CC(C)(C)CO KPSSIOMAKSHJJG-UHFFFAOYSA-N 0.000 description 2
- XNLICIUVMPYHGG-UHFFFAOYSA-N pentan-2-one Chemical compound CCCC(C)=O XNLICIUVMPYHGG-UHFFFAOYSA-N 0.000 description 2
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 2
- YWAKXRMUMFPDSH-UHFFFAOYSA-N pentene Chemical compound CCCC=C YWAKXRMUMFPDSH-UHFFFAOYSA-N 0.000 description 2
- QMMOXUPEWRXHJS-UHFFFAOYSA-N pentene-2 Natural products CCC=CC QMMOXUPEWRXHJS-UHFFFAOYSA-N 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 229930195734 saturated hydrocarbon Natural products 0.000 description 2
- 229950011008 tetrachloroethylene Drugs 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- HLZKNKRTKFSKGZ-UHFFFAOYSA-N tetradecan-1-ol Chemical compound CCCCCCCCCCCCCCO HLZKNKRTKFSKGZ-UHFFFAOYSA-N 0.000 description 2
- KFUSEUYYWQURPO-OWOJBTEDSA-N trans-1,2-dichloroethene Chemical group Cl\C=C\Cl KFUSEUYYWQURPO-OWOJBTEDSA-N 0.000 description 2
- KJIOQYGWTQBHNH-UHFFFAOYSA-N undecanol Chemical compound CCCCCCCCCCCO KJIOQYGWTQBHNH-UHFFFAOYSA-N 0.000 description 2
- 229930195735 unsaturated hydrocarbon Natural products 0.000 description 2
- NMRPBPVERJPACX-UHFFFAOYSA-N (3S)-octan-3-ol Natural products CCCCCC(O)CC NMRPBPVERJPACX-UHFFFAOYSA-N 0.000 description 1
- WUOACPNHFRMFPN-SECBINFHSA-N (S)-(-)-alpha-terpineol Chemical compound CC1=CC[C@@H](C(C)(C)O)CC1 WUOACPNHFRMFPN-SECBINFHSA-N 0.000 description 1
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- OZXIZRZFGJZWBF-UHFFFAOYSA-N 1,3,5-trimethyl-2-(2,4,6-trimethylphenoxy)benzene Chemical compound CC1=CC(C)=CC(C)=C1OC1=C(C)C=C(C)C=C1C OZXIZRZFGJZWBF-UHFFFAOYSA-N 0.000 description 1
- 239000005968 1-Decanol Substances 0.000 description 1
- VTBOTOBFGSVRMA-UHFFFAOYSA-N 1-Methylcyclohexanol Chemical compound CC1(O)CCCCC1 VTBOTOBFGSVRMA-UHFFFAOYSA-N 0.000 description 1
- CYNYIHKIEHGYOZ-UHFFFAOYSA-N 1-bromopropane Chemical compound CCCBr CYNYIHKIEHGYOZ-UHFFFAOYSA-N 0.000 description 1
- WOFPPJOZXUTRAU-UHFFFAOYSA-N 2-Ethyl-1-hexanol Natural products CCCCC(O)CCC WOFPPJOZXUTRAU-UHFFFAOYSA-N 0.000 description 1
- PTTPXKJBFFKCEK-UHFFFAOYSA-N 2-Methyl-4-heptanone Chemical compound CC(C)CC(=O)CC(C)C PTTPXKJBFFKCEK-UHFFFAOYSA-N 0.000 description 1
- TZYRSLHNPKPEFV-UHFFFAOYSA-N 2-ethyl-1-butanol Chemical compound CCC(CC)CO TZYRSLHNPKPEFV-UHFFFAOYSA-N 0.000 description 1
- YIWUKEYIRIRTPP-UHFFFAOYSA-N 2-ethylhexan-1-ol Chemical compound CCCCC(CC)CO YIWUKEYIRIRTPP-UHFFFAOYSA-N 0.000 description 1
- NDVWOBYBJYUSMF-UHFFFAOYSA-N 2-methylcyclohexan-1-ol Chemical compound CC1CCCCC1O NDVWOBYBJYUSMF-UHFFFAOYSA-N 0.000 description 1
- GIEZWIDCIFCQPS-UHFFFAOYSA-N 3-ethyl-3-methylpentane Chemical compound CCC(C)(CC)CC GIEZWIDCIFCQPS-UHFFFAOYSA-N 0.000 description 1
- WVYWICLMDOOCFB-UHFFFAOYSA-N 4-methyl-2-pentanol Chemical compound CC(C)CC(C)O WVYWICLMDOOCFB-UHFFFAOYSA-N 0.000 description 1
- VGVHNLRUAMRIEW-UHFFFAOYSA-N 4-methylcyclohexan-1-one Chemical compound CC1CCC(=O)CC1 VGVHNLRUAMRIEW-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- NHTMVDHEPJAVLT-UHFFFAOYSA-N Isooctane Chemical compound CC(C)CC(C)(C)C NHTMVDHEPJAVLT-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- OVKDFILSBMEKLT-UHFFFAOYSA-N alpha-Terpineol Natural products CC(=C)C1(O)CCC(C)=CC1 OVKDFILSBMEKLT-UHFFFAOYSA-N 0.000 description 1
- MVNCAPSFBDBCGF-UHFFFAOYSA-N alpha-pinene Natural products CC1=CCC23C1CC2C3(C)C MVNCAPSFBDBCGF-UHFFFAOYSA-N 0.000 description 1
- 229940088601 alpha-terpineol Drugs 0.000 description 1
- 150000001721 carbon Chemical class 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- KFUSEUYYWQURPO-UPHRSURJSA-N cis-1,2-dichloroethene Chemical group Cl\C=C/Cl KFUSEUYYWQURPO-UPHRSURJSA-N 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 description 1
- WVIIMZNLDWSIRH-UHFFFAOYSA-N cyclohexylcyclohexane Chemical compound C1CCCCC1C1CCCCC1 WVIIMZNLDWSIRH-UHFFFAOYSA-N 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Natural products CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000011152 fibreglass Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- NGAZZOYFWWSOGK-UHFFFAOYSA-N heptan-3-one Chemical compound CCCCC(=O)CC NGAZZOYFWWSOGK-UHFFFAOYSA-N 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- XLSMFKSTNGKWQX-UHFFFAOYSA-N hydroxyacetone Chemical group CC(=O)CO XLSMFKSTNGKWQX-UHFFFAOYSA-N 0.000 description 1
- 229940035429 isobutyl alcohol Drugs 0.000 description 1
- ULYZAYCEDJDHCC-UHFFFAOYSA-N isopropyl chloride Chemical compound CC(C)Cl ULYZAYCEDJDHCC-UHFFFAOYSA-N 0.000 description 1
- 231100000053 low toxicity Toxicity 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- SHOJXDKTYKFBRD-UHFFFAOYSA-N mesityl oxide Natural products CC(C)=CC(C)=O SHOJXDKTYKFBRD-UHFFFAOYSA-N 0.000 description 1
- GYNNXHKOJHMOHS-UHFFFAOYSA-N methyl-cycloheptane Natural products CC1CCCCCC1 GYNNXHKOJHMOHS-UHFFFAOYSA-N 0.000 description 1
- AFFLGGQVNFXPEV-UHFFFAOYSA-N n-decene Natural products CCCCCCCCC=C AFFLGGQVNFXPEV-UHFFFAOYSA-N 0.000 description 1
- SNMVRZFUUCLYTO-UHFFFAOYSA-N n-propyl chloride Chemical compound CCCCl SNMVRZFUUCLYTO-UHFFFAOYSA-N 0.000 description 1
- ZCYXXKJEDCHMGH-UHFFFAOYSA-N nonane Chemical compound CCCC[CH]CCCC ZCYXXKJEDCHMGH-UHFFFAOYSA-N 0.000 description 1
- BKIMMITUMNQMOS-UHFFFAOYSA-N normal nonane Natural products CCCCCCCCC BKIMMITUMNQMOS-UHFFFAOYSA-N 0.000 description 1
- BNIXVQGCZULYKV-UHFFFAOYSA-N pentachloroethane Chemical compound ClC(Cl)C(Cl)(Cl)Cl BNIXVQGCZULYKV-UHFFFAOYSA-N 0.000 description 1
- AQIXEPGDORPWBJ-UHFFFAOYSA-N pentan-3-ol Chemical compound CCC(O)CC AQIXEPGDORPWBJ-UHFFFAOYSA-N 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- TVDSBUOJIPERQY-UHFFFAOYSA-N prop-2-yn-1-ol Chemical compound OCC#C TVDSBUOJIPERQY-UHFFFAOYSA-N 0.000 description 1
- GRWFGVWFFZKLTI-UHFFFAOYSA-N rac-alpha-Pinene Natural products CC1=CCC2C(C)(C)C1C2 GRWFGVWFFZKLTI-UHFFFAOYSA-N 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 238000013020 steam cleaning Methods 0.000 description 1
- 239000005437 stratosphere Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000005436 troposphere Substances 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
- PXXNTAGJWPJAGM-UHFFFAOYSA-N vertaline Natural products C1C2C=3C=C(OC)C(OC)=CC=3OC(C=C3)=CC=C3CCC(=O)OC1CC1N2CCCC1 PXXNTAGJWPJAGM-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Detergent Compositions (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、プリント基板等に付着したフラックス類を除
去するために用いるフラックス洗浄剤に関するものであ
る。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a flux cleaning agent used for removing flux adhered to printed circuit boards and the like.
[従来の技術]
半導体、IC1電子部品等を実装するプリント基板の組
み立て工程では、フラックス類が使われるが、これらが
付着したままでは、製品とはならない場合が多い、従っ
て、通常フラックスは、有機溶剤を用いて洗浄除去され
る。その有機溶剤としては、次に掲げるような種必の利
点から、1,1゜2−トリクロロ−1,2,2−)リフ
ルオロエタン(以下R113という)が広く使われてい
る。[Prior Art] Fluxes are used in the assembly process of printed circuit boards on which semiconductors, IC1 electronic components, etc. are mounted, but in many cases, the product cannot be produced if these substances remain attached.Therefore, fluxes are usually used for organic It is washed away using a solvent. As the organic solvent, 1,1°2-trichloro-1,2,2-)lifluoroethane (hereinafter referred to as R113) is widely used because of the following advantages.
R113は、不燃性で毒性が低く安定性も優れている。R113 is nonflammable, has low toxicity, and has excellent stability.
しかも、金属、プラスチック、エラストマー等の基材を
侵さずフラックスを選択的に溶解除去する性質がある。Furthermore, it has the property of selectively dissolving and removing flux without damaging base materials such as metals, plastics, and elastomers.
一般に、プリント配線板は、ガラス繊維強化プラスチッ
クと銅からなり、さらに金属、プラスチック、エラスト
マー等からなる各種部品を実装しており、従ってこの点
からもR113が有利であった。In general, printed wiring boards are made of glass fiber reinforced plastic and copper, and are further mounted with various parts made of metal, plastic, elastomer, etc. Therefore, R113 was advantageous from this point as well.
[発明が解決しようとする課題]
従来使用されていたR113が種々の利点を有するにも
かかわらず、対流圏内での寿命が長く、拡散して成層圏
に達し、ここで太陽光線により分解して塩素ラジカルを
発生し、このラジカルがオゾンと連鎖反応を起こし、オ
ゾン層を破壊するとのことから、R113の使用を規制
することとなった。このため、本発明は、これに対応す
べく、R113と同様な種々の利点を有し、同等にフラ
ックスの洗浄除去が行える新規のフラックス洗浄剤を提
供することを目的とするものである。[Problems to be solved by the invention] Despite the fact that conventionally used R113 has various advantages, it has a long lifetime in the troposphere and diffuses into the stratosphere, where it is decomposed by sunlight and becomes chlorine. The use of R113 has been regulated because it generates radicals that cause a chain reaction with ozone and destroy the ozone layer. Therefore, in response to this, it is an object of the present invention to provide a new flux cleaning agent that has various advantages similar to R113 and can wash and remove flux in the same manner.
[課題を解決するための手段]
本発明は前述の目的を達成すべくなされたものであり、
炭素数が4である塩素化弗素化炭化水素を有効成分とし
て含有するフラックス洗浄剤を提供するものである0本
発明の塩素化弗素化炭化水素としては、 1−クロロ−
1,1−ジフルオロブタン(b、 p、 55.5℃)
、3−クロロ−1,1,1−トリフルオロブタン(b、
p、 66℃)、1−クロロ−1,1,3,3−テト
ラフルオロブタン(b、 p、 70℃)、2−クロロ
−1,1,1,4,4,4−ヘキサフルオロブタン(b
、p、51℃)、 4−クロロ−1゜1、1.2.2.
3.3−ヘプタフルオロブタン(b、 p、 54℃)
、3.4−ジクロロ−1,1,1,2,2,3−ヘキサ
フルオロブタン(b、 p、 72℃)、2.3−ジク
ロロ−1,1,1,4,4,4−ヘキサフルオロブタン
(b、 p、 78℃)、 4.4−ジクロロ−1゜1
、1.2.2.3.3−ヘプタフルオロブタン (b、
p、 76、5℃)、1−クロロ−2,2,3,3−
テトラフルオロシクロブタン(b、 9.73℃)、1
.1−ジクロロ−2,2,3,3−テトラフルオロシク
ロブタン(b、 9.84℃)、 1−クロロ−2、2
,3,3,4,4−へキサフルオロシクロブタン(b、
p。[Means for Solving the Problems] The present invention has been made to achieve the above-mentioned objects, and
The chlorinated fluorinated hydrocarbon of the present invention, which provides a flux cleaning agent containing a chlorinated fluorinated hydrocarbon having 4 carbon atoms as an active ingredient, includes 1-chloro-
1,1-difluorobutane (b, p, 55.5°C)
, 3-chloro-1,1,1-trifluorobutane (b,
p, 66°C), 1-chloro-1,1,3,3-tetrafluorobutane (b, p, 70°C), 2-chloro-1,1,1,4,4,4-hexafluorobutane ( b
, p, 51°C), 4-chloro-1°1, 1.2.2.
3.3-Heptafluorobutane (b, p, 54°C)
, 3.4-dichloro-1,1,1,2,2,3-hexafluorobutane (b, p, 72°C), 2.3-dichloro-1,1,1,4,4,4-hexafluorobutane Fluorobutane (b, p, 78°C), 4,4-dichloro-1°1
, 1.2.2.3.3-heptafluorobutane (b,
p, 76, 5°C), 1-chloro-2,2,3,3-
Tetrafluorocyclobutane (b, 9.73°C), 1
.. 1-dichloro-2,2,3,3-tetrafluorocyclobutane (b, 9.84°C), 1-chloro-2,2
,3,3,4,4-hexafluorocyclobutane (b,
p.
40℃)等の含水素塩素化弗素化炭化水素から選ばれる
1種叉は2種以上の混合物が好ましい。One type or a mixture of two or more types selected from hydrogen-containing chlorinated fluorinated hydrocarbons such as 40°C) is preferred.
本発明のフラックス洗浄剤には、各種の目的に応じてそ
の他の各種成分を含有させることができる0例えば、溶
解力を高めるために、炭化水素類、アルコール類、ケト
ン類、叉はハロゲン化炭化水素類等の有機溶剤から選ば
れる少なくとも1種を含有させることができる。これら
の有機溶剤のフラックス洗浄剤中の含有割合は、0〜5
0重量%、好ましくは10〜40重量%、さらに好まし
くは20〜30重量%である0本発明の塩素化弗素化炭
化水素類と有機溶剤との混合物に共沸組成が存在する場
合には、その共沸組成での使用が特に好ましい。The flux cleaning agent of the present invention may contain various other components depending on various purposes. For example, in order to increase the dissolving power, hydrocarbons, alcohols, ketones, or halogenated carbon At least one kind selected from organic solvents such as hydrogens can be contained. The content ratio of these organic solvents in the flux cleaning agent is 0 to 5.
0% by weight, preferably 10 to 40% by weight, more preferably 20 to 30% by weight.0 When an azeotropic composition exists in the mixture of the chlorinated fluorinated hydrocarbons and organic solvent of the present invention, Particular preference is given to its use in its azeotropic composition.
炭化水素類としては、炭素数1〜15の直鎖叉は環状の
飽和又は不飽和炭化水素類が好ましく、n−ペンタン、
イソペンタン、n−ヘキサン、イソヘキサン、ネオヘキ
サン、2,3−ジメチルブタン、3−メチルペンタン、
n−へブタン、イソへブタン、3−メチルヘキサン、2
,4−ジメチルベンクン、n−オクタン、2−メチルへ
ブタン、3−メチルへブタン、4−メチルへブタン、2
.2−ジメチルヘキサン、2.5−ジメチルヘキサン、
3.3−ジメチルヘキサン、・2−メチル−3−エチル
ペンタン、3−メチル−3−エチルペンタン、2.3.
3− )ジメチルベンクン、2.3.4− )ジメチル
ベンクン、2.2.3− トリメチルペンタン、イソオ
クタン、ノナン、2.2.5− )ジメチルヘキサン、
デカン、 ドデカン、1−ペンテン、2−ペンテン、1
−ヘキセン、1−オクテン、1−ノネン、l−デセン、
シクロベンクン、メチルシクロペンタン、シクロヘキサ
ン、メチルシクロヘキサン、エチルシクロヘキサン、ビ
シクロヘキサン、シクロヘキセン、α−ピネン、ジペン
テン、デカリン、テトラリン、アミジノ、アミルナフタ
レン等から選ばれるものである。より好ましくはn−ペ
ンタン、ネオヘキサン、2.3−ジメチルブタン、n−
ヘキサン、シクロベンクン、シクロヘキサン、n−へブ
タン等である。The hydrocarbons are preferably linear or cyclic saturated or unsaturated hydrocarbons having 1 to 15 carbon atoms, such as n-pentane,
Isopentane, n-hexane, isohexane, neohexane, 2,3-dimethylbutane, 3-methylpentane,
n-hebutane, isohebutane, 3-methylhexane, 2
, 4-dimethylbencune, n-octane, 2-methylhebutane, 3-methylhebutane, 4-methylhebutane, 2
.. 2-dimethylhexane, 2.5-dimethylhexane,
3.3-dimethylhexane, 2-methyl-3-ethylpentane, 3-methyl-3-ethylpentane, 2.3.
3-) dimethylbenkune, 2.3.4-) dimethylbenkune, 2.2.3-trimethylpentane, isooctane, nonane, 2.2.5-) dimethylhexane,
decane, dodecane, 1-pentene, 2-pentene, 1
-hexene, 1-octene, 1-nonene, l-decene,
It is selected from cyclobencune, methylcyclopentane, cyclohexane, methylcyclohexane, ethylcyclohexane, bicyclohexane, cyclohexene, α-pinene, dipentene, decalin, tetralin, amidino, amylnaphthalene, and the like. More preferably n-pentane, neohexane, 2,3-dimethylbutane, n-
Hexane, cyclobencune, cyclohexane, n-hebutane, etc.
アルコール類としては、炭素数1〜17の鎖状叉は、環
状の飽和叉は不飽和アルコール類が好ましく、メタノー
ル、エタノール、n−プロピルアルコール、イソプロピ
ルアルコール、n−ブチルアルコール、イソブチルアル
コール、5ec−ブチルアルコール、tert−ブチル
アルコール、ペンチルアルコール、5ec−アミルアル
コール、1−エチル−1−プロパツール、2−メチル−
1−ブタノール、イソペンチルアルコール、tert−
ペンチルアルコール、3−メチル−2−ブタノール、ネ
オペンチルアルコール、1−ヘキサノール、2−メチル
−1−ペンタノール、4−メチル−2−ペンタノール、
2−エチル−1−ブタノール、1−ヘプタツール、2−
ヘプタツール、3−ヘプタツール、1−オクタノール、
2−オクタツール、2−エチル−1−ヘキサノール、l
−ノナノール、3.5.5−)ジメチル−1−ヘキサノ
ール、1−デカノール、1−ウンデカノール、1−ドデ
カノール、アリルアルコール、プロパルギルアルコール
、ベンジルアルコール、シクロヘキサノール、1−メチ
ルシクロヘキサノール、2−メチルシクロヘキサノール
、3−メチルシクロヘキサノール、4−メチルシクロヘ
キサノール、α−テルピネオール、アとニチノール、2
.6−シメチルー4−ヘプタツール、トリメチルノニル
アルコール、テトラデシルアルコール、ヘプタデシルア
ルコール等から選ばれるものである。より好ましくは、
メタノール、エタ、ノール、イソプロピルアルコール等
である。The alcohols are preferably chain or cyclic saturated or unsaturated alcohols having 1 to 17 carbon atoms, such as methanol, ethanol, n-propyl alcohol, isopropyl alcohol, n-butyl alcohol, isobutyl alcohol, and 5ec- Butyl alcohol, tert-butyl alcohol, pentyl alcohol, 5ec-amyl alcohol, 1-ethyl-1-propanol, 2-methyl-
1-butanol, isopentyl alcohol, tert-
Pentyl alcohol, 3-methyl-2-butanol, neopentyl alcohol, 1-hexanol, 2-methyl-1-pentanol, 4-methyl-2-pentanol,
2-ethyl-1-butanol, 1-heptatool, 2-
heptatool, 3-heptatool, 1-octanol,
2-octatool, 2-ethyl-1-hexanol, l
-nonanol, 3.5.5-)dimethyl-1-hexanol, 1-decanol, 1-undecanol, 1-dodecanol, allyl alcohol, propargyl alcohol, benzyl alcohol, cyclohexanol, 1-methylcyclohexanol, 2-methylcyclo Hexanol, 3-methylcyclohexanol, 4-methylcyclohexanol, α-terpineol, atonitinol, 2
.. It is selected from 6-dimethyl-4-heptatool, trimethylnonyl alcohol, tetradecyl alcohol, heptadecyl alcohol, and the like. More preferably,
Examples include methanol, ethanol, alcohol, and isopropyl alcohol.
1〜9の飽和又は不飽和炭化水素基)のいずれかの一般
式で示されるものが好ましく、アセトン、メチルエチル
ケトン、2−ペンタノン、3−ペンタノン、2−ヘキサ
ノン、メチルブチルケトン、メチルイソブチルケトン、
2−ヘプタノン、4−ヘプタノン、ジイソブチルケトン
、アセトニルアセトン、メシチルオキシド、ホロン、メ
チル−n−アミルケトン、エチルブチルケトン、メチル
へキシルケトン、シクロヘキサノン、メチルシクロヘキ
サノン、イソホロン、2.4−ベンタンジオン、ジアセ
トンアルコール、アセトフェノン、フェンチョン等から
選ばれるものである。より好ましくは、アセトン、メチ
ルエチルケトン等である。1 to 9 saturated or unsaturated hydrocarbon groups) are preferred, including acetone, methyl ethyl ketone, 2-pentanone, 3-pentanone, 2-hexanone, methyl butyl ketone, methyl isobutyl ketone,
2-heptanone, 4-heptanone, diisobutyl ketone, acetonylacetone, mesityl oxide, holon, methyl-n-amyl ketone, ethyl butyl ketone, methylhexyl ketone, cyclohexanone, methylcyclohexanone, isophorone, 2,4-bentanedione, di It is selected from acetone alcohol, acetophenone, fenchen, etc. More preferred are acetone, methyl ethyl ketone and the like.
ハロゲン化炭化水素類としては、炭素数1〜4の飽和叉
は不飽和のハロゲン化炭化水素類が好ましく、ジクロロ
メタン、四塩化炭素、クロロホルム、1.1−ジクロロ
エタン、1.2−ジクロロエタン、1、1.1−トリク
ロロエタン、1.1.2−トリクロロエタン、1.1.
1.2−テトラクロロエタン、1.1.2.2−テトラ
クロロエタン、ペンタクロロエタン、1.1−ジクロロ
エチレン、trans−1,2−ジクロロエチレン、c
is−1,2−ジクロロエチレン、トリクロロエチレン
、テトラクロロエチレン、l−クロロプロパン、2−ク
ロロプロパン、1−ブロモプロパン、2−ブロモプロパ
ン等から選ばれるものである。より好ましくは、ジクロ
ロメタン、1.1.1−トリクロロエタン、trans
−1,2−ジクロロエチレン、cis−1,2−ジクロ
ロエチレン、トリクロロエチレン、テトラクロロエチレ
ン、2−ブロモプロパン等である。The halogenated hydrocarbons are preferably saturated or unsaturated halogenated hydrocarbons having 1 to 4 carbon atoms, such as dichloromethane, carbon tetrachloride, chloroform, 1.1-dichloroethane, 1.2-dichloroethane, 1, 1.1-trichloroethane, 1.1.2-trichloroethane, 1.1.
1.2-tetrachloroethane, 1.1.2.2-tetrachloroethane, pentachloroethane, 1.1-dichloroethylene, trans-1,2-dichloroethylene, c
It is selected from is-1,2-dichloroethylene, trichlorethylene, tetrachloroethylene, 1-chloropropane, 2-chloropropane, 1-bromopropane, 2-bromopropane, and the like. More preferably dichloromethane, 1.1.1-trichloroethane, trans
-1,2-dichloroethylene, cis-1,2-dichloroethylene, trichlorethylene, tetrachlorethylene, 2-bromopropane, etc.
本発明のフラックス洗浄剤には、各種の洗浄助剤や安定
剤あるいは、オゾン破壊に対する影響の少ない含水素塩
素化弗素化炭イヒ水素類をさらに添加混合してもよい、
洗浄方法としては、手拭き、浸漬、スプレー法、揺動、
超音波洗浄、蒸気洗浄等通常の方法を採用することがで
きる。The flux cleaning agent of the present invention may further be mixed with various cleaning aids and stabilizers, or hydrogen-containing chlorinated fluorinated hydrohydrogens that have little effect on ozone destruction.
Cleaning methods include hand wiping, dipping, spraying, shaking,
Conventional methods such as ultrasonic cleaning and steam cleaning can be used.
[実施例]
実施例1〜27
下記第1表に示すフラックス洗浄剤を用いてフラックス
め洗浄除去試験を行なった。[Examples] Examples 1 to 27 Flux cleaning and removal tests were conducted using flux cleaning agents shown in Table 1 below.
ガラスエポキシ製のプリント基板(50mmX 100
鳳■X 1.651℃厚)全面にフラックス(タムラF
−AI−4、■タムラ制作所製)を塗布し、200℃の
電気炉で2分間焼成後、フラックス洗浄剤に1分間浸漬
した。Glass epoxy printed circuit board (50mm x 100
Flux on the entire surface (Tamura F
-AI-4 (manufactured by Tamura Manufacturing Co., Ltd.) was applied, baked for 2 minutes in an electric furnace at 200°C, and then immersed in a flux cleaning agent for 1 minute.
フラックスの除去の度合を第1表に示す。Table 1 shows the degree of flux removal.
第1表
[発明の効果]
本発明のフラックス洗浄剤は、実施例から明らかなよう
にフラックス類の洗浄除去効果の優れたものである。叉
、従来使用されていたR113と同様に適度な溶解力を
持つことから、金属、プラスチック、及びエラストマー
等から成る複合部品に悪影響を与えることなく、フラッ
クスを洗浄除去することができる。Table 1 [Effects of the Invention] As is clear from the Examples, the flux cleaning agent of the present invention has an excellent cleaning and removal effect on fluxes. In addition, since it has an appropriate dissolving power like R113 that has been used conventionally, flux can be washed and removed without adversely affecting composite parts made of metals, plastics, elastomers, etc.
第1表(続き)Table 1 (continued)
Claims (1)
として含有するフラックス洗浄剤。 2、塩素化弗素化炭化水素が1−クロロ−1,1−ジフ
ルオロブタン、3−クロロ−1,1,1−トリフルオロ
ブタン、1−クロロ−1,1,3,3−テトラフルオロ
ブタン、2−クロロ−1,1,1,4,4,4−ヘキサ
フルオロブタン、4−クロロ−1,1,1,2,2,3
,3−ヘプタフルオロブタン、3,4−ジクロロ−1,
1,1,2,2,3−ヘキサフルオロブタン、2,3−
ジクロロ−1,1,1,4,4,4−ヘキサフルオロブ
タン、4,4−ジクロロ−1,1,1,2,2,3,3
−ヘプタフルオロブタン、1−クロロ−2,2,3,3
−テトラフルオロシクロブタン、1,1−ジクロロ−2
,2,3,3−テトラフルオロシクロブタン、1−クロ
ロ−2,2,3,3,4,4−ヘキサフルオロシクロブ
タンである請求項1に記載のフラックス洗浄剤。 3、フラックス洗浄剤中に、炭化水素類、アルコール類
、ケトン類、及びハロゲン化炭化水素類から選ばれる少
なくとも1種が含まれている請求項1に記載のフラック
ス洗浄剤。[Claims] 1. A flux cleaning agent containing a chlorinated fluorinated hydrocarbon having 4 carbon atoms as an active ingredient. 2. The chlorinated fluorinated hydrocarbon is 1-chloro-1,1-difluorobutane, 3-chloro-1,1,1-trifluorobutane, 1-chloro-1,1,3,3-tetrafluorobutane, 2-chloro-1,1,1,4,4,4-hexafluorobutane, 4-chloro-1,1,1,2,2,3
, 3-heptafluorobutane, 3,4-dichloro-1,
1,1,2,2,3-hexafluorobutane, 2,3-
Dichloro-1,1,1,4,4,4-hexafluorobutane, 4,4-dichloro-1,1,1,2,2,3,3
-heptafluorobutane, 1-chloro-2,2,3,3
-tetrafluorocyclobutane, 1,1-dichloro-2
, 2,3,3-tetrafluorocyclobutane, and 1-chloro-2,2,3,3,4,4-hexafluorocyclobutane. 3. The flux cleaning agent according to claim 1, wherein the flux cleaning agent contains at least one selected from hydrocarbons, alcohols, ketones, and halogenated hydrocarbons.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4157989A JPH02222495A (en) | 1989-02-23 | 1989-02-23 | Chlorinated and fluorinated hydrocarbon based flux cleaning agent |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4157989A JPH02222495A (en) | 1989-02-23 | 1989-02-23 | Chlorinated and fluorinated hydrocarbon based flux cleaning agent |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02222495A true JPH02222495A (en) | 1990-09-05 |
Family
ID=12612355
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4157989A Pending JPH02222495A (en) | 1989-02-23 | 1989-02-23 | Chlorinated and fluorinated hydrocarbon based flux cleaning agent |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02222495A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5348681A (en) * | 1992-08-21 | 1994-09-20 | Elf Atochem S.A. | Composition based on 1,1,1,3,3-pentafluorobutane and methylene chloride, for the cleaning and/or drying of solid surfaces |
US5350534A (en) * | 1992-08-21 | 1994-09-27 | Elf Atochem S.A. | Composition based on 1,1,1,3,3-pentafluorobutane, methylene chloride and methanol, for the cleaning and/or drying of solid surfaces |
KR100523435B1 (en) * | 1997-07-31 | 2006-01-27 | 아르끄마 | Quasi-azeotropic mixture based on 1,1,1,3,3-pentafluorobutane, methylene chloride and methanol for the treatment of solid surfaces |
WO2007016359A2 (en) * | 2005-07-28 | 2007-02-08 | Great Lakes Chemical Corporation | Production processes and systems, compositions, surfactants, monomer units, metal complexes, phosphate esters, glycols, aqueous film forming foams, and foam stabilizers |
-
1989
- 1989-02-23 JP JP4157989A patent/JPH02222495A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5348681A (en) * | 1992-08-21 | 1994-09-20 | Elf Atochem S.A. | Composition based on 1,1,1,3,3-pentafluorobutane and methylene chloride, for the cleaning and/or drying of solid surfaces |
US5350534A (en) * | 1992-08-21 | 1994-09-27 | Elf Atochem S.A. | Composition based on 1,1,1,3,3-pentafluorobutane, methylene chloride and methanol, for the cleaning and/or drying of solid surfaces |
KR100523435B1 (en) * | 1997-07-31 | 2006-01-27 | 아르끄마 | Quasi-azeotropic mixture based on 1,1,1,3,3-pentafluorobutane, methylene chloride and methanol for the treatment of solid surfaces |
WO2007016359A2 (en) * | 2005-07-28 | 2007-02-08 | Great Lakes Chemical Corporation | Production processes and systems, compositions, surfactants, monomer units, metal complexes, phosphate esters, glycols, aqueous film forming foams, and foam stabilizers |
WO2007016359A3 (en) * | 2005-07-28 | 2008-11-27 | Great Lakes Chemical Corp | Production processes and systems, compositions, surfactants, monomer units, metal complexes, phosphate esters, glycols, aqueous film forming foams, and foam stabilizers |
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