JPH02144946A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPH02144946A
JPH02144946A JP29872988A JP29872988A JPH02144946A JP H02144946 A JPH02144946 A JP H02144946A JP 29872988 A JP29872988 A JP 29872988A JP 29872988 A JP29872988 A JP 29872988A JP H02144946 A JPH02144946 A JP H02144946A
Authority
JP
Japan
Prior art keywords
semiconductor element
resin
sealing resin
inner lead
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP29872988A
Other languages
Japanese (ja)
Other versions
JP2694871B2 (en
Inventor
Ryuichiro Mori
隆一郎 森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP63298729A priority Critical patent/JP2694871B2/en
Publication of JPH02144946A publication Critical patent/JPH02144946A/en
Application granted granted Critical
Publication of JP2694871B2 publication Critical patent/JP2694871B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

PURPOSE:To prevent a crack of a resin during a mounting operation by a method wherein a hollow is formed in a face where an inner lead part of a semiconductor element is not attached. CONSTITUTION:A hollow 9 is formed on the rear of a semiconductor element 1; this hollow 9 is filled with a sealing resin 7. Thereby, a close contact force at an inner face between the semiconductor element 1 and the sealing resin 7 can be increased. As a result, even when a temperature is raised during a mounting operation, an exfoliation at an interface between the rear of the semiconductor element 1 and the sealing resin 7 is suppressed; it is possible to prevent a crack of the resin 7. Since the hollow is formed in a face other than a bonding face of an inner lead part of the semiconductor element, the close contact force between the semiconductor element and the sealing resin is increased; even when the temperature is raised during the mounting operation, the exfoliation is hardly caused; it is possible to prevent the crack of the resin.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は、樹脂封止型半導体装置に係り、特に装置外
形の薄形化に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a resin-sealed semiconductor device, and particularly relates to making the outer shape of the device thinner.

〔従来の技術〕[Conventional technology]

第3図は、例えば特開昭59−92556号公報に示さ
れた従来の樹脂封止型半導体装置を示す断面図であり、
1は半導体素子、2はリードフレームのアウターリード
部、3はリードフレームのインナーリード部、4はイン
ナーリード部3と半導体素子1とを接着固定するための
接合層、5は半導体素子1上の電極であり、6はこの電
極5とインナーリード部3をつなぐワイヤ、7は前記半
導体素子1、リードフレームのインナーリード部3、接
合層4、ワイヤ6等を封止する封止樹脂である。
FIG. 3 is a sectional view showing a conventional resin-sealed semiconductor device disclosed in, for example, Japanese Patent Laid-Open No. 59-92556.
1 is a semiconductor element, 2 is an outer lead portion of the lead frame, 3 is an inner lead portion of the lead frame, 4 is a bonding layer for adhesively fixing the inner lead portion 3 and the semiconductor element 1, and 5 is a layer on the semiconductor element 1. Reference numeral 6 denotes an electrode, a wire connecting the electrode 5 and the inner lead portion 3, and 7 a sealing resin for sealing the semiconductor element 1, the inner lead portion 3 of the lead frame, the bonding layer 4, the wire 6, and the like.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

従来の樹脂封止型半導体装置は以上のように構成されて
おり、最近の表面実装型パッケージ(ガルウィング、J
リード等)の装置外形が薄形化する傾向の中では、第4
図に示すように、半導体素子1の上下両側の封止樹脂7
の厚さが薄くなってしまう。
Conventional resin-sealed semiconductor devices are configured as described above, and recent surface mount packages (gull wing, J
With the trend toward thinner device outlines (leads, etc.),
As shown in the figure, the sealing resin 7 on both the upper and lower sides of the semiconductor element 1
becomes thinner.

そのため、半導体装置を基板(図示せず)に実装する際
の昇温時に、半導体素子1と封止樹脂7の熱膨張係数が
大きく異なる(半導体素子;約3.5X 10−’/”
C、封止樹脂;約2 X 10−’/”C) コトカら
、半導体素子1の裏面と封止樹脂7との界面が剥離して
、半導体素子1の端部に接する封止樹脂7に応力が集中
し、第5図に示すようなりラック8が生じるという問題
点があった。
Therefore, when the temperature rises when the semiconductor device is mounted on a substrate (not shown), the thermal expansion coefficients of the semiconductor element 1 and the sealing resin 7 differ greatly (semiconductor element: approximately 3.5X 10-'/''
C, sealing resin; approximately 2 x 10-'/''C) From Kotoka, the interface between the back surface of the semiconductor element 1 and the sealing resin 7 peels off, and the sealing resin 7 in contact with the edge of the semiconductor element 1 peels off. There was a problem in that stress was concentrated and a rack 8 as shown in FIG. 5 was formed.

この発明は、上記のような問題点を解消するためになさ
れたもので、実装時の樹脂クラックを防止できる樹脂封
止型半導体装置を得ることを目的とする。
The present invention has been made to solve the above-mentioned problems, and an object of the present invention is to obtain a resin-sealed semiconductor device that can prevent resin cracks during mounting.

〔課題を解決するための手段〕[Means to solve the problem]

この発明に係る半導体装置は、半導体素子がリードフレ
ームのインナーリード部に取り付けられ樹脂封止成型さ
れた半導体装置において、前記半導体素子のインナーリ
ード部が取り付けられていない面に窪みを設けたことを
特徴とするものである。
A semiconductor device according to the present invention is a semiconductor device in which a semiconductor element is attached to an inner lead part of a lead frame and molded with a resin, in which a recess is provided on a surface of the semiconductor element to which the inner lead part is not attached. This is a characteristic feature.

〔作用〕[Effect]

この考案における半導体装置は、半導体素子裏面に窪み
が設けられているので、封止樹脂と半導体素子間の密着
力が機械的に増すため、昇温時に生じる半導体素子裏面
と封止樹脂の界面の剥離が抑えられ、樹脂クラックを防
止する。
In the semiconductor device according to this invention, since the recess is provided on the back surface of the semiconductor element, the adhesion between the encapsulating resin and the semiconductor element is mechanically increased. Peeling is suppressed and resin cracks are prevented.

〔実施例〕〔Example〕

以下、この発明の一実施例を図について説明する。第1
図において、1は半導体素子、2はリードフレームのア
ウターリード部、3はリードフレームのインナーリード
部、4はインナーリード部3と半導体素子1とを接着固
定するための接合層、5は半導体素子1上の電極であり
、6はこの電極5とインナーリード部3をつなぐワイヤ
、7は封止樹脂、9は半導体素子1の裏面に設けられた
窪みである。
An embodiment of the present invention will be described below with reference to the drawings. 1st
In the figure, 1 is a semiconductor element, 2 is an outer lead part of the lead frame, 3 is an inner lead part of the lead frame, 4 is a bonding layer for adhesively fixing the inner lead part 3 and the semiconductor element 1, and 5 is a semiconductor element. 1 is an electrode, 6 is a wire connecting this electrode 5 and the inner lead part 3, 7 is a sealing resin, and 9 is a recess provided on the back surface of the semiconductor element 1.

次に動作について説明する。半導体素子1の裏面に設け
られた窪み9に封止樹脂7が充てんされているので、半
導体素子1と封止樹脂7の界面の密着力が機械的に増え
る。そのため、実装時に昇温されても、半導体素子1の
裏面と封止樹脂7の界面の剥離が抑えられ、樹脂7のク
ラックを防止する。
Next, the operation will be explained. Since the recess 9 provided on the back surface of the semiconductor element 1 is filled with the sealing resin 7, the adhesion force at the interface between the semiconductor element 1 and the sealing resin 7 is mechanically increased. Therefore, even if the temperature rises during mounting, separation of the interface between the back surface of the semiconductor element 1 and the sealing resin 7 is suppressed, and cracking of the resin 7 is prevented.

なお、第5図に示すように、インナーリード部3と電極
5を直接接続した半導体装置において、その半導体素子
1の裏面に窪み9を設けても同様の効果を得る。
Note that, as shown in FIG. 5, in a semiconductor device in which the inner lead portion 3 and the electrode 5 are directly connected, a similar effect can be obtained by providing a depression 9 on the back surface of the semiconductor element 1.

〔発明の効果〕〔Effect of the invention〕

以上のように、この発明によれば半導体素子のインナー
リード部の接合面以外の面(特に裏面)に窪みを設けた
ので、半導体素子と封止樹脂間の密着力が増し、実装作
業の際、温度を上げても剥離が生じにくくなり、樹脂ク
ラックが防止される。
As described above, according to the present invention, since the recess is provided on the surface other than the bonding surface (especially the back surface) of the inner lead portion of the semiconductor element, the adhesion between the semiconductor element and the encapsulating resin is increased, and during mounting work. Even if the temperature is raised, peeling is less likely to occur, and resin cracks are prevented.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの発明の一実施例による半導体装置を示す側
面断面図、第2図はこの発明の他の実施例による半導体
装置を示す側面断面図、第3図、第4図は従来の半導体
装置を示す側面断面図、第5図は従来の半導体装置に封
止樹脂クラックが発生した状態を示す側面断面図である
。 図において、1は半導体素子、2はアウターリード部、
3はインナーリード部、4は接合層、5は電極、6はワ
イヤ、7は封止樹脂、9は窪みである。 なお、図中同一符号は同−又は相当部分を示す。
FIG. 1 is a side sectional view showing a semiconductor device according to one embodiment of the present invention, FIG. 2 is a side sectional view showing a semiconductor device according to another embodiment of the invention, and FIGS. 3 and 4 are conventional semiconductor devices. FIG. 5 is a side sectional view showing a conventional semiconductor device in which cracks have occurred in the sealing resin. In the figure, 1 is a semiconductor element, 2 is an outer lead part,
3 is an inner lead portion, 4 is a bonding layer, 5 is an electrode, 6 is a wire, 7 is a sealing resin, and 9 is a recess. Note that the same reference numerals in the figures indicate the same or equivalent parts.

Claims (1)

【特許請求の範囲】[Claims] 半導体素子がリードフレームのインナーリード部に取り
付けられ樹脂封止成型された半導体装置において、前記
半導体素子のインナーリード部が取り付けられていない
面に窪みを設けたことを特徴とする半導体装置。
1. A semiconductor device in which a semiconductor element is attached to an inner lead part of a lead frame and molded with resin, characterized in that a recess is provided in a surface of the semiconductor element to which the inner lead part is not attached.
JP63298729A 1988-11-26 1988-11-26 Semiconductor device Expired - Fee Related JP2694871B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63298729A JP2694871B2 (en) 1988-11-26 1988-11-26 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63298729A JP2694871B2 (en) 1988-11-26 1988-11-26 Semiconductor device

Publications (2)

Publication Number Publication Date
JPH02144946A true JPH02144946A (en) 1990-06-04
JP2694871B2 JP2694871B2 (en) 1997-12-24

Family

ID=17863517

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63298729A Expired - Fee Related JP2694871B2 (en) 1988-11-26 1988-11-26 Semiconductor device

Country Status (1)

Country Link
JP (1) JP2694871B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5256903A (en) * 1990-02-28 1993-10-26 Hitachi Ltd. Plastic encapsulated semiconductor device
WO2004082018A2 (en) * 2003-03-11 2004-09-23 Infineon Technologies Ag Electronic component comprising a semiconductor chip and a plastic housing, and method for producing the same
US6891252B2 (en) 2001-02-20 2005-05-10 Infineon Technologies Ag Electronic component with a semiconductor chip and method of producing an electronic component
JP2014192347A (en) * 2013-03-27 2014-10-06 Murata Mfg Co Ltd Resin-sealed electronic equipment and electronic device with the same

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5815225A (en) * 1981-07-21 1983-01-28 Seiko Epson Corp Semiconductor device substrate
JPS62252156A (en) * 1986-04-25 1987-11-02 Hitachi Ltd Semiconductor device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5815225A (en) * 1981-07-21 1983-01-28 Seiko Epson Corp Semiconductor device substrate
JPS62252156A (en) * 1986-04-25 1987-11-02 Hitachi Ltd Semiconductor device

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5256903A (en) * 1990-02-28 1993-10-26 Hitachi Ltd. Plastic encapsulated semiconductor device
US6891252B2 (en) 2001-02-20 2005-05-10 Infineon Technologies Ag Electronic component with a semiconductor chip and method of producing an electronic component
WO2004082018A2 (en) * 2003-03-11 2004-09-23 Infineon Technologies Ag Electronic component comprising a semiconductor chip and a plastic housing, and method for producing the same
WO2004082018A3 (en) * 2003-03-11 2004-11-11 Infineon Technologies Ag Electronic component comprising a semiconductor chip and a plastic housing, and method for producing the same
US7508083B2 (en) 2003-03-11 2009-03-24 Infineon Technologies Ag Electronic component comprising a semiconductor chip and a plastic housing, and method for producing the same
JP2014192347A (en) * 2013-03-27 2014-10-06 Murata Mfg Co Ltd Resin-sealed electronic equipment and electronic device with the same

Also Published As

Publication number Publication date
JP2694871B2 (en) 1997-12-24

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