JPH02200389A - Laser irradiating device - Google Patents

Laser irradiating device

Info

Publication number
JPH02200389A
JPH02200389A JP1021049A JP2104989A JPH02200389A JP H02200389 A JPH02200389 A JP H02200389A JP 1021049 A JP1021049 A JP 1021049A JP 2104989 A JP2104989 A JP 2104989A JP H02200389 A JPH02200389 A JP H02200389A
Authority
JP
Japan
Prior art keywords
harmonic
irradiated
wave
fundamental wave
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1021049A
Other languages
Japanese (ja)
Inventor
Shinichi Imai
信一 今井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP1021049A priority Critical patent/JPH02200389A/en
Publication of JPH02200389A publication Critical patent/JPH02200389A/en
Pending legal-status Critical Current

Links

Landscapes

  • Laser Beam Processing (AREA)
  • Lasers (AREA)

Abstract

PURPOSE:To easily irradiate the same point of an object to be irradiated with two beams of light by separating laser light to a basic wave and second harmonic wave, focusing both by utilizing a chromatic aberration, matching the basic wave with a focal position, deviating the focus of the second harmonic wave and irradiating the object to be irradiated with this wave. CONSTITUTION:The laser light released from a laser oscillating section 1 is separated to the basic wave and the second harmonic wave which are made the same in optical axis by an output transmission mirror (1st optical means 4). The basic wave and the second harmonic wave separated by the 1st optical means 4 are focused by a focusing lens (2nd optical means) 8 utilizing the chromatic aberration, by which the basic wave is matched with the focal position and the focus of the second harmonic wave is deviated. The object 12 to be irradiated is irradiated with this light. The operations for positioning two beams of the light is facilitated in this way.

Description

【発明の詳細な説明】 [発明の目的] (産業上の利用分野) この発明はレーザ光を基本波と第2高調波とに分離して
被照射物に照射するレーザ照射装置に関する。
DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention] (Industrial Application Field) The present invention relates to a laser irradiation device that separates laser light into a fundamental wave and a second harmonic and irradiates the irradiated object with the separated laser light.

(従来の技術) レーザ光を被照射物に照射してレーザ加工を行なう場合
、この被照射物の同一部分に溶融加工と変質加工(たと
えば紫外線処理)などのように2つの加工を同時あるい
は順次に行なうことがある。
(Prior art) When performing laser processing by irradiating a laser beam onto an irradiated object, two processes such as melt processing and alteration processing (for example, ultraviolet treatment) are performed on the same part of the irradiated object simultaneously or sequentially. I have something to do.

従来、このような2つの加工を同時あるいは順次に行な
うには、それぞれの加工に適した波長の光を別々の光源
から出射させ、反射鏡などの光学部品を用いて上記波加
工物の同一箇所に導くようにしていた。
Conventionally, in order to perform these two processes simultaneously or sequentially, light with a wavelength suitable for each process is emitted from separate light sources, and an optical component such as a reflector is used to illuminate the same part of the wave-processed object. I was trying to guide him.

しかしなから、波長の異なる2つの光を得るために2つ
の光源を用いるようにすると、各光源から出射された光
を被照射物へ導くために2つの光路が必要となるから、
構成の複雑化を招くということがあった。また、別々の
光源から出射された波長の異なる2つの光が被照射物の
同じ箇所を照射するように光学部品を位置決めしなけれ
ばならないが、その位置決めは難しく、手間が掛かると
いうことがあった。さらに、被照射物に溶融加工と変質
加工との2つの加工を行なう場合、被照射物に対して一
方の光は焦点位置を合致させて照射し、他方の光は焦点
位置をはずしで照射しなljればならないから、それに
よっても構成の複雑化や光学部品の位置決めに手間が掛
かるなどのことがあった (発明が解決しようとする課題) このように、従来は被照射物に波長の異なる2つの光を
照射する場合、2つの光源を用いるようにしていたので
、構成の複雑化を18いたり、各光源から出射されたそ
れぞれ光の位置決めが難しくなるなどのことがあった。
However, if two light sources are used to obtain two lights of different wavelengths, two optical paths are required to guide the light emitted from each light source to the irradiated object.
This may lead to a more complex configuration. In addition, the optical components must be positioned so that the two lights of different wavelengths emitted from separate light sources illuminate the same part of the object to be irradiated, but this positioning can be difficult and time-consuming. . Furthermore, when performing two processes, melting processing and alteration processing, on an irradiated object, one light is irradiated with the focused position of the irradiated object aligned, and the other light is irradiated with the focused position shifted. This has led to complications in the configuration and time-consuming positioning of optical components (problems to be solved by the invention). When irradiating two different lights, two light sources are used, which makes the configuration complicated and makes it difficult to position each light emitted from each light source.

この発明は−に記事端にもとずきなされたもので、その
目的とするところは、2つの光源を用いずに波長の異な
る2つの光を得ることができ、しかも複雑な光学部品を
用いずにこれら2つの光の一方を焦点位置を合致させ、
他方を焦点はずしして被照射物に照射することができる
ようにしたレーザ照射装置を提供することにある。
This invention was made based on the end of the article, and its purpose is to be able to obtain two lights of different wavelengths without using two light sources, and to use complex optical components. Match the focal position of one of these two lights without
It is an object of the present invention to provide a laser irradiation device that can irradiate an object with the other side out of focus.

【発明の構成] (課題を解決するための手段及び作用)上記課題を解決
するためにこの発明は、レーザ発振部と、このレーザ発
振部から放出されたレーザ光を光軸を同じにした基本波
と第2高調波とに分離する第1の光学手段と、この第1
の光学手段によって分離された基本波と第2高調波とを
色収差を利用して集束し、1−紀基本波を焦点位置を合
致させるとともに上記第2高調波を焦点はずしして被照
射物に照射する第2の光学手段とを具備する。それによ
って、1つのレーザ発振部から異なる波長の2つの光を
得ることができ、しかも−方の波長の光を被照射物に対
して焦点位置を合致させて照射することと、他方の波長
の光を焦点はずし1.て照射することが上記第2の光学
手段で容易に行なえるようにした。
[Structure of the Invention] (Means and Effects for Solving the Problems) In order to solve the above problems, the present invention provides a basic structure in which a laser oscillation section and a laser beam emitted from this laser oscillation section have the same optical axis. a first optical means for separating the wave and a second harmonic;
The fundamental wave and the second harmonic separated by the optical means are focused using chromatic aberration, and the focal position of the first-order fundamental wave is made to match, and the second harmonic is defocused and directed onto the object to be irradiated. and second optical means for irradiating. As a result, it is possible to obtain two lights of different wavelengths from one laser oscillation part, and in addition, it is possible to irradiate the target object with the light of the - one wavelength while aligning the focal position to the irradiated object, and to irradiate the object with the other wavelength. Defocus the light 1. The second optical means can easily perform irradiation using the second optical means.

(実施例) 以下、この発明の一実施例を図面を参照して説明する。(Example) An embodiment of the present invention will be described below with reference to the drawings.

第1図に示すレーザ照射装置はレーザ発振部1を備えて
いる。このレーザ発振部1はたとえばアレキサンドライ
トレーザヘッドの励起へラド2と、この励起へラド2の
一方の端面に対向して配設された全反射ミラー3と、他
方の端面に対向して配設された出力透過ミラー4とから
構成されている。アレキサンドライトレーザのレーザ発
振部1からは、波長が700〜800nsの基本波が発
振されるが、上記全反射ミラー3と出力透過ミラー4と
を選択することによって波長が75on麿の基本波を発
振させることができる。
The laser irradiation device shown in FIG. 1 includes a laser oscillation section 1. The laser irradiation device shown in FIG. This laser oscillation unit 1 includes, for example, an excitation radar 2 of an alexandrite laser head, a total reflection mirror 3 disposed facing one end face of the excitation radar 2, and a total reflection mirror 3 disposed facing the other end face. and an output transmission mirror 4. The laser oscillation unit 1 of the alexandrite laser oscillates a fundamental wave with a wavelength of 700 to 800 ns, but by selecting the total reflection mirror 3 and the output transmission mirror 4, a fundamental wave with a wavelength of 75 ns is oscillated. be able to.

上記励起へラド2の他方の端面と出力透過ミラー4との
間にはβ−BaB204結晶からなり、上記基本波の一
部分を波長が375 naの第2^調波に変換する波長
変換素子5が位相整合を満たす角度で設置されている。
Between the other end face of the excitation radar 2 and the output transmission mirror 4 is a wavelength conversion element 5 made of β-BaB204 crystal and converting a part of the fundamental wave into a second harmonic with a wavelength of 375 na. It is installed at an angle that satisfies phase matching.

上記出力透過ミラー4は、5i202とT i O2と
を交互にコーティングするなどして基本波は十分に増幅
してレーザ発振させることができ、第2高調波に対して
は無反射に形成されている。それによって、上記レーザ
発振部1からは750 n mの基本波と、375n−
の第2高調波とが光軸を同じにして出力されるようにな
っている。
The output transmission mirror 4 is coated with 5i202 and TiO2 alternately, so that the fundamental wave can be sufficiently amplified for laser oscillation, and the second harmonic is not reflected. There is. As a result, a fundamental wave of 750 nm and a fundamental wave of 375 nm are emitted from the laser oscillation section 1.
and the second harmonic of the optical axis are output on the same optical axis.

上記レーザ発振部1から発振された基本波と第2高調波
とは入射用レンズ5aで集束されて光ファイバ6に入射
し、この光ファイバ6によってコリメートレンズ系7に
導入される。このコリメートレンズ系7で平行光に補正
された基本ルと第2高調波とは集束レンズ8、石英板9
および波長選択板11を通って被照射物12を照射する
ようになっている。上記波長選択板11は基本波あるい
は第2高調波のいずれか一方だけを透過させることがで
きる。また、波長選択板11と上記石英板9とは図示し
ない駆動機構で光路に対して進退させることができるよ
うになっている。
The fundamental wave and the second harmonic oscillated by the laser oscillation section 1 are focused by the entrance lens 5a, enter the optical fiber 6, and are introduced into the collimating lens system 7 through the optical fiber 6. The fundamental light and second harmonic corrected to parallel light by this collimating lens system 7 are collected by a focusing lens 8 and a quartz plate 9.
And the object 12 to be irradiated is irradiated through the wavelength selection plate 11. The wavelength selection plate 11 can transmit only either the fundamental wave or the second harmonic. Further, the wavelength selection plate 11 and the quartz plate 9 can be moved forward and backward with respect to the optical path by a drive mechanism (not shown).

上記集束レンズ8は石英によって作られていて、第2図
に示すように波長が750nmの基本波に対しては1.
46の屈折率となり、波長が375ns+の第2高調波
に対しCは1.47の屈折率となる。1−記集束レンズ
7に、たとえば5LSQ−30−35P (シグマ光I
a株式会社の商品名)を用いれば、基本波す焦点距離を
35.1!mm、第2高調波の焦点距離を33.8mm
とすることができる。すなわち、F記集束レンズ8の色
収差を利用することによって基本波と第2高調波との焦
点距離を変えることができる。したかって、F、記集束
レンズ8で集束された基本波の焦点位置が合致するよう
に被照射物12を位置決めすれば、第2高調波を上記被
照射物11に対1゜て2 mmの焦点はずし量で照射す
ることができる。
The focusing lens 8 is made of quartz and, as shown in FIG. 2, has a wavelength of 1.
C has a refractive index of 46, and C has a refractive index of 1.47 for the second harmonic with a wavelength of 375 ns+. 1- For example, 5LSQ-30-35P (Sigma Light I
If you use A Co., Ltd.'s product name), the focal length of the fundamental wave will be 35.1! mm, the focal length of the second harmonic is 33.8 mm
It can be done. In other words, by utilizing the chromatic aberration of the F focusing lens 8, the focal lengths of the fundamental wave and the second harmonic can be changed. Therefore, if the object 12 to be irradiated is positioned so that the focal position of the fundamental wave focused by the focusing lens 8 coincides with F, then the second harmonic will be radiated at a distance of 2 mm at 1° relative to the object 11 to be irradiated. It is possible to irradiate with an out-of-focus amount.

また、上記石英板9を光路に進入させれば、第21已調
波の焦点はずし量をさらに増大させることができる。す
なわち、石英板9の通過長をdとすれば、基本波と第2
15調波との屈折率の差と通過長dとの積により光路長
差か生じるから、それによって焦点はずし量を増大させ
ることができる。
Furthermore, by inserting the quartz plate 9 into the optical path, the amount of defocusing of the 21st harmonic can be further increased. That is, if the passage length of the quartz plate 9 is d, then the fundamental wave and the second
Since an optical path length difference is generated by the product of the refractive index difference with the 15th harmonic and the passage length d, it is possible to increase the amount of defocusing.

上記石英板9の通過長dは、板厚と設置角塵により調整
することができる。
The passage length d of the quartz plate 9 can be adjusted by the plate thickness and installation angle.

このような構成のレーザ照射装置によれば、レーザ発振
部1の励起ヘッド2から発振される基本波は、その一部
が波長変換素子5によって第2高1凋波に変換されて出
力透過ミラー4から出力される。また、V記波長変換素
子5で第2高調波に変換されなかった基本波は−1−配
出力ミラー4から−に2第2高、凋波と光軸を同じにし
て出力される。すなわち、1つのし・−ザ発振部1から
波長の異なる2つのレーザ光を出力することができる。
According to the laser irradiation device having such a configuration, a part of the fundamental wave oscillated from the excitation head 2 of the laser oscillation unit 1 is converted into a second wave by the wavelength conversion element 5, and then transmitted to the output transmission mirror. Output from 4. Further, the fundamental wave which has not been converted into the second harmonic by the V wavelength conversion element 5 is output from the -1-distribution output mirror 4 to -2 with the same optical axis as the second harmonic wave. That is, one laser oscillation unit 1 can output two laser beams with different wavelengths.

レーザ発振部1から出力された基本波と第2高調波とは
、光ファイバ6を通ってコリメートレンズ系7で平行光
に補正されたのち、集束レンズ8で集束される。そして
、石英板つと波長選択板11とが光路から後退していれ
ば、上記集束レンズ8で集束された基本波は焦点位置を
合致させた状態で、また第2高調波は焦点はずしされた
状態で被照射物12を照射することになる。したがって
、焦点位置が合致された基本波は第2図にAで示す範u
Nを照射して上記被照射物12を溶融加工し、焦点はず
しされた第2高調波は同じく第2図にBで示す被照射物
12の基本波で照射された範囲Aよりも広い範囲を照射
して変質加工することになる。
The fundamental wave and the second harmonic outputted from the laser oscillation unit 1 pass through an optical fiber 6, are corrected into parallel light by a collimating lens system 7, and are then focused by a focusing lens 8. If the quartz plate and the wavelength selection plate 11 are retracted from the optical path, the fundamental wave focused by the focusing lens 8 will have its focal position matched, and the second harmonic will be defocused. The object 12 to be irradiated will be irradiated. Therefore, the fundamental wave whose focus position is matched is the range u shown by A in FIG.
The object 12 to be irradiated is melt-processed by irradiation with N, and the defocused second harmonic covers a wider range A than the range A irradiated by the fundamental wave of the object 12 shown as B in FIG. It will be irradiated and altered in quality.

上記基本波と第2高調波とは1つの集束レンズ8の色収
差によって焦点位置が合致された状態と焦点はずしされ
た状態とで被照射物12を照射する。そのため、基本波
と第2高調波とを別々の光学部品で集束する場合に比べ
て構成が簡単であるばかりか、光軸を同じにして上記集
束レンズ8に入射するから、とくに位置決めをせずとも
、基本波と第2高、i波とを光軸を興じにして被照射物
12を照射することができる。
The fundamental wave and the second harmonic irradiate the object 12 with their focal positions matched and out of focus due to the chromatic aberration of one focusing lens 8. Therefore, the configuration is not only simpler than when the fundamental wave and the second harmonic are focused using separate optical components, but also because they are incident on the focusing lens 8 with the same optical axis, no particular positioning is required. In both cases, the object 12 can be irradiated with the fundamental wave, the second wave, and the i-wave along the optical axis.

また、石英板9を光路に進入させれば、第2高調波の焦
点はずし量をさらに大きくすることができる。
Furthermore, by introducing the quartz plate 9 into the optical path, the amount of defocusing of the second harmonic can be further increased.

一方、波長選択板11としてたとえば基本波だけを通過
させるものを用いれば、それを光路に進入させることに
よって第2高調波による変質加工を1制御することがで
き、また波長選択板11が第2高調波だけを通過させる
ものであれば、基本波による溶融加工を制御することが
できる。
On the other hand, if a wavelength selection plate 11 that allows only the fundamental wave to pass, for example, is used, alteration processing by the second harmonic can be controlled by entering the wavelength selection plate 11 into the optical path. If only harmonics are allowed to pass through, melt processing using fundamental waves can be controlled.

なお、上記一実施例ではアレキサンドライトレーザにつ
いて述べたが、波長が1.0B4 #のNd:YAGレ
ーザの基本波を波長が0.532−の第2高調波に変換
する場合にもこの発明は適用することができ、レーザの
i類に制限を受けるものでない。
Although the above embodiment describes an alexandrite laser, the present invention can also be applied to the case where the fundamental wave of an Nd:YAG laser with a wavelength of 1.0B4 # is converted to a second harmonic with a wavelength of 0.532-. It is not limited to Class I lasers.

〔発明の効果] 以上述べたようにこの発明は、レーザ光を第1の光学手
段によって光軸を同じにした基本波と第2の高調波とに
分離し、色収差を利用した第2の光学手段によって上記
基本波を焦点位置を合致させるとともに第2鳥調波を焦
点はずしして被照射物を照射することができるようにし
た。したがって、波長の異なる2つの光を別々の光源か
ら出力させる従来に比べて構成の簡略化や位置決め作業
の容易化などを計ることができるばかりか、2つの光を
被照射物の同一箇所に照射することも簡ζ11に行なえ
るなどの利点を有する。
[Effects of the Invention] As described above, the present invention separates a laser beam into a fundamental wave and a second harmonic having the same optical axis by a first optical means, and separates a laser beam into a second harmonic wave using chromatic aberration. By means of this means, the focal position of the fundamental wave is made to coincide with the focal position, and the second harmonic wave is defocused so that the object to be irradiated can be irradiated. Therefore, compared to the conventional method of outputting two lights with different wavelengths from separate light sources, this not only simplifies the configuration and makes positioning work easier, but also irradiates the same part of the object with the two lights. It also has the advantage that it can be easily carried out.

【図面の簡単な説明】[Brief explanation of the drawing]

図面はこの発明の一実施例を示し、第1図は装置全体の
概略的構成図、第2図は被照射物の一部分の拡大平面図
、第3図は石英による光の波長と屈折率との関係のグラ
フである。 1・・・レーザ発振部、4・・・出力透過ミラー(第1
の光学手段)、5・・・波長変換素子(第1の光学手段
) 8・・・集束レンズ(第2の光学手段)、12・・
・被照射物。 出願人代理人 弁理士 鈴江武彦 第 図 叫ミ升
The drawings show an embodiment of the present invention; Fig. 1 is a schematic diagram of the entire apparatus, Fig. 2 is an enlarged plan view of a portion of the object to be irradiated, and Fig. 3 shows the wavelength and refractive index of light due to quartz. This is a graph of the relationship between 1... Laser oscillation unit, 4... Output transmission mirror (first
optical means), 5... wavelength conversion element (first optical means), 8... focusing lens (second optical means), 12...
・Irradiated object. Applicant's agent Patent attorney Takehiko Suzue

Claims (1)

【特許請求の範囲】[Claims] レーザ発振部と、このレーザ発振部から放出されたレー
ザ光を光軸を同じにした基本波と第2高調波とに分離す
る第1の光学手段と、この第1の光学手段によって分離
された基本波と第2高調波とを色収差を利用して集束し
、上記基本波を焦点位置に合致させるとともに上記第2
高調波を焦点はずしして被照射物に照射する第2の光学
手段とを具備したことを特徴とするレーザ照射装置。
a laser oscillation section; a first optical means for separating a laser beam emitted from the laser oscillation section into a fundamental wave and a second harmonic having the same optical axis; The fundamental wave and the second harmonic are focused using chromatic aberration, and the fundamental wave is made to match the focal position and the second harmonic is focused.
A laser irradiation device comprising a second optical means for defocusing harmonics and irradiating an object to be irradiated.
JP1021049A 1989-01-31 1989-01-31 Laser irradiating device Pending JPH02200389A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1021049A JPH02200389A (en) 1989-01-31 1989-01-31 Laser irradiating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1021049A JPH02200389A (en) 1989-01-31 1989-01-31 Laser irradiating device

Publications (1)

Publication Number Publication Date
JPH02200389A true JPH02200389A (en) 1990-08-08

Family

ID=12044065

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1021049A Pending JPH02200389A (en) 1989-01-31 1989-01-31 Laser irradiating device

Country Status (1)

Country Link
JP (1) JPH02200389A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05152669A (en) * 1991-11-28 1993-06-18 Sumitomo Metal Mining Co Ltd Laser oscillator
JP2009043788A (en) * 2007-08-06 2009-02-26 Ulvac Japan Ltd Laser annealing device, and laser annealing method
US20110139755A1 (en) * 2009-11-03 2011-06-16 Applied Materials, Inc. Multi-wavelength laser-scribing tool

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05152669A (en) * 1991-11-28 1993-06-18 Sumitomo Metal Mining Co Ltd Laser oscillator
JP2009043788A (en) * 2007-08-06 2009-02-26 Ulvac Japan Ltd Laser annealing device, and laser annealing method
US20110139755A1 (en) * 2009-11-03 2011-06-16 Applied Materials, Inc. Multi-wavelength laser-scribing tool

Similar Documents

Publication Publication Date Title
US4396285A (en) Laser system and its method of use
US7102118B2 (en) Beam formation unit comprising two axicon lenses, and device comprising one such beam formation unit for introducing radiation energy into a workpiece consisting of a weakly-absorbent material
US4123143A (en) Laser beam aligning apparatus
EP0491192B1 (en) Laser processing apparatus and laser processing method
CN1617784A (en) Laser machining device
WO2012098930A1 (en) Laser processing apparatus
WO2021145205A1 (en) Laser device, and laser processing device in which same is used
JPH02200389A (en) Laser irradiating device
JPH0436794B2 (en)
JP2019193944A (en) Laser processing device
CN114924406A (en) Micro reflector array processing method and system
JPH09159572A (en) Optical device
JP4333836B2 (en) Pulse laser processing equipment
JPH0722685A (en) Focus composition method of beam and its focus composition device
JPS60117201A (en) Optical waveguide device
JPH02284782A (en) Method for converging laser beams having different wavelengths
JPH09323184A (en) Laser beam machine
JPS6225379B2 (en)
KR20190129669A (en) Device for combining multi pulse lasers and method for the same
WO2021157546A1 (en) Laser processing apparatus
GB2254444A (en) Laser microscopy
JP6998488B1 (en) Laser scanning device and laser scanning method
JP2022187238A (en) Laser processing device and laser processing method
JPH10156571A (en) Laser beam machine
JPH06170575A (en) Laser beam machine