JPH02174260A - Solid state image pickup device - Google Patents
Solid state image pickup deviceInfo
- Publication number
- JPH02174260A JPH02174260A JP88330888A JP33088888A JPH02174260A JP H02174260 A JPH02174260 A JP H02174260A JP 88330888 A JP88330888 A JP 88330888A JP 33088888 A JP33088888 A JP 33088888A JP H02174260 A JPH02174260 A JP H02174260A
- Authority
- JP
- Japan
- Prior art keywords
- conductive film
- package
- electrically conductive
- glass member
- semiconductor substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007787 solid Substances 0.000 title 1
- 239000011521 glass Substances 0.000 claims abstract description 20
- 239000004065 semiconductor Substances 0.000 claims abstract description 12
- 239000000758 substrate Substances 0.000 claims abstract description 12
- 238000003384 imaging method Methods 0.000 claims description 15
- 239000005394 sealing glass Substances 0.000 abstract description 10
- 230000005611 electricity Effects 0.000 abstract description 9
- 230000003068 static effect Effects 0.000 abstract description 8
- 229910052751 metal Inorganic materials 0.000 abstract description 5
- 239000002184 metal Substances 0.000 abstract description 5
- 239000004840 adhesive resin Substances 0.000 abstract description 4
- 229920006223 adhesive resin Polymers 0.000 abstract description 4
- 230000006378 damage Effects 0.000 abstract description 4
- 230000002159 abnormal effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- BLBNEWYCYZMDEK-UHFFFAOYSA-N $l^{1}-indiganyloxyindium Chemical compound [In]O[In] BLBNEWYCYZMDEK-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Landscapes
- Solid State Image Pick-Up Elements (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は固体撮像装置に関し、特に固体撮像素子(ベレ
ット)に静電気による素子の破壊を防止する対策を施し
ていない固体撮像装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a solid-state imaging device, and particularly to a solid-state imaging device in which a solid-state imaging device (bellet) is not provided with measures to prevent destruction of the device due to static electricity.
従来のガラスフィルターを貼り合せない固体撮像装置で
ある白黒用デバイスや固体撮像素子の画素上に直接色フ
ィルターを形成するカラー用デバイスでは、ガラスフィ
ルターを素子表面に正確に位置合わせをした上で接着剤
で固定するといった工程を必要とせず、コストも安くで
きる。For black-and-white devices, which are solid-state imaging devices that cannot be pasted with conventional glass filters, and for color devices, in which color filters are formed directly on the pixels of the solid-state imaging device, the glass filter is precisely positioned on the element surface and then bonded. It does not require a process of fixing with an agent, and costs can be reduced.
しかし、ガラスフィルターが貼り付けられていないデバ
イスは、透明ガラスキャップに静電気が帯電した場合に
、直接素子表面に帯電し、表面に電極の形成されていな
いフォトダイオードの5i02−3t界面に影響を及ぼ
す。このため、フォトダイオードや垂直CODなどに余
分な電荷が発生し、異常出力が出たり、素子表面を破壊
し、電荷が蓄積しなくなるといっなように静電気に対し
て弱いという欠点があった。However, in a device without a glass filter attached, when the transparent glass cap is charged with static electricity, it is directly charged on the element surface and affects the 5i02-3t interface of the photodiode, which has no electrode formed on the surface. . As a result, excess charge is generated in the photodiode, vertical COD, etc., resulting in abnormal output, damage to the element surface, and failure to accumulate charge, which has the disadvantage of being vulnerable to static electricity.
また、第2図に示すように、入射光が透明ガラスキャッ
プを通過し、半導体基板2の表面で反射してきた場合、
透明ガラスキャップの封入内面側で反射し、再び半導体
基板2上に光が入射するため、強烈な点光源を撮像した
ときに、フレアーやゴーストが現れてしまう。これは、
ガラスフィルターを貼り合わせたデバイスについても同
様にいえる欠点である。Furthermore, as shown in FIG. 2, when the incident light passes through the transparent glass cap and is reflected on the surface of the semiconductor substrate 2,
Since the light is reflected on the inner surface of the transparent glass cap and enters the semiconductor substrate 2 again, flare and ghosts appear when an intense point light source is imaged. this is,
This is a similar drawback to devices with glass filters bonded together.
上述のように従来の固体撮像装置は、透明ガラスキャッ
プに静電気が帯電した場合に、素子の特性異常が生じた
り、破壊されやすいといつな欠点や入射光が素子表面で
反射して透明ガラスキャップの封入内面側で反射し、再
び素子表面に光が入射するため、フレア、ゴーストが表
れるといった欠点かあった。As mentioned above, in conventional solid-state imaging devices, when the transparent glass cap is charged with static electricity, the characteristics of the element may be abnormal or the element may be easily destroyed. Since the light is reflected from the inner surface of the encapsulation and re-enters the element surface, it has the disadvantage of causing flare and ghosting.
本発明の固体撮像装置は、入射光に応じた電荷を発生し
て蓄積する感光手段と前記感光手段から前記電荷に応じ
た信号電流を読み出すための信号読み出し手段とを有す
る感光セルが半導体基板の主表面に形成された固体撮像
素子をパッケージに搭載して透明ガラスキャップで封止
した固体撮像装置において、前記透明ガラスキャップの
封入内面側に反射防止機能を備えた透明導電膜を有する
とともに、前記透明導電膜が前記パッケージの特定の電
極リードピンと電気的に接続されているというものであ
る。In the solid-state imaging device of the present invention, a photosensitive cell having a photosensitive means for generating and accumulating charges according to incident light and a signal reading means for reading out a signal current corresponding to the charges from the photosensitive means is mounted on a semiconductor substrate. In a solid-state imaging device in which a solid-state imaging device formed on a main surface is mounted in a package and sealed with a transparent glass cap, the transparent glass cap has a transparent conductive film having an anti-reflection function on the enclosed inner surface side, and A transparent conductive film is electrically connected to a specific electrode lead pin of the package.
次に、本発明について図面を参照して説明する。 Next, the present invention will be explained with reference to the drawings.
第1図は本発明の一実施例の縦断面図である。FIG. 1 is a longitudinal sectional view of an embodiment of the present invention.
パッケージ15上にAgペーストでマウントされた感光
セルを形成した半導体基板14(固体撮像素子)は、ボ
ンディングワイヤー13(及び図示しないメタライズ層
)によりパッケージのり一ドピン16と接続される。そ
して、反射防止機能を備えた透明導電膜17を有する封
止ガラス11は、封止ガラス11の周辺に形成されてい
る導電性の接着樹脂12とパッケージ15の金属部18
か密着して封止される。A semiconductor substrate 14 (solid-state image pickup device) on which a photosensitive cell is mounted on a package 15 using Ag paste is connected to a package adhesive pin 16 by a bonding wire 13 (and a metallized layer (not shown)). The sealing glass 11 having the transparent conductive film 17 with anti-reflection function is connected to the conductive adhesive resin 12 formed around the sealing glass 11 and the metal part 18 of the package 15.
or tightly sealed.
静電気が封止ガラス11およびパッケージ15に帯電し
た場合、封止ガラス11に形成された反射防止機能を備
えた透明導電膜17と導電性の接着樹脂12、およびパ
ッケージ15の金属部18をたとえば接地電位又は直流
電位の印加される特定のリードピン16と接続しておく
ことにより、帯電した電荷が逃げて半導体基板14に影
響を及ぼさない。When the sealing glass 11 and the package 15 are charged with static electricity, the transparent conductive film 17 with an antireflection function formed on the sealing glass 11, the conductive adhesive resin 12, and the metal part 18 of the package 15 are grounded, for example. By connecting to a specific lead pin 16 to which a potential or DC potential is applied, the charged charges will escape and will not affect the semiconductor substrate 14.
また半導体基板14に反射された入射光は、封止ガラス
11に形成された反射防止機能を備えた透明導電膜17
により封止ガラス11の封入内面側で反射せず、再び半
導体基板14上に光が入射してフレア、ゴーストが現わ
れるということがない
反射防止機能を備えた透明導電膜の例としては電子ビー
ム蒸着によるMgFz(λ/4) In203(λ
/4) −Ce F、 (λ/2) −(透明ガラスキ
ャップ)や厚さ約130nmのI 、1□oq (S
n02を3wt%含む)が適当である。Further, the incident light reflected by the semiconductor substrate 14 is transmitted to a transparent conductive film 17 formed on the sealing glass 11 and having an anti-reflection function.
An example of a transparent conductive film with an anti-reflection function that does not reflect on the inner surface of the sealing glass 11 and cause light to enter the semiconductor substrate 14 again and cause flares and ghosts to appear is electron beam evaporation. MgFz(λ/4) In203(λ
/4) -Ce F, (λ/2) - (transparent glass cap) or approximately 130 nm thick I, 1□oq (S
(containing 3 wt% n02) is suitable.
応用物理比、第49巻、第2頁、1980年に記載され
ているように、これらは良好な反射防止機能を有してい
る。後者の■。203単層膜は透過率が波長0.4〜0
.5μmで約80〜90%とやや低い難点があるがなお
実用可能である。They have good anti-reflection properties, as described in Applied Physics Ratio, Vol. 49, p. 2, 1980. The latter ■. 203 Single layer film has a transmittance of wavelength 0.4 to 0.
.. At 5 μm, it is about 80 to 90%, which is a little low, but it is still practical.
前者の3層膜の場合、透明ガラスキャップの周辺部でM
gF2膜を除去しておき、特定のリードピンとIn2O
3膜との導通をとればよいのである。In the case of the former three-layer film, M at the periphery of the transparent glass cap
Remove the gF2 film and connect specific lead pins and In2O
It is sufficient to establish conduction with the three membranes.
また、透明導電膜は図示のように透明ガラスキャップの
外縁部まで設ける必要はなく、端から一定寸法の部分に
は設けなくてもよい。Further, the transparent conductive film does not need to be provided up to the outer edge of the transparent glass cap as shown in the figure, and may not be provided in a portion of a certain size from the end.
さらに又、接着樹脂12の代りにインジウムのような導
電性封止材を用いてもよい。Furthermore, instead of the adhesive resin 12, a conductive sealing material such as indium may be used.
以上説明したように本発明は、固体撮像装置の透明ガラ
スキャップに反射防止機能を備えた透明導電膜を設ける
ことにより、静電気による素子の破壊を防止するととも
に、素子上で反射した入射光が透明ガラスキャップで反
射することにより生じるフレア、ゴーストを防止できる
効果がある。As explained above, the present invention provides a transparent conductive film with an anti-reflection function on the transparent glass cap of a solid-state imaging device, thereby preventing destruction of the device due to static electricity and transmitting transparent incident light reflected on the device. This has the effect of preventing flare and ghosting caused by reflections off the glass cap.
第1図は本発明の一実施例である固体撮像装置の縦断面
図、第2図は従来の固体撮像装置の縦断面図である。
11.1・・・透明ガラスキャップ、12.2・・・ボ
ンディングワイヤー、14.4・・・半導体基板、15
.5・・・パッケージ、16,6・・・リードビン、1
7・・・反射防止機能を備えた透明導電膜、18・・・
金属部。FIG. 1 is a vertical cross-sectional view of a solid-state imaging device according to an embodiment of the present invention, and FIG. 2 is a vertical cross-sectional view of a conventional solid-state imaging device. 11.1... Transparent glass cap, 12.2... Bonding wire, 14.4... Semiconductor substrate, 15
.. 5...Package, 16,6...Lead bin, 1
7...Transparent conductive film with anti-reflection function, 18...
Metal part.
Claims (1)
感光手段から前記電荷に応じた信号電流を読み出すため
の信号読み出し手段とを有する感光セルが半導体基板の
主表面に形成された固体撮像素子をパッケージに搭載し
て透明ガラスキャップで封止した固体撮像装置において
、前記透明ガラスキャップの封入内面側に反射防止機能
を備えた透明導電膜を有するとともに、前記透明導電膜
が前記パッケージの特定の電極リードピンと電気的に接
続されていることを特徴とする固体撮像装置A solid-state imaging device in which a photosensitive cell is formed on the main surface of a semiconductor substrate, the photosensitive cell having photosensitive means for generating and accumulating charges according to incident light and signal readout means for reading out a signal current according to the charges from the photosensitive means. In a solid-state imaging device in which an element is mounted in a package and sealed with a transparent glass cap, the transparent glass cap has a transparent conductive film with an anti-reflection function on the inner surface of the enclosure, and the transparent conductive film is used to identify the package. A solid-state imaging device characterized in that it is electrically connected to an electrode lead pin of
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63330888A JP2743420B2 (en) | 1988-12-27 | 1988-12-27 | Solid-state imaging device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63330888A JP2743420B2 (en) | 1988-12-27 | 1988-12-27 | Solid-state imaging device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH02174260A true JPH02174260A (en) | 1990-07-05 |
JP2743420B2 JP2743420B2 (en) | 1998-04-22 |
Family
ID=18237630
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63330888A Expired - Lifetime JP2743420B2 (en) | 1988-12-27 | 1988-12-27 | Solid-state imaging device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2743420B2 (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63197359U (en) * | 1987-06-11 | 1988-12-19 |
-
1988
- 1988-12-27 JP JP63330888A patent/JP2743420B2/en not_active Expired - Lifetime
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63197359U (en) * | 1987-06-11 | 1988-12-19 |
Also Published As
Publication number | Publication date |
---|---|
JP2743420B2 (en) | 1998-04-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US11387189B2 (en) | Image pickup apparatus and camera module | |
US20130048960A1 (en) | Photoelectric conversion substrate, radiation detector, and radiographic image capture device | |
EP0960441B1 (en) | Method for tight sealing of a radiation detector and detector obtained by this method | |
JPS61123288A (en) | Solid-state pick up device | |
CN213367904U (en) | Photosensitive circuit assembly, camera module and electronic equipment | |
JP4054168B2 (en) | Imaging device and operation method thereof | |
JPH02174260A (en) | Solid state image pickup device | |
US5321334A (en) | Imaging device | |
JPH05236361A (en) | Picture detector | |
JP2001085652A (en) | Infrared ccd image pick up element package | |
JPS5842368A (en) | Solid-state image pickup element | |
JP2008108808A (en) | Solid-state imaging device | |
WO2000072381A1 (en) | Detector with semiconductor for detecting ionizing radiation | |
JPH0778951A (en) | Solid-state image pick-up device | |
JPS5836078A (en) | Solid-state image pickup device | |
JP2684861B2 (en) | Solid-state imaging device | |
JPS61168956A (en) | Photo-semiconductor device | |
JPH0548361U (en) | Photoelectric conversion device | |
KR20240033894A (en) | X-ray detector | |
WO2022044556A1 (en) | Light detection device | |
CN110098218A (en) | Photographic device | |
JPS59225576A (en) | Package for solid state image pick-up element | |
JP3047535B2 (en) | Charge transfer device and method of manufacturing the same | |
JPH0329368A (en) | Solid-state image-pickup device | |
JPS6355789B2 (en) |