JPH02214615A - Method and equipment for varnishing - Google Patents

Method and equipment for varnishing

Info

Publication number
JPH02214615A
JPH02214615A JP1034672A JP3467289A JPH02214615A JP H02214615 A JPH02214615 A JP H02214615A JP 1034672 A JP1034672 A JP 1034672A JP 3467289 A JP3467289 A JP 3467289A JP H02214615 A JPH02214615 A JP H02214615A
Authority
JP
Japan
Prior art keywords
base material
varnish
viscosity liquid
low viscosity
low
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1034672A
Other languages
Japanese (ja)
Other versions
JPH0581410B2 (en
Inventor
Mitsuaki Harada
原田 光章
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Takuma Co Ltd
Takuma Research and Development Co Ltd
Original Assignee
Takuma Co Ltd
Takuma Research and Development Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Takuma Co Ltd, Takuma Research and Development Co Ltd filed Critical Takuma Co Ltd
Priority to JP1034672A priority Critical patent/JPH02214615A/en
Priority to KR1019890014226A priority patent/KR930001712B1/en
Priority to US07/430,329 priority patent/US5056457A/en
Priority to EP89420444A priority patent/EP0369907B1/en
Priority to DE68915401T priority patent/DE68915401T2/en
Publication of JPH02214615A publication Critical patent/JPH02214615A/en
Priority to US07/738,953 priority patent/US5137756A/en
Publication of JPH0581410B2 publication Critical patent/JPH0581410B2/ja
Granted legal-status Critical Current

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  • Coating Apparatus (AREA)
  • Reinforced Plastic Materials (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

PURPOSE:To enhance varnishing properties and voidless effect in base material by providing a closed thermosiphon region which is opened on the liquid surface of a low viscous liquid storage region and opened under the liquid surface of a varnish storage region. CONSTITUTION:While base material 1 is passed through a low viscous liquid storage region 2', the air in fiber bundle is thoroughly replaced by low viscous liquid 12 and discharged. This base material is introduced into a thermosiphon chamber 4 through an inlet part 4a opened on the liquid surface 12'. The base material 11 is heated by a heating roll 5a in the chamber 4 and low viscous liquid 12 impregnated therein is evaporated and separated. At this time, vapor of low viscous liquid which is generated in the chamber 4 is condensed by a cooler 11 and recovered in a low viscous liquid recovery part 10. Successively the base material 1 is passed through a varnish reservoir 13a from an outlet part 4b and introduced into a varnish storage region 3' and impregnated with varnish 13. At this time, the base material 11 is free from air and therefore even the inside of fiber is uniformly and sufficiently impregnated with varnish 13.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、例えば電気絶縁板、化粧板等の積層板の製造
に使用される紙、布等の繊維質材からなるシート状の基
材にワニスを含浸させるための方法及び装置に関するも
のである。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a sheet-like base material made of a fibrous material such as paper or cloth used for manufacturing laminates such as electrical insulating boards and decorative boards. The present invention relates to a method and apparatus for impregnating water with varnish.

〔従来の技塘〕[Traditional technique]

一般に、繊維質材からなるシート状の基材にワニスを含
浸させる場合、ワニスが基材の繊維内部にまで含浸され
、各部のワニス量分布かむらなく均一であることが重要
であり、且つ基材中に残存する気泡を可及的に少なくす
ることが望ましい。
Generally, when impregnating a sheet-like base material made of fibrous material with varnish, it is important that the varnish is impregnated into the fibers of the base material and that the amount of varnish is evenly distributed in each part. It is desirable to reduce the number of air bubbles remaining inside as much as possible.

従来の含浸方法では、一般に、基材をこれに予備含浸用
の通常ワニスを予備含浸させた上で、タイミングロール
を経てワニス槽に導いて、通常ワニスを含浸させるよう
にしているのが普通である。
In conventional impregnation methods, the substrate is generally pre-impregnated with an ordinary varnish for pre-impregnation, and then guided through a timing roll to a varnish tank where it is impregnated with an ordinary varnish. be.

ところが、このような含浸方法では、基材の内部にまで
ワニスを均−且つ充分に含浸させることが困難であり、
ワニスを含浸させるに長時間を要するといった問題があ
った。しかも、基材中に残存する気泡を充分に少なくす
ることが困難である。
However, with this impregnation method, it is difficult to uniformly and sufficiently impregnate the inside of the base material with the varnish.
There was a problem in that it took a long time to impregnate the varnish. Furthermore, it is difficult to sufficiently reduce the number of bubbles remaining in the base material.

かかる問題は、特に高粘度のワニスを使用した場合に顕
著となる。
This problem becomes particularly noticeable when a high viscosity varnish is used.

そこで、近時、上記した予備含浸用の通常ワニスに代え
て溶剤若しくは溶剤を多量に含む稀薄なワニス(以下「
予備含浸液」という)を貯溜した予備含浸槽と通常ワニ
スを貯溜した本含浸槽とを並置して、基材をガイドロー
ルにより予備含浸槽。
Therefore, recently, in place of the above-mentioned ordinary varnish for pre-impregnation, a dilute varnish containing a large amount of solvent or a solvent (hereinafter referred to as "
A pre-impregnating tank storing a pre-impregnating liquid (referred to as "pre-impregnating liquid") and a main impregnating tank storing a normal varnish are placed side by side, and the base material is moved to the pre-impregnating tank by guide rolls.

本含浸槽を順次通過せしめるようにすることが行われて
いる。
This impregnation tank is passed through in sequence.

かかる含浸方法によれば、基材が予備含浸液中を通過せ
しめられる間に、基材中の空気が予備含浸液と置換され
て排除されるから、基材を、これに含浸された予備含浸
液を蒸発させつつワニス中にもたらすと、ワニスを効率
良く含浸させ得ると共に、気泡の減少を図ることができ
る。
According to this impregnation method, while the substrate is passed through the pre-impregnating liquid, the air in the substrate is replaced with the pre-impregnating liquid and removed, so that the pre-impregnating liquid impregnated in the substrate is removed. When the liquid is introduced into the varnish while being evaporated, the varnish can be impregnated efficiently and bubbles can be reduced.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

しかしながら、予備含浸液中からワニス中への移行段階
において、基材が空気に触れると共に両槽間のガイドロ
ールによる圧縮作用を受けることから、基材中の空気の
排除が充分に行われず、ワニス含浸性、ボイドレス効果
を余り期待できない。
However, in the transition stage from the pre-impregnating liquid to the varnish, the base material is exposed to air and is compressed by the guide rolls between the two tanks, so air in the base material is not removed sufficiently and the varnish is Impregnating properties and voidless effects cannot be expected.

すなわち、基材が上記ガイドロールに至ると、基材を構
成する繊維束に接触面圧力が作用して、繊維束が開繊す
ることになり、繊維束内の毛管力により保持されている
予備含浸液の液相が破壊される。そして、このガイドロ
ールを通過した時点で繊維束の圧縮は解除されるが、こ
の解圧作用によって開繊された繊維束は再形成される。
In other words, when the base material reaches the guide roll, contact surface pressure acts on the fiber bundles constituting the base material, causing the fiber bundles to open, and the reserve held by the capillary force within the fiber bundles to open. The liquid phase of the impregnating liquid is destroyed. The fiber bundle is decompressed when it passes through this guide roll, but the opened fiber bundle is reformed by this decompressing action.

このように、繊維束における含浸液相の破壊と開繊され
た繊維束の再形成とが空気中で行なわれることから、予
備含浸液中からワニス中への移行段階において基材には
空気が再侵入する虞れがある。
As described above, since the destruction of the impregnating liquid phase in the fiber bundle and the reformation of the opened fiber bundle take place in the air, air is present in the base material during the transition stage from the pre-impregnating liquid to the varnish. There is a risk of re-invasion.

本発明は、かかる点に鑑みてなされたもので。The present invention has been made in view of this point.

基材におけるワニス含浸性、ボイドレス効果を大幅に向
上させ得るワニス含浸方法とこれを好適に実施しうるワ
ニス含浸装置とを提供することを目的とするものである
The object of the present invention is to provide a varnish impregnation method that can significantly improve the varnish impregnation properties and void-free effect in a base material, and a varnish impregnation apparatus that can suitably carry out the method.

〔課題を解決するための手段〕[Means to solve the problem]

この課題を解決した本発明のワニス含浸方法は、溶剤等
の低粘性液を貯溜せる低粘性液貯溜領域とワニスを貯溜
せるワニス貯溜領域との間に、低粘性液貯溜領域の液面
上に開口し且つワニス貯溜領域の液面下に開口する自閉
状の熱サイホン領域を設けて、繊維質材からなるシート
状の基材を低粘性液貯溜領域、熱サイホン領域、ワニス
貯溜領域。
The varnish impregnation method of the present invention solves this problem, and the varnish impregnation method of the present invention provides a method for impregnating a liquid on the liquid surface of the low viscosity liquid storage area between a low viscosity liquid storage area where a low viscosity liquid such as a solvent can be stored and a varnish storage area where varnish can be stored. A self-closed thermosyphon region is provided which opens below the liquid surface of the varnish storage region, and a sheet-like base material made of a fibrous material is used as a low-viscosity liquid storage region, a thermosyphon region, and a varnish storage region.

を順次通過さ合るようにし、熱サイホン領域において、
基材を加熱してこれに含浸された低粘性液を蒸発させる
と共に基材の出口側に貯溜せる低粘性液を蒸発させ、且
つ熱サイホン領域で発生した低粘性液蒸気を基材の出口
側から基材の入口側へと流動させるようにしたものであ
る。
in the thermosiphon region,
The base material is heated to evaporate the low viscosity liquid impregnated into the base material, and the low viscosity liquid stored on the outlet side of the base material is evaporated, and the low viscosity liquid vapor generated in the thermosyphon region is evaporated to the outlet side of the base material. The liquid is made to flow from the base material to the inlet side of the base material.

一方、かかる方法を実施するための本発明のワニス含浸
装置は、溶剤等の低粘性液を貯溜した低粘性液貯溜槽と
、ワニスを貯溜したワニス貯溜槽と、低粘性液貯溜槽の
液面上に開口する基材入口部及びワニス貯溜槽の液面下
に開口する基材出口部を備えた密閉状の熱サイホン室と
、繊維質材からなるシート状の基材を低粘性液貯溜槽か
ら基材入口部を経て熱サイホン室に導き更に基材出口部
からワニス貯溜槽に導く基材走行ガイド機構と、熱サイ
ホン室内において基材を加熱して、これに含浸された低
粘性液を蒸発させる基材加熱機構と、基材出口部に低粘
性液貯溜部及び低粘性液加熱器を備えており、低粘性液
貯溜部の低粘性液を加熱蒸発させる共に熱サイホン室内
で発生する低粘性液蒸気を基材出口部側から基材入口部
側へと流動させる蒸気流動機構と、を具備するものであ
る。
On the other hand, the varnish impregnation apparatus of the present invention for carrying out such a method includes a low viscosity liquid storage tank storing a low viscosity liquid such as a solvent, a varnish storage tank storing varnish, and a liquid level of the low viscosity liquid storage tank. A sealed thermosiphon chamber with a base material inlet opening at the top and a base material outlet opening below the liquid surface of the varnish storage tank, and a low-viscosity liquid storage tank containing a sheet-like base material made of fibrous material. A base material running guide mechanism that guides the base material from the base material through the base material inlet to the thermosyphon chamber and further leads the base material from the base material outlet to the varnish storage tank; It is equipped with a base material heating mechanism for evaporation, a low viscosity liquid reservoir and a low viscosity liquid heater at the base material outlet, and it heats and evaporates the low viscosity liquid in the low viscosity liquid reservoir and also heats the low viscosity liquid generated in the thermosyphon chamber. The apparatus includes a vapor flow mechanism that causes viscous liquid vapor to flow from the base material outlet side to the base material inlet side.

〔作用〕[Effect]

基材が低粘性液貯溜槽内を通過する間において、基材中
の空気が低粘性液と置換されて排除される。
While the substrate passes through the low viscosity liquid reservoir, the air in the substrate is replaced with the low viscosity liquid and removed.

引き続き、低粘性液を含浸された基材は低粘性液貯溜槽
を出て、その液面上に開口する基材入口部から熱サイホ
ン室内にもたらされる。
Subsequently, the substrate impregnated with the low viscosity liquid leaves the low viscosity liquid reservoir and is brought into the thermosyphon chamber through the substrate inlet opening above the liquid level.

このとき、基材は空気に触れることになるが、基材には
低粘性液が含浸されているため、熱サイホン室内に進入
する前の段階で空気が再侵入するようなことはない。
At this time, the base material comes into contact with air, but since the base material is impregnated with a low-viscosity liquid, air will not re-enter before entering the thermosyphon chamber.

そして、熱サイホン室内にもたらされた基材は基材加熱
機構により加熱されて、これに含浸された低粘性液が蒸
発分離される。
Then, the base material brought into the thermosyphon chamber is heated by the base material heating mechanism, and the low viscosity liquid impregnated therein is evaporated and separated.

このとき、熱サイホン室内は蒸気流動機構及び基材加熱
機構により発生せしめられた低粘性液蒸気で充満されて
おり、且つその蒸気は蒸気流動機構により基材出口部側
から基材入口部側へと流動せしめられることから、少な
くとも基材加熱機構から基材出口部に至る基材通過領域
部分は、空気を含まない低粘性液飽和蒸気雰囲気に保持
されることになる。
At this time, the thermosiphon chamber is filled with low-viscosity liquid vapor generated by the steam flow mechanism and the base material heating mechanism, and the steam is transferred from the base material outlet side to the base material inlet side by the steam flow mechanism. As a result, at least the substrate passage area from the substrate heating mechanism to the substrate outlet is maintained in a low-viscosity liquid-saturated vapor atmosphere that does not contain air.

したがって、基材は低粘性液の飽和蒸気のみを含む状態
で、熱サイホン室からワニス貯溜槽内にもたらされるこ
とになる。すなわち、低粘性液貯溜領域からワニス貯溜
領域への移行段階において基材に空気が侵入することが
なく、ワニス領域には空気を含有しない基材がもたらさ
れることになる。
The substrate will therefore be brought from the thermosyphon chamber into the varnish reservoir containing only saturated vapor of a low viscosity liquid. That is, no air enters the substrate during the transition stage from the low viscosity liquid reservoir region to the varnish reservoir region, resulting in an air-free substrate in the varnish region.

その結果、基材がワニス貯溜領域にもたらされると、基
材へのワニス含浸が良好に行なわれ、基材には空気を含
まない状態でワニスが均−且つ充分に含浸せしめられる
ことになる。
As a result, when the substrate is brought into the varnish storage area, the substrate is impregnated with varnish well, and the substrate is evenly and thoroughly impregnated with varnish in an air-free manner.

〔実施例) 以下、本発明の構成を第1図に示す実施例に基づいて具
体的に説明する。
[Example] Hereinafter, the configuration of the present invention will be specifically explained based on the example shown in FIG.

第1図に示すワニス含浸装置において、1は基材、2は
低粘性液貯溜槽、3はワニス貯溜槽、4は熱サイホン室
、5は基材加熱機構、6は蒸気流動機構、7は基材走行
ガイド機構である。
In the varnish impregnation apparatus shown in FIG. 1, 1 is a base material, 2 is a low viscosity liquid storage tank, 3 is a varnish storage tank, 4 is a thermosyphon chamber, 5 is a base material heating mechanism, 6 is a steam flow mechanism, and 7 is a This is a base material traveling guide mechanism.

基材1は繊維質材からなるシート状のもので、合成、天
然の有機、V!、機繊維からなる織布、不織布1例えば
紙、ガラス繊維布、ガラス繊維不織布。
The base material 1 is a sheet-like material made of fibrous material, which may be synthetic, natural, organic, or V! , woven fabrics made of machine fibers, nonwoven fabrics 1 such as paper, glass fiber cloth, glass fiber nonwoven fabrics.

カーボン繊維布、カーボン繊維不織布、アラミド繊維布
、アラミド繊維不織布等が使用される。
Carbon fiber cloth, carbon fiber nonwoven fabric, aramid fiber cloth, aramid fiber nonwoven fabric, etc. are used.

低粘性液貯溜槽2は溶剤等の低粘性液12を所定量貯溜
した上面開放状のものであり、ワニス貯溜槽3はワニス
13を所定量貯溜した上面開放状のものである。各貯溜
槽2,3の側壁には溢流堰2a、3a及び溢流溜2b、
3bが設けられていて、各貯溜槽2,3における液面高
さを一定に保持するように工夫しである。なお、溢流溜
2b。
The low viscosity liquid storage tank 2 has an open top and stores a predetermined amount of a low viscosity liquid 12 such as a solvent, and the varnish storage tank 3 has an open top and stores a predetermined amount of varnish 13. Overflow weirs 2a, 3a and overflow basins 2b are provided on the side walls of each storage tank 2, 3.
3b, and is designed to keep the liquid level height in each reservoir tank 2, 3 constant. In addition, overflow reservoir 2b.

3bの液は、図示しない返戻手段により貯溜槽2゜3に
返戻されるようになっている。また、低粘性液12及び
ワニス13は、夫々、図示しない温度制御装置により所
定温度に保持されている。
The liquid 3b is returned to the storage tank 2.3 by a return means (not shown). Further, the low viscosity liquid 12 and the varnish 13 are each maintained at a predetermined temperature by a temperature control device (not shown).

ところで、低粘性液12としては、基材1に対して充分
な濡れ性を有するものが使用される。具体的には、ワニ
ス13より低粘度であり且つ100cP以下の粘度の溶
剤等を使用するが、含浸させようとするワニスに配合さ
れた溶剤と同質のものを使用しておくことが好ましい、
また、ワニス13としては、一般に熱硬化性樹脂ワニス
が使用されるが、その他、熱可塑性樹脂、天然樹脂等の
ワニスや無溶剤の液状合成樹脂、液状天然樹脂等も使用
される。
By the way, as the low viscosity liquid 12, one having sufficient wettability to the base material 1 is used. Specifically, a solvent with a viscosity lower than Varnish 13 and 100 cP or less is used, but it is preferable to use a solvent of the same quality as the solvent blended in the varnish to be impregnated.
Further, as the varnish 13, a thermosetting resin varnish is generally used, but other varnishes such as thermoplastic resins, natural resins, solvent-free liquid synthetic resins, liquid natural resins, etc. can also be used.

熱サイホン室4は両射溜槽2,3間の上方部位に配!さ
れた密閉状のもので、底壁部から垂下する筒状の基材入
口部4a及び基材出口部4bを備えた逆U字状の略サイ
ホン管形状に構成されている。基材入口部4aは低粘性
液貯溜槽2の液面12′の近傍直上位に開口されており
、基材出口部4bはワニス貯溜槽3の液面13′下に開
口されている。また、この実施例では、基材入口部4a
を除く熱サイホン室4の周壁4cをジャケット構造に構
成して、その内部に適宜の加熱媒体を供給、流動させる
ことによって、周壁4cを低粘性液12の沸点以上に加
熱、保温し、装置起動時に熱サイホン室4内の圧力が低
粘性液12の飽和蒸気圧に迅速に達する゛ように、つま
り迅速な立上りが可能となるように図ると共に、低粘性
液蒸気が周壁4C内面に凝縮付着するのを防止すべく図
っている。
The thermosiphon chamber 4 is located above between the two injection tanks 2 and 3! It is constructed in the shape of an inverted U-shaped substantially siphon tube including a cylindrical base material inlet part 4a and a base material outlet part 4b hanging from the bottom wall. The base material inlet portion 4a is opened just above the liquid level 12' of the low viscosity liquid storage tank 2, and the base material outlet part 4b is opened below the liquid level 13' of the varnish storage tank 3. Further, in this embodiment, the base material entrance portion 4a
By configuring the peripheral wall 4c of the thermosiphon chamber 4 other than the outside in a jacket structure, and supplying and flowing an appropriate heating medium inside the peripheral wall 4c, the peripheral wall 4c is heated to a temperature higher than the boiling point of the low-viscosity liquid 12, kept warm, and the device is started. At the same time, the pressure inside the thermosyphon chamber 4 is designed to quickly reach the saturated vapor pressure of the low-viscosity liquid 12, that is, to enable a rapid rise, and the low-viscosity liquid vapor condenses and adheres to the inner surface of the peripheral wall 4C. We are trying to prevent this from happening.

勿論1周壁4cにおけるジャケットの外壁及び基材入口
部4aの周壁は断熱材で構成されている。
Of course, the outer wall of the jacket in the first circumferential wall 4c and the circumferential wall of the base material inlet portion 4a are made of a heat insulating material.

なお、熱サイホン室4には、必要に応じて、抽気管等を
接続しておいてもよい。
Note that an air bleed pipe or the like may be connected to the thermosyphon chamber 4 as necessary.

基材加熱機構5は、熱サイホン室4内に加熱ロール5a
を基材1の回行に追従すべく回転自在に設けてなる。こ
の加熱ロール5aは、熱サイホン室4内の熱サイホン領
域4′において基材1を低粘性液12の沸点以上に加熱
して、これに含浸せる低粘性液12を蒸発させるもので
ある。ところで、加熱ロール5aによる基材加熱温度は
図示しない温度制御装置により制御されようになってい
るが、その蒸発能力は、基材lに含浸されて熱サイホン
室4内に持込まれる最大量の低粘性液12を蒸発させ得
るに充分なものとされている。なお、加熱ロール5aは
基材1の通過方向に回転駆動させるようにしておいても
よい、この場合、ロール周速を基材1の走行速度に一致
させておくことはいうまでもない。
The base material heating mechanism 5 includes a heating roll 5a in the thermosyphon chamber 4.
is rotatably provided to follow the rotation of the base material 1. This heating roll 5a heats the base material 1 to a temperature higher than the boiling point of the low-viscosity liquid 12 in the thermosyphon region 4' in the thermosyphon chamber 4, and evaporates the low-viscosity liquid 12 impregnated therein. Incidentally, the temperature at which the base material is heated by the heating roll 5a is controlled by a temperature control device (not shown), but its evaporation capacity is determined by the maximum amount of evaporation that is impregnated into the base material 1 and brought into the thermosyphon chamber 4. It is said to be sufficient to evaporate the viscous liquid 12. Note that the heating roll 5a may be driven to rotate in the direction in which the substrate 1 passes.In this case, it goes without saying that the circumferential speed of the roll is made to match the traveling speed of the substrate 1.

蒸気流動機構6は、基材出口部4bに低粘性液貯溜部8
及び低粘性液加熱器9を設けると共に、基材入口部4a
に低粘性液回収部10及び冷却器11を設けてなる。低
粘性液貯溜部8及び低粘性液回収部10には低粘性液貯
溜槽2の低粘性液12と同一の低粘性液が貯溜されてお
り1両部8゜10は互いに連通8aされている。低粘性
液加熱器9は、低粘性液貯溜部8を囲繞するジャケット
構造壁で構成されていて、その内部に適宜の加熱媒体を
供給、流動させることによって、低粘性液貯溜部8の低
粘性液12を加熱蒸発させるものである。この低粘性液
加熱器9におけるジャケット壁(並びに低粘性液回収部
10の囲繞壁)は、低粘性液貯溜部8及び基材出口部4
b内のワニス溜13aに接する部分を除いて断熱材で構
成されており、その熱がワニス溜13a周辺のワニス1
3に伝わらないように工夫しである。なお、この実施例
では、低粘性液加熱器9を熱サイホン室4の周壁4cに
連通する一連のジャケット構造壁に構成しである。冷却
器11は低粘性液回収部10内に配置された冷却コイル
等であって、熱サイホン室4内の低粘性液蒸気を凝縮し
て、低粘性液回収部10に回収させるものである。
The vapor flow mechanism 6 includes a low viscosity liquid storage section 8 at the base material outlet section 4b.
and a low viscosity liquid heater 9, and a base material inlet portion 4a.
A low viscosity liquid recovery section 10 and a cooler 11 are provided at the bottom. The same low viscosity liquid as the low viscosity liquid 12 in the low viscosity liquid storage tank 2 is stored in the low viscosity liquid storage section 8 and the low viscosity liquid recovery section 10, and both parts 8 and 10 are in communication with each other 8a. . The low viscosity liquid heater 9 is composed of a jacket structure wall surrounding the low viscosity liquid storage section 8, and by supplying and flowing an appropriate heating medium inside the jacket structure wall, the low viscosity of the low viscosity liquid storage section 8 is reduced. The liquid 12 is heated and evaporated. The jacket wall of this low viscosity liquid heater 9 (and the surrounding wall of the low viscosity liquid recovery section 10) is connected to the low viscosity liquid storage section 8 and the base material outlet section 4.
It is made of a heat insulating material except for the part in contact with the varnish reservoir 13a inside b, and the heat is transferred to the varnish 1 around the varnish reservoir 13a.
This is done in a way that does not convey the message to 3. In this embodiment, the low viscosity liquid heater 9 is configured as a series of jacket structure walls communicating with the peripheral wall 4c of the thermosiphon chamber 4. The cooler 11 is a cooling coil or the like disposed within the low-viscosity liquid recovery section 10, and is used to condense the low-viscosity liquid vapor in the thermosiphon chamber 4 and recover it in the low-viscosity liquid recovery section 10.

基材走行ガイド機構7は、少なくとも各貯溜槽2.3内
に配設した適当数のガイドロール7a・・・7b・・・
からなり、基材1が基材供給源から低活性液p溜槽2内
の低粘性液貯溜領域2′に至り、基材入口部4aから熱
サイホン室4内の熱サイホン領域4′に至り、加熱ロー
ル5aを通過して基材出口部4bからワニス貯溜槽3内
のワニス貯溜領域3′に至り、ワニス貯溜槽3上のワニ
ス含浸量調整機構14を通過せしめられるようにガイド
するものである。なお、各貯溜領域2’、3’に配設さ
れているガイドロール7a・・・、7b・・・の一部は
、基材1にその幅方向への伸展力を付与しうるエキスパ
ンダ式のものに構成されていて、基材1の進行方向に対
して直角方向の、低粘性液貯溜領域2′における空気と
低粘性液との置換及びワニス貯溜領域3′におけるワニ
ス含浸を、夫々促進させるように図っている。また、ワ
ニス含浸量調整機構14はスクイズロール又はスクイズ
バーからなるもので、ワニス貯溜槽3を経過した基材1
をスクイズして、そのワニス含浸量を調整する。
The substrate traveling guide mechanism 7 includes at least an appropriate number of guide rolls 7a...7b... disposed within each storage tank 2.3.
The base material 1 reaches from the base material supply source to the low viscosity liquid storage area 2' in the low active liquid p storage tank 2, and from the base material inlet part 4a to the thermosiphon area 4' in the thermosiphon chamber 4, The material is guided so that it passes through the heating roll 5a, reaches the varnish storage area 3' in the varnish storage tank 3 from the base material outlet part 4b, and passes through the varnish impregnation amount adjustment mechanism 14 on the varnish storage tank 3. . Note that some of the guide rolls 7a..., 7b... disposed in each of the storage areas 2', 3' are expander-type rollers that can apply stretching force to the base material 1 in its width direction. and promotes replacement of air and low viscosity liquid in the low viscosity liquid storage area 2' and varnish impregnation in the varnish storage area 3' in the direction perpendicular to the direction of movement of the base material 1. I am trying to make this happen. Further, the varnish impregnation amount adjustment mechanism 14 is composed of a squeeze roll or a squeeze bar, and the varnish impregnation amount adjustment mechanism 14 is composed of a squeeze roll or a squeeze bar.
Squeeze to adjust the amount of varnish impregnated.

次に、以上のように構成されたワニス含浸装置を用いて
1本発明の方法を具体的に説明する。
Next, a method of the present invention will be specifically explained using the varnish impregnation apparatus configured as described above.

熱サイホン室4内を低粘性液蒸気で充満させた上で、基
材1を走行させる。
The base material 1 is run after the inside of the thermosiphon chamber 4 is filled with low viscosity liquid vapor.

まず、基材1は基材供給源から低粘性液貯溜槽2内にも
たらされて、低粘性液12中に浸漬され。
First, the substrate 1 is brought into the low viscosity liquid reservoir 2 from a substrate supply source and immersed in the low viscosity liquid 12 .

基材1中の空気が低粘性液12と置換される。Air in the substrate 1 is replaced with a low viscosity liquid 12.

このとき、基材1が低粘性液貯溜槽2の液面12′に至
ると、低粘性液12が毛細管現象により基材1を構成す
る繊維束に浸透し、同時に、その浸透力によって繊維束
中の空気は押出される。ががる浸透作用は、繊維束にお
ける浸透抵抗のため成る段階で停止する。つまり、浸透
作用の停止は、基材1の走行速度つまり繊維束の低粘性
液12への侵入速度が浸透速度より大きい場合は液面1
2′上で生じ、逆の場合は液面12′下で生じる。
At this time, when the base material 1 reaches the liquid level 12' of the low-viscosity liquid storage tank 2, the low-viscosity liquid 12 permeates into the fiber bundles constituting the base material 1 by capillary action, and at the same time, the fiber bundles The air inside is forced out. The osmotic action stops at a stage due to the osmotic resistance in the fiber bundle. In other words, if the traveling speed of the base material 1, that is, the speed at which the fiber bundle penetrates into the low-viscosity liquid 12 is higher than the permeation speed, the permeation action stops.
2' and vice versa below the liquid level 12'.

したがって、基材1が低粘性液貯溜領域2′を通過する
間に、エキスパンダ式ガイドロール7aによる作用を受
けることとも相俟って、繊維束中の空気はすべて低粘性
液12と置換されて排除されることになる。
Therefore, while the base material 1 passes through the low-viscosity liquid storage area 2', all the air in the fiber bundle is replaced with the low-viscosity liquid 12, together with the action of the expander-type guide roll 7a. will be excluded.

引き続き、低粘性液12を含浸された基材1は低粘性液
貯溜領域2′を出て、その液面12′上に開口する基材
入口部4aから熱サイホン室4内にもたらされる。
Subsequently, the substrate 1 impregnated with the low viscosity liquid 12 leaves the low viscosity liquid storage area 2' and is brought into the thermosiphon chamber 4 through the substrate inlet 4a opening above the liquid level 12'.

このとき、基材1は空気に触れることになるが、基材1
には低粘性液が含浸されているため、熱サイホン室4内
に進入する前の段階で空気が再侵入するようなことはな
い。
At this time, the base material 1 comes into contact with air, but the base material 1
Since it is impregnated with a low viscosity liquid, air will not re-enter before it enters the thermosyphon chamber 4.

そして、熱サイホン室4内にもたらされた基材1は加熱
ロール5aにより加熱されて、これに含浸された低粘性
液12が蒸発分離される。
The base material 1 brought into the thermosyphon chamber 4 is heated by the heating roll 5a, and the low viscosity liquid 12 impregnated therein is evaporated and separated.

このとき、熱サイホン室4内で発生する低粘性液蒸気は
冷却[111により凝縮されて、低粘性液回収部10に
回収される。したがって、基材出口部4bつまり低粘性
液貯溜部8で低粘性液蒸気が発生することと相俟って、
熱サイホン室4内の低粘性液蒸気は、第1図に示す如く
、基材出口部4b側から基材入口部4a側へと流動せし
められることになり、少なくとも基材加熱部5aからワ
ニス溜13aに至る基材通過領域部分は、空気が存在し
ない低粘性液飽和蒸気雰囲気に保持される。
At this time, the low viscosity liquid vapor generated in the thermosyphon chamber 4 is condensed by cooling [111] and collected in the low viscosity liquid recovery section 10. Therefore, together with the generation of low viscosity liquid vapor in the base material outlet section 4b, that is, the low viscosity liquid storage section 8,
As shown in FIG. 1, the low-viscosity liquid vapor in the thermosyphon chamber 4 is caused to flow from the base material outlet section 4b side to the base material inlet section 4a side, and is at least drained from the base material heating section 5a to the varnish reservoir. The base material passing region portion reaching 13a is maintained in a low viscosity liquid saturated vapor atmosphere free of air.

また、基材1はその進行速度で低粘性液12を基材加熱
部5aへ供給し続けることから、基材1は熱サイホンと
してのウィックの役割を果たすことになる。
Further, since the base material 1 continues to supply the low viscosity liquid 12 to the base material heating section 5a at the advancing speed, the base material 1 plays the role of a wick as a thermosiphon.

そして、加熱ロール5aを経過した基材1は、引き続き
基材出口部4bからワニス溜13aを通過して、ワニス
貯溜領域3′にもたらされる。
Then, the base material 1 that has passed through the heating roll 5a continues to pass through the varnish reservoir 13a from the base material outlet portion 4b, and is brought to the varnish reservoir region 3'.

このとき、ワニス温度は一般に低粘性液の飽和蒸気温度
よりも低いため、基材1がワニス13中に進入する際、
これに含まれている低粘性液蒸気が凝縮されることにな
る。しかし、ワニス溜13aの液面部分が加熱器9によ
り低粘性液12の沸点以上に加熱されていることから、
上記した如くワニス溜13aに進入する際に生じる凝縮
液は再蒸発されて、ワニス13中には殆ど侵入しない。
At this time, since the varnish temperature is generally lower than the saturated vapor temperature of the low viscosity liquid, when the base material 1 enters the varnish 13,
The low viscosity liquid vapor contained in this will be condensed. However, since the liquid level portion of the varnish reservoir 13a is heated by the heater 9 to a temperature higher than the boiling point of the low viscosity liquid 12,
As described above, the condensed liquid generated when entering the varnish reservoir 13a is re-evaporated and hardly enters into the varnish 13.

これらのことから、基材1の進入に伴って低粘性液12
がワニス13中に侵入する虞れは殆どなく、ワニス13
が稀釈化される心配はない。
From these facts, as the base material 1 enters, the low viscosity liquid 12
There is almost no possibility that the varnish 13 will enter the varnish 13.
There is no need to worry about it being diluted.

このようにしてワニス貯溜領域3′にもたらされた基材
1は、該領域3′を通過する間にワニス13を含浸され
る。
The substrate 1 thus brought into the varnish storage area 3' is impregnated with varnish 13 while passing through this area 3'.

このとき、基材1には空気が含有されていないため、エ
キスパンダ式ガイドロール7bによる作用を受けること
とも相俟って、その繊維内部にまでワニス13が均−且
つ充分に含浸せしめられることになる。その結果、ボイ
ドレスの極めて高品質のプリプレグを得ることができる
At this time, since the base material 1 does not contain air, the varnish 13 is evenly and sufficiently impregnated into the fibers thereof, together with the action of the expander type guide rolls 7b. become. As a result, a void-free prepreg of extremely high quality can be obtained.

ところで、本発明は上記実施例に限定されるものではな
く、その基本原理を逸脱しない範囲内において種々の変
更、改良が可能である。
By the way, the present invention is not limited to the above embodiments, and various changes and improvements can be made without departing from its basic principles.

例えば、第2図に示す如く、基材入口部4aに連通ずる
低粘性液貯溜槽2の上面領域を、基材1の導入口2dを
有する蓋体2cで閉塞し、導入口2dに冷却コイル等の
冷却機構17を配設するようにしておいてもよい、この
ようにすれば、低粘性液12の放散を確実に防止して、
環境汚染や低粘性液の損失を防止することができると共
に、引火性のものであっても低粘性液12として安全に
使用できる。かかる構成は、ワニス貯溜槽3についても
適用することが可能である。
For example, as shown in FIG. 2, the upper surface area of the low-viscosity liquid storage tank 2 communicating with the base material inlet 4a is closed with a lid 2c having an inlet 2d of the base 1, and a cooling coil is connected to the inlet 2d. Alternatively, a cooling mechanism 17 such as the
Environmental pollution and loss of the low viscosity liquid can be prevented, and even flammable liquids can be safely used as the low viscosity liquid 12. Such a configuration can also be applied to the varnish storage tank 3.

また、第3図に示す如く、低粘性液回収部10を設けず
、低粘性液貯溜部8を低粘性液貯溜領域2′に連通8a
させるようにしてもよい、この場合、基材入口部4aに
は冷却器11を配設しておくが、この冷却器11は必要
に応じて廃しておくことも可能である。
Further, as shown in FIG. 3, the low viscosity liquid collection section 10 is not provided, and the low viscosity liquid storage section 8 is communicated 8a with the low viscosity liquid storage region 2'.
In this case, a cooler 11 is provided at the base material inlet portion 4a, but this cooler 11 may be omitted if necessary.

また、ワニス溜13aを加熱することによりワニス13
中の溶剤等が蒸発し、これが熱サイホン室4内に侵入す
る虞れのある場合には、ワニス13中に浸漬する基材出
口部4b部分における基材通路を、基材1が通過しうる
範囲内において可及的に狭くして、ワニス貯溜領域3′
と熱サイホン領域4′との境界面積つまり基材出口部4
b内におけるワニス表面積を小さくしておけばよい。こ
のようにしておけば、ワニス溜13aの加熱によるワニ
ス13中の溶剤等の蒸発を可及的に防止できると共に、
その蒸気の熱サイホン室4への侵入を基材1の進行によ
り可及的に防止できる。しかも、ワニス溜13aの液面
での低粘性液蒸気の凝縮も可及的に防止できる。また、
基材入口部4aにおける基材通過路も、蒸気洩れが基材
1の進行により阻止されるように可及的に狭くしておい
てもよ%l’ll さらに、熱サイホン室4の周壁、例えば基材出口部4b
の周壁に低粘性液蒸気を吹き込むノズルを設けておいて
もよい、このようにすれば、前記した熱サイホン室4の
周壁4cによる加熱作用と相俟って、装置起動時におけ
る迅速な立上りを更に図ることができる。
Also, by heating the varnish reservoir 13a, the varnish 13
If there is a risk that the solvent etc. inside will evaporate and enter the thermosyphon chamber 4, the base material 1 may pass through the base material passage in the base material outlet portion 4b portion immersed in the varnish 13. The varnish storage area 3' is made as narrow as possible within the range.
The boundary area between
The surface area of the varnish within b may be kept small. By doing this, evaporation of the solvent, etc. in the varnish 13 due to heating of the varnish reservoir 13a can be prevented as much as possible, and
Intrusion of the steam into the thermosiphon chamber 4 can be prevented as much as possible by advancing the base material 1. Furthermore, condensation of low-viscosity liquid vapor on the liquid surface of the varnish reservoir 13a can be prevented as much as possible. Also,
The base material passageway in the base material inlet portion 4a may also be made as narrow as possible so that steam leakage is prevented as the base material 1 advances. For example, the base material outlet section 4b
A nozzle for blowing low-viscosity liquid vapor may be provided on the peripheral wall of the thermosyphon chamber 4. In this way, in combination with the heating effect of the peripheral wall 4c of the thermosyphon chamber 4, a rapid start-up at the time of starting the device can be achieved. It is possible to further improve the results.

また、熱サイホン室4内には、加熱ロール5aからワニ
ス溜13aに至る基材通過経路に沿って基材1を囲繞す
る筒状等の加熱壁(又は断熱壁)を配設して、この間に
おいて基材1を低粘性液蒸気の凝縮温度以上に加熱、保
温しうるようにしておいてもよい。
In addition, a heating wall (or a heat insulating wall) having a cylindrical shape or the like surrounding the base material 1 along the base material passing path from the heating roll 5a to the varnish reservoir 13a is disposed in the thermosyphon chamber 4. In this case, the base material 1 may be heated to a temperature higher than the condensation temperature of the low-viscosity liquid vapor and kept warm.

〔発明の効果〕〔Effect of the invention〕

以上の説明から容易に理解されるように1本発明によれ
ば、基材にワニスを均−且つ充分に短時間で含浸させる
ことができ、しかも基材中の気泡を皆無とすることがで
きる。かかる効果は、高粘度のワニスを含浸させる場合
に著しい。
As can be easily understood from the above description, according to the present invention, it is possible to impregnate a base material with varnish evenly and in a sufficiently short time, and moreover, it is possible to completely eliminate air bubbles in the base material. . This effect is significant when impregnating high viscosity varnishes.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明に係るワニス含浸装置の一実施例を示す
縦断側面図、第2図及び第3図は夫々その変形例を示す
第1図相当の縦断側面図である。 1・・・基材、2・・・低粘性液貯溜槽、2′・・・低
粘性液貯溜領域、3・・・ワニス貯溜槽、3′・・・ワ
ニス貯溜領域、4・・・熱サイホン室、4′・・・熱サ
イホン領域、4a・・・基材入口部、4b・・・基材出
口部、5・・・基材加熱機構、5a・・・加熱ロール、
6・・・蒸気流動機構、7・・・基材走行ガイド機構、
7a、7b・・・ガイドロール、8・・・低粘性液貯溜
部、9・・・低粘性液加熱器。
FIG. 1 is a longitudinal sectional side view showing one embodiment of the varnish impregnating apparatus according to the present invention, and FIGS. 2 and 3 are longitudinal sectional side views corresponding to FIG. 1 showing modifications thereof. 1... Base material, 2... Low viscosity liquid storage tank, 2'... Low viscosity liquid storage area, 3... Varnish storage tank, 3'... Varnish storage area, 4... Heat Siphon chamber, 4'...thermosyphon area, 4a...substrate inlet section, 4b...substrate outlet section, 5...substrate heating mechanism, 5a...heating roll,
6... Steam flow mechanism, 7... Base material traveling guide mechanism,
7a, 7b...Guide roll, 8...Low viscosity liquid reservoir, 9...Low viscosity liquid heater.

Claims (2)

【特許請求の範囲】[Claims] (1)溶剤等の低粘性液を貯溜せる低粘性液貯溜領域と
ワニスを貯溜せるワニス貯溜領域との間に、低粘性液貯
溜領域の液面上に開口し且つワニス貯溜領域の液面下に
開口する密閉状の熱サイホン領域を設けて、繊維質材か
らなるシート状の基材を低粘性液貯溜領域、熱サイホン
領域、ワニス貯溜領域を順次通過させるようにし、熱サ
イホン領域において、基材を加熱してこれに含浸された
低粘性液を蒸発させると共に基材の出口側に貯溜せる低
粘性液を蒸発させ、且つ熱サイホン領域で発生した低粘
性液蒸気を基材の出口側から基材の入口側へと流動させ
るようにしたことを特徴とするワニス含浸方法。
(1) Between the low viscosity liquid storage area where a low viscosity liquid such as a solvent can be stored and the varnish storage area where varnish can be stored, there is an opening above the liquid level of the low viscosity liquid storage area and below the liquid level of the varnish storage area. A sealed thermosyphon region is provided which opens into the thermosiphon region, and a sheet-like base material made of a fibrous material is passed sequentially through a low viscosity liquid storage region, a thermosyphon region, and a varnish storage region. The material is heated to evaporate the low viscosity liquid impregnated into it, and the low viscosity liquid stored on the outlet side of the base material is evaporated, and the low viscosity liquid vapor generated in the thermosyphon region is evaporated from the outlet side of the base material. A varnish impregnation method characterized by causing the varnish to flow toward the entrance side of the base material.
(2)溶剤等の低粘性液を貯溜した低粘性液貯溜槽と、
ワニスを貯溜したワニス貯溜槽と、低粘性液貯溜槽の液
面上に開口する基材入口部及びワニス貯溜槽の液面下に
開口する基材出口部を備えた密閉状の熱サイホン室と、
繊維質材からなるシート状の基材を低粘性液貯溜槽から
基材入口部を経て熱サイホン室に導き更に基材出口部か
らワニス貯溜槽に導く基材走行ガイド機構と、熱サイホ
ン室内において基材を加熱して、これに含浸された低粘
性液を蒸発させる基材加熱機構と、基材出口部に低粘性
液貯溜部及び低粘性液加熱器を備えており、低粘性液貯
溜部の低粘性液を加熱蒸発させる共に熱サイホン室内で
発生する低粘性液蒸気を基材出口部側から基材入口部側
へと流動させる蒸気流動機構と、を具備することを特徴
とするワニス含浸装置。
(2) a low viscosity liquid storage tank storing a low viscosity liquid such as a solvent;
A varnish storage tank storing varnish, a sealed thermosyphon chamber comprising a base material inlet opening above the liquid level of the low viscosity liquid storage tank and a base material outlet opening below the liquid level of the varnish storage tank. ,
A base material traveling guide mechanism that guides a sheet-like base material made of a fibrous material from a low-viscosity liquid storage tank through a base material inlet to a thermosyphon chamber, and further guides the base material from a base material outlet to a varnish storage tank; It is equipped with a base material heating mechanism that heats the base material and evaporates the low viscosity liquid impregnated into the base material, and a low viscosity liquid reservoir and a low viscosity liquid heater at the base material outlet. a vapor flow mechanism that heats and evaporates the low-viscosity liquid and flows the low-viscosity liquid vapor generated in the thermosiphon chamber from the base material outlet side to the base material inlet side. Device.
JP1034672A 1988-11-18 1989-02-14 Method and equipment for varnishing Granted JPH02214615A (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP1034672A JPH02214615A (en) 1989-02-14 1989-02-14 Method and equipment for varnishing
KR1019890014226A KR930001712B1 (en) 1988-11-18 1989-10-04 Varnish impregnation method and apparatus
US07/430,329 US5056457A (en) 1988-11-18 1989-11-02 Varnish impregnation method and apparatus
EP89420444A EP0369907B1 (en) 1988-11-18 1989-11-15 A varnish impregnation method and apparatus
DE68915401T DE68915401T2 (en) 1988-11-18 1989-11-15 Method and device for impregnation with varnish.
US07/738,953 US5137756A (en) 1988-11-18 1991-08-01 Varnish impregnation method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1034672A JPH02214615A (en) 1989-02-14 1989-02-14 Method and equipment for varnishing

Publications (2)

Publication Number Publication Date
JPH02214615A true JPH02214615A (en) 1990-08-27
JPH0581410B2 JPH0581410B2 (en) 1993-11-12

Family

ID=12420918

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1034672A Granted JPH02214615A (en) 1988-11-18 1989-02-14 Method and equipment for varnishing

Country Status (1)

Country Link
JP (1) JPH02214615A (en)

Also Published As

Publication number Publication date
JPH0581410B2 (en) 1993-11-12

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