JPH02162503A - Magnetic head and production thereof - Google Patents
Magnetic head and production thereofInfo
- Publication number
- JPH02162503A JPH02162503A JP31877688A JP31877688A JPH02162503A JP H02162503 A JPH02162503 A JP H02162503A JP 31877688 A JP31877688 A JP 31877688A JP 31877688 A JP31877688 A JP 31877688A JP H02162503 A JPH02162503 A JP H02162503A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- main core
- glass
- substrates
- core half
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005291 magnetic effect Effects 0.000 title claims description 45
- 238000004519 manufacturing process Methods 0.000 title description 7
- 239000011521 glass Substances 0.000 claims abstract description 45
- 239000000758 substrate Substances 0.000 claims abstract description 38
- 238000004804 winding Methods 0.000 claims abstract description 27
- 238000002844 melting Methods 0.000 claims abstract description 21
- 230000008018 melting Effects 0.000 claims abstract description 21
- 230000005294 ferromagnetic effect Effects 0.000 claims abstract description 17
- 238000000151 deposition Methods 0.000 claims abstract description 4
- 239000010409 thin film Substances 0.000 claims description 49
- 239000002184 metal Substances 0.000 claims description 13
- 238000005520 cutting process Methods 0.000 claims description 5
- 238000005304 joining Methods 0.000 claims description 3
- 238000005498 polishing Methods 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 2
- 230000002542 deteriorative effect Effects 0.000 abstract description 5
- 239000000919 ceramic Substances 0.000 abstract description 4
- 125000006850 spacer group Chemical group 0.000 abstract description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- 238000012856 packing Methods 0.000 abstract 2
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 230000005540 biological transmission Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 239000000696 magnetic material Substances 0.000 description 3
- 229910000702 sendust Inorganic materials 0.000 description 3
- 239000010408 film Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3103—Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing
Landscapes
- Magnetic Heads (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
Abstract
Description
【発明の詳細な説明】
（イ）産業上の利用分野
本発明は高周波信号の記録、再生に好適な磁気ヘッドに
関する。DETAILED DESCRIPTION OF THE INVENTION (a) Field of Industrial Application The present invention relates to a magnetic head suitable for recording and reproducing high frequency signals.
（ロ）従来の技術
最近のＶＴＲ（ビデオテープレコーダ）においては高画
質化を実現するために、信号周波数帯域を広帯域化する
傾向にあり、特にハイビジョン用の高品位ＶＴＲにおい
てはその帯域が３０ＭＨｚ以上にまで拡大されている。(b) Conventional technology In recent VTRs (video tape recorders), there is a tendency to widen the signal frequency band in order to achieve high image quality, and in particular, high-definition VTRs for high-definition use have a band of 30 MHz or more. It has been expanded to.
従来、この種のＶＴＲに用いられる磁気ヘッドとしては
、実開昭６３−６５１０９号（ＧＬＩＢ５ ／ １２７
）に示されているようにコア幅が１０ｍ１！１以下の
ものや、第９図に示されているように媒体摺接側の端面
に凹部（１）（１）を設けることによりコア幅Ｗａが３
〜５工に対して巻線（２）（２）が施されている部分の
コア幅ｗｂをｌ ｍｍ前後にしたものが提案されている
。第９図において、（３）はセンダスト等の強磁性金属
材料よりなる主コア、（４）（４）は結晶化ガラス等の
非磁性材料よりなる補強コアである。尚、上記従来の磁
気ヘッドにおいてコア幅を１０前後と小さくしている理
由は、巻線が巻回されている磁性体部の断面積を小さく
することにより再生効率を低下させずに巻線巻回領域で
のインダクタンス値を小さくして高周波領域での伝送系
の損失を防止し且つ回路との共振周波数を高くするため
である。Conventionally, the magnetic head used in this type of VTR was disclosed in Utility Model Application Publication No. 63-65109 (GLIB5/127
), the core width is 10m1!1 or less, and as shown in FIG. is 3
It has been proposed that the core width wb of the portion where the windings (2) and (2) are applied is approximately 1 mm for the windings (2) and (2). In FIG. 9, (3) is a main core made of a ferromagnetic metal material such as Sendust, and (4) (4) is a reinforcing core made of a non-magnetic material such as crystallized glass. The reason why the core width of the above-mentioned conventional magnetic head is made small to around 10 mm is that by reducing the cross-sectional area of the magnetic material part around which the winding is wound, the winding can be easily wound without reducing the reproduction efficiency. This is to reduce the inductance value in the frequency range to prevent loss in the transmission system in the high frequency range and to increase the resonant frequency with the circuit.
しかし乍ら、上記従来の磁気ヘッドでは、巻線が巻回さ
れている部分の断面積が小さいため機械的強度が弱く、
製造歩留りの低下を招く。また、媒体との対接面積が小
さいため、寿命等の信頼性においても問題がある。However, in the conventional magnetic head described above, the cross-sectional area of the part where the winding is wound is small, so the mechanical strength is weak.
This results in a decrease in manufacturing yield. Furthermore, since the contact area with the medium is small, there are also problems in reliability such as life span.
（ハ）発明が解決しようとする課題
本発明は上記従来例の欠点に鑑み為されたものであり、
機械的強度を劣化させることなしに再生効率を低下させ
ず高周波領域での伝送系の損失を防止し且つ回路との共
振周波数を高くした磁気ヘッド及びその製造方法を提供
することを目的とするものである。(c) Problems to be Solved by the Invention The present invention has been made in view of the drawbacks of the above-mentioned conventional examples.
An object of the present invention is to provide a magnetic head that prevents loss in a transmission system in a high frequency range without deteriorating mechanical strength or deteriorating reproduction efficiency, and that increases the resonant frequency with a circuit, and a method for manufacturing the same. It is.
（ニ）課題を解決するための手段
本発明は一対の非磁性基板間に強磁性金属薄膜よりなる
主コア半体が被着形成されている第１、第２コア半体を
有し、該第１、第２コア半体の前記主コアの端面が露出
しているギャップ形成面同士を衝き合わせることにより
前記端面間に作動ギャップを構成すると共に前記第１、
第２コア半体間に巻線溝を形成した磁気ヘッドであって
、前記第１、第２コア半体のうち少なくとも一方のコア
半体は巻線巻回領域における前記一対の非磁性基板間の
前記主コア半体の前記作動ギャップと反対側の側部に、
前記一対の非磁性基板同士を直接接合するガラスを充填
したことを特徴とする。(D) Means for Solving the Problems The present invention has first and second core halves, each of which has a main core half made of a ferromagnetic metal thin film adhered between a pair of non-magnetic substrates. By abutting the gap-forming surfaces of the first and second core halves on which the end surfaces of the main cores are exposed, an operating gap is formed between the end surfaces, and the first,
A magnetic head having a winding groove formed between the second core halves, wherein at least one of the first and second core halves is arranged between the pair of non-magnetic substrates in the winding region. on the side opposite the working gap of the main core half of;
It is characterized in that it is filled with glass that directly joins the pair of nonmagnetic substrates.
更に、本発明の磁気ヘッドは、前記主コア半体が強磁性
金属薄膜と絶縁薄膜との積層薄膜であることを特徴とす
る。Furthermore, the magnetic head of the present invention is characterized in that the main core half is a laminated thin film of a ferromagnetic metal thin film and an insulating thin film.
また、本発明の磁気ヘッドの製造方法は、非磁性基板の
一方の面に強磁性金属薄膜を有する薄膜を島状に被着す
ると共に他方の面にガラス層を形成する第１の工程と、
前記第１の工程により形成された基板を複数枚積み重ね
た後、前記ガラス層を溶融して前記複数の基板間の前記
薄膜未形成部分にガラスを充填し前記複数の基板を接合
してブロックを形成する第２の工程と、前記ブロックを
前記ガラス充填部で切断して前記薄膜の両側に前記ガラ
ス充填部を有するヘッドピースを形成する第３の工程と
、前記ヘッドピースに研磨加工を施して一方の端面がギ
ャップ形成面に露出し他方の端面が前記ガラスに覆われ
ている前記薄膜からなる主コア半体を形成する第４の工
程と、前記第４の工程で形成されたヘッドピースを一対
用意し、該一対のヘッドピースのギャップ形成面同士を
非磁性材料を介して接合し、前記主コア半体間に作動ギ
ャップを形成する第５の工程とを有することを特徴とす
る。Further, the method for manufacturing a magnetic head of the present invention includes a first step of depositing a thin film having a ferromagnetic metal thin film in an island shape on one surface of a nonmagnetic substrate and forming a glass layer on the other surface;
After stacking a plurality of substrates formed in the first step, the glass layer is melted to fill the portion where the thin film is not formed between the plurality of substrates with glass, and the plurality of substrates are bonded to form a block. a second step of forming the block, a third step of cutting the block at the glass filling portion to form a head piece having the glass filling portion on both sides of the thin film, and polishing the head piece. a fourth step of forming a main core half made of the thin film, one end surface of which is exposed to the gap forming surface and the other end surface of which is covered with the glass; and a head piece formed in the fourth step. A fifth step of preparing a pair of head pieces and joining the gap forming surfaces of the pair of head pieces via a non-magnetic material to form an operating gap between the main core halves.
（ホ）作 用
上記構成に依れば、非磁性基板及び該非磁性基板間に充
填されたガラスにより機械的強度を劣化させることなく
巻線巻回領域における強磁性金属薄膜よりなる主コア半
体の断面積を小さくすることが出来る。(E) Effect According to the above configuration, the main core half made of the ferromagnetic metal thin film in the winding region can be formed without deteriorating the mechanical strength due to the non-magnetic substrate and the glass filled between the non-magnetic substrates. The cross-sectional area of can be reduced.
更に、前記主コア半体を強磁性金属薄膜と絶縁薄膜との
積層薄膜で形成することにより高周波領域での渦電流損
失を防止することが出来る。Furthermore, by forming the main core half with a laminated thin film of a ferromagnetic metal thin film and an insulating thin film, eddy current loss in a high frequency region can be prevented.
また、上記製造方法に依れば、強磁性金属薄膜にヒビ、
剥離等を生じることなく、上記本発明の磁気ヘッドを形
成することが出来る。Moreover, according to the above manufacturing method, cracks and
The above magnetic head of the present invention can be formed without causing peeling or the like.
（へ）実施例
以下、図面を参照しつつ本発明の一実施例を詳細に説明
する。(F) Embodiment Hereinafter, an embodiment of the present invention will be described in detail with reference to the drawings.
第１図は本実施例の磁気ヘッドの外観を示す斜視図であ
る。FIG. 1 is a perspective view showing the appearance of the magnetic head of this embodiment.
第１図中、（５ａ）（５ｂ）は第１、第２コア半体であ
り、該第１、第２コア半体（５ａ）（５ｂ）は夫々結晶
化ガラス、非磁性セラミック等よりなる非磁性基板（６
）（６）上の一部分にセンダスト等の強磁性金属薄膜（
７）と５ｉＯｚ等の絶縁薄膜（８）との積層薄膜（９）
よりなる主コア半体（１０）（１０）を被着形成し、該
主コア半体（１０）（１０）上に高融点ガラス（１１）
（１１）により結晶化ガラス、非磁性セラミック等より
なる非磁性基板（６’）（６’）を接合してなる。前記
第１コア半体（５ａ）のギャップ形成面上には巻線溝（
１２）及びガラス充填溝（１３）（１４）が形成されて
いる。前記第１、第２コア半体（５ａ）（５ｂ）のギャ
ップ形成面同士は前記巻線溝（１２）の上端及びガラス
充填溝（１３）（１４）全域に充填されている低融点ガ
ラス（１５）（１５）（１５）によりＳｉｎ、等よりな
るギャップ゛スペーサを介して接合固定されており、前
記主コア半体（１０）（１０）同士の接合部分に作動ギ
ャップ（１６）が形成されている。前記非磁性基板（６
）（６）（６’）（６’）間のうち主コア半体（１０）
（１０）以外の部分には高融点ガラス（１１）（１１）
が充填されており、媒体摺接面（１７）においては作動
ギャップ（１６）側に主コア半体（１０）（１０）が露
出し、その両側に高融点ガラス（１１）（１１）が露出
している。また、ギャップ形成面においては媒体摺接面
（１７）側に主コア半体（１０）（１０）が露出し、そ
の下方域に高融点ガラス（１１）（１１）が露出してい
る。また、前記主コア半体（１０）には前記巻線溝（１
２）が形成されており、該巻線溝（１２）によりフロン
トギャップ部とパックギャップ部とが規定され磁路が形
成される。（１８）（１８）は巻線である。In FIG. 1, (5a) and (5b) are first and second core halves, and the first and second core halves (5a and 5b) are made of crystallized glass, nonmagnetic ceramic, etc., respectively. Non-magnetic substrate (6
) (6) A thin ferromagnetic metal film such as sendust (
7) and an insulating thin film (8) such as 5iOz (9)
A high melting point glass (11) is formed on the main core halves (10) (10).
(11) Non-magnetic substrates (6') (6') made of crystallized glass, non-magnetic ceramic, etc. are bonded together. A winding groove (
12) and glass filled grooves (13) and (14) are formed. The gap forming surfaces of the first and second core halves (5a) and (5b) are formed by a low melting point glass (filled with the upper end of the winding groove (12) and the entire area of the glass filling grooves (13) and (14). 15) (15) By (15), the main core halves (10) are joined and fixed via a gap spacer made of Sin, etc., and an operating gap (16) is formed at the joint portion of the main core halves (10) (10). ing. The non-magnetic substrate (6
) (6) (6') Main core half (10) between (6')
(10) High melting point glass (11) (11)
The main core halves (10) (10) are exposed on the working gap (16) side at the medium sliding contact surface (17), and the high melting point glasses (11) (11) are exposed on both sides. are doing. Further, in the gap forming surface, the main core halves (10) (10) are exposed on the medium sliding contact surface (17) side, and the high melting point glasses (11) (11) are exposed in the lower region thereof. Further, the main core half (10) has the winding groove (1).
2) is formed, and the winding groove (12) defines a front gap portion and a pack gap portion to form a magnetic path. (18) (18) is a winding.
次に、上記磁気ヘッドの製造方法について説明する。Next, a method of manufacturing the above magnetic head will be explained.
先ず、第２図に示すように結晶化ガラス、非磁性セラミ
ック等よりなる非磁性基板（６）の下面に例えば軟化点
が５４０℃であるＮａｘＯ−Ｂ！０ｌ−５ｉｎ、系の高
融点ガラスよりなる高融点ガラス層（ｌｌａ）を印刷塗
布法等により１０〜２０μｍ厚形成し、また、前記非磁
性基板（６）の上面に島状の積層薄膜（９）を被着して
積層基板（す）を形成する。前記積層薄膜（９）はセン
ダストどうよりなる５μｍ厚の強磁性金属薄膜（７）と
５ｉｎｓ等よりなる０、１１Ｉｍ厚の絶縁薄膜（８）と
をスパッタリング等により交互に被着してなるものであ
り、４層（但し、図面では３層）の強磁性金属薄膜（７
）を有している。尚、前記積層薄膜（９）の最上面は４
層目の絶縁薄膜である。前記積層薄膜（９）の全膜厚く
約２０．３ａｍ）は所望のトラック幅に略等しく、前記
積層薄膜（９）の上面の大きさは磁気ヘッド最終形状に
おける主コア半体（１０）（１０）の大きさ（例えば１
．ＯＸｏ、５ｍｆｆ１）よりも少許大きく、その大きさ
は例えば１．２Ｘ０．６ｍｍ程度である。また、隣り合
う積層薄膜（９）の間隔２、ｍの関係はｌ ＜ ｍであ
り、間隔２は後の切断工程で積層薄膜に影響を与えない
大きさに設定され、間隔ｍは磁気ヘッド完成体の大きさ
により決まる。前記積層薄膜（９）の前記非磁性基板（
６）への配置はスパッタリング時のマスキング、または
成膜後のエツチングにより行われる。First, as shown in FIG. 2, NaxO-B having a softening point of 540 DEG C., for example, is applied to the lower surface of a non-magnetic substrate (6) made of crystallized glass, non-magnetic ceramic, etc. A high melting point glass layer (lla) made of a 0l-5in type high melting point glass is formed to a thickness of 10 to 20 μm by a printing coating method or the like, and an island-shaped laminated thin film (9) is formed on the upper surface of the non-magnetic substrate (6). ) to form a laminated substrate. The laminated thin film (9) is made by alternately depositing a 5 μm thick ferromagnetic metal thin film (7) made of Sendust material and a 0.11 Im thick insulating thin film (8) made of 5 ins or the like by sputtering or the like. Yes, a 4-layer (however, 3 layers in the drawing) ferromagnetic metal thin film (7
)have. Incidentally, the top surface of the laminated thin film (9) is 4
This is a layered insulating thin film. The total thickness of the laminated thin film (9) (approximately 20.3 am) is approximately equal to the desired track width, and the size of the upper surface of the laminated thin film (9) is the main core half (10) (10) in the final shape of the magnetic head. ) (e.g. 1
．． OXo, 5mff1), and its size is, for example, about 1.2 x 0.6 mm. In addition, the relationship between the spacing 2 and m between adjacent laminated thin films (9) is l < m, and the spacing 2 is set to a size that does not affect the laminated thin film in the subsequent cutting process, and the spacing m is set to a value that does not affect the laminated thin film in the subsequent cutting process. Determined by body size. The non-magnetic substrate (
6) is performed by masking during sputtering or by etching after film formation.
次に、第２図に示す積層基板（１９）を複数個用意し、
該複数の積層基板（１９）を第３図に示すように隣接す
る積層基板（１９）の高融点ガラス層（ｌｌａ）と積層
薄膜（９）とが当接するように所定の治具を用いて整列
積層させた後、この整列積層体を例えば７００℃の加熱
雰囲気中で上下方向に５０〜１０Ｑｇ／ｍｍ”で加圧し
て前記高融点ガラス層（ｌｌａ）を溶融し、前記積層基
板（１９）間の積層薄膜（９）未形成部分に高融点ガラ
ス（１１）を充填して前記複数の積層基板（１９）を接
合し積層ブロック（２０）を形成する。尚、前記積層ブ
ロック（２０）の最上部には高融点ガラス層の°みが形
成された非磁性基板（６”）が接合されており、前記積
層ブロック（２０）の最下部には積層薄膜（９）のみが
形成されている非磁性基板（６”）が接合されている。Next, prepare a plurality of laminated substrates (19) shown in FIG.
As shown in FIG. 3, the plurality of laminated substrates (19) are assembled using a predetermined jig so that the high melting point glass layer (lla) of the adjacent laminated substrate (19) and the laminated thin film (9) are in contact with each other. After aligning and laminating, the aligned laminate is pressurized vertically at 50 to 10 Qg/mm'' in a heated atmosphere of 700°C, for example, to melt the high melting point glass layer (lla) and form the laminated substrate (19). A high melting point glass (11) is filled in the portion where the laminated thin film (9) is not formed between them, and the plurality of laminated substrates (19) are bonded to form a laminated block (20). A non-magnetic substrate (6") on which a recessed high melting point glass layer is formed is bonded to the top, and only a laminated thin film (9) is formed at the bottom of the laminated block (20). A non-magnetic substrate (6”) is bonded.
次に、前記積層ブロック（２０）を積層薄膜（９）未形
成部分り高融点ガラス（１１）充填部に沿って（破線Ａ
−Ａ’ Ｂ−Ｂ’ Ｃ−Ｃ’に沿って）切断し、Ｂ
−Ｂ’切断面を積層薄膜（９）の側端面（９ａ）が露出
するまで研削研磨することにより第４図に示す積層ヘッ
ドピース（２１）を複数個形成する。Next, the laminated block (20) is placed along the part where the laminated thin film (9) is not formed and the part filled with the high melting point glass (11) (broken line A).
-A'B-B' Cut along C-C', and B
A plurality of laminated head pieces (21) shown in FIG. 4 are formed by grinding and polishing the -B' cut surface until the side end surface (9a) of the laminated thin film (9) is exposed.
尚、この切断方法では積層薄膜（９）は直接切断されな
いので、前記積層薄膜（９）にはヒビ、剥離は発生しな
い。Incidentally, in this cutting method, since the laminated thin film (9) is not directly cut, no cracks or peeling occur in the laminated thin film (9).
次に、第４図に示すように一対の前記積層ヘッドピース
（２１）（２１）を用意した後、第５図に示すように一
方の積層ヘッドピース（２１）の積層薄膜（９）の側端
面（９ａ）（９ａ）が露出しているギャップ形成面（２
２）のうち前記積層薄膜（９）の側端面露出域に巻線溝
（１２）を形成すると共に高融点ガラス（１１）露出域
にガラス充填溝（１３）（１４）を形成し、前記巻線溝
に（１２）の上端及び前記ガラス充填溝（１３）（１４
）全域に例えば軟化点が３５０℃であるＰｂ０−Ｂ。Next, as shown in FIG. 4, after preparing the pair of laminated head pieces (21) (21), as shown in FIG. Gap forming surface (2) with exposed end surface (9a) (9a)
In 2), a winding groove (12) is formed in the side end face exposed area of the laminated thin film (9), and glass filling grooves (13) and (14) are formed in the exposed area of the high melting point glass (11), The upper end of the line groove (12) and the glass filling groove (13) (14)
) Pb0-B whose softening point is, for example, 350°C over the entire region.
０ｌ−３ｉＯ＋系の低融点ガラス（１５）（１５）（１
５）を充填し、その後、前記一対の積層ヘッドピース（
２１）（２１）のギャップ形成面（２２）（２２）同士
を５ｌｏｔ薄膜等のギャップスペーサとなる非磁性薄膜
（図示せず）を介して衝き合わせ前記低融点ガラス（１
５）（１５）（１５）を溶融固化することにより前記積
層ヘッドピース（２１）（２１）を接合して積層ヘッド
ブロック（２３）を形成する。0l-3iO+ type low melting point glass (15) (15) (1
5) and then fill the pair of laminated head pieces (
21) The gap forming surfaces (22) (22) of (21) are brought into contact with each other through a non-magnetic thin film (not shown) serving as a gap spacer, such as a 5 lot thin film, and the low melting point glass (1)
5) By melting and solidifying (15) (15), the laminated head pieces (21) (21) are joined to form a laminated head block (23).
そして、最後に前記積層ヘッドブロック（２３）を非磁
性基板（６）（６’）部分で切断してヘッドチップを形
成し、該ヘッドチップの媒体摺接面側の端面にＲ付研磨
を行うことにより第１図に示す本実施例の磁気ヘッドが
完成する。Finally, the laminated head block (23) is cut at the non-magnetic substrates (6) (6') to form a head chip, and the end surface of the head chip on the medium sliding surface side is polished with an R. As a result, the magnetic head of this embodiment shown in FIG. 1 is completed.
上述のような磁気ヘッドでは、主コア半体（１０）（１
０）のうち巻線（１８）が巻回されている部分の断面積
がヘッド全体のうち巻線（１８）が巻回されている部分
よりも十分に小さいため、機械的強度を低下させること
なしに再生効率を低下させず、更に巻線（１８）巻回部
におけるインダクタンス値を小さくして高周波領域での
伝送系の損失を防止し且つ回路との共振周波数を高くす
ることが出来る。In the magnetic head as described above, the main core halves (10) (1
0), the cross-sectional area of the part around which the winding (18) is wound is sufficiently smaller than the part of the entire head around which the winding (18) is wound, which reduces the mechanical strength. Furthermore, by reducing the inductance value in the winding portion of the winding (18), loss in the transmission system in the high frequency region can be prevented and the resonant frequency with the circuit can be increased without reducing the reproduction efficiency.
第６図は上記実施例の主コア半体（１０）（１０）の位
置を示す図であるが、それ以外にも第７図まのたは第８
図に示す位置に主コア半体（１０）（１０）を形成して
も上記実施例と略同様の効果を得ることがでる。また、
非磁性基板（６）（６’）の巻線が巻回される部分の側
面に主コア半体（１０）にまで及ばない大きさの切欠き
を設けることにより巻線の巻回の作業効率を向上させる
ことが出来る。尚、前記切欠きの大きさは磁気ヘッドの
機械的強度に悪影響を与えない範囲である。FIG. 6 is a diagram showing the positions of the main core halves (10) and (10) in the above embodiment, but there are also other locations shown in FIG. 7 or 8.
Even if the main core halves (10) (10) are formed in the positions shown in the figure, substantially the same effects as in the above embodiment can be obtained. Also,
By providing a notch with a size that does not reach the main core half (10) on the side surface of the part of the non-magnetic substrate (6) (6') where the winding is wound, the work efficiency of winding the winding is improved. can be improved. The size of the notch is within a range that does not adversely affect the mechanical strength of the magnetic head.
（ト）発明の効果
本発明に依れば、機械的強度を劣化させることなしに再
生効率の低下及び高周波領域での伝送系の損失を防止し
且つ回路との共振周波数を高くした磁気ヘッドを提供し
得る。(G) Effects of the Invention According to the present invention, a magnetic head is provided which prevents a reduction in reproduction efficiency and loss in the transmission system in a high frequency region without deteriorating mechanical strength, and which increases the resonant frequency with the circuit. can be provided.
更に、本発明に依れば、高周波領域における渦電流損失
をも防止な磁気ヘッドを提供し得る。Further, according to the present invention, it is possible to provide a magnetic head that prevents eddy current loss in a high frequency region.
また、本発明に依れば、主コア半体を構成する強磁性金
属薄膜にヒビ、剥離等を生じさせることなく上記本発明
の磁気ヘッドを形成することが出来る磁気ヘッドの製造
方法を提供し得る。Further, according to the present invention, there is provided a method for manufacturing a magnetic head that can form the magnetic head of the present invention without causing cracks, peeling, etc. in the ferromagnetic metal thin film constituting the main core half. obtain.
第１図乃至第８図は本発明に係り、第１図は磁気ヘッド
の外観を示す斜視図、第２図、第３図、第４図、及び第
５図は夫々磁気ヘッドの外観を示す斜視図、第６図は主
コア半体の位置を示す図、第７図及び第８図は他の実施
例の主コア半体の位置を示す図である。第９図は従来の
磁気ヘッドの外観を示す図である。
（５ａ）・・・第１コア半体、（５ｂ）・・・第２コア
半体、（６）（６）（６’）（６’）・・・非磁性基板
、（７）・・・強磁性金属薄膜、（８）・・・絶縁薄膜
、（９）・・・積層薄膜、（９ａ）・・・側端面、（１
０）・・・主コア半体、（１１）・・・高融点ガラス、
（ｌｌａ）・・・高融点ガラス層、（１２）・・・巻線
溝、（１６）・・・作動ギャップ、（１８）・・・巻線
、（１９）・・・積層基板、（銭）・・・積層ブロック
、（旦）・・・積層ヘッドピース、（２２）・・・ギャ
ップ形成面。
第１図
第３図
第２図
第６図
第７図
Ｏ
第９図1 to 8 relate to the present invention, FIG. 1 is a perspective view showing the external appearance of the magnetic head, and FIG. 2, FIG. 3, FIG. 4, and FIG. 5 each show the external appearance of the magnetic head. A perspective view, FIG. 6 is a diagram showing the position of the main core half body, and FIGS. 7 and 8 are diagrams showing the position of the main core half body of other embodiments. FIG. 9 is a diagram showing the appearance of a conventional magnetic head. (5a)...First core half, (5b)...Second core half, (6)(6)(6')(6')...Nonmagnetic substrate, (7)...・Ferromagnetic metal thin film, (8)... Insulating thin film, (9)... Laminated thin film, (9a)... Side end surface, (1
0)...Main core half, (11)...High melting point glass,
(lla)...High melting point glass layer, (12)...Winding groove, (16)...Working gap, (18)...Winding, (19)...Laminated substrate, )... Laminated block, (dan)... Laminated head piece, (22)... Gap forming surface. Figure 1 Figure 3 Figure 2 Figure 6 Figure 7 O Figure 9
Claims (3)
コア半体が被着形成されている第１、第２コア半体を有
し、該第１、第２コア半体の前記主コアの端面が露出し
ているギャップ形成面同士を衝き合わせることにより前
記端面間に作動ギャップを構成すると共に前記第１、第
２コア半体間に巻線溝を形成した磁気ヘッドであって、
前記第１、第２コア半体のうち少なくとも一方のコア半
体は巻線巻回領域における前記一対の非磁性基板間の前
記主コア半体の前記作動ギャップと反対側の側部に、前
記一対の非磁性基板同士を直接接合するガラスを充填し
たことを特徴とする磁気ヘッド。(1) having first and second core halves in which main core halves made of a ferromagnetic metal thin film are adhered between a pair of non-magnetic substrates; A magnetic head, wherein a working gap is formed between the end surfaces of the main core by abutting the gap forming surfaces where the end surfaces of the main core are exposed, and a winding groove is formed between the first and second core halves. ,
At least one of the first and second core halves has the main core half on the side opposite to the working gap between the pair of non-magnetic substrates in the winding region. A magnetic head characterized by being filled with glass that directly joins a pair of nonmagnetic substrates.
積層薄膜であることを特徴とする請求項（１）記載の磁
気ヘッド。(2) The magnetic head according to claim 1, wherein the main core half is a laminated thin film of a ferromagnetic metal thin film and an insulating thin film.
薄膜を島状に被着すると共に他方の面にガラス層を形成
する第１の工程と、前記第１の工程により形成された基
板を複数枚積み重ねた後、前記ガラス層を溶融して前記
複数の基板間の前記薄膜未形成部分にガラスを充填し前
記複数の基板を接合してブロックを形成する第２の工程
と、前記ブロックを前記ガラス充填部で切断して前記薄
膜の両側に前記ガラス充填部を有するヘッドピースを形
成する第３の工程と、前記ヘッドピースに研磨加工を施
して一方の端面がギャップ形成面に露出し他方の端面が
前記ガラスに覆われている前記薄膜からなる主コア半体
を形成する第４の工程と、前記第４の工程で形成された
ヘッドピースを一対用意し、該一対のヘッドピースのギ
ャップ形成面同士を非磁性材料を介して接合し、前記主
コア半体間に作動ギャップを形成する第５の工程とを有
することを特徴とする磁気ヘッドの製造方法。(3) A first step of depositing a thin film having a ferromagnetic metal thin film in an island shape on one surface of a non-magnetic substrate and forming a glass layer on the other surface; After stacking a plurality of substrates, a second step of melting the glass layer to fill the portion where the thin film is not formed between the plurality of substrates with glass and joining the plurality of substrates to form a block; a third step of cutting the block at the glass filling portion to form a head piece having the glass filling portion on both sides of the thin film; and polishing the head piece so that one end surface is exposed to the gap forming surface. and a fourth step of forming a main core half made of the thin film whose other end surface is covered with the glass, and preparing a pair of head pieces formed in the fourth step, and preparing the pair of head pieces. a fifth step of joining the gap forming surfaces of the main core halves with each other via a nonmagnetic material to form an operating gap between the main core halves.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31877688A JPH02162503A (en) | 1988-12-16 | 1988-12-16 | Magnetic head and production thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31877688A JPH02162503A (en) | 1988-12-16 | 1988-12-16 | Magnetic head and production thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02162503A true JPH02162503A (en) | 1990-06-22 |
Family
ID=18102817
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP31877688A Pending JPH02162503A (en) | 1988-12-16 | 1988-12-16 | Magnetic head and production thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02162503A (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS581825A (en) * | 1981-06-25 | 1983-01-07 | Sony Corp | Production of magnetic head |
-
1988
- 1988-12-16 JP JP31877688A patent/JPH02162503A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS581825A (en) * | 1981-06-25 | 1983-01-07 | Sony Corp | Production of magnetic head |
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