JPH02135704A - Manufacture of varistor - Google Patents
Manufacture of varistorInfo
- Publication number
- JPH02135704A JPH02135704A JP63289715A JP28971588A JPH02135704A JP H02135704 A JPH02135704 A JP H02135704A JP 63289715 A JP63289715 A JP 63289715A JP 28971588 A JP28971588 A JP 28971588A JP H02135704 A JPH02135704 A JP H02135704A
- Authority
- JP
- Japan
- Prior art keywords
- varistor
- zno
- added
- material powder
- heat treatment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- 239000000843 powder Substances 0.000 claims abstract description 15
- 238000000034 method Methods 0.000 claims abstract description 7
- 239000002994 raw material Substances 0.000 claims abstract description 6
- 239000004065 semiconductor Substances 0.000 claims description 10
- 238000010298 pulverizing process Methods 0.000 claims description 2
- 230000000694 effects Effects 0.000 abstract description 6
- 229910052751 metal Inorganic materials 0.000 abstract description 6
- 239000002184 metal Substances 0.000 abstract description 6
- 238000010521 absorption reaction Methods 0.000 abstract description 4
- 238000010438 heat treatment Methods 0.000 abstract description 4
- 239000006104 solid solution Substances 0.000 abstract description 2
- 239000000463 material Substances 0.000 abstract 1
- 238000002474 experimental method Methods 0.000 description 2
- 229910052727 yttrium Inorganic materials 0.000 description 2
- 230000002159 abnormal effect Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000011812 mixed powder Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
Landscapes
- Thermistors And Varistors (AREA)
- Compositions Of Oxide Ceramics (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、電圧非直線性抵抗として機能するバリスタに
関し、特に高電流aH域での非直線係数に優れたバリス
タの製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a varistor that functions as a voltage nonlinear resistor, and particularly to a method for manufacturing a varistor that has an excellent nonlinear coefficient in a high current aH range.
従来から、印加電圧に応して抵抗値が非直線的に変化す
る抵抗体素子としてバリスタがある。このようなバリス
タとして、例えば半導体セラミクスからなるバリスタ素
子の両生面に電極を形成してなるディスク型バリスタ、
あるいはバリスタ層と内部電極とを交互に積層して一体
焼結してなる積層型バリスタがある。このバリスタは、
例えば電子回路に過電圧が加わるのを防止するためのサ
ージ吸収素子として採用されている。Conventionally, a varistor has been known as a resistor element whose resistance value changes non-linearly depending on an applied voltage. Examples of such a varistor include a disk-shaped varistor, which is formed by forming electrodes on both sides of a varistor element made of semiconductor ceramics;
Alternatively, there is a laminated type varistor in which varistor layers and internal electrodes are alternately laminated and integrally sintered. This barista is
For example, it is used as a surge absorption element to prevent overvoltage from being applied to electronic circuits.
このようなバリスタの電圧−電流特性は次式で表される
。The voltage-current characteristics of such a varistor are expressed by the following equation.
1o / I + −(Vo / V+ )”ここで
、!。、Ilは素子を流れる電流、v。1o/I+-(Vo/V+)'' where !., Il is the current flowing through the element, v.
■1は印加電圧である。また、上記式のαは非直線係数
(以下、単にαと記す)であり、これはバリスタを電気
回路に組み込んだ際の電圧がいかに制御されるかを示す
もので、このα値が大きいほど電圧非直線特性は優れて
いる。このαは、次式によって実験的に求められる。(1) 1 is the applied voltage. Also, α in the above equation is a nonlinear coefficient (hereinafter simply referred to as α), which indicates how the voltage is controlled when the varistor is incorporated into an electric circuit, and the larger the α value, the more Voltage nonlinear characteristics are excellent. This α is experimentally determined by the following equation.
= log (I o / + +)/ i!og(
Vo /νl)この式からαは、電流、電圧を測定する
領域によって左右されることが判る。一般的にZnO系
バリスタの電圧−電流特性は、約10−’A/cIa”
以下の第1 fil域、該第1領域から約10A/(♂
までの第2領域、及びこれ以上の第3 fil域に分け
られている。= log (I o / + +) / i! og(
Vo /vl) From this equation, it can be seen that α depends on the area in which the current and voltage are measured. Generally, the voltage-current characteristics of ZnO-based varistors are approximately 10-'A/cIa"
The following first fil area, approximately 10A/(♂
It is divided into a second area up to and a third fil area beyond this area.
ところでαは、上記第1〜第3領域すべてにおいて優れ
ていることが望ましいわけであるが、例えば、ZnOに
Bi、Co、Mn、Sb等の酸化物を添加して製造され
たバリスタは、上記第2領域の1〜10mA/cs+”
におけるαは50以上あるのに対して、第3領域の10
〜100 A / cm”では20以下と非常に低い値
となっている。この第3ffl域といわれる高電流領域
でのαが小さいと、制限電圧が高くなり、その結果被保
護回路を異常な高電圧から守る能力に劣るという問題が
あり、この高電流領域でのαの向上が要請されている。By the way, it is desirable that α is excellent in all of the first to third regions, but for example, a varistor manufactured by adding oxides such as Bi, Co, Mn, and Sb to ZnO is 1-10mA/cs+” in the second area
α in the third region is 50 or more, whereas α in the third region is 10 or more.
~100 A/cm", it is a very low value of 20 or less. If α in this high current region called the third ffl region is small, the limiting voltage will become high, and as a result, the protected circuit will be exposed to abnormally high voltages. There is a problem that the ability to protect against voltage is poor, and there is a need to improve α in this high current region.
本発明の目的は、上記高1i流領域でのαに優れたバリ
スタを堤供することにある。An object of the present invention is to provide a varistor with excellent α in the high 1i flow region.
c問題点を解決するための手段〕
本件発明者らは、高電流領域でのαを向上させるために
鋭意検討を重ねたところ、上記第2.第3領域でのαは
、ZnO粒子そのものの抵抗値によって決まることに着
目し、このZnOの抵抗値を変えてやれば、即ち、抵抗
値を小さくできればそれだけαを大きくできることを見
出し、本発明を成したものである。Means for Solving Problem c] The inventors of the present invention have conducted intensive studies to improve α in the high current region, and have found the solution described in the above 2. Focusing on the fact that α in the third region is determined by the resistance value of the ZnO particles themselves, they discovered that by changing the resistance value of ZnO, that is, if the resistance value could be reduced, α could be increased accordingly. It was completed.
そこで本発明は、ZnOに■族から選ばれた元素又はこ
れの酸化物を0.01〜5 so j!%の範囲で添加
して加熱処理して、上記ZnOを半導体化させる第1工
程と、このZnOを粉砕し、これにバリスタとして機能
する副成分を添加して原料粉を作成する第2工程と、こ
の原料粉を所望の形状に成形焼成して焼結体を得る第3
工程とからなることを特徴とするバリスタの製造方法で
ある。Therefore, in the present invention, an element selected from group (1) or an oxide thereof is added to ZnO in an amount of 0.01 to 5 so j! % range and heat treatment to turn the ZnO into a semiconductor, and a second step of pulverizing this ZnO and adding thereto a subcomponent that functions as a varistor to create a raw material powder. The third step is to mold and sinter the raw material powder into a desired shape to obtain a sintered body.
A method of manufacturing a varistor is characterized by comprising the steps of:
ここで、上記■族から選ばれる元素としてはA41、Y
、Ga等があり、これを1種fs1 または複数種類添
加すればよい。Here, the elements selected from the above group (■) are A41, Y
, Ga, etc., and one or more types of these may be added.
また、上記添加量を0.01moj%以上5 gio
n!%以下と規定したのは、添加量が0.01s+o
1%以下ではほとんど半導体化の効果が得られず、また
5 mo 1%を越えるとかえってバリスタ特性を悪化
させるためである。In addition, the above addition amount should be increased to 0.01 moj% or more.
n! % or less is specified when the amount added is 0.01s+o
This is because if it is less than 1%, hardly any effect of semiconductor formation can be obtained, and if it exceeds 5 mo 1%, the varistor characteristics will deteriorate.
さらに本発明のバリスタは、単板状のバリスタ。Furthermore, the varistor of the present invention is a single-plate varistor.
あるいはバリスタ層と内部電極とを交互に積石してなる
積層型バリスタ等が考えられ、特に限定されるものでは
ない。Alternatively, a laminated varistor formed by alternately stacking varistor layers and internal electrodes may be considered, but is not particularly limited.
本発明に係るバリスタの製造方法によれば、第1工程で
、ZnOに■族から選ばれた金属を添加し、これを加熱
処理して半導体化したZnOを得るようにしたので、上
記熱処理時に添加金属がZnoに固溶して該ZnOの抵
抗値を下げることとなる。従って、この半導体化したZ
nOで第2第3工程に沿ってバリスタを製造することに
より、高電流領域でのα債を大幅に向上でき、制限電圧
を低下させてサージ吸収特性に優れたバリスタが得られ
る。According to the method for manufacturing a varistor according to the present invention, in the first step, a metal selected from group ① is added to ZnO, and this is heat-treated to obtain semiconducting ZnO. The additive metal dissolves in ZnO and lowers the resistance value of ZnO. Therefore, this semiconductor Z
By manufacturing a varistor using nO according to the second and third steps, it is possible to significantly improve the α bond in the high current region, reduce the limiting voltage, and obtain a varistor with excellent surge absorption characteristics.
以下、本発明の詳細な説明する。 The present invention will be explained in detail below.
本実施例では、ディスク型バリスタに適用した場合を例
にとって説明する。In this embodiment, a case where the present invention is applied to a disk type varistor will be explained.
第1工程
■ まず、ZnO粉末に、元素の周期表から選択された
An!、Y、Ga、Gd等の金属6あるいはこれらの酸
化物粉末を、0.01mo 1%以上5 ago 1%
以下の範囲内で添加混合する。First step■ First, An! selected from the periodic table of elements is added to ZnO powder. , Y, Ga, Gd and other metals 6 or their oxide powders at 0.01 mo 1% or more 5 ago 1%
Add and mix within the following range.
■ 次に上記混合粉末を1300℃×1時間で加熱処理
する。すると上記金属がZnOに固溶し、該ZnO粉末
を半導体化することとなる。(2) Next, the above mixed powder is heat treated at 1300° C. for 1 hour. Then, the above-mentioned metal becomes a solid solution in ZnO and turns the ZnO powder into a semiconductor.
第2工程
■ 上記半導体化したZnOの仮焼結体を粉砕して、再
度粉末状にする。そしてこのZnO粉末に、バリスタと
して機能する副成分としてのB180、を0.5s+o
j%、MnOを0.5aoj!%、C。2nd Step (2) The semiconducting ZnO pre-sintered body is pulverized and made into powder again. Then, 0.5s+o of B180, which is a subcomponent that functions as a varistor, is added to this ZnO powder.
j%, MnO 0.5 aoj! %,C.
20、を0.5soj!%、Sb富0!を0.7moj
%それぞれ添加した後混合し、さらにこれに有機バイン
ダーを混合してグリーンシートを形成する。20, 0.5soj! %, Sb wealth 0! 0.7moj
% and then mixed, and further mixed with an organic binder to form a green sheet.
第3工程
■ 次に、上記グリーンシートを円板状に打ち抜いて8
.0 φX1.Otのバリスタ素子を形成し、このバリ
スタ素子を空気中にて1100℃×2時間で加熱焼成し
、焼結体を得る。3rd step ■ Next, punch out the green sheet into a disk shape and
.. 0 φX1. A varistor element of Ot is formed, and this varistor element is heated and fired in air at 1100° C. for 2 hours to obtain a sintered body.
■ 最後に、上記焼結体の両主面に、Agペースbを塗
布した後焼き付けて電極を形成し、しかる後リード加工
、デイツプ外装する。これにより本実施例のディスク型
バリスタが製造される。(2) Finally, Ag paste b is applied to both main surfaces of the sintered body and baked to form electrodes, followed by lead processing and dip exterior packaging. In this way, the disk type varistor of this example is manufactured.
このように本実施例の製造方法によれば、ZnOに■族
の金属、酸化金属を添加し、これを加熱処理して半導体
化させたので、ZnOの抵抗値を小さくでき、それだけ
第3領域でのαを向上させることができる。その結果、
被保護回路を異常な高電圧から守るサージ吸収素子とし
ての機能を向上できる。As described above, according to the manufacturing method of this embodiment, since the group (III) metal and metal oxide are added to ZnO and the ZnO is heat-treated to become a semiconductor, the resistance value of ZnO can be reduced, and the third region can be reduced accordingly. α can be improved. the result,
The function as a surge absorption element that protects the protected circuit from abnormal high voltage can be improved.
次に本実施例方法により製造されたバリスタの効果を5
1認するために行った実験について説明する。Next, the effects of the varistor manufactured by the method of this example are as follows.
I will explain the experiment I conducted to confirm this.
この実験は、ZnO粉末に、それぞれA1t’s、Yt
Ox 、Gas o3 、Gdl O,の酸化物粉末
を0.005 moi1%〜10moJI%添加し、こ
れを1300tx1時間加熱して半導体化させて、しか
る後上述した■〜■の製造方法に沿ってバリスタを作成
した。そしてこの各バリスタのV+−a、1〜10mA
での非直線係数α8.及びl〜IOAでの非直線係数α
、を測定した。なお、比較するため半導体化処理を施し
ていないバリスタについても同様の測定を行った。In this experiment, A1t's and Yt's were added to ZnO powder, respectively.
Add 0.005 moi 1% to 10 moJI% of oxide powder of Ox, Gas O3, and GdlO, and heat it at 1300 tx for 1 hour to convert it into a semiconductor, and then manufacture a varistor according to the manufacturing method described in (1) to (3) above. It was created. And V+-a of each varistor, 1 to 10mA
The nonlinear coefficient α8. and the nonlinear coefficient α at l~IOA
, was measured. For comparison, similar measurements were also performed on a varistor that had not been subjected to semiconductor processing.
その結果を表に示す。同表からも明らかなように、上記
各酸化物粉末の添加量が0.005 tsol、%の場
合は高t’a 6i域でのα2が20以下と低くほとん
ど効果が得られていない、また、上記添加量がlO■o
1%の場合はVI6A+ α、及びα2とも悪化してい
る。これに対して、添加量が0.01mo 1%〜5a
+oj!%の範囲の場合は、VImA+ α1とも所
定の値を確保できているとともに、α2がいずれも20
以上得られており、直覚’lJL fin域でのαが優
れていることがわかる。The results are shown in the table. As is clear from the same table, when the amount of each oxide powder added is 0.005 tsol,%, α2 in the high t'a 6i region is as low as 20 or less, and almost no effect is obtained. , the above addition amount is lO■o
In the case of 1%, both VI6A+ α and α2 deteriorated. In contrast, the amount added is 0.01mo 1% to 5a
+oj! % range, both VImA + α1 are able to secure the specified values, and α2 is both 20.
The above results are obtained, and it can be seen that α in the intuition'lJL fin region is excellent.
なお、上記実施例ではディスク型バリスタの製造方法を
例にとって説明したが、本発明は勿論これに限られるも
のではな(、例えばバリスタ層と内部電極とを交互に積
層して一体焼結してなる積層型バリスタにも適用できる
。In the above embodiments, the method for manufacturing a disk-type varistor was explained as an example, but the present invention is of course not limited to this. It can also be applied to multilayer varistors.
以上のように本発明に係るバリスタの製造方法によれば
、ZnOに■族から選ばれた元素又はこれの酸化物を0
.O1〜5 no 12%添加して、これを熱処理する
ことによりZnOを半導体化させたので、高電流領域で
の非直線係数を向上でき、制限電圧を低下できる効果が
ある。As described above, according to the method for manufacturing a varistor according to the present invention, zero of the elements selected from group (1) or their oxides are added to ZnO.
.. Since ZnO is made into a semiconductor by adding 12% of O1-5no and heat-treating it, the nonlinear coefficient in the high current region can be improved and the limiting voltage can be lowered.
Claims (1)
を0.01mol%以上5mol%以下添加して熱処理
することにより上記ZnOを半導体化させる第1工程と
、この半導体化したZnOを粉砕し、これにバリスタと
して機能する副成分を添加して原料粉を作成する第2工
程と、この原料粉を所望の形状に成形した後焼成して焼
結体を得る第3工程とからなることを特徴とするバリス
タの製造方法。1) A first step of converting the ZnO into a semiconductor by adding 0.01 mol% to 5 mol% of an element selected from Group III or an oxide thereof to ZnO and heat-treating the same, and pulverizing the semiconducting ZnO. and a second step in which a subcomponent that functions as a varistor is added to this to create a raw material powder, and a third step in which this raw material powder is molded into a desired shape and then fired to obtain a sintered body. A method for manufacturing a barista characterized by:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63289715A JP2625178B2 (en) | 1988-11-16 | 1988-11-16 | Varistor manufacturing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63289715A JP2625178B2 (en) | 1988-11-16 | 1988-11-16 | Varistor manufacturing method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH02135704A true JPH02135704A (en) | 1990-05-24 |
JP2625178B2 JP2625178B2 (en) | 1997-07-02 |
Family
ID=17746814
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63289715A Expired - Fee Related JP2625178B2 (en) | 1988-11-16 | 1988-11-16 | Varistor manufacturing method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2625178B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010232460A (en) * | 2009-03-27 | 2010-10-14 | Tdk Corp | Voltage nonlinear resistor element and method of manufacturing the same |
JP2011040734A (en) * | 2009-07-17 | 2011-02-24 | Leader Well Technology Co Ltd | Process which produces zinc oxide varistor through two independent procedures for producing zinc oxide varistor |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58122703A (en) * | 1982-01-14 | 1983-07-21 | 株式会社東芝 | Method of producing voltage nonlinear resistor |
-
1988
- 1988-11-16 JP JP63289715A patent/JP2625178B2/en not_active Expired - Fee Related
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58122703A (en) * | 1982-01-14 | 1983-07-21 | 株式会社東芝 | Method of producing voltage nonlinear resistor |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010232460A (en) * | 2009-03-27 | 2010-10-14 | Tdk Corp | Voltage nonlinear resistor element and method of manufacturing the same |
JP2011040734A (en) * | 2009-07-17 | 2011-02-24 | Leader Well Technology Co Ltd | Process which produces zinc oxide varistor through two independent procedures for producing zinc oxide varistor |
Also Published As
Publication number | Publication date |
---|---|
JP2625178B2 (en) | 1997-07-02 |
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