JPH02135656A - High frequency inductive coupling plasma mass spectrometer - Google Patents
High frequency inductive coupling plasma mass spectrometerInfo
- Publication number
- JPH02135656A JPH02135656A JP63288280A JP28828088A JPH02135656A JP H02135656 A JPH02135656 A JP H02135656A JP 63288280 A JP63288280 A JP 63288280A JP 28828088 A JP28828088 A JP 28828088A JP H02135656 A JPH02135656 A JP H02135656A
- Authority
- JP
- Japan
- Prior art keywords
- high frequency
- inductively coupled
- coupled plasma
- induction coil
- cooling water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000008878 coupling Effects 0.000 title abstract 3
- 238000010168 coupling process Methods 0.000 title abstract 3
- 238000005859 coupling reaction Methods 0.000 title abstract 3
- 230000001939 inductive effect Effects 0.000 title abstract 3
- 230000006698 induction Effects 0.000 claims abstract description 22
- 239000000498 cooling water Substances 0.000 claims abstract description 17
- 238000009616 inductively coupled plasma Methods 0.000 claims description 28
- 150000002500 ions Chemical class 0.000 claims description 8
- 230000003287 optical effect Effects 0.000 claims 1
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 10
- 239000007789 gas Substances 0.000 description 6
- 229910052786 argon Inorganic materials 0.000 description 5
- 230000005494 condensation Effects 0.000 description 5
- 238000009833 condensation Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 238000001816 cooling Methods 0.000 description 4
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 238000001514 detection method Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 230000002159 abnormal effect Effects 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000006199 nebulizer Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
Landscapes
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
- Electron Tubes For Measurement (AREA)
Abstract
Description
【発明の詳細な説明】
〈産業上の利用分野〉
本発明は、高周波誘導結合プラズマ質量分析計に係わり
、特に、高周波誘導結合プラズマが点火していないとき
にワークコイルに流れる冷却水量を制限することにより
冷却し過ぎによる結露を防止するようにした高周波誘導
結合プラズマ質量分析計に関する。[Detailed Description of the Invention] <Industrial Application Field> The present invention relates to a high frequency inductively coupled plasma mass spectrometer, and in particular, to a method for limiting the amount of cooling water flowing to a work coil when the high frequency inductively coupled plasma is not ignited. The present invention relates to a high frequency inductively coupled plasma mass spectrometer which prevents dew condensation due to excessive cooling.
〈従来の技術〉
高周波誘導結合プラズマ質量分析計は、高周波誘導結合
プラズマを用いて試料を励起させ、生じたイオンをノズ
ルとスキマーからなるインターフェイスを介して質量分
析計に導いて電気的に検出し該イオン量を精密に測定す
ることにより、試料中の被測定元素を高精度に分析する
ように構成されている。第２図は、このような高周波誘
導結合プラズマ質量分析計の従来例構成説明図である。<Prior art> A high-frequency inductively coupled plasma mass spectrometer uses high-frequency inductively coupled plasma to excite a sample, guide the generated ions to a mass spectrometer through an interface consisting of a nozzle and a skimmer, and electrically detect them. By precisely measuring the amount of ions, the element to be measured in the sample is analyzed with high precision. FIG. 2 is an explanatory diagram of the configuration of a conventional example of such a high frequency inductively coupled plasma mass spectrometer.
この図において、プラズマトーチ１の外室１ｂと最外室
ＩＣにはガス調節器２を介してアルゴンガス供給源３か
らアルゴンガスが供給され、内室１ａには試料槽４内の
試料がネプライザ５で霧化されてのちアルゴンガスによ
って搬入されるようになっている。また、プラズマトー
チ１に巻回された高周波誘導コイル６には高周波電源１
０によって高周波電流が流され、該コイル６の周囲に高
周波磁界（図示せず）が形成されている。一方、ノズル
８とスキマー９に挟まれたフォアチャンバー本体１１内
は、真空ポンプ１２によって例えばＩＴｏｒｒ、に吸引
されている。更に、センターチャンバー１３内にはイオ
ンレンズ１４ａ、１４ｂが設けられると共に、該センタ
ーチャンバー１３の内部は第１油拡散ポンプ１５によっ
て例えば１０−’Ｔｏｒｒ、に吸引され、マスフィルタ
（例えば四重径マスフィルタ）１６を収容しているリア
チャンバー１７内は第２油拡散ポンプ１８によって例え
ば１０″″’Ｔｏｒｒ、に吸引されている。In this figure, argon gas is supplied from an argon gas supply source 3 to an outer chamber 1b and an outermost chamber IC of a plasma torch 1 via a gas regulator 2, and a sample in a sample tank 4 is supplied to an inner chamber 1a through a nebulizer. After being atomized in step 5, it is carried in using argon gas. In addition, a high frequency power source 1 is connected to the high frequency induction coil 6 wound around the plasma torch 1.
0, a high frequency current is caused to flow, and a high frequency magnetic field (not shown) is formed around the coil 6. On the other hand, the inside of the forechamber main body 11 sandwiched between the nozzle 8 and the skimmer 9 is suctioned to, for example, ITorr by a vacuum pump 12. Furthermore, ion lenses 14a and 14b are provided inside the center chamber 13, and the inside of the center chamber 13 is suctioned to, for example, 10-' Torr by the first oil diffusion pump 15, and a mass filter (for example, a quadruple diameter mass The interior of the rear chamber 17 housing the filter 16 is suctioned to, for example, 10''' Torr by a second oil diffusion pump 18.
この状態で上記高周波磁界の近傍でアルゴンガス中に電
子かイオンが植え付けられると、該高周波磁界の作用に
よって瞬時に高周波誘導プラズマ７が生ずる。該プラズ
マ７内のイオンは、ノズル８やスキマー９を経由しての
ちイオンレンズ１４ａ、１４ｂ（若しくはダブレット四
重径レンズ）の間を通って収束され、その後、マスフィ
ルタ１６を通り二次電子増倍管１９に導かれて検出され
、該検出信号が信号処理部２０に送出されて演算・処理
されることによって前記試料中の被測定元素分析値が求
められるようになっている。When electrons or ions are implanted in the argon gas in the vicinity of the high frequency magnetic field in this state, high frequency induced plasma 7 is instantaneously generated by the action of the high frequency magnetic field. The ions in the plasma 7 pass through the nozzle 8 and the skimmer 9, pass between the ion lenses 14a and 14b (or a doublet quadruple diameter lens), are focused, and then pass through the mass filter 16 to increase secondary electrons. The detection signal is guided to a multiplier tube 19 and detected, and the detection signal is sent to a signal processing section 20 where it is calculated and processed, thereby obtaining an analysis value of the element to be measured in the sample.
また、上記高周波誘導コイル６の周辺は第３図に示すよ
うな構成になっており、該コイル６の内部を配管２１ａ
を介して冷却水が供給され配管２１ｂを介して冷却水が
排出されるようになっている。Further, the area around the high frequency induction coil 6 is constructed as shown in FIG. 3, and the inside of the coil 6 is connected to a pipe 21a
Cooling water is supplied through the piping 21b, and is discharged through the piping 21b.
〈発明が解決しようとする問題点〉
然しなから、上記従来例においては、高周波誘導コイル
６に高周波電流が流れ高周波誘導結合プラズマ７が点火
している状態でなくとも高周波誘導コイル６を冷却する
ようになっている。このため、高周波誘導結合プラズマ
７が点火していない状態では高周波誘導コイル６が冷却
され過ぎて結露を生じ、その水滴が原因で異常な放電を
生じて高周波電源が損傷したり水滴によって周囲の金属
が腐蝕されたりするという問題があった。<Problems to be Solved by the Invention> However, in the above conventional example, a high frequency current flows through the high frequency induction coil 6 and the high frequency induction coil 6 is cooled even when the high frequency inductively coupled plasma 7 is not ignited. It looks like this. For this reason, when the high-frequency inductively coupled plasma 7 is not ignited, the high-frequency induction coil 6 is cooled too much and condensation occurs, and the water droplets cause abnormal discharge and damage the high-frequency power supply, and the water droplets may damage surrounding metals. There was a problem that the metal was corroded.
本発明は、かかる従来例の欠点に鋸みてなされものであ
り、その課題は、高周波誘導結合プラズマが点火してい
ないときに高周波誘導コイルに流れる冷却水量を制限す
ることにより冷却し過ぎによる結露を防止するようにし
た高周波誘導結合プラズマ質量分析計を提供することに
ある。The present invention has been made in view of the drawbacks of the conventional example, and its object is to prevent dew condensation due to excessive cooling by limiting the amount of cooling water flowing to the high frequency induction coil when the high frequency inductively coupled plasma is not ignited. An object of the present invention is to provide a high frequency inductively coupled plasma mass spectrometer that prevents the above problems.
〈課題を解決するための手段〉
本発明は、高周波誘導結合プラズマ質量分析計において
、プラズマトーチに巻回された高周波誘導コイル内に冷
却水を供給する配管の途中に、高周波誘導結合プラズマ
の点火と連動して開く開閉電磁弁を設け、前記高周波誘
導結合プラズマの点火時のみ前記配管内に冷却水が流れ
るようにすることにより前記課題を解決したものである
。<Means for Solving the Problems> The present invention provides a high-frequency inductively coupled plasma mass spectrometer in which a high-frequency inductively coupled plasma is ignited in the middle of a pipe that supplies cooling water into a high-frequency induction coil wound around a plasma torch. This problem is solved by providing an on-off solenoid valve that opens in conjunction with the high-frequency inductively coupled plasma so that cooling water flows into the pipe only when the high-frequency inductively coupled plasma is ignited.
〈実施例〉
以下、本発明について図を用いて詳細に説明する。第１
図は本発明実施例の要部構成説明図であり、図中、第３
図と同一記号は同一意味を持たせて使用しここでの重複
説明は省略する。また、２２は配管２１ａ（プラズマト
ーチに巻回された高周波誘導コイル内に冷却水を供給す
る配管）に配設され高周波電源１０からの司令（即ち、
電源ＯＮの出力信号）により高周波誘導結合プラズマ７
の点火と連動して開く開閉電磁弁である。 このような
構成からなる本考案の実施例において、高周波電源１０
がＯＮとなり高周波誘導結合プラズマ７が点火している
状態では高周波誘導結合プラズマ７の点火と連動して開
閉電磁弁２２が開いている。このため、配管２１ａから
導入された冷却水が、開閉電磁弁２２−高周波誘導コイ
ル６−配管２１ｂの経路で流れ、高周波誘導コイル６が
冷却されている。また、高周波電源１０がＯＦＦとなり
高周波誘称結合プラズマ７が消えている状態では、高周
波電源１０からの司令（即ち、電源ＯＦＦの出力信号）
により開閉電磁弁２２が閉じている。このなめ、配管２
１ａから導入された冷却水は、開閉電磁弁２２のため高
周波誘導コイル６に達せず高周波誘導コイル６は冷却さ
れない。<Example> Hereinafter, the present invention will be described in detail using the drawings. 1st
The figure is an explanatory diagram of the main part configuration of the embodiment of the present invention, and in the figure, the third
The same symbols as in the figures are used with the same meaning, and redundant explanation will be omitted here. Further, 22 is disposed in a pipe 21a (a pipe that supplies cooling water into the high-frequency induction coil wound around the plasma torch), and receives commands from the high-frequency power source 10 (i.e.,
High frequency inductively coupled plasma 7
This is a solenoid valve that opens and closes in conjunction with the ignition of the In the embodiment of the present invention having such a configuration, the high frequency power source 10
is turned on and the high frequency inductively coupled plasma 7 is ignited, the opening/closing solenoid valve 22 is opened in conjunction with the ignition of the high frequency inductively coupled plasma 7. Therefore, the cooling water introduced from the pipe 21a flows through the opening/closing electromagnetic valve 22-high frequency induction coil 6-piping 21b, thereby cooling the high frequency induction coil 6. In addition, when the high-frequency power supply 10 is turned off and the high-frequency inductively coupled plasma 7 is extinguished, a command from the high-frequency power supply 10 (that is, an output signal to turn off the power)
The on-off solenoid valve 22 is closed. This lick, piping 2
The cooling water introduced from 1a does not reach the high frequency induction coil 6 because of the opening/closing solenoid valve 22, and the high frequency induction coil 6 is not cooled.
尚、本発明は上述の実施例に限定されることなく種々の
変形が可能であり、例えば、■高周波誘導結合プラズマ
の炎を光ファイバー等で検出し該検出信号に基いて冷却
水を流したり、■高周波誘導コイル付近の温度を検出し
該温度が高いときだけ冷却水を流しなり、■高周波誘導
結合プラズマ質量分析計を制御するソフトウェアに高周
波誘導結合プラズマ点火中に冷却水を流すようにシーケ
ンスを組込んだりしてもよい。It should be noted that the present invention is not limited to the above-mentioned embodiments and can be modified in various ways. ■ Detects the temperature near the high-frequency induction coil and flows the cooling water only when the temperature is high. ■ Creates a sequence in the software that controls the high-frequency inductively coupled plasma mass spectrometer to flow the cooling water during the ignition of the high-frequency inductively coupled plasma. It may also be incorporated.
〈発明の効果〉
以上詳しく説明したような本発明によれば、高周波誘導
結合プラズマが点火していないときに高周波誘導コイル
に流れる冷却水量を制限することにより冷却し過ぎによ
る結露を防止するようにした高周波誘導結合プラズマ質
量分析計が実現する。<Effects of the Invention> According to the present invention as described in detail above, condensation due to excessive cooling can be prevented by limiting the amount of cooling water flowing to the high frequency induction coil when the high frequency inductively coupled plasma is not ignited. A high-frequency inductively coupled plasma mass spectrometer is realized.
また、高周波誘導コイルおよび途中の配管に結露を生じ
ないなめ水滴による電気的障害を起こしたり金属の腐蝕
を起こしなりする問題がなくなるという利点もある。Further, there is an advantage that there is no problem of electrical failure caused by water droplets that do not cause dew condensation on the high frequency induction coil or intermediate piping, or metal corrosion.
第１図は本発明実施例の要部構成説明図、第２図は高周
波誘導結合プラズマ質量分析計の全体的な構成説明図、
第３図は高周波誘導コイルの周辺構成説明図である。
１・・・・・・プラズマトーチ、２・・・・・・流量制
御部、３・・・・・・アルゴンガス供給源、４・・・・
・・試料槽、５・・・・・・ネプライザ、６・・・・・
・高周波誘導コイル、７・・・・・・高周波誘導結合プ
ラズマ、８・・・・・・ノズル、９・・・・・・スキマ
ー １０・・・・・・高周波電源１１・・・・・・フォ
アチャンバー
１３・・・・・・センターチャンバ
１６・・・・・・マスフィルタ、１７・・・・・・リア
チャンバー２０・・・・・・信号処理部、２１ａ、２１
ｂ・・・・・・配管、２２・・・・・・電磁開閉弁
第１図
／、アクスマトー斗
６ 闘ｎ〜隊コ不υ
ヘン３凶
第２図
１？FIG. 1 is an explanatory diagram of the main part configuration of an embodiment of the present invention, FIG. 2 is an explanatory diagram of the overall configuration of a high frequency inductively coupled plasma mass spectrometer,
FIG. 3 is an explanatory diagram of the peripheral configuration of the high frequency induction coil. 1... Plasma torch, 2... Flow rate control unit, 3... Argon gas supply source, 4...
... Sample tank, 5 ... Nepizer, 6 ...
・High frequency induction coil, 7...High frequency inductively coupled plasma, 8...Nozzle, 9...Skimmer 10...High frequency power supply 11... Fore chamber 13... Center chamber 16... Mass filter, 17... Rear chamber 20... Signal processing section, 21a, 21
b... Piping, 22... Solenoid on-off valve Fig. 1/, Axuma Toto 6 Ton~tai Kofu Hen 3 Kofu Fig. 2 1?
Claims (1)
イオンを真空中に導入しイオン光学系を通して質量分析
計検出器に導いて検出することにより試料中の被測定元
素を分析する分析計において、プラズマトーチに巻回さ
れた高周波誘導コイル内に冷却水を供給する配管の途中
に、前記高周波誘導結合プラズマの点火と連動して開く
開閉電磁弁を設け、前記高周波誘導結合プラズマの点火
時のみ前記配管内に冷却水が流れるようにしたことを特
徴とする高周波誘導結合プラズマ質量分析計。In an analyzer that analyzes the element to be measured in a sample by exciting the sample using high-frequency inductively coupled plasma and introducing the generated ions into a vacuum, guiding them through an ion optical system to a mass spectrometer detector and detecting them, plasma An opening/closing electromagnetic valve that opens in conjunction with the ignition of the high frequency inductively coupled plasma is provided in the middle of the piping that supplies cooling water into the high frequency induction coil wound around the torch, and the piping is closed only when the high frequency inductively coupled plasma is ignited. A high-frequency inductively coupled plasma mass spectrometer that is characterized by having cooling water flowing inside it.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63288280A JPH02135656A (en) | 1988-11-15 | 1988-11-15 | High frequency inductive coupling plasma mass spectrometer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63288280A JPH02135656A (en) | 1988-11-15 | 1988-11-15 | High frequency inductive coupling plasma mass spectrometer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02135656A true JPH02135656A (en) | 1990-05-24 |
Family
ID=17728122
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63288280A Pending JPH02135656A (en) | 1988-11-15 | 1988-11-15 | High frequency inductive coupling plasma mass spectrometer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02135656A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010157383A (en) * | 2008-12-26 | 2010-07-15 | Shin-Etsu Chemical Co Ltd | High frequency heat plasma torch for solid synthesis |
-
1988
- 1988-11-15 JP JP63288280A patent/JPH02135656A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010157383A (en) * | 2008-12-26 | 2010-07-15 | Shin-Etsu Chemical Co Ltd | High frequency heat plasma torch for solid synthesis |
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