JPH0221296B2 - - Google Patents
Info
- Publication number
- JPH0221296B2 JPH0221296B2 JP61021795A JP2179586A JPH0221296B2 JP H0221296 B2 JPH0221296 B2 JP H0221296B2 JP 61021795 A JP61021795 A JP 61021795A JP 2179586 A JP2179586 A JP 2179586A JP H0221296 B2 JPH0221296 B2 JP H0221296B2
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- processing
- magnetic field
- gas
- cylindrical body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000012545 processing Methods 0.000 claims description 37
- 150000002500 ions Chemical class 0.000 claims description 14
- 239000000463 material Substances 0.000 claims description 12
- 239000000843 powder Substances 0.000 claims description 8
- 230000005469 synchrotron radiation Effects 0.000 claims description 7
- BSYNRYMUTXBXSQ-UHFFFAOYSA-N Aspirin Chemical compound CC(=O)OC1=CC=CC=C1C(O)=O BSYNRYMUTXBXSQ-UHFFFAOYSA-N 0.000 claims description 6
- 238000011282 treatment Methods 0.000 claims description 5
- 239000011810 insulating material Substances 0.000 claims description 3
- 241000269627 Amphiuma means Species 0.000 claims 1
- 239000007789 gas Substances 0.000 description 26
- 239000000758 substrate Substances 0.000 description 23
- 238000004381 surface treatment Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 230000001133 acceleration Effects 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 239000010408 film Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000012495 reaction gas Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 108010014691 Lithostathine Proteins 0.000 description 1
- 102100027361 Lithostathine-1-alpha Human genes 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000000427 thin-film deposition Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
- B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
Landscapes
- Chemical & Material Sciences (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Toxicology (AREA)
- General Health & Medical Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
- Carbon And Carbon Compounds (AREA)
- Chemical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
- Plasma Technology (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61021795A JPS62180747A (ja) | 1986-02-03 | 1986-02-03 | 放電反応装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61021795A JPS62180747A (ja) | 1986-02-03 | 1986-02-03 | 放電反応装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62180747A JPS62180747A (ja) | 1987-08-08 |
| JPH0221296B2 true JPH0221296B2 (sv) | 1990-05-14 |
Family
ID=12064987
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61021795A Granted JPS62180747A (ja) | 1986-02-03 | 1986-02-03 | 放電反応装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62180747A (sv) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1995008182A1 (en) * | 1993-09-17 | 1995-03-23 | Isis Innovation Limited | Rf plasma reactor |
| JPH07142463A (ja) * | 1993-11-22 | 1995-06-02 | Nec Corp | 半導体装置の製造方法と製造装置 |
| JP2012130825A (ja) * | 2010-12-20 | 2012-07-12 | Kagawa Univ | ナノ粒子の製造方法、ナノ粒子およびナノ粒子製造装置 |
| JP6055721B2 (ja) * | 2013-05-31 | 2016-12-27 | フルード工業株式会社 | 粉体物性測定装置 |
-
1986
- 1986-02-03 JP JP61021795A patent/JPS62180747A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62180747A (ja) | 1987-08-08 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| EXPY | Cancellation because of completion of term |