JPH02154424A - Method of washing semiconductor device and the like - Google Patents

Abstract

PURPOSE:To form a water flow from a lower layer to an upper layer and facilitate secure discharge of contaminants having a large specific gravity by a method wherein a nozzle is provided near the bottom of a washing vessel and pure water is spouted out along the direction approximately in parallel with the pure water surface of the washing vessel. CONSTITUTION:The spouting outlet of a nozzle 4 for spouting out pure water is provided near the bottom of a washing vessel 1 and in parallel with the water surface of the vessel 1. Pure water spouted out by the nozzle is made to flow from the lower layer to upper layer of the vessel 1 diagonally and overflows the edge of the washing vessel 1 to be discharged. Therefore, if contaminants having a large specific gravity stay on the bottom of the washing chamber, they are whirled up by a water flow in parallel with the bottom and brought up to the surface of the washing vessel 1 and discharged. With this constitution, water staying in the washing vessel is always replaced and the contaminants in the washing vessel can be efficiently discharged, so that high washing capability can be maintained.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a cleaning method for cleaning semiconductor devices or semiconductor manufacturing jigs using pure water.

Conventional technology A conventional cleaning method will be explained using FIG. 2.

1 is a cleaning tank, 2 is a nozzle for injecting pure water, 3 is a stream of the injected pure water, and 3' is a stream of pure water stored in the cleaning tank 1.

Problems to be Solved by the Invention In the conventional configuration, since the flow velocity on the surface layer of the cleaning tank 1 is high, the accumulated water from the center to the lower layer of the cleaning tank 1 circulates like a water flow of 3゛, and dirt with a large specific gravity is As the dirt is discharged outside the cleaning tank, the amount of dirt inside the cleaning tank increases over time.

The present invention solves these conventional problems and provides a cleaning method that quickly discharges dirt with a high specific gravity from the cleaning tank, thereby providing a sustained high cleaning effect.

Means for Solving the Problems In the present invention, a nozzle is provided near the bottom of a cleaning tank, and pure water is injected approximately parallel to the surface of the purified water in the cleaning tank.

According to the present invention, the pure water injected from the nozzle first flows almost parallel to the bottom of the cleaning tank, and then the water pressure pushes the accumulated water in the cleaning tank to the upper layer, so that the water flows from the lower layer to the upper layer. This creates a flow of water towards the area, ensuring that even heavy dirt is removed.

EXAMPLE Hereinafter, an example of the present invention will be described with reference to FIG. In FIG. 1, the same parts as in the conventional example shown in FIG. 2 are given the same numbers and will be described in detail.

Reference numeral 4 denotes a nozzle for injecting pure water, and its injection port is located near the bottom of the cleaning tank 1 and is arranged parallel to the water surface. Reference numeral 5 indicates a stream of injected pure water, and 5' and 5'' indicate water streams circulating within the cleaning tank.

In the above configuration, the pure water injected from the nozzle 4 passes obliquely from the upper layer to the upper layer in the cleaning tank 1.
If dirt with a large specific gravity accumulates on the bottom of the cleaning tank 1 and is overflowing from the edge of the cleaning tank 1, it will be lifted up by the water flow parallel to the bottom, carried to the surface of the cleaning tank 1 by water pressure, and discharged. be done. Further, 5' and 5'' are circulating water flows caused by the water flow 5, which lift up dirt adhering to the inner wall of the cleaning tank 1, carry it on the water flow 5 to the surface layer of the cleaning tank, and discharge it. Ru.

Effects of the Invention According to the present invention, the water stored in the cleaning tank is constantly replaced and the dirt in the cleaning tank is efficiently discharged, so that high cleaning power can be maintained.

[Brief explanation of the drawing]

FIG. 1 is a conceptual diagram of an embodiment of the present invention, and FIG. 2 is a conceptual diagram of a conventional example. 1...Cleaning tank, 4-...Nozzle, 5.
...Water flow, 5', 5''...Water flow circulating in the tank.

Claims (1)

[Claims] A semiconductor comprising a cleaning tank filled with pure water and a nozzle provided near the bottom of the cleaning tank, and injecting pure water from the nozzle substantially parallel to the surface of the pure water in the cleaning tank. How to clean equipment, etc.