JPH02189503A - Optical parts - Google Patents
Optical partsInfo
- Publication number
- JPH02189503A JPH02189503A JP1017989A JP1017989A JPH02189503A JP H02189503 A JPH02189503 A JP H02189503A JP 1017989 A JP1017989 A JP 1017989A JP 1017989 A JP1017989 A JP 1017989A JP H02189503 A JPH02189503 A JP H02189503A
- Authority
- JP
- Japan
- Prior art keywords
- film
- films
- chromium oxide
- layers
- transmissivity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims description 15
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 claims abstract description 14
- 229910000423 chromium oxide Inorganic materials 0.000 claims abstract description 14
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 11
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 10
- 239000010703 silicon Substances 0.000 claims abstract description 10
- 239000011521 glass Substances 0.000 claims abstract description 9
- 239000000758 substrate Substances 0.000 claims abstract description 8
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 abstract description 8
- 239000000463 material Substances 0.000 abstract description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 6
- 229910052681 coesite Inorganic materials 0.000 abstract description 3
- 229910052906 cristobalite Inorganic materials 0.000 abstract description 3
- 230000007613 environmental effect Effects 0.000 abstract description 3
- 239000000377 silicon dioxide Substances 0.000 abstract description 3
- 235000012239 silicon dioxide Nutrition 0.000 abstract description 3
- 229910052682 stishovite Inorganic materials 0.000 abstract description 3
- 229910052905 tridymite Inorganic materials 0.000 abstract description 3
- 238000002310 reflectometry Methods 0.000 abstract 2
- 230000003595 spectral effect Effects 0.000 description 7
- 238000002834 transmittance Methods 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 230000010365 information processing Effects 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 101150107611 rio2 gene Proteins 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Optical Elements Other Than Lenses (AREA)
- Optical Filters (AREA)
Abstract
Description
【発明の詳細な説明】
［発明の目的］
（産業上の利用分野）
この発明は、光学的情報処理装置例えば光ピツクアップ
ヘッド等における半導体レーザ光の全反射ミラーなどに
使用して好適な光学部品に関する。[Detailed Description of the Invention] [Object of the Invention] (Industrial Application Field) The present invention provides an optical system suitable for use in a total reflection mirror for semiconductor laser light in an optical information processing device, such as an optical pickup head. Regarding parts.
（従来の技術）
一般に、光学部品例えば光ピツクアップヘッドにおける
半導体レーザ光の全反射ミラーは、所定の波長帯のみの
光の透過及び反射の機能を有する高屈折率物質膜と低屈
折率物質膜が交互に積層された誘電体多層膜からなって
おり、製造に当たっては真空蒸着法で成膜している。(Prior Art) In general, a total reflection mirror for semiconductor laser light in an optical component, such as an optical pickup head, consists of a high refractive index material film and a low refractive index material film that have the function of transmitting and reflecting light only in a predetermined wavelength band. It consists of a dielectric multilayer film in which layers are alternately stacked, and the film is formed using a vacuum evaporation method during manufacturing.
（発明が解決しようとする課題）
ところが、従来の製造方法では、−船釣に２０層以上と
いうように成膜層数が多く、長時間の蒸着時間を必要と
し、生産性が悪い。(Problems to be Solved by the Invention) However, in the conventional manufacturing method, the number of film layers is large, such as 20 or more layers for boat fishing, and a long vapor deposition time is required, resulting in poor productivity.
この発明は、上記課題を改芒するためになされたもので
、少ない層数で特定波長範囲を全反射する特性が得られ
る光学部品を提供することを目的とする。The present invention has been made to solve the above problem, and aims to provide an optical component that can achieve total reflection in a specific wavelength range with a small number of layers.
［発明の構成］
（課題を解決するための手段）
この発明は、透明ガラス基板上に酸化クロム膜又はシリ
コン膜が付むされ、この酸化クロム膜又はシリコン膜上
に、交互層からなる誘電体多層膜が形成されてなる光学
部品である。尚、透明ガラス基板は光透過率が９０％以
上のガラスである。[Structure of the Invention] (Means for Solving the Problems) This invention provides a method in which a chromium oxide film or a silicon film is attached on a transparent glass substrate, and a dielectric material consisting of alternating layers is formed on the chromium oxide film or silicon film. This is an optical component formed by forming a multilayer film. Note that the transparent glass substrate is glass with a light transmittance of 90% or more.
（作用）
この発明によれば、少ない層数で所要の透過率、反射率
の分光特性が得られ、更にＪｌｌがれが防止されると共
に耐環境性も改善される。(Function) According to the present invention, the required spectral characteristics of transmittance and reflectance can be obtained with a small number of layers, Jll peeling is prevented, and environmental resistance is also improved.
（実施例）
以下、図面を参照して、この発明の一実施例を詳細に説
明する。(Example) Hereinafter, an example of the present invention will be described in detail with reference to the drawings.
光学部品として、光ピツクアップヘッドにおける半導体
レーザ光の全反射ミラーを例にとると、この全反射ミラ
ーの形状はプリズム形又は平板形のものが使用されてお
り、７８０ｎｍ±２０ｎｍの波長の全反射用である。Taking as an example an optical component, a total reflection mirror for semiconductor laser light in an optical pickup head, the shape of this total reflection mirror is a prism shape or a flat plate shape, and total reflection of a wavelength of 780 nm ± 20 nm is used. It is for use.
即ち、この発明による全反射ミラーは第１図に示すよう
に構成され、上記波長の透過率が９２％の硼硅酸ガラス
からなる透明ガラス基板１上に、酸化クロム（Ｃｒ２０
３）膜２が付着されている。That is, the total reflection mirror according to the present invention is constructed as shown in FIG. 1, in which chromium oxide (Cr20
3) Membrane 2 is attached.
この酸化クロム膜２は、紫外線をカットするもので、第
２図に示すような分光特性を有している。This chromium oxide film 2 blocks ultraviolet rays and has spectral characteristics as shown in FIG.
このような酸化クロム膜２上には、光学的厚さがそれぞ
れλ／４の高屈折率物質膜であるＴｉＯ２膜３と低屈折
率物質膜である５ｉｎ２膜４の交互層が４回繰返し積層
されてなる誘電体多層膜が形成され、更に最終層として
光学的厚さがλ／２のＳｉＯ□膜５が形成されている。On such a chromium oxide film 2, alternating layers of a TiO2 film 3, which is a high refractive index material film, and a 5in2 film 4, which is a low refractive index material film, each having an optical thickness of λ/4 are repeatedly laminated four times. A dielectric multilayer film is formed, and a SiO□ film 5 having an optical thickness of λ/2 is further formed as a final layer.
尚、λは中心波長で、例えば約７８０ｎｍである。Note that λ is a center wavelength, for example, about 780 nm.
ところで、従来から一般に用いられている全反射ミラー
は、透明ガラス基板１上に、’ｒｉｏ２膜３と５ｉｎ２
膜４の交互層が９回繰返し積層されてなる誘電体多層膜
が形成され、更に最終層としてＴｉＯ２膜５が形成され
ている。By the way, a total reflection mirror that has been generally used has a 'rio2 film 3 and a 5in2 film on a transparent glass substrate 1.
A dielectric multilayer film is formed by repeating the alternating layers of the film 4 nine times, and a TiO2 film 5 is further formed as the final layer.
従って、この発明ではＴｉＯ２膜３とＳｉＯ２膜４の交
互層が従来に比べ５回減らされた誘電体多層膜でミラー
を形成することが出来、生産性の向上が図れる。又、こ
の発明の全反射ミラーは第３図に示す分光特性を有し、
少ない層数で所要の透過率、反射率の分光特性が得られ
る。Therefore, in the present invention, a mirror can be formed using a dielectric multilayer film in which the number of alternating layers of TiO2 film 3 and SiO2 film 4 is reduced by five times compared to the conventional method, and productivity can be improved. Further, the total reflection mirror of the present invention has the spectral characteristics shown in FIG.
The required spectral characteristics of transmittance and reflectance can be obtained with a small number of layers.
、（変形例）
上記実施例における酸化クロム膜（ｃｒ２０ｉ）の代わ
りにシリコン（Ｓｔ）膜を使用しても、同様効果が得ら
れる。尚、シリコン膜は赤外線をカットするものである
。(Modification) Similar effects can be obtained by using a silicon (St) film instead of the chromium oxide film (CR20i) in the above embodiment. Note that the silicon film cuts infrared rays.
［発明の効果］
この発明によれば、透明ガラス基板上に酸化クロム膜又
はシリコン膜を付着し、紫外線或いは可視域、赤外域の
透過率をフラットに下げ、その表面に高屈折率物質膜と
低屈折率物質膜とが交２ｉに積層されてなる少ない誘電
体多層膜が形成されている。[Effects of the Invention] According to the present invention, a chromium oxide film or a silicon film is deposited on a transparent glass substrate to flatten transmittance in the ultraviolet, visible, and infrared regions, and a high refractive index material film is coated on the surface. A small dielectric multilayer film is formed by laminating low refractive index material films in an intersecting 2i pattern.
この結果、所要の透過率、反射率の分光特性を有する膜
構成が少なく出来、生産性の良好な光学部品が得られる
。As a result, the number of film structures having the required spectral characteristics of transmittance and reflectance can be reduced, and an optical component with good productivity can be obtained.
又、膜の剥がれが防止され、耐環境性が改善される。Moreover, peeling of the film is prevented and environmental resistance is improved.
第１図はこの発明の一実施例に係る光学部品（全反射ミ
ラー）を示す断面図、第２図は酸化クロムの分光特性を
示す特性曲線図、第３図はこの発明の光学部品（全反射
ミラー）の分光特性を示す特性曲線図である。
１・・・ガラス基板、２・・・酸化クロム膜、３・・・
Ｔ ｉ ０２膜、４・・・ＳｉＯ＊膜、５・・・Ｓｉｎ
、膜。
第１図
出願人代理人 弁理士 鈴江武彦
魚
＋０００
λ（ｎｍ）FIG. 1 is a cross-sectional view showing an optical component (total reflection mirror) according to an embodiment of the present invention, FIG. 2 is a characteristic curve diagram showing the spectral characteristics of chromium oxide, and FIG. FIG. 3 is a characteristic curve diagram showing the spectral characteristics of a reflective mirror. 1...Glass substrate, 2...Chromium oxide film, 3...
T i 02 film, 4...SiO* film, 5...Sin
,film. Figure 1 Applicant's agent Patent attorney Takehiko Suzue +000 λ (nm)
Claims (1)
され、この酸化クロム膜又はシリコン膜上に、交互層か
らなる誘電体多層膜が形成されてなることを特徴とする
光学部品。An optical component characterized in that a chromium oxide film or a silicon film is deposited on a transparent glass substrate, and a dielectric multilayer film consisting of alternating layers is formed on the chromium oxide film or silicon film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1017989A JPH02189503A (en) | 1989-01-19 | 1989-01-19 | Optical parts |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1017989A JPH02189503A (en) | 1989-01-19 | 1989-01-19 | Optical parts |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02189503A true JPH02189503A (en) | 1990-07-25 |
Family
ID=11743062
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1017989A Pending JPH02189503A (en) | 1989-01-19 | 1989-01-19 | Optical parts |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02189503A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113716877A (en) * | 2015-10-22 | 2021-11-30 | 康宁股份有限公司 | Ultraviolet light resistant articles and methods of making the same |
-
1989
- 1989-01-19 JP JP1017989A patent/JPH02189503A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113716877A (en) * | 2015-10-22 | 2021-11-30 | 康宁股份有限公司 | Ultraviolet light resistant articles and methods of making the same |
| CN113716877B (en) * | 2015-10-22 | 2023-06-16 | 康宁股份有限公司 | Ultraviolet light resistant articles and methods of making the same |
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