JPH0214320B2 - - Google Patents
Info
- Publication number
- JPH0214320B2 JPH0214320B2 JP57168455A JP16845582A JPH0214320B2 JP H0214320 B2 JPH0214320 B2 JP H0214320B2 JP 57168455 A JP57168455 A JP 57168455A JP 16845582 A JP16845582 A JP 16845582A JP H0214320 B2 JPH0214320 B2 JP H0214320B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- melt
- crystal growth
- inp
- atmosphere containing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B19/00—Liquid-phase epitaxial-layer growth
- C30B19/12—Liquid-phase epitaxial-layer growth characterised by the substrate
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16845582A JPS5957999A (ja) | 1982-09-29 | 1982-09-29 | 結晶成長方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16845582A JPS5957999A (ja) | 1982-09-29 | 1982-09-29 | 結晶成長方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5957999A JPS5957999A (ja) | 1984-04-03 |
JPH0214320B2 true JPH0214320B2 (enrdf_load_stackoverflow) | 1990-04-06 |
Family
ID=15868422
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16845582A Granted JPS5957999A (ja) | 1982-09-29 | 1982-09-29 | 結晶成長方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5957999A (enrdf_load_stackoverflow) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59190299A (ja) * | 1983-04-07 | 1984-10-29 | Agency Of Ind Science & Technol | 燐化インジウム結晶の熱変形防止方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5559716A (en) * | 1978-10-30 | 1980-05-06 | Nec Corp | Liquid phase growing method of 3-5 group compound semiconductor |
JPS571888A (en) * | 1980-05-31 | 1982-01-07 | Bridgestone Tire Co Ltd | Fiber reinforced hose and its manufacture |
-
1982
- 1982-09-29 JP JP16845582A patent/JPS5957999A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5957999A (ja) | 1984-04-03 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CA1225465A (en) | Fabrication of grooved semiconductor devices | |
CA1086431A (en) | Etching of iii-v semiconductor materials in the preparation of heterodiodes | |
US4347486A (en) | Single filament semiconductor laser with large emitting area | |
EP0469900B1 (en) | A method for the production of a semiconductor laser device | |
GB2144337A (en) | Process for epitaxial growth | |
US5161167A (en) | Semiconductor laser producing visible light | |
US4049488A (en) | Method of manufacturing a semiconductor device | |
JPH0214320B2 (enrdf_load_stackoverflow) | ||
EP0321294B1 (en) | A semiconductor laser device | |
US4902644A (en) | Preservation of surface features on semiconductor surfaces | |
EP0117051B2 (en) | Growth of semiconductors | |
JPH0217519B2 (enrdf_load_stackoverflow) | ||
US4805178A (en) | Preservation of surface features on semiconductor surfaces | |
JPH0763053B2 (ja) | InP上へInGaAsPを結晶成長する方法 | |
US4717443A (en) | Mass transport of indium phosphide | |
KR940007591B1 (ko) | 화합물 반도체를 이용한 광전소자의 제조방법 | |
JP3287311B2 (ja) | 半導体レーザ装置の製造方法 | |
Deppe et al. | Buried heterostructure Al x Ga1− x As‐GaAs quantum well lasers by Ge diffusion from the vapor | |
JPH0136689B2 (enrdf_load_stackoverflow) | ||
Botez et al. | Crystal growth of mode-stabilized semiconductor diode lasers by liquid-phase epitaxy | |
JPH058568B2 (enrdf_load_stackoverflow) | ||
JPS6021586A (ja) | 化合物半導体装置 | |
JPH0310222B2 (enrdf_load_stackoverflow) | ||
KR100390394B1 (ko) | 반도체 레이저 다이오드의 제조방법 | |
JPH07221385A (ja) | 半導体レーザの製造方法 |