JPH02143921A - Apparatus for producing thin soft magnetic film - Google Patents
Apparatus for producing thin soft magnetic filmInfo
- Publication number
- JPH02143921A JPH02143921A JP29776788A JP29776788A JPH02143921A JP H02143921 A JPH02143921 A JP H02143921A JP 29776788 A JP29776788 A JP 29776788A JP 29776788 A JP29776788 A JP 29776788A JP H02143921 A JPH02143921 A JP H02143921A
- Authority
- JP
- Japan
- Prior art keywords
- plating
- substrate
- soft magnetic
- thin film
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007747 plating Methods 0.000 claims abstract description 57
- 239000000758 substrate Substances 0.000 claims abstract description 54
- 239000010409 thin film Substances 0.000 claims description 47
- 239000010408 film Substances 0.000 claims description 18
- 238000004519 manufacturing process Methods 0.000 claims description 16
- 238000009713 electroplating Methods 0.000 claims description 12
- 230000015572 biosynthetic process Effects 0.000 claims description 3
- 230000035699 permeability Effects 0.000 abstract description 17
- 229910003271 Ni-Fe Inorganic materials 0.000 abstract description 5
- 150000002500 ions Chemical class 0.000 abstract description 4
- 230000005415 magnetization Effects 0.000 abstract description 4
- 238000000034 method Methods 0.000 description 7
- 238000004544 sputter deposition Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 235000003891 ferrous sulphate Nutrition 0.000 description 1
- 239000011790 ferrous sulphate Substances 0.000 description 1
- BAUYGSIQEAFULO-UHFFFAOYSA-L iron(2+) sulfate (anhydrous) Chemical compound [Fe+2].[O-]S([O-])(=O)=O BAUYGSIQEAFULO-UHFFFAOYSA-L 0.000 description 1
- 229910000359 iron(II) sulfate Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
Landscapes
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
〔イ既 要〕
二層膜構造の垂直磁気ディスク等の製造に用いて好適な
軟磁性薄膜の製造装置に関し、基板とめっき用電極との
配置構成により、該基板上の半径方向に磁気容易軸が向
く磁気異方性を付与した軟磁性薄膜を容易に形成して、
該軟磁性薄膜の透磁率を高めることを目的とし、基板上
に電解めっき法によりめっき膜からなる軟磁性薄膜を形
成する装置において、上記基板のめっき膜形成面に対し
て、めっき用電極を斜め位置に対向設置した構成とする
。[Detailed Description of the Invention] [Required] Regarding a soft magnetic thin film manufacturing apparatus suitable for manufacturing a double-layered perpendicular magnetic disk, etc., the arrangement of a substrate and a plating electrode allows By easily forming a soft magnetic thin film with magnetic anisotropy in which the magnetic easy axis is oriented in the radial direction of
In an apparatus for forming a soft magnetic thin film consisting of a plated film on a substrate by electrolytic plating with the aim of increasing the magnetic permeability of the soft magnetic thin film, the plating electrode is placed diagonally with respect to the plated film forming surface of the substrate. The configuration is such that they are installed opposite each other.
〔産業上の利用分野］
本発明は二層膜構造の垂直磁気ディスク等の製造に用い
て好適な軟磁性薄膜の製造装置に係り、特に電解めっき
法により軟磁性薄膜を形成する製造装置に関するもので
ある。[Industrial Field of Application] The present invention relates to a manufacturing apparatus for soft magnetic thin films suitable for use in manufacturing perpendicular magnetic disks with a double-layer film structure, and more particularly to a manufacturing apparatus for forming soft magnetic thin films by electrolytic plating. It is.
磁気ディスク装置に用いられる磁気ディスクとしては、
記録トラックに対して水平方向に磁化する水平磁気記録
方式の磁気ディスクが広く用いられているが、このよう
な方式の磁気ディスクでは水平方向に連なって磁化され
た微小な磁石が隣同士で反発し合って、互いに磁化を弱
め合う傾向がある。このような傾向は情報記録の高密度
化に伴って顕著になり、高密度記録に限界が生じてくる
。Magnetic disks used in magnetic disk devices include:
Horizontal magnetic recording type magnetic disks are widely used, in which magnetic disks are magnetized horizontally with respect to the recording track, but in such magnetic disks, small magnets that are magnetized in a row in the horizontal direction repel each other. They tend to weaken each other's magnetization. This tendency becomes more noticeable as the density of information recording increases, and there is a limit to high-density recording.
従って、かかる限界を打破するものとして記録トラック
に対して垂直方向の磁化を利用する垂直磁気記録方式の
磁気ディスクが提案され、これを実現する磁気ディスク
として高透磁率な軟磁性層と垂直記録層とを積層した二
層膜構造の垂直磁気ディスクが実用化されつつある。Therefore, a perpendicular magnetic recording type magnetic disk that utilizes magnetization in the direction perpendicular to the recording track has been proposed as a way to overcome this limit. Perpendicular magnetic disks with a two-layer structure consisting of two layers are being put into practical use.
このような垂直磁気ディスクにおける軟磁性層は、磁気
ヘッドからの記録磁界が垂直記録層を垂直に磁化した後
、再び磁気ヘッド側へ帰還する磁界経路の役割を果たす
磁気ヘッドの一部の機能を担っており、その透磁率を高
めることによって記録再生効率を向上し、記録再生特性
の優れた垂直磁気ディスクを得ることが必要とされる。The soft magnetic layer in such a perpendicular magnetic disk performs a part of the function of the magnetic head, which serves as a magnetic field path for the recording magnetic field from the magnetic head to perpendicularly magnetize the perpendicular recording layer and then return to the magnetic head side. It is necessary to improve the recording and reproducing efficiency by increasing its magnetic permeability and to obtain a perpendicular magnetic disk with excellent recording and reproducing characteristics.
従来、上記した二層膜構造の垂直磁気ディスクにおける
軟磁性層（以下軟磁性薄膜と称する）を形成する方法と
しては、第６図に示すように例えばアルマイト表面処理
を施したアルミニウム製からなる非磁性のディスク基板
１１上にスパッタリング法により０．５μｍの膜厚のＮ
ｉ−Ｆｅからなる軟磁性薄膜１２を形成している。この
ようにスパッタリング法を用いると、同一スパッタリン
グ装置内でこの形成された軟磁性薄膜１２上に引き続い
てＣｏ−Ｃｒからなる垂直記録層１３を連続的にスパッ
タリングして形成することができる。Conventionally, as a method for forming the soft magnetic layer (hereinafter referred to as soft magnetic thin film) in the perpendicular magnetic disk with the above-mentioned two-layer film structure, as shown in FIG. A film of N with a thickness of 0.5 μm is deposited on the magnetic disk substrate 11 by sputtering.
A soft magnetic thin film 12 made of i-Fe is formed. When the sputtering method is used in this manner, the perpendicular recording layer 13 made of Co--Cr can be continuously sputtered and formed on the soft magnetic thin film 12 thus formed within the same sputtering apparatus.
しかし、上記したスパッタリング法により形成されたＮ
ｉ−Ｆｅからなる軟磁性薄膜１２の透磁率は５０〜６０
程度で、電解めっき法により形成された薄膜磁気ヘッド
のＮｉ−Ｆｅからなる磁極層の透磁率の数十分の一程度
と極めて低いものであった。このため、繋る軟磁性薄膜
１２の透磁率を高めるために、例えば第７図に示すよう
にＮｉ−Ｆｅを主成分とするめっき？＆２２が満たされ
ためっき槽２１内に、基板ホルダ２３に支持され、かつ
表面にめっき下地膜（図示省略）が施された非磁性のデ
ィスク基板１１と該基板１１と同一形状のめっき用電極
２４とを図示のように対向配置し、ディスク基板１１を
回転した状態で該めっき下地膜上に電解めっきによりＮ
ｉ−Ｆｅめっき膜からなる軟磁性薄膜を形成することに
よって、該軟磁性薄膜の透磁率を４００〜５００程度と
、スパッタリング法によ、り形成された軟磁性薄膜１２
の透磁率を１０倍程度に高めている。However, the N
The magnetic permeability of the soft magnetic thin film 12 made of i-Fe is 50 to 60.
The magnetic permeability of the magnetic pole layer made of Ni--Fe of the thin-film magnetic head formed by electrolytic plating was extremely low. Therefore, in order to increase the magnetic permeability of the connected soft magnetic thin film 12, for example, as shown in FIG. 7, plating mainly composed of Ni--Fe is used. In a plating tank 21 filled with &22, a non-magnetic disk substrate 11 supported by a substrate holder 23 and having a plating base film (not shown) applied to its surface and a plating electrode 24 having the same shape as the substrate 11 are placed. are arranged facing each other as shown in the figure, and with the disk substrate 11 rotated, N is applied on the plating base film by electrolytic plating.
By forming a soft magnetic thin film made of an i-Fe plating film, the magnetic permeability of the soft magnetic thin film is set to about 400 to 500, and the soft magnetic thin film 12 is formed by a sputtering method.
The magnetic permeability is increased by about 10 times.
ところでこのような方法で形成された軟磁性薄膜は磁気
的に等方性であるため、これ以上の透磁率を得ることが
困難であり、更に軟磁性薄膜の透磁率を高める方法を検
討した結果、ディスク基板の半径方向に磁気容易軸が向
くように磁気異方性を付与した軟磁性薄膜を形成するこ
とにより、その円周方向（記録トラック）の透磁率を２
０００以上に高めるられることか判明した。By the way, since the soft magnetic thin film formed by this method is magnetically isotropic, it is difficult to obtain a higher magnetic permeability.As a result of investigating ways to further increase the magnetic permeability of the soft magnetic thin film. By forming a soft magnetic thin film with magnetic anisotropy so that the magnetic easy axis points in the radial direction of the disk substrate, the magnetic permeability in the circumferential direction (recording track) is increased to 2.
It turns out that it can be raised to over 000.
しかしながら、上記したような磁気異方性を付与した軟
磁性薄膜を形成する方法としては、■予め半径方向に磁
気容易軸が向くように多数のスジを形成したディスク基
板面に軟磁性薄膜を電解めっきにより形成する。■半径
方向に磁場を印加した状態のディスク基板面に軟磁性薄
膜を電解めっきにより形成する。■ディスク基板面の半
径方向にめっき液の流れを作った状態で軟磁性薄膜を電
解めっきにより形成する透磁率の方法が考えられる。However, as a method for forming a soft magnetic thin film imparted with magnetic anisotropy as described above, there are two methods: (1) electrolyzing a soft magnetic thin film on a disk substrate surface on which many stripes have been formed in advance so that the magnetic easy axis is oriented in the radial direction; Formed by plating. ■A soft magnetic thin film is formed by electrolytic plating on the disk substrate surface while a magnetic field is applied in the radial direction. 1) A possible method for magnetic permeability is to form a soft magnetic thin film by electrolytic plating while creating a flow of plating solution in the radial direction of the disk substrate surface.
ところが、■についてはディスク基板面の円周方向に多
数のスジを形成することは比較的容易であるが、半径方
向に多数のスジを形成することは困難である。また■に
ついては半径方向に磁場を印加する基板取付は機構等の
装置構成が大掛かりになり、容易でない。更に■ではめ
っき時にディスク基板を回転させているため円周方向に
めっき液の流れを作ることは容易であるが、半径方向へ
のめっき液の流れを作ることば困難である等の問題があ
った。However, regarding (2), it is relatively easy to form a large number of stripes in the circumferential direction of the disk substrate surface, but it is difficult to form a large number of stripes in the radial direction. Regarding (2), mounting a substrate that applies a magnetic field in the radial direction requires a large-scale device configuration such as a mechanism, and is not easy. Furthermore, in ■, the disk substrate is rotated during plating, so it is easy to create a flow of plating solution in the circumferential direction, but it is difficult to create a flow of plating solution in the radial direction. .
本発明は上記した従来の実状に鑑み、基板とめっき用電
極との配置構成により、該基板上の半径方向に磁気容易
軸が向く磁気異方性を付与した軟磁性薄膜を容易に形成
して、該軟磁性薄膜の透磁率を高めることを可能にした
新規な軟磁性薄膜の製造装置を提供することを目的とす
るものである。In view of the above-mentioned conventional situation, the present invention allows easy formation of a soft magnetic thin film imparted with magnetic anisotropy with the magnetic easy axis oriented in the radial direction on the substrate by the arrangement configuration of the substrate and the plating electrode. The object of the present invention is to provide a novel soft magnetic thin film manufacturing apparatus that makes it possible to increase the magnetic permeability of the soft magnetic thin film.
本発明は上記した目的を達成するため、第１図の斜視図
及び第２図の側断面図により原理的に示すように、基板
４１上に電解めっき法によりめっき膜からなる軟磁性薄
膜を形成する装置において、上記基板４１のめっき膜形
成面に対してめっき用電極３１を斜め位置で対向するよ
うに設置した構成とする。In order to achieve the above object, the present invention forms a soft magnetic thin film made of a plating film on a substrate 41 by electrolytic plating, as shown in principle in the perspective view of FIG. 1 and the side sectional view of FIG. In this apparatus, the plating electrode 31 is installed so as to face the plating film forming surface of the substrate 41 at an oblique position.
本発明の軟磁性薄膜の製造装置では基板４１に対して例
えば該基板４１の外周よりも大きい円環状のめっき用電
極３１を第１図及び第２図に示すように該基板４１のめ
っき膜形成面に対して斜め位置で対向させると、例えば
Ｎｉ−Ｐｅめっきを行うことによって前記めっき用電極
３１側より基板４１のめっき膜形成面の全ての点に対し
て、めっき電流、或いはＮｉイオン及びＦｅイオンが鎖
線矢印で示すように斜め方向に流れてＮｉ−Ｆｅめっき
膜が成膜される。その結果、前記基板面の周囲から中心
方向に磁気容易軸が向くように磁気異方性が付与された
Ｎｉ−Ｆｅめっき膜からなる軟磁性薄膜を容易に形成す
ることができ、該軟磁性薄膜の透磁率を著しく高めるこ
とが可能となる。In the soft magnetic thin film manufacturing apparatus of the present invention, a plating electrode 31 having a ring shape larger than the outer circumference of the substrate 41 is attached to the substrate 41 as shown in FIGS. 1 and 2 to form a plating film on the substrate 41. When facing the surface diagonally, for example, by performing Ni--Pe plating, a plating current or Ni ions and Fe is applied from the plating electrode 31 side to all points on the plating film formation surface of the substrate 41. The ions flow diagonally as shown by the chain arrows to form a Ni--Fe plating film. As a result, it is possible to easily form a soft magnetic thin film made of a Ni-Fe plating film imparted with magnetic anisotropy such that the magnetic easy axis is directed from the periphery of the substrate surface toward the center, and the soft magnetic thin film It becomes possible to significantly increase the magnetic permeability of.
以下図面を用いて本発明の実施例について詳細に説明す
る。Embodiments of the present invention will be described in detail below with reference to the drawings.
第３図は本発明に係る軟磁性薄膜を電解めっきにより形
成する製造装置の一実施例を示す構成断面図である。FIG. 3 is a sectional view showing an embodiment of a manufacturing apparatus for forming a soft magnetic thin film according to the present invention by electrolytic plating.
本実施例は図示のように、例えば硫酸ニッケル（ＮｉＳ
０４・６＋１２０）と硫酸第一鉄（ＦｅＳＯ４・７ＦＩ
ｚＯ）とを主成分とするめっき液２２が満たされためっ
き槽２１内に、基板ホルダ２３に支持され、かつ例えば
予めＮ４２表面処理が施されたアルミニウム製のディス
ク基板４１を設け、かつ該ディスク基板４１の外径より
も大きい内径を有する円環状のめっき用電極３１ａとデ
ィスク基板４１の内径、即ち中心取付は孔４１ａよりも
小さい外径の円板状のめっき用電極３１ｂとを同心的に
、かつディスク基板４１に対向して配置する。In this example, as shown in the figure, for example, nickel sulfate (NiS
04.6+120) and ferrous sulfate (FeSO4.7FI
A disk substrate 41 made of aluminum and supported by a substrate holder 23 and subjected to N42 surface treatment in advance, for example, is provided in a plating tank 21 filled with a plating solution 22 whose main component is An annular plating electrode 31a having an inner diameter larger than the outer diameter of the substrate 41 and a disk-shaped plating electrode 31b having an outer diameter smaller than the hole 41a are attached concentrically to the inner diameter of the disk substrate 41, that is, the center mounting. , and are arranged opposite to the disk substrate 41.
そして所定速度で回転させた前記ディスク基板４１と円
環状めっき用電極３１ａ及び円板状めっき用電極３１ｂ
間に４〜５ＶのＤＣ電圧を印加し、６Ａ／ｄｍ２の電流
密度の条件によって１μｌの膜厚のＮｉ−Ｆｅめっき膜
を形成する。Then, the disk substrate 41 rotated at a predetermined speed, the annular plating electrode 31a, and the disk-shaped plating electrode 31b.
A DC voltage of 4 to 5 V is applied in between, and a Ni--Fe plating film with a thickness of 1 μl is formed under the conditions of a current density of 6 A/dm 2 .
このような装置構成により形成されたＮｉ−Ｆｅめっき
膜のＢ−Ｈ磁気特性を測定した結果、第４図に示すよう
に前記ディスク基板４１の半径方向のヒステリシス曲線
Ａと円周方向のヒステリシス曲線Ｂとが異なり、第５図
に示す従来の磁気的に等方性の軟磁性薄膜の半径方向の
ヒステリシス曲線Ａ及び円周方向のヒステリシス曲線Ｂ
と比較して明らかなように半径方向に磁気容易軸が向く
ように磁気異方性が付与されており、円周方向に２００
０以上の高透磁率を有する軟磁性薄膜を容易に得ること
ができる。As a result of measuring the B-H magnetic characteristics of the Ni-Fe plating film formed by such an apparatus configuration, as shown in FIG. B is different from the radial hysteresis curve A and the circumferential hysteresis curve B of the conventional magnetically isotropic soft magnetic thin film shown in FIG.
As is clear from the comparison, magnetic anisotropy is imparted so that the magnetic easy axis points in the radial direction, and
A soft magnetic thin film having a high magnetic permeability of 0 or more can be easily obtained.
なお、以上の実施例の変形として、例えば前記円環状め
っき用電極だけのもの、または前記円板状めっき用電極
だけのもの、或いはディスク基板の周囲に所定間隔を隔
てて円筒状のめっき用電極を配置した構成が挙げられ、
これらによっても同様に高透磁率な軟磁性薄膜を容易に
得ることができる。In addition, as a modification of the above embodiment, for example, only the annular plating electrode, only the disc-shaped plating electrode, or cylindrical plating electrodes arranged at a predetermined interval around the disk substrate. One example is a configuration in which
Similarly, a soft magnetic thin film with high magnetic permeability can be easily obtained using these materials.
以上の説明から明らかなように、本発明に係る軟磁性薄
膜の製造装置によれば、軟磁性薄膜を該基板とめっき用
電極との位置関係に対応する方向に磁気容易軸が向（よ
うに磁気異方性を付与することができ、その対応方向と
直交する方向に高い透磁率を有する軟磁性薄膜を容易に
得ることができる。As is clear from the above description, according to the soft magnetic thin film manufacturing apparatus according to the present invention, the magnetic easy axis of the soft magnetic thin film is oriented in the direction corresponding to the positional relationship between the substrate and the plating electrode. A soft magnetic thin film that can be imparted with magnetic anisotropy and has high magnetic permeability in a direction orthogonal to the corresponding direction can be easily obtained.
従って、二層膜構造の垂直磁気ディスクの製造に適用し
て記録再生効率がよく、記録再生特性の優れた垂直磁気
ディスクを得ることが可能となる利点を有する。Therefore, it has the advantage that it can be applied to the manufacture of a perpendicular magnetic disk having a double layer structure, and a perpendicular magnetic disk with good recording and reproducing efficiency and excellent recording and reproducing characteristics can be obtained.
第１図は本発明に係る軟磁性薄膜の製造装置における基
板とめっき用電極との位置関
係を示す原理斜視図、
第２図は第１図の基板とめっき用電極との位置関係と作
用を説明するための側断面図、第３図は本発明に係る軟
磁性薄膜を電解めっきにより形成する製造装置の一実施
例を
示す構成断面図、
第４図は本発明に係る軟磁性薄膜の製造装置によって形
成された軟磁性薄膜のＢ −Ｈ磁気特性の測定結果を説
明するための
図、
第５図は従来の電解めっき法により形成された軟磁性薄
膜のＢ −Ｈ磁気特性を示す図、第６図は従来の軟磁性
薄膜の形成方法を説明するための要部断面図、
第７図は従来の電解めっき法により軟磁性薄膜を形成す
る装置構成を示す側断面図で
ある。
第１図〜第３図において、
２１はめっき槽、２２はめっき液、２３は基板ホルダ、
３１ａは円環状めっき用電極、３１ｂは円板状めっき用
電極、４１は基板及びディスク基板、４１ａは取付は孔
をそれぞれ第４図
うｒ１巴り、１く本りｔめ２２膣本配ｔの位５シ１「釆
Ｙ４下ｍ１説ｑ珂η便％ｔ４ゴδ］１２ｆｉ
Δ桐宅ｉル１すＺ霞利頃１頃ｄ解め・粕ｓｌｙ形成す）
Ｍ遵頷しオＴ末１反ｒケ面バ乙第３図
従す軟祿牲簿膜ｑ Ｂ−Ｈ禮ル拝社図
第５図Fig. 1 is a principle perspective view showing the positional relationship between the substrate and the plating electrode in the soft magnetic thin film manufacturing apparatus according to the present invention, and Fig. 2 shows the positional relationship and operation between the substrate and the plating electrode in Fig. 1. FIG. 3 is a cross-sectional view showing an embodiment of a manufacturing apparatus for forming a soft magnetic thin film according to the present invention by electrolytic plating, and FIG. 4 is a side cross-sectional view for explaining the production of a soft magnetic thin film according to the present invention. A diagram for explaining the measurement results of the B-H magnetic properties of a soft magnetic thin film formed by the apparatus; FIG. 5 is a diagram showing the B-H magnetic properties of a soft magnetic thin film formed by a conventional electrolytic plating method; FIG. 6 is a sectional view of essential parts for explaining a conventional method for forming a soft magnetic thin film, and FIG. 7 is a side sectional view showing the configuration of an apparatus for forming a soft magnetic thin film by a conventional electrolytic plating method. 1 to 3, 21 is a plating tank, 22 is a plating solution, 23 is a substrate holder,
31a is an annular plating electrode, 31b is a disk-shaped plating electrode, 41 is a substrate and a disk substrate, and 41a is a mounting hole with 1 hole and 22 holes in each case in Figure 4. Place 5 1 "Y4 lower m1 theory q ka η flight % t 4 go δ] 12 fi Δ Kiritaku iru 1 s Z Kasuri around 1 d solving/kasu sly forming)
M Nodding O T End 1 Anti-r-face Ba Otsu Figure 3 Follow Soft Sacrifice Record Book q B-H Reiru Worship Service Figure Figure 5
Claims (3)
らなる軟磁性薄膜を形成する装置において、上記基板（
４１）のめっき膜形成面に対して、めっき用電極（３１
）を斜め位置に対向設置してなることを特徴とする軟磁
性薄膜の製造装置。(1) In an apparatus for forming a soft magnetic thin film consisting of a plated film on a substrate (41) by electrolytic plating, the substrate (41)
The plating electrode (31) is placed on the plating film formation surface of (41).
) are installed diagonally opposite each other to produce a soft magnetic thin film.
有するディスク基板からなり、前記めっき用電極（３１
）がディスク基板（４１）の外径よりも大きい内径を有
する円環状電極からなり、それらディスク基板（４１）
及び円環状電極（３１）の中心を一致させて対向配置し
たことを特徴とする請求項１に記載の軟磁性薄膜の製造
装置。(2) The substrate (41) is a disk substrate having a mounting hole (41a) in the center, and the plating electrode (31)
) consists of an annular electrode having an inner diameter larger than the outer diameter of the disk substrate (41), and these disk substrates (41)
The apparatus for manufacturing a soft magnetic thin film according to claim 1, characterized in that the annular electrodes (31) are arranged facing each other with their centers coincident.
有するディスク基板からなり、前記めっき用電極（３１
）がディスク基板（４１）の取付け孔（４１ａ）の中心
に、その中心を一致させて設けた該ディスク基板（４１
）の内径よりも小さい外径を有する円板状電極（３１ｂ
）と、該円板状電極（３１ｂ）と同心的に設けた前記デ
ィスク基板（４１）の外径よりも大きな内径を有する円
環状電極（３１ａ）とからなることを特徴とする請求項
１に記載の軟磁性薄膜の製造装置。(3) The substrate (41) is a disk substrate having a mounting hole (41a) in the center, and the plating electrode (31)
) is provided with its center aligned with the center of the mounting hole (41a) of the disk substrate (41).
) having a smaller outer diameter than the inner diameter of the disc-shaped electrode (31b
), and an annular electrode (31a) having an inner diameter larger than an outer diameter of the disk substrate (41), which is provided concentrically with the disk-shaped electrode (31b). A manufacturing apparatus for the soft magnetic thin film described above.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29776788A JPH02143921A (en) | 1988-11-24 | 1988-11-24 | Apparatus for producing thin soft magnetic film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29776788A JPH02143921A (en) | 1988-11-24 | 1988-11-24 | Apparatus for producing thin soft magnetic film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02143921A true JPH02143921A (en) | 1990-06-01 |
Family
ID=17850913
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP29776788A Pending JPH02143921A (en) | 1988-11-24 | 1988-11-24 | Apparatus for producing thin soft magnetic film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02143921A (en) |
-
1988
- 1988-11-24 JP JP29776788A patent/JPH02143921A/en active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US7351484B2 (en) | High field contrast magnetic stampers/imprinters for contact patterning of magnetic media | |
| JP2004259306A (en) | Magnetic recording medium and manufacturing method of magnetic recording medium | |
| US4880514A (en) | Method of making a thin film magnetic disk | |
| JPH06103553A (en) | Perpendicular magnetic recording medium and its production | |
| JPH02143921A (en) | Apparatus for producing thin soft magnetic film | |
| JPH02214023A (en) | Production of perpendicular magnetic disk | |
| JP4425286B2 (en) | Magnetic recording medium and recording / reproducing apparatus thereof | |
| JPH0785442A (en) | Vertical magnetic recording medium | |
| JPH05258274A (en) | Perpendicular magnetic recording medium and its production | |
| JP4444797B2 (en) | Magnetic circuit for generating radial magnetic field used for film formation by sputtering process | |
| JPH04176021A (en) | Manufacture of perpendicular magnetic recording disk | |
| JPH05258275A (en) | Perpendicular magnetic recording medium and its production | |
| JPS6052919A (en) | Vertical magnetic recording medium and its production | |
| EP0205239A2 (en) | Thin film magnetic disc | |
| JPS61177633A (en) | Production of vertical magnetic recording medium | |
| JPH05101385A (en) | Production of magnetic recording medium having axis of easy magnetization unified in circumferential direction | |
| US7151653B2 (en) | Depositing a pinned layer structure in a self-pinned spin valve | |
| JPH02103727A (en) | Production of perpendicular magnetic disk | |
| JPH02223020A (en) | Production of perpendicular magnetic disk | |
| JPH0298820A (en) | Production of perpendicular magnetic disk | |
| JP2010238301A (en) | Magnetic transfer method and master carrier for magnetic transfer | |
| JPS6282517A (en) | Production of magnetic disk | |
| JPH04283413A (en) | Perpendicular magnetic recording medium and production theerof | |
| JPH0317829A (en) | Production of perpendicular magnetic disk | |
| JPS62212918A (en) | Vertical magnetism recording medium |