JPH02188431A - Production of quartz glass - Google Patents

Production of quartz glass

Info

Publication number
JPH02188431A
JPH02188431A JP739589A JP739589A JPH02188431A JP H02188431 A JPH02188431 A JP H02188431A JP 739589 A JP739589 A JP 739589A JP 739589 A JP739589 A JP 739589A JP H02188431 A JPH02188431 A JP H02188431A
Authority
JP
Japan
Prior art keywords
sol
gel
quartz glass
bubbles
dry gel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP739589A
Other languages
Japanese (ja)
Inventor
Kazuo Shingyouchi
新行内 和夫
Shiro Konishi
小西 史郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Cable Ltd
Original Assignee
Hitachi Cable Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Cable Ltd filed Critical Hitachi Cable Ltd
Priority to JP739589A priority Critical patent/JPH02188431A/en
Publication of JPH02188431A publication Critical patent/JPH02188431A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C03C1/006Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00Other methods of shaping glass
    • C03B19/12Other methods of shaping glass by liquid-phase reaction processes
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01Manufacture of glass fibres or filaments
    • C03B37/012Manufacture of preforms for drawing fibres or filaments
    • C03B37/014Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/016Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by a liquid phase reaction process, e.g. through a gel phase

Abstract

PURPOSE:To obtain high-purity quartz glass with little admixture of bubbles at low cost by adding the specified amount of lower alcohol and water to fine powdery silica, agitating and mixing the mixture to make sol and allowing this sol to gel with time and thereafter drying gel to obtain dry gel and then heating and sintering this dry gel and producing transparent glass. CONSTITUTION:Sol good in foam break is produced by adding 1-5mol lower alcohol (methyl alcohol, ethyl alcohol) and 1-4mol water to 1mol fine powdery silica, agitating and mixing the mixture to make sol. Then this sol is introduced into a vessel and this vessel is closed and allowed to stand at room temp. Sol is allowed to gel and furthermore gel is aged and thereafter heated and dried to obtain dry gel. Then this dry gel is introduced into a sintering furnace, heated and sintered to produce transparent glass and thereby quartz glass is obtained. This obtained quartz glass is free from admixture of bubbles and foreign matters and preferably utilized for stock of optical fiber.

Description

【発明の詳細な説明】 [産業上の利用分野J 本発明は、光フアイバ用として使用可能な気泡混入の極
めて少い石英ガラスをゾル−ゲル法を用いて安価に製造
する石英ガラスの製造方法に関するものである。
[Detailed Description of the Invention] [Industrial Field of Application J] The present invention provides a method for producing quartz glass that can be used for optical fibers and that can be produced at low cost by using a sol-gel method and has very little air bubbles. It is related to.

[従来の技術] 光ファイバの素材とするための石英ガラスは高純度であ
ることのほかに気泡や異物の混入のないことが要求され
る。
[Prior Art] Silica glass used as a material for optical fibers is required not only to have high purity but also to be free from air bubbles and foreign matter.

このような石英ガラスの製造方法としては、今日法〈実
施されている火炎加水分解法をはじめこれまでにもさま
ざまな方法が提案されてきた。
Various methods have been proposed for producing such quartz glass, including the flame hydrolysis method currently in use.

ゾル−ゲル法もそのような製造方法の一つであり、具体
的には図に示すような工程に従い光フアイバ用母材ガラ
スを製造するものである。
The sol-gel method is one of such manufacturing methods, and specifically, a matrix glass for optical fibers is manufactured according to the steps shown in the figure.

すなわち、図(a)に示すように容器2中において原材
料としてのシリカ微粉末を水やアルコールによって溶か
しコロイド状のゾル1aとなし、これを図(b)のよう
に密封蓋4を有する密閉容器3中に封入し加水分解させ
てゲル1bとし、その後回(C)のように密封蓋4に穴
4aをUnけるなどして前記ゲル1bを容器3中で乾燥
させて多孔質のドライゲルICとする。このドライゲル
ICを図(d)のように電気炉5中において加熱焼結さ
せると透明な高純度石英ガラス1dとなる。
That is, as shown in Figure (a), fine silica powder as a raw material is dissolved in water or alcohol in a container 2 to form a colloidal sol 1a, and this is then placed in a closed container with a sealed lid 4 as shown in Figure (b). After that, as in step (C), holes 4a are made in the sealing lid 4, and the gel 1b is dried in the container 3 to form a porous dry gel IC. do. When this dry gel IC is heated and sintered in an electric furnace 5 as shown in Figure (d), a transparent high-purity quartz glass 1d is obtained.

このゾル−ゲル法は、上述のように中間工程で多孔質の
ドライゲルICが中間製品として形成されるため、その
多孔質物質としての特色を生かし、例えば耐放射線性に
優れたガラス素材とするためのOH基の吸着に利用する
など、ガラス素材の特性の改良を行なう上で便利である
という利点があり、そのよう意味合いからも注目を集め
ている製造方法の一つである。
In this sol-gel method, as mentioned above, a porous dry gel IC is formed as an intermediate product in the intermediate process, so by taking advantage of its characteristics as a porous material, it is possible to make, for example, a glass material with excellent radiation resistance. It has the advantage of being convenient for improving the properties of glass materials, such as by using it for adsorption of OH groups, and for this reason, it is one of the manufacturing methods that is attracting attention.

[発明が解決しようとする課題フ シル−ゲル法は、上記のような利点のほかに、高純度化
も比較的容易である上、ドライゲル製造中や焼結中に割
れやクラックが生じにくいために、比較的マスの大きな
石英ガラスを入手し易いという利点らある。
[Problems to be Solved by the Invention] In addition to the above-mentioned advantages, the fusil-gel method has the following advantages: it is relatively easy to achieve high purity, and cracks are less likely to occur during dry gel production and sintering. Another advantage is that it is easy to obtain quartz glass with a relatively large mass.

しかし、この方法は、ゾル中の気泡の切れが悪く、ドラ
イゲル中に気泡が残り易く、結果的に焼結した石英ガラ
ス中に多数の気泡が残存し易くなるという欠点かあり、
これの改善が強く望まれている。
However, this method has the disadvantage that the air bubbles in the sol are difficult to cut, and air bubbles tend to remain in the dry gel, resulting in a large number of air bubbles remaining in the sintered quartz glass.
Improvement of this is strongly desired.

本発明の目的は、上記したような従来技術の問題点を解
消し、内部に気泡の残存しない石英ガラスをゾル−ゲル
法により安価に製造する方法を提供しようとするもので
ある。
SUMMARY OF THE INVENTION An object of the present invention is to solve the above-mentioned problems of the prior art and to provide a method for manufacturing quartz glass without any air bubbles at a low cost by a sol-gel method.

し課題を解決するための手段] 本発明は、ゾル−ゲル法により石英ガラスを製造するに
際し、微粉末シリカ1モルに対し低級アルコール1〜5
モルおよび水1〜4モルを加えゾル化することを特徴と
するものである。
Means for Solving the Problems] The present invention provides that when producing quartz glass by the sol-gel method, 1 to 5 lower alcohols are added to 1 mole of fine powder silica.
It is characterized by adding 1 to 4 moles of water and 1 to 4 moles of water to form a sol.

本発明において使用する微粉末シリカとしては、SiC
,l!aを酸水素炎バーナで加水分解して得られるもの
に限らず、金属アルコキシドを加水分解して得られたシ
リカ微粒子やケイ酸ソーダを原料とする湿式法によれ得
られた微粉末シリカなども使用できる。
The fine powder silica used in the present invention includes SiC
,l! Not only those obtained by hydrolyzing a with an oxyhydrogen flame burner, but also fine silica particles obtained by hydrolyzing metal alkoxides and fine powdered silica obtained by a wet method using sodium silicate as a raw material. Can be used.

低級アルコールとしては、メチルアルコール、エチルア
ルコール、プロピルアルコール、ブチルアルコールが好
ましい、これ以上炭素数の大きいアルコールを用いると
、ゾル液の粘度が高くなり、ゾル液中の泡切れが悪くな
り、好ましくない。また、この添加量は1〜5モルの範
囲が好ましく、1モル以下ではゾル液中の泡切れが悪く
なり、5モル以上になるとゲル化しない。
As the lower alcohol, methyl alcohol, ethyl alcohol, propyl alcohol, and butyl alcohol are preferable. If an alcohol with a larger number of carbon atoms is used, the viscosity of the sol will increase, making it difficult to remove bubbles in the sol, which is not preferable. . Further, the amount added is preferably in the range of 1 to 5 moles; if it is less than 1 mole, it becomes difficult to remove bubbles in the sol solution, and if it is more than 5 moles, it will not gel.

水の添加量は1〜4モルの範囲が好ましく、1モル以下
ではゲル化しなくなり、4モル以上になると泡切れが悪
くなる。
The amount of water added is preferably in the range of 1 to 4 moles; if it is less than 1 mole, gelation will not occur, and if it is more than 4 moles, foaming will be difficult.

[作用] 本発明か規定した範囲の低級アルコールおよび水により
ゾル化すると、ゾル中の泡切れが格段によくなり、ゾル
−ゲル法の難点であった気泡の残存が解消され、他の確
立された製造方法によったと同様の気泡のない高純度石
英ガラスを製造することかできる。
[Function] When the present invention is made into a sol using a lower alcohol and water within the specified range, the bubble breakage in the sol becomes much better, and the remaining bubbles, which were a drawback of the sol-gel method, are eliminated. It is possible to produce high-purity quartz glass without bubbles similar to that produced by the production method described above.

[実施例] 以下に、本発明について実施ρ1を参照し説明する。[Example] The present invention will be described below with reference to implementation ρ1.

実施例1 商品名Aearosil ox50 60g (1モル
)にエチルアルコール92g (2モル)と水36g(
2モル)を加え、激しく撹拌してゾル化した。
Example 1 60 g (1 mol) of Aerosil ox50 (trade name), 92 g (2 mol) of ethyl alcohol and 36 g of water (
2 mol) was added thereto and stirred vigorously to form a sol.

このゾルをフッ素樹脂製の円筒型容器(内径20 rm
 X高さ200nn)に注入し、密閉して室温に放置し
たところ17時間後にゲル化した。これをさらに50℃
で一週間熟成した後、密封蓋に直径0.5間の穴を1個
開け、60℃で1日、80℃て1日、100℃で1日、
120℃で1日の順に加熱しドライゲルを作製した。こ
のドライゲルを焼結炉に入れ1250℃で焼結してガラ
ス化し、直径的1 、Or+on、長さ約100間の石
英ガラスロッドを得た。得られた石英ガラスの近赤外吸
収スペクトルを測定した結果、市販の石英ガラスと同様
のピークが見られた。また、比重は2.23、ビッカー
ス硬さは815kg/止2であり、これも市販のガラス
とほぼ7致しな、さらに、He−Naレーザーで散乱の
様子を調べたところ、小さな散乱が数個見られたか、気
泡による大きな散乱は見られなかった。
This sol was poured into a cylindrical container made of fluororesin (inner diameter 20 rm).
When the mixture was injected into a tube (height: 200 nn), sealed and left at room temperature, it gelled after 17 hours. This is further heated to 50℃
After aging for one week, one hole with a diameter of 0.5 mm was made in the sealed lid, and the temperature was 1 day at 60 °C, 1 day at 80 °C, and 1 day at 100 °C.
A dry gel was prepared by heating at 120° C. for one day. This dry gel was placed in a sintering furnace and sintered at 1250° C. to vitrify it to obtain a quartz glass rod with a diameter of 1 mm, Or+on, and a length of about 100 mm. As a result of measuring the near-infrared absorption spectrum of the obtained quartz glass, peaks similar to those of commercially available quartz glass were observed. In addition, the specific gravity is 2.23 and the Vickers hardness is 815 kg/2, which is almost the same as commercially available glass.Furthermore, when we investigated the state of scattering with a He-Na laser, we found several small scattering particles. No significant scattering due to air bubbles was observed.

実施例2 商品名Cab−0−3it  M5 60g <1モル
)にn−プロピルアルコール90g(1,5モル)と水
45g (2,5モル)を加えて、激しく撹拌してゾル
化した。このゾルをフッ素樹脂製の円筒型容器(内径2
0+wmX高さ200ffi目)に注入し密閉して室温
に放置しなところ21時間後にゲル化した。さらに50
℃で一週間熟成した後、密封若に直径0.5++mの穴
を1個開け120℃まで1時間に1℃の速度で昇温して
徐々に乾燥した。
Example 2 90 g (1.5 mol) of n-propyl alcohol and 45 g (2.5 mol) of water were added to Cab-0-3it (trade name: M5, 60 g <1 mol) and stirred vigorously to form a sol. This sol was poured into a cylindrical container made of fluororesin (inner diameter 2
When the mixture was injected into a container (0+wm x height 200ffi), sealed and left at room temperature, it turned into a gel after 21 hours. 50 more
After aging for one week at °C, one hole with a diameter of 0.5++ m was made in the sealed container, and the temperature was raised to 120 °C at a rate of 1 °C per hour to gradually dry.

得られたドライゲルを焼結炉に入れ1250℃で焼結し
てガラス化し、直径約10m+、長さ約100薗の石英
ガラスロッドを得た。得られた石英ガラスの近赤外吸収
スペクトルを測定した結果、市販の石英ガラスと同様の
ピークが見られた。また、比重は2.19、ビッカース
硬さは802kg/am”であり、これも市販の石英ガ
ラスとほぼ一致した。さらにHe−Neレーザーで散乱
の様子をユ1べたところ、小さな散乱が数個見られたが
、気泡による大きな散乱は見られなかった。
The obtained dry gel was placed in a sintering furnace and sintered at 1250° C. to vitrify it to obtain a quartz glass rod with a diameter of about 10 m+ and a length of about 100 mm. As a result of measuring the near-infrared absorption spectrum of the obtained quartz glass, peaks similar to those of commercially available quartz glass were observed. In addition, the specific gravity was 2.19 and the Vickers hardness was 802 kg/am'', which was almost the same as that of commercially available quartz glass.Furthermore, when we examined the state of scattering with a He-Ne laser, we found several small scattering particles. However, no significant scattering due to air bubbles was observed.

実施例3 Aearos+l ox50 60g (1モル)にメ
タノール96g (3モル)と水27g(1,5モル)
を加え、激しく撹拌してゾル化した。このゾルをフッ素
樹脂製の円筒型容器(内径20o+mX高さ200m+
n)に注入し密閉して室温に放置しなところ15時間後
にゲル化した。さらにこれを50℃で一週間熟成した後
、密封蓋に直径0.5市の穴を1個開け120℃まで1
時間に1℃の速度で昇温して徐々に乾燥してドライゲル
を作製しな、このドライゲルを焼結炉に入れ1250℃
で焼結してガラス化し、直径約10關、長さ約100I
IIIの石英ガラスロッドを得な、得られた石英ガラス
の近赤外吸収スペクトルを測定した結果、市販の石英ガ
ラスと同様のピークが見られた。また、比重は2,18
、ビッカース硬さは813 kir/ Il+n2であ
り、これも市販の石英ガラスとほぼ一致した。
Example 3 60 g (1 mol) of Aeros+l ox50, 96 g (3 mol) of methanol and 27 g (1.5 mol) of water
was added and stirred vigorously to form a sol. This sol was poured into a cylindrical container made of fluororesin (inner diameter 20o+m x height 200m+
When the mixture was injected into the container, sealed, and left at room temperature, it turned into a gel after 15 hours. Furthermore, after aging this at 50℃ for one week, one hole with a diameter of 0.5 mm was made in the sealed lid and the temperature was raised to 120℃.
The temperature is increased at a rate of 1°C per hour to gradually dry the dry gel, and this dry gel is placed in a sintering furnace at 1250°C.
It is sintered and vitrified, with a diameter of about 10 mm and a length of about 100 mm.
The quartz glass rod III was obtained, and the near-infrared absorption spectrum of the obtained quartz glass was measured, and as a result, peaks similar to those of commercially available quartz glass were observed. Also, the specific gravity is 2.18
The Vickers hardness was 813 kir/Il+n2, which also almost matched that of commercially available quartz glass.

さらにHe−Neレーザーで散乱の様子を調べたところ
、小さな散乱が数個みられたが、気泡による大きな散乱
は見られなかった。
Furthermore, when the state of scattering was investigated using a He-Ne laser, several small scatterings were observed, but no large scattering due to bubbles was observed.

比較例I Aearosil ox50 60g (1モル)にメ
タノール29g (0,9モル)と水54g (3モル
)を加えて、激しく撹拌してゾル化しな、このゾルをフ
ッ素樹脂製の円筒型容器(内径20關×高さ200 +
u+ )に注入し密閉して室温に放置したところ18時
間後にゲル化した。
Comparative Example I To 60 g (1 mol) of Aerosil ox50, 29 g (0.9 mol) of methanol and 54 g (3 mol) of water were added and stirred vigorously to form a sol. 20 cm x height 200 +
When the mixture was injected into a container (u+), sealed, and left at room temperature, it turned into a gel after 18 hours.

しかし、この時ゾル中の泡切れが悪く、気泡がたくさん
残った。このゲルを50℃で一週間熟成した後、密封蓋
に直径0.5++++nの穴を1個開け120℃まで1
時間に1°Cの速度で昇温して徐々に乾燥した。得られ
たドライゲルを焼結炉に入れ1250°Cで焼結してガ
ラス化し、直径約10+u+、長さ約10(lnmの石
英ガラスロッドを得た。しかし、He−Neレーザーで
散乱の様子を調べなところ、気泡による大きな散乱が多
数見られた。
However, at this time, the bubbles in the sol did not break easily, and many bubbles remained. After aging this gel at 50℃ for one week, make one hole with a diameter of 0.5++++n in the sealed lid and heat it to 120℃.
The temperature was increased at a rate of 1°C per hour to gradually dry the film. The obtained dry gel was placed in a sintering furnace and sintered at 1250°C to vitrify it to obtain a silica glass rod with a diameter of about 10+u+ and a length of about 10 (lnm). Upon closer inspection, we found that there was a lot of large scattering caused by air bubbles.

比較例2 Cab−0−3il  M5 60g (1モル)にエ
タノール235g (5,1モル)と水27g(1,5
モル2を加え、激しく撹拌してゾル化した。このゾルを
フッ素樹脂製の円筒型容器(内径20 nm X高さ2
00 mn )に注入し密閉して室温に放置したが、−
a間装置してもゲル化しなかった。
Comparative Example 2 60 g (1 mol) of Cab-0-3il M5, 235 g (5.1 mol) of ethanol and 27 g (1,5 mol) of water
2 moles were added and stirred vigorously to form a sol. This sol was placed in a cylindrical container made of fluororesin (inner diameter 20 nm x height 2
00 mn), sealed and left at room temperature, but -
It did not gel even after being exposed to the apparatus for a period of a day.

比較例3 Aearosil ox50 60g (1モル)にn
−プロピルアルコール120g<2モル)と水16g(
0,9モル)を加え、激しく撹拌してゾル化した。この
ゾルをフッ素樹脂製の円筒型容器(内径20市×高さ2
00 ++n+ )に注入し密閉して室温に放置したが
、−週間放置してもゲル化しなかった。
Comparative Example 3 Aerosil ox50 60g (1 mol)
- 120 g of propyl alcohol <2 mol) and 16 g of water (
0.9 mol) was added and stirred vigorously to form a sol. This sol was poured into a cylindrical container made of fluororesin (inner diameter 20mm x height 2mm).
00++n+), the mixture was sealed and left at room temperature, but gelation did not occur even after being left for -week.

比較例4 Cab−o−8it  M5 60 (1モル)にエタ
ノール46g(1モル)と水74g(4,1モル)を加
え、激しく撹拌してゾル化した。このゾルをフッ素樹脂
製の円筒型容8(内径20關×高さ200 rm )に
注入し、密閉して室温に放置しなところ26時間後にゲ
ル化した。
Comparative Example 4 46 g (1 mol) of ethanol and 74 g (4.1 mol) of water were added to Cab-o-8it M5 60 (1 mol), and the mixture was vigorously stirred to form a sol. This sol was poured into a cylindrical volume 8 (inner diameter 20 mm x height 200 rm) made of fluororesin, sealed and left at room temperature, where it gelled after 26 hours.

しかし、この時のゾル中の泡切れが悪く、気泡がたくさ
ん残った。このゲルを50℃で一週間熟成した後、密封
蓋に直径0.5+mの穴を1個開け120℃まで1時間
に1℃の速度で昇温して徐々に乾煉した。得られたドラ
イゲルを焼結炉に入れ1250℃で焼結してガラス化し
、直径的101w1l、長さ約1100nの石英カラス
ロッドを得た。
However, at this time, the bubbles in the sol were not easily removed, and many bubbles remained. After this gel was aged at 50°C for one week, one hole with a diameter of 0.5+ m was made in the sealed lid and the temperature was raised to 120°C at a rate of 1°C per hour, and the gel was gradually fermented. The obtained dry gel was placed in a sintering furnace and sintered at 1250° C. to vitrify it to obtain a quartz glass rod having a diameter of 101 w1 l and a length of about 1100 n.

He−Neレーザーで散乱の様子を調べなところ、気泡
による大きな散乱が多数見られた。
When examining the state of scattering using a He-Ne laser, many large scatterings due to bubbles were observed.

1Cニドライゲル、 1d:焼結石英ガラス、 5:電気炉。1C Nidrigel, 1d: Sintered quartz glass, 5: Electric furnace.

[発明の効果] 以上の通り、本発明に係る製造方法によれば、加える水
と低級アルコールの最′iM範囲が見出されたことでゾ
ル−ゲル法を用い市販の高純度石英ガラスと同等の気泡
のない品質良好な石英ガラスを安価な製造コストで入手
できるものであり、アルコールや水は高純度のものが容
易に得られることを考慮すれば、微粉末シリカとして高
純度のものを用いることにより光フアイバ用に使用でき
る高純度石英ガラスを製造することを可能ならしめる。
[Effect of the invention] As described above, according to the manufacturing method of the present invention, the maximum iM range of water and lower alcohol to be added has been found, and it is equivalent to commercially available high-purity quartz glass using the sol-gel method. Considering that high-quality silica glass without bubbles can be obtained at a low manufacturing cost, and high-purity alcohol and water can be easily obtained, high-purity fine powder silica is used. This makes it possible to produce high-purity quartz glass that can be used for optical fibers.

【図面の簡単な説明】[Brief explanation of the drawing]

図は、ゾル−ゲル法の工程を示す説明図である。 la:ゾル、 ■bニゲル、 The figure is an explanatory diagram showing the steps of the sol-gel method. la: sol, ■b Nigel,

Claims (1)

【特許請求の範囲】[Claims] (1)微粉末シリカ1モルに対し低級アルコール1〜5
モルおよび水1〜4モルを加えて撹拌混合してゾル化し
、これを経時的にゲル化した後乾燥してドライゲルとし
、その後加熱焼結して透明ガラスとする石英ガラスの製
造方法。
(1) 1 to 5 lower alcohols per 1 mole of fine powder silica
A method for producing quartz glass, in which 1 to 4 moles of water are added and stirred to form a sol, the gel is gelated over time and then dried to form a dry gel, and then heated and sintered to form transparent glass.
JP739589A 1989-01-13 1989-01-13 Production of quartz glass Pending JPH02188431A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP739589A JPH02188431A (en) 1989-01-13 1989-01-13 Production of quartz glass

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP739589A JPH02188431A (en) 1989-01-13 1989-01-13 Production of quartz glass

Publications (1)

Publication Number Publication Date
JPH02188431A true JPH02188431A (en) 1990-07-24

Family

ID=11664719

Family Applications (1)

Application Number Title Priority Date Filing Date
JP739589A Pending JPH02188431A (en) 1989-01-13 1989-01-13 Production of quartz glass

Country Status (1)

Country Link
JP (1) JPH02188431A (en)

Similar Documents

Publication Publication Date Title
JPH02188431A (en) Production of quartz glass
JP2635313B2 (en) Method for producing silica glass
US20020013209A1 (en) Erbium-doped multicomponent glasses manufactured by the sol-gel method
JPS5992924A (en) Preparation of quartz glass
JP4027625B2 (en) Method for producing SiO2-TiO2 glass having a low coefficient of thermal expansion and the glass
JPS6096533A (en) Preparation of quartz glass tube
JPS62246835A (en) Production of base material for quartz glass optical fiber
JPS63176315A (en) Production of quartz glass containing rare earth element
JPS6296339A (en) Production of optical fiber preform
JPS6054929A (en) Production of quartz glass
JPS63151624A (en) Production of organic substance-containing silica bulk material
JPS63307139A (en) Cerium-conatining quartz type laser glass and production thereof
JPS6428243A (en) Cerium-doped quartz glass and production thereof
JPH02199033A (en) Production of optical glass
JPS6027611A (en) Production of additive-type silica gel
JPS6369724A (en) Production of glass
JPS61186237A (en) Production of parent material for optical fiber of quartz glass
JPH013024A (en) Method for manufacturing doped quartz glass
JPH066493B2 (en) Method for producing low OH glass
JPH03232741A (en) Highly transparent silica-titania glass particle and production thereof
JPH0393637A (en) Production of glass
JPS63319229A (en) Quartz laser glass and its production
JPS62113737A (en) Production of quartz glass
JPS62100425A (en) Production of quartz glass
JPS63277535A (en) Laser glass of terbium-containing quartz type and production thereof