JPH0220705B2 - - Google Patents

Info

Publication number
JPH0220705B2
JPH0220705B2 JP59267874A JP26787484A JPH0220705B2 JP H0220705 B2 JPH0220705 B2 JP H0220705B2 JP 59267874 A JP59267874 A JP 59267874A JP 26787484 A JP26787484 A JP 26787484A JP H0220705 B2 JPH0220705 B2 JP H0220705B2
Authority
JP
Japan
Prior art keywords
gas
film
electrode
treated
glow discharge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59267874A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61147879A (ja
Inventor
Akyoshi Takahashi
Naotatsu Asahi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP26787484A priority Critical patent/JPS61147879A/ja
Publication of JPS61147879A publication Critical patent/JPS61147879A/ja
Publication of JPH0220705B2 publication Critical patent/JPH0220705B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
JP26787484A 1984-12-19 1984-12-19 表面処理方法 Granted JPS61147879A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26787484A JPS61147879A (ja) 1984-12-19 1984-12-19 表面処理方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26787484A JPS61147879A (ja) 1984-12-19 1984-12-19 表面処理方法

Publications (2)

Publication Number Publication Date
JPS61147879A JPS61147879A (ja) 1986-07-05
JPH0220705B2 true JPH0220705B2 (https=) 1990-05-10

Family

ID=17450824

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26787484A Granted JPS61147879A (ja) 1984-12-19 1984-12-19 表面処理方法

Country Status (1)

Country Link
JP (1) JPS61147879A (https=)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59136475A (ja) * 1983-01-21 1984-08-06 Semiconductor Energy Lab Co Ltd プラズマ気相反応装置

Also Published As

Publication number Publication date
JPS61147879A (ja) 1986-07-05

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