JPH02131943A - Liquid jet recording head - Google Patents

Abstract

PURPOSE:To provide a recording head having a low cost, high accuracy, high reliability and excellent durability by incorporating specific graft copolymerizable polymer, specific linear polymer, specific epoxy resin, and polymerization initiator for generating Lewis acid by radiating it with active energy beam. CONSTITUTION:Composition contains graft copolymerizable polymer in which branched of chain having a structure unit derived from monomer selected from a group consisting of monomer represented by formulae x and y is added to backbone chain having a structure unit derived from monomer selected from a group consisting of alkylmethacrylate, acrylonitrile and styrene as a main ingredient, its number-average molecular weight is 5000 or more, and its weight- average molecular weight is 50,000 or less, specific linear polymer, epoxy resin containing compound having epoxy group in its molecule, and polymerization initiator for generating Lewis acid by radiating it with active energy beam. In the formulae x and y, R<1> is alkyl group or hydroxyalkyl group, R<2> is alkyl group or acyl group, R<3> is alkyl group or specific phenylalkyl group.

Description

[Detailed Description of the Invention] [Field of Industrial Application] The present invention relates to a liquid jet recording head, specifically, a liquid jet recording head that generates droplets of a recording liquid such as ink and attaches them to a recording material such as paper. The present invention relates to a recording head for generating small particles of recording liquid used in a liquid jet recording method that performs recording.

[Conventional technology]

The liquid jet recording method generates small droplets of recording liquid such as ink and attaches them to a recording material such as paper to perform recording, and the noise generated during recording is extremely small and can be ignored at high speed. It has been described as a recording method that allows recording without the need for special processing such as fixing on paper, and has recently been actively researched into various types.

The recording head section of a recording device used in the liquid jet recording method generally has an orifice (
a liquid passage communicating with the orifice and having a portion where energy for ejecting the recording liquid acts on the recording liquid; and a liquid for storing the recording liquid to be supplied to the liquid passage. It is configured with a chamber.

During recording, the energy for ejecting the recording liquid is generated by a heat generating element placed at a predetermined position in a part (energy application part) that applies ejection energy to the recording liquid, which forms part of the liquid path. In many cases, ejection energy is generated by various types of ejection energy generating elements such as piezoelectric elements.

A method for manufacturing a liquid jet recording head having such a configuration is, for example, to form five fine grooves on a flat plate of glass, metal, etc. by cutting or etching, and then to form other suitable grooves on the flat plate with these grooves. A method including a step of bonding the plates to form a liquid passage, or, for example, forming a groove wall of hardened photosensitive resin on the J, +1, plate on which the ejection energy generating element is arranged by a photolithography process, and forming the substrate. A known method includes forming a groove to serve as a liquid passage in the V plate, and joining another (V) plate (cover) to the thus formed grooved plate to form a liquid passage. (For example, JP-A-57-43878).

Among these methods for manufacturing liquid jet recording heads, the latter method using photosensitive resin allows for fine machining of liquid passages with higher accuracy and higher yield than the aviator's method, and is also easier to mass-produce. The photosensitive resin used for manufacturing such a recording head includes printing plates, printed wiring, etc. For example, dry film has been used for pattern formation, or is known as a photo-curable paint or adhesive used for glass, metal, ceramics, etc. type of resin has been mainly used.

[The invention aims to solve a! ) In a recording head that uses a cured film of a photosensitive resin as part of its structure, in order to obtain excellent characteristics such as advanced recording characteristics, durability, and calendar reliability, the photosensitive resin used must contain ( +) Especially as a cured film, it has excellent adhesion to μ plates, etc. (2) It has excellent mechanical strength and durability when cured, (3) When patterning using pattern exposure It is required to have characteristics such as excellent sensitivity and resolution.

However, there are currently very few photosensitive resins that have been used to form known liquid jet recording heads that satisfy all of the required characteristics listed in F.

For example, photosensitive resins used for recording heads and for pattern formation in printing plates, printed wiring, etc. have excellent sensitivity and resolution;
It has poor adhesion and adhesion to glass, ceramics, plastic films, etc. used as substrates, and also lacks sufficient mechanical strength and durability when cured. Therefore, during the manufacturing stage of the print head or during use, for example, the flow of the print liquid in the liquid passage may be obstructed, or the direction of droplet ejection may be made unstable, resulting in deterioration of the print characteristics. Deformation of the cured resin film and peeling from the substrate, which can significantly impair the reliability of the recording head.
It has the disadvantage of being easily damaged.

On the other hand, known photocuring paints and adhesives used for glass, metals, ceramics, etc. have excellent adhesion and adhesion to substrates made of these materials, and have sufficient mechanical strength when cured. Although it has the advantage of being strong and durable, it is inferior in sensitivity and resolution, requiring higher-intensity exposure equipment and longer exposure operations. Since it is not possible to obtain a high-density pattern, this method has the problem that it is not suitable for use in recording heads that require particularly fine and precise surface processing.

In addition, in the photosensitive resin compositions used for various conventional purposes, various additives such as heterocyclic compounds having the ability to form complexes with metals, or coupling agents, etc. are added to the photosensitive resin. Added to compositions to improve adhesion to metals, etc.
However, this method has a problem in that, over a long period of time, the additives mentioned above cause oxidation of the composition and phenomena such as lrx corrosion.

On the other hand, with the aim of obtaining a cured composition with sufficient adhesion even without the addition of such additives, a polymeric material consisting of a graft co-cross polymer having polar groups in its branch chains was disclosed in Japanese Patent Application Laid-open No. 1-28:1
646. Active energy ray-curable p. +1 The resin composition improves adhesion and improves the durability of the coating film without relying on additives, etc.]
It has 111 points, indicating that it is possible to achieve one goal.

However, in this composition, there still remains the problem that the molecular design of the polymer substance (graft copolymer polymer) is difficult.

That is, in general, while keeping the molecular weight and content of the branch chains constant, the commercial weight average molecular weight of the entire graft co-coalescence is selected over a wide range (approximately 50,000 to 350,000) to obtain the desired molecular size. Synthesizing it is technically difficult.

In other words, in order to improve the development characteristics during pattern formation, i.e., the dissolution rate of uncombined parts, the swelling property of polymerized parts, the sensitivity as a result of drying, the sharpness of the pattern, and the resolution. , the average molecular weight of the polymeric material should not be too small. In graft copolymer polymers, a large number of branch chains with sufficient length to obtain effective adhesion are bonded to a relatively large molecular weight trunk chain, and -1 double chain is used (Y Obtaining homogeneous molecules jJ is difficult with current synthetic techniques due to steric hindrance.

In other words, if the average molecular weight of the polymeric substance is too low, the development characteristics of the pattern-forming material using it, i.e., the dissolution rate of the polymeric part, the swelling property of the polymeric part, and the results of There are certain limitations on the sensitivity, pattern sharpness, and resolution adjustment.

The present invention has been made in view of the problem described in F.The purpose of the present invention is to have 70% adhesion without the addition of additives, excellent development characteristics during pattern formation, and liquid jetting. We use an active energy ray-curable resin composition whose properties can be easily controlled to obtain good properties as a component of the recording head, and it is inexpensive, precise, and highly reliable.
The objective is to provide a recording head with excellent durability.

Another object of the present invention is to provide a liquid jet recording head having a structure in which liquid passages are finely machined with good roughness and high yield.

Another object of the present invention is to provide a liquid jet recording head that is highly reliable and has excellent durability even when it has multiple orifices.

[Means to solve the problem]

The above objects can be achieved by the following invention.

The present invention provides a liquid jet recording head that includes a cured product of an active energy ray-curable resin composition as part of its configuration,
The composition is composed mainly of structural units derived from (A) one or more monomers selected from the group consisting of alkyl methacrylate, acrylonitrile, and styrene (hereinafter referred to as monomer component (2)). At least one monomer (
It is made by adding a branch chain that connects the structural unit derived from the following monomer components (ri), and the average molecular weight of several points is 5,000 or more, and the average molecular weight of several points is 50,000 or less. Graph t4 [combined polymer and R1 R CH,=C...
・(y)0=C-0-R3 -OH [However, Rl represents hydrogen, or an alkyl group or hydroxyalkyl group having 1 to 3 carbon atoms, and R2
represents hydrogen, or an alkyl group or acyl group having 1 to 4 carbon atoms which may have a hydroxy group,
R3 is an alkyl group having 2 to 6 carbon atoms or a halogen-substituted alkyl group, represented by →CH2 piece "-〇1廿CH,i (however, 2≦m+n≦6, n≠0, m≠0) alkyl ether group, (2≦m + n≦4, n=o or m-0
) is a phenyl alkyl group represented by ] (B) Methyl methacrylate, ethyl methacrylate, isobutyl methacrylate, t-butyl methacrylate,
Penzyl methacrylate, acrylonitrile, inbornyl methacrylate, isophonyl acrylate,
Derived from one or more monomers selected from the group consisting of tricyclodecane acrylate, tricyclodecane methacrylate, tricyclodecaneoxyethyl methacrylate, styrene, dimethylaminoethyl methacrylate, and cyclohexyl methacrylate (hereinafter referred to as monomer component ■) At least one monomer (hereinafter referred to as monomer component ■′) selected from the group consisting of the monomer represented by the general formula (x) and the monomer represented by the general formula (y) Monomer component (2) and monomer component (2) may have the same composition or may have different compositions), and have a number average molecular weight of 50,000 or more.
(C) a linear polymer having a weight average molecular weight of 350,000 or less and a glass transition temperature of 60°C or more; and (C) at least one compound having one or more epoxy groups in the molecule. (D) a 1F initiator that generates a Lewis acid upon irradiation with active energy rays.

The liquid jet recording head of the present invention can have a unique configuration as desired, and at least a cured product of the resin composition mentioned above is used as a part of the configuration.

Hereinafter, an example of the liquid jet recording head of the present invention will be described in detail with reference to the drawings.

FIG. 1 shows an example of the liquid jet recording head of the present invention, FIG. 1(a) is a perspective view of its main parts, and FIG.
FIG. 3 is a cross-sectional view taken along line CC in FIG.

This liquid jet recording head basically consists of a substrate 1, a liquid passage wall 311 made of a cured resin film provided on the substrate and patterned into a predetermined shape, and a liquid passage wall 311 laminated on the liquid passage wall. These members include an orifice 9 for ejecting the recording liquid, and a portion that communicates with the orifice and on which energy for ejecting the recording liquid acts on the recording liquid. Liquid passage 6-
2 and a liquid chamber 6-1 for storing recording liquid to be supplied to the liquid passage. Furthermore, a supply pipe IO for supplying recording liquid from the outside of the recording head to the liquid chamber 6-1 is connected to the through hole 8 provided in the cover.

Note that the supply pipe 10 is omitted in FIG. 1(a).

During recording, the energy for ejecting the recording liquid is generated by a heating element or a piezoelectric element disposed at a predetermined position in a part of the liquid passage 6-2 that applies ejection energy to the recording liquid. Wiring (not shown) connected to various types of ejection energy generating elements 2, such as elements f,
The ejection signal is generated by applying an ejection signal as desired via the ejection signal.

The substrate l constituting the recording head of the present invention is made of glass, ceramics, plastic, metal, or the like, and a desired number of generating elements 2 are disposed at predetermined positions. In addition, the first
In the illustrated example, whether two generating elements are provided or the number and arrangement of heating elements are determined as appropriate depending on the predetermined configuration of the recording head.

The cover 7 is made of a flat plate made of glass, ceramics, plastic, metal, etc., and is bonded to the liquid passage wall 3H by fusion bonding or adhesive bonding. A J through hole 8 for connection is provided.

In this recording head, a liquid passage 6-2 and a liquid chamber 6-
The cured resin film patterned into a predetermined shape constituting the wall 3H of 1 is cured with active energy rays containing the above-mentioned components (A) to (D) provided on the substrate 1-L or on the cover 7F. It is obtained by patterning a layer made of a mold resin composition using a photolithography process.

Although an example in which a cured film of the resin composition is used in the structure of the liquid passage wall 3H has been described above, the cured film (cured product) of the resin composition can be suitably used for other parts of the recording head. .

For example, as shown in FIGS. 7(a) to 7(h), which are shown as partial cut-offs of the recording head perpendicular to the liquid path, 1. As a cover 7, (a) 2. (b) as the liquid passage wall 3H and the cover 7 (in this case, the liquid passage wall 3H and the cover 7 may be formed integrally, or may be formed separately and then joined) 3. Liquid passage wall 311 and cover 7 made of various resins, etc.
Adhesion with WIl4 (c), (e) and (g) as 4. (d) and (f) as an adhesive layer l4 between the liquid passage wall 3H and the liquid passage wall 311 and the cover 7; 5. III. (h) can be used as the adhesive layer l4 (two-layer structure) between the body passage wall 311 and the liquid passage wall 311 and the cover 7. In addition, among the above configurations, FIGS. 7(a) to (e). Structure of (h) and Fig. 7(f)
A dry film type can be suitably used to form the liquid passage wall 3■ in FIGS. 7(f) and (
For the adhesive layer l4 in G), a type that is used in a liquid state and then cured is preferably used.

Historically, the recording head of the present invention is shown in FIGS. 8(a) and (b).
It may also have a structure that discharges droplets in a direction perpendicular to the liquid passage (6-2) shown in FIG. 9, in which case, for example, as shown in FIGS. The cured film of the resin composition can be suitably used for the same parts as shown in FIG. 7 above, such as the parts shown in ).

The active energy ray-curable resin composition containing the above-mentioned constituent components (A) to (D) used in the structure of the recording head of the present invention will be described below.

The resin composition has good adhesion to various members such as substrates made of glass, plastic, ceramics, etc., especially when formed into a cured film, and has good resistance to recording liquids such as ink and mechanical strength. Furthermore, it has excellent properties as a component of a liquid jet recording head, such as being able to form a dense, high-resolution pattern by patterning with active energy rays.

Furthermore, this resin composition can be used as a dry film, and the above-mentioned excellent properties are exhibited in that case as well.

In forming the backbone chain of the graft copolymer polymer (A) contained in the resin composition, the monomer component (2) mentioned above is used as the main component.

As monomers used for branch chains, the monomer components mentioned above ■
In addition, the following polar monomers can be used in combination as necessary.

(1) Acrylic monomer containing an amine group or alkylamino group (11) Acrylic or vinyl monomer containing a carboxyl group (III) N-vinylpyrrolitone or its derivative (IV) Vinylpyridine or its derivative Also, a hydrophobic monomer, It can be used as a component of the co-1R combination within a range of about 25 mol% or less F.

For the formation of the kraft covalent polymer (8), for example, as described in [Basics and Applications of Bolimar Alloys] (edited by the Society of Polymer Science, published by Tokyo Kagaku Dojin, 1981), lθ ~ 350, Various conventionally known methods can be used. These methods include ① a chain transfer method, ② a method using radiation, ② an oxidative polymerization method, ② an ion graft polymerization method, and ② a macromonomer method. Using these methods and using the Sennoma Ichi etc. as exemplified above, polymerization conditions were appropriately selected so as to obtain a graft copolymer with a number average molecular weight of 5,000 or more and a weight average molecular weight of 50,000 or less. The graft copolymer polymer (^) can be obtained by polymerization.

Of the methods listed above, method (1) or (141) is particularly preferable because the lengths of the chain branches of the copolymer (A) are made uniform.

The above linear polymer (n) contains 1 monomer component
component, and using the monomer component ■' mentioned above, the number average fraction 'j. 150,000 or more, weight average molecular weight of 350,000 or less, and a glass transition temperature of 60°C or more,
It can be obtained by polymerizing using a conventionally known method while appropriately selecting polymerization conditions. It is preferable to add monomer component (2) in an amount of 5 mol % to 630 mol %. There are 3 monomer components ■′ in the linear polymer.
If the content exceeds 0 mol %, the concentration of polar groups in the cured coating film will increase, and the effect of improving adhesion will not further increase, but water resistance will decrease, which is not preferable. Furthermore, if the monomer component (■') is less than 5 mol%, the effect of improving adhesion and acting as a binder for the coating film will be insufficient.

For the purpose of imparting a high glass transition temperature to the cured product of the resin composition and increasing its water resistance, the above-mentioned monomer component (2) may include methyl methacrylate, isobornyl methacrylate, isobornyl acrylate, tricyclodecane methacrylate, tricyclo Decane acrylate and the like give particularly favorable results.

The epoxy resin (C) consisting of one or more types of compounds containing one or more epoxy groups in one molecule refers to the resin composition of the present invention that is irradiated with active energy rays in the presence of the polymerization initiator (D) described below. In addition to this, the resin composition of the present invention is applied in liquid form onto various supports made of glass, plastics, ceramics, etc., and then cured. When formed as a cured film or used in the form of a dry film adhered to various supports 1-, the cured film made of the resin composition has better adhesion to the support and water resistance. It is a component for imparting chemical resistance, ten-method stability, etc.

As the epoxy resin (C), any epoxy resin can be used without particular limitation as long as it is made of one or more compounds containing one or more epoxy groups in one molecule. However, for example, considering the chemical resistance and mechanical strength of the cured film obtained by curing the resin composition of the present invention, high durability as a structural material, etc., or various patterns made of the cured composition 11q, Considering the workability when forming on a support and the resolution of the formed pattern, it is preferable to use an epoxy resin consisting of one or more compounds containing 2 to 7 epoxy groups in one molecule. .

The above-mentioned epoxy resins containing two or more epoxy groups in one molecule include epoxy resins typified by bisphenol A type, novolak type, and alicyclic type, or bisphenol S, bisphenol F, and tetrahydroxyphenylmethane tetraglycidyl ether. , resorcinol diglycidyl ether, glycerin triglycidyl ether, pentaerythritol triglycidyl ether, isocyanuric acid triglycidyl ether, and epoxyurethane resins represented by the following general formula E (wherein R4 represents an alkyl group or an oxyalkyl group) Examples include mixtures of one or more of polyfunctional epoxy resins such as epoxy resins and stiffeners.

In addition, the following can be mentioned as a specific example of these polyfunctional epoxy resins.

That is, as a bisphenol A type epoxy resin,
For example, Epicote 828, 834, 871, 1
00l, +004 (product name, manufactured by Shell Chemical Co., Ltd.), DE
R:l31-J, 337-J, 661J,
6fi4-J, 667-J (Dow Chemical Company c
A) and Ebicuron 800 (trade name, manufactured by Dainippon Ink & Chemicals Co., Ltd.), etc.: Examples of novolak-type epoxy resins include Ebicoat 152, +54, +72, (trade name, manufactured by Shell Chemical Co., Ltd.), Araldite EPN 1138
(Product name, manufactured by Ciba Geigy), DEII-31,
438 and 439 (trade name, manufactured by Dow Chemical Company), etc.:
As the alicyclic epoxy resin, for example, Araldite C
Y-175, -176, -179, = 182, -18
4, -192 (product name, manufactured by Ciba Gaigine L), Chisson Knox 090, 091, 092, 301, 3
13 (product name, manufactured by Chisso Corporation), Syracure (GY1)
+8Cutl Bi) 6100, 61lO, 6200 and
F. RI. 4090, 4617, 2256, 541
1 (trade name, manufactured by Union-Beit Co., Ltd.) etc.; Polyglycidyl ethers of aliphatic polyhydric alcohols include:
For example, ethylene glycol diglycidyl ether, polyethylene glycol diglycidyl ether, propylene glycol diglycidyl ether, polypropylene glycol diglycidyl ether, neobentyl glycol diglycidyl ether, 1,6-hexanediol diglycidyl ether, glycerin diglycidyl ether,
Trimethylolbroban triglycidyl ether, diglycidyl ether of hydrogenated bisphenol A, 2.2
-Dibromoneopentylene glycoleglycidinoleate, etc.; polyhydric glycidyl ethers derived from aromatic polyhydric alcohols include diglycidyl ether of 2 to 16 mole adduct of alkylene oxide of bisphenol A, bisphenol F alkylene ochinto 2
Diglycidyl ether is an adduct of 2 to 16 moles of alkylene oxide of 5-bisphenol S, and diglycidyl ether is an adduct of 2 to 16 moles of alkylene oxide.

Compounds containing one epoxy group in one molecule include olefin oxide, octylene oxide, butyl glycidyl ether, glycidyl methacrylate, acrylic glycidyl ether, styrene oxide, phenyl glycidyl ether, n-butylphenol glycidyl ether, 3-benta Examples include decylphenyl glycidyl ether, cyclohexane vinyl monoxide, α-binene oxide, glycidyl ester of tert-carboxylic acid, and mixtures thereof.

These monofunctional epoxy resins can be used in conjunction with the multifunctional epoxy resins mentioned above, or by themselves.

The polymerization initiator (D) that generates a Lewis acid upon irradiation with active energy rays is a polymerization initiator (D) that cures the above-mentioned epoxy resin (C) by the action of the Lewis acid and injects active energy rays into the resin composition of the present invention. It is a component for exhibiting sufficient curability with high sensitivity to
Aromatic onium salt compounds having photosensitivity containing elements belonging to Group Vla as shown in Japanese Patent Publication No. 14278/1982, or containing elements belonging to Group Va as shown in Japanese Patent Publication No. 14279/1983 Aromatic onium salt compounds having photosensitivity or aromatic octaronium salts having photosensitivity as disclosed in Japanese Patent Publication No. 14277/1984 can be used. Both of these aromatic onium salt compounds and aromatic halonium salts have the property of curing the epoxy resin (C) by releasing a Lewis acid when irradiated with active energy rays.

The photosensitive aromatic onium salt compounds containing elements belonging to Group Via or Group Va listed in Table 12 are typically the following general compounds. c(l+6). ,(n')b(R8)cX]d"
[MQ. ]-"-"... (II) In the formula C1, 1{6 is a monovalent organic aromatic group, and R7 is a small number of organic aliphatic groups selected from an alkyl group, a cycloalkyl group, and a substituted alkyl group. group, R8 is a polyvalent organic group constituting a heterocyclic or fused ring structure selected from aliphatic groups and aromatic groups, X is Group Vla selected from sulfur, selenium and tellurium, or nitrogen, phosphorus, arsenic, antimony and M, an element belonging to group Va selected from bismuth
represents a metal or semimetal, and Q represents a halogen group, and a is 0 when X is an element belonging to Group Via.
An integer of ~3, if X is an element belonging to Group Va, an integer of 0 to 4, b is an integer of 0 to 2, and C is 0 or 1 if X is an element belonging to Group Via. an integer of 0 to 2 when X is an element belonging to Group Va, f is the valence of M and an integer of 2 to 7, e is an integer greater than f and less than or equal to 8, and a The sum of b and C is 3 when X is an element belonging to group VTa, 4 when X is an element belonging to group Va, and d=e-f). can be mentioned.

In addition, as the photosensitive aromatic octaronium salt, the following general ■: [(rt9). (R”)hxL”[MQ. + do (k-
11..., (m) (In the above formula, R9 is one aromatic organic group, [10 is two aromatic organic groups, respectively, g is an integer of 0 or 2, h is an integer of 0 or 1, the sum of g and h is equal to 2 or the valence of X, i is equal to k-1, and j is an atom of M. is an integer from 2 to 7 equal to the valence, and k is an integer from 1 to 8).

Specific examples of the photosensitive aromatic onium salt compounds containing elements belonging to Group Via or Group Va include photosensitive aromatic onium salts of elements belonging to Group IVa, such as; Examples include photosensitive aromatic salts of elements belonging to Group Va, such as. Further, as specific examples of photosensitive aromatic halonium salts, for example, the polymerization initiator (E) that releases a Lewis acid as described above.
In addition, curing agents such as polyamines, polyamides, acid anhydrides, boron trifluoride monoamine complexes, imidazoles, complexes of imidazole and metal salts, etc., which are generally widely known as curing agents for epoxy resins, can be used as necessary. May be used.

The active energy ray-curable resin composition used for producing the liquid jet recording head of the present invention described above is one that is cured by active energy rays. When using a molecule (B) that has optical marketability and using an active energy ray with a wavelength of 25 Or+m to 450 nm as the active energy line, the molecule (B) has the ability to generate free radicals that can be activated by the action of the active energy ray. It is preferable to add a radical polymerization initiator to the resin composition.

Specific examples of such radical polymerization initiators include benzyl ether. Penzoin alkyl ethers such as henzoin isobutyl ether, penzoin isobutyl ether, benzoin-old-butyl ether, benzoin ethyl ether, and henzoin methyl ether; benzophenone, 4,4'-bis(N,N-ethylamino)
Henzophenones such as penzophenone and penzophenone methyl ether; 2-ethylanthraquinone, 2-t
crt. -Anthraquinones such as butylanthraquinone: Xanthones such as 2,4-dimethylthioxanthone and 2,4-cyisobrobylthioxanthone: 2,2-
Dimethoxy-2-phenylacetophenone, α,α-cyclo-4-phenoxyacetophenone, p-te
rt-butyltolic oral acetophenone, p-te
Acetophenones such as rt-butyl diacetophenone, 2,2-jetoxyacetophenone, and p-dimethylaminoacetophenone; bilphenyl)-2
-Hydroxy-2-methylbroban-1-one (DAROCURE 111B, manufactured by MERCK), 2-Hydroxy-2-methyl-1-phenylbroban-1-
On (Tarocur 1 173 manufactured by Merck@) and the like are preferably used. In addition to these radical polymerization initiators, an amino compound may be added as a photo+1 polymerization accelerator.

Amino compounds used as light market promoters include ethanolamine, ethyl-4-dimethylaminohenzoate, 2-(dimethylamino)ethylhenzoate 1., p
-dimethylaminobenzoic acid n-amyl ester, ρ-dimethylaminobenzoic acid isoamyl ester, and the like.

Next, the blending ratio of each of the above components is appropriately selected depending on the location or purpose of use of the active energy ray-curable resin composition containing these components in the liquid jet recording head of the present invention.

For example, a graft copolymer polymer (A) and a linear polymer f (
The weight ratio with B) is (A):(B)=8040~5
A range of 0.50 is desirable, and within this range, good adhesion based on the graft copolymer polymer and good patterning properties based on the linear polymer can be obtained. The weight ratio of the epoxy resin (C) to the total amount of polymeric substances (A) ÷ (B) is {(A) ÷ (B)): (C) = 100.
A range of 50 to 100:200 is desirable. Photoinitiator (D
) is the sum of the resin (A) + (B) + (C), f (A) + (B) + (C)): (D) = +00
: It is desirable to use in the range of 1 to 100:10.

In addition, when using the above radical polymerization initiator (E) and/or amino compound (F) as a photopolymerization accelerator, the amount added ((E) + (F)) [(E)・0 or (F) ) and 0 are the total stars of Fuuki resin (
A) ” (II) ” ((;) ” (D) for {(A) ÷ (B) + CG> + (D) )
:((1mi)+(F)) =]00:1 -100:1
It is desirable to use it in the range of 0.

Furthermore, the active energy ray-curable resin composition described below may optionally contain a condensation crosslinking catalyst, a thermal synthesis inhibitor,
Even if coloring agents such as dyes and pigments, heat stabilizers such as hydroquinone and para-medoxyphenol, adhesion promoters, extenders such as abrasives, silica and talc, and leveling agents that provide underpainting properties are added. good.

For example, examples of the condensation crosslinking catalyst include sulfonic acids represented by para-toluenesulfonic acid, carboxylic acids such as formic acid, and the like. Examples of the thermal polymerization inhibitor include hydroquinone and its derivatives, paramethoxyphenol, and phenothiazine. As the colorant, oil-soluble dyes and pigments may be added to the extent that they do not substantially prevent the transmission of active energy rays. Fillers include extender pigments, plastic particles, etc., which are commonly used in paints, in order to increase the hardness, color, density, and mechanical strength of the coating film. Examples of adhesion promoters include silane coupling agents as inorganic surface modifiers, low molecular weight surfactants, and the like.

In order to produce the liquid jet recording head of the present invention, when using the above active energy ray-curable resin composition in the form of a solution or when forming it into a dry film, the resin composition is applied to a plastic film that is a film base material. Examples of solvents used for coating on such surfaces include hydrophilic solvents such as alcohols, glycol compounds, and glycol esters. Of course, these hydrophilic solvents are
and ketones such as methyl ethyl ketone and methyl isobutyl ketone, esters such as ethyl acetate and isobutyl acetate, aromatic hydrocarbons such as toluene and xylene and their halogen substituted products, methylene chloride,
It is also possible to use an appropriate mixture of a chlorine-containing aliphatic solvent such as 1,1.1-trichloroethane. Incidentally, these solvents can also be used as a developer for the resin composition.

When producing the liquid jet recording head of the present invention, the resin composition can be used to form a cured layer on a substrate or the like by a conventional method.

For example, (1) When forming a layer consisting of a cured coating film on a substrate, etc.: Applying a liquid active energy ray-curable resin composition -E to form a liquid coating film on a substrate, etc. and then evaporated to dryness. Then, the obtained dry coating film is cured by irradiating active energy rays to form a layer consisting of a cured coating film.

(2) In the case of forming a layer consisting of a cured coating film in the shape of a desired pattern on a substrate, etc. (Part 1) etc. and subsequently evaporated to dryness. Then, by scanning the layer consisting of the dried coating film with a laser beam in a desired pattern, and removing the unexposed areas with a suitable solvent such as 1.1. Form a cured coating layer.

(3) When forming a layer consisting of a cured coating film in a desired pattern shape on a substrate, etc. (Part 2): A liquid coating film is formed by applying the active energy ray-curable resin composition in liquid form onto a substrate, etc. and subsequently evaporated to dryness. A photomask having a pattern of a desired shape through which active energy rays do not pass is superimposed on the layer made of the obtained dry coating film, and the photomask is exposed to active energy rays from above. Then, the unexposed areas are removed using a suitable solvent such as 1.1, i-trichloroethane, and a layer of a cured coating film having a desired pattern shape is formed on the base plate or the like.

(1) When forming a photosensitive dry film and laminating the dry film on a substrate, etc.: Apply liquid active energy ray-curable resin to the polyethylene terephthalate film 12 to form a liquid film. and then evaporation drying to obtain a photosensitive tri-film on the polyethylene terephthalate film. The dry film is laminated on a board, etc. by a normal lamination method to obtain a laminate.Then, the photosensitive dry film laminated on the substrate, etc. is processed in the same manner as in method (1) above. It is cured by irradiation with active energy rays.

When it is desired to form a cured photosensitive film into a desired pattern, the dry film laminated on the support is treated in the same manner as method (2) or (3) above.

The active energy ray-curable resin composition has the general formula (x)
When containing a monomer represented by
It is desirable to carry out condensation curing by heat treatment at a temperature of 0.000C.

In the process of manufacturing the liquid jet recording head of the present invention, the active energy rays used for curing the active energy ray-curable resin composition or pattern exposure of the resin composition are ultraviolet rays, which have already been widely put into practical use. Another example is an electron beam. As an ultraviolet light source, wavelength 2
Examples include high-pressure mercury lamps, ultra-high-pressure mercury lamps, and metal halide lamps that contain a lot of light of 50 nm to 450 r+m.
The intensity of light near 5 nm is 1 mW/c+n2~IOO
A power of about mW/cm2 is preferable. The electron beam irradiation device is not particularly limited, but devices having a dose in the range of 0.5 to 20 M Rad are practically used.

Hereinafter, a method for manufacturing a liquid jet recording head of the present invention will be described with reference to the drawings, taking as an example a case in which the liquid passage wall 311 is formed using a cured film obtained from a dry film type resin composition L.

FIGS. 2 to 6 are schematic diagrams for explaining the manufacturing procedure of the liquid jet recording head of the present invention.

In order to form the liquid jet recording head of the present invention, first, as shown in FIG. The number of pieces will be placed. In addition, for the purpose of imparting resistance to recording liquid, electrical insulation, etc. to the surface of the substrate 1, if necessary, the surface is coated with Sin2, T.
A205, a protective layer such as glass may be coated. Further, although not shown, an electrode for recording signal manually is connected to the ejection energy generating element 2.

Next, after cleaning the surface of the substrate 1 obtained through the process shown in FIG. 2 and drying it at, for example, 80 to 150°C, as shown in FIGS. 3(a) and 3(b), Active energy ray-curable resin composition 3 of dry film type (film thickness, approximately 20-1 to 200-1) as described above was added to 40-1
Heating to about 30℃, e.g. 0.5 to 0.4 f/m
in. The substrate surface IA7 is laminated at a speed of 1 to 3 Kg/cm2 under pressure conditions.

Subsequently, as shown in FIG. 4, a photomask 4 having a pattern 4P of a predetermined shape that does not transmit active energy rays is superimposed on the dry film layer 3 provided on the substrate IA. Exposure is performed from the top of the mask 4.

Note that the alignment between the photomask 4 and the substrate 1 is performed so that the element 2 is located in the liquid passage area that is finally formed through steps such as exposure and development. This can be carried out by drawing marks on each of the substrate 1 and the mask 4 in advance and aligning them according to the marks.

When exposed in this way, the area other than the area covered by the pattern, that is, the exposed area of the dry film layer 3, polymerizes and hardens, and the unexposed area remains solvent soluble, whereas the solvent Becomes insoluble.

The active energy rays used for this pattern exposure are:
Depending on the types of components of the above-mentioned active energy ray-curable composition, a suitable one may be selected and used from conventionally known active energy rays. Specifically, for example, high-pressure mercury lamps, ultra-high pressure Mercury lamp, metal halide lamp,
Examples include carbon arc lamps and electron beams.

For example, as an ultraviolet light source, the wavelength is 250 nm to 450 nm.
Examples include high-pressure mercury lamps, ultra-high pressure mercury lamps, metal halide lamps, etc. that contain a lot of nm light, and the intensity of light in the vicinity of 365 nm is 1 mW/cm2 to 100 mW/cm2 at a practically acceptable distance between the irradiated objects. It is preferable that the degree of The electron beam irradiation device is not particularly limited, but a device having a wire meter in the range of 0.5 to 20 M Rad is practically suitable.

After completing the pattern exposure of the dry film layer 3, next, the exposed dry film 3 is
The film is developed by immersion in a volatile organic solvent such as 1-lychloroethane, and the unpolymerized (uncured) portion of the solvent-soluble dry film layer 3 is dissolved and removed from the substrate 1.
As shown in FIGS. 5(a) and 5(b), the cured resin film 311 remaining on the substrate 1 forms grooves that will eventually become the liquid passage 6-2 and the liquid chamber 6-1.

Next, the cured resin film 3H on the substrate 1 is heated to at least 80°C.
Heat polymerization by heating at the above temperature for about 10 minutes to 3 hours. Note that when a thermosetting graft copolymer polymer is used in the resin composition 3, the heat treatment temperature is at least 100° C. for about 5 to 60 minutes.

In the recording head of this example, an example is described in which a dry film type resin composition, that is, a solid material is used to form the grooves that will become the liquid passage 6-2 and the liquid chamber 6-1. However, the active energy ray-curable resin composition that can be used in forming the recording head of the present invention is not limited to solid ones, and of course liquid ones can also be used.

J. Examples of methods for forming a layer made of a liquid resin composition on a Ti plate include a method using a squeegee, which is used when creating a relief image; Examples include a method in which a wall of a corresponding height is provided around the substrate and excess resin composition is removed using a squeegee. In this case, the appropriate viscosity of the resin composition is loocp to 3000 cp.

Further, the height of the wall placed around the substrate must be determined in consideration of the amount of weight loss due to evaporation of the solvent contained in the photosensitive resin composition.

In addition, when using a solid resin composition, the method of attaching a dry film to the substrate by heat-pressing as described above is suitable.

However, when forming the recording head of the present invention, a solid film type recording head is convenient in terms of handling and the fact that the thickness can be easily and accurately controlled.

After forming the grooves that will finally constitute the liquid passage 6-2 and the liquid chamber 6-1 using the cured resin film 311 in this way, as shown in FIGS. 6(a) and 6(b), , the flat plate 7 that covers the groove is bonded to the cured resin film 3H with adhesive;
Form a zygote.

In the steps shown in FIG. 6(a) and FIG. 6(b),
A specific method for attaching the cover 7 is, for example, after coating the flat plate 7 of glass, ceramic, metal, plastic, etc. with an epoxy resin adhesive to a thickness of 3 to 4 μm,
The adhesive layer is preheated to form a so-called B-stacy,
There is a method such as laminating this onto a cured dry film 3+1 and then curing the adhesive layer. A method that does not use an adhesive may also be used, such as directly heat-sealing the film on the surface of the film for 3 days.

Further, a resin layer made of the resin composition for forming a cured resin film according to the present invention is provided on the side of the cover 7 that is joined to the liquid passage, and this is heat-sealed to the cured resin film 3H forming the liquid passage. Also preferable is a method in which active energy rays are irradiated and heated afterwards, that is, a method in which the resin composition for forming a cured resin film of the present invention is used as an adhesive.

In FIG. 6, 6-1 is a liquid chamber, 6-2 is a liquid passage, and 8 is a supply pipe for supplying recording liquid from the outside of the recording head (not shown) to the inside of the recording head. (not shown).

In this way, the resin cured film 31 provided on the substrate 1
1 and the flat plate 7, this joined body is moved to the C-CI.1 on the downstream side of the liquid passage 6-2 shown in FIGS. : Cut along the cut surface to form an orifice for discharging the recording liquid, which is the opening of the liquid passage on the cut surface.

This ball size is determined by the ejection energy generating element f2 and the orifice 9.
This is done to normalize the distance between the two, and the area to be cut here is selected as appropriate.

For this cutting, a dicing method or the like commonly employed in the semiconductor industry can be employed.

Note that the downstream part of the liquid path in the present invention refers to the downstream region in the flow direction of the recording liquid when recording is performed using a recording head, specifically, the installation position of the ejection energy generating element 2. Refers to the part of the liquid passage further downstream.

Once cutting is complete, the cut surface is polished and smoothed.
A supply pipe 10 is attached to the through hole 8 to complete a liquid jet recording head as shown in FIG.

In addition, in the example explained above, the resin cured film 31 is formed on the substrate 1.
After forming the cover 7, the cover 7 was joined to the cover 7.
It is also possible to form a cured resin film 3 on the side and then bond it to the substrate 1. Further, the liquid passage 6-2 and the liquid chamber 6-1 may be formed separately.

〔Example〕

Hereinafter, the present invention will be explained in more detail with reference to Synthesis Examples and Examples.

Synthesis Example 1 The following components were prepared as components constituting the active energy ray-curable resin composition used for producing the liquid jet recording head of the present invention.

Grafting'' 12 (■Ima Taka no-82-), 80 parts by weight of droxyethyl methacrylate, 20 parts by weight of butyl acrylate, thioglycolic acid as a chain transfer agent, azobisisobutylnitrile as an initiator, and a radical Chain transfer polymerization was performed to obtain an oligomer with a carboxy group at the end.

By reacting this oligomer with glycidyl methacrylate, a macromonomer having a methacryloyl group at one end of the molecular chain was obtained.

The number average molecular weight of this macromonomer by GPC method is:
It was about 3,000. 30 parts by weight of this macromonomer and 70 parts by weight of methyl methacrylate were solution polymerized in a methyl cellosolve solvent to obtain a graft copolymer having a weight average molecular weight of about 40,000 and a number average molecular weight of about 5,500. Obtained.

■ A linear acrylic polymer obtained by polymerizing methyl methacrylate. The number average molecular weight is about 70,000, and the weight average molecular weight is about 250,000.

and above average/Shitane μ) l). Epicoat 1001 (bisphenol A type epoxy resin manufactured by Yuka Shell Epoxy ■, epoxy equivalent 450-500) 2). Epicoat 152 (cresol noholac type epoxy resin manufactured by Yuka Shell Epoxy ■, epoxy equivalent: 172 to 179) 3), Celoxide 2021 (alicyclic type epoxy resin manufactured by Daicel Chemical ■, epoxy equivalent: 128 to 14)
5) Bis-[4-(diphenylsulfonio)phenyl]sulfide bis-hexafluoroantimonate shown in the structure 2〇) Next, the above materials are shown below. A liquid active energy ray-curable resin composition was obtained by mixing at a commercially available ratio.

Material Part by weight (A50 (B50 (C -1 50 ((:) -2 20 (C -3
30 (D 10 Toluene 100 Methyl cellosolve 200 Example 1 Using the liquid active energy ray-curable resin composition obtained in Synthesis Example 1, the steps of FIGS. 1 to 6 described earlier in the specification were carried out. , IO heating elements [hafnium boride (l1fB2)] as ejection energy generating elements and orifices provided corresponding to the heating elements (orifice dimensions: 80μ x 50μ1, arrangement pitch 0.130 m)
m) of the type shown in Figure 7(f)}
' An IFF liquid jet recording head was created as follows. In addition, the recording head has the same shape as each 30
I made a prototype for each individual.

First, a plurality of heating elements were arranged at predetermined positions on a substrate made of silicon, and quasi-poles for applying a recording signal were connected to them.

Next, a SiO2 layer (J-thickness 1.0.) is provided as a protective film on the surface of the substrate on which the heating element is disposed, and after cleaning and drying the surface of the protective layer, the surface of the protective layer is Synthesis example 1
The liquid active energy ray-curable resin composition obtained in
Coating is performed using a roll coater, and the resulting coating layer is coated with i
The film was dried with hot air at 0°C for 15 minutes to obtain a dry coated film layer of about 50 - of film J7.

Next, a photomask having a pattern corresponding to the shape of the liquid passage and the liquid chamber is superimposed on the dry coating layer,
After aligning and vacuum-adhering the above-mentioned element so that it is installed in the liquid path that is finally formed, the maximum irradiation energy is 100 mVI/
Exposure was performed for 60 seconds under a cffi2 high pressure mercury lamp.

After exposure, the dried coating layer was heated with Eterna NU at 35°C for 6
The unpolymerized (uncured) portion of the dried coating film layer is dissolved and removed from the substrate by a spray development process for 0 seconds, and the wall made of the cured coating film remaining on the substrate finally forms a liquid passage and a liquid chamber. A groove was formed.

After the development process, apply IOJ/cn to the cured coating film on the substrate.
Post-exposure with +2 UV light and further at 150°C:
Heat treatment was performed for 10 minutes.

In this way, after grooves that serve as liquid passages and liquid chambers are formed on the substrate using walls made of a cured coating film, a flat plate (top plate) with through holes made of soda glass is formed to cover the formed grooves. , apply the liquid active energy ray-curable resin composition obtained in Synthesis Example 1 using a roll coater,
The obtained coating layer was dried with hot air at 80° C. for 5 minutes to obtain a dry coating layer with a thickness of 3 μm.

Next, the top plate is aligned and pressure bonded from the dry coating film layer side to the wall made of the cured coating film on the substrate obtained earlier, and then the top plate is attached to the dry coating film layer from the top plate side (501!). lW/crn2,
Ultraviolet irradiation was performed for 60 seconds.

Next, the distance is 0.150 m from the downstream side of the liquid passage of the bonded body, that is, from the installation position of the ejection energy generating element.
A commercially available dicing saw (product name: DAD 2H/B type, DISCO
An orifice for discharging the recording liquid was formed by cutting the plate using an orifice (manufactured by Co., Ltd.).

Finally, the cut surface was cleaned and dried, and the cut surface was polished to make it smooth, and a recording liquid supply pipe was attached to the through hole to complete the liquid jet recording head. The resulting recording heads all had liquid passages and liquid chambers that faithfully reproduced the mask pattern, and had excellent dimensional accuracy. By the way, the orifice dimensions are 80±5pX50±5
−, the orifice bitch was in the range of 130±5 scales.

The quality and durability of the thus prototyped recording head during long-term use were tested as follows.

First, the obtained recording head was subjected to a durability test in which it was immersed in a recording liquid having the following compositions at 60° C. for 1000 hours (environmental conditions comparable to those during long-term use of the recording head).

Recording liquid component 1) H,0/diethylene glycol/1,3-dimethyl-2-imidazolidinone/C. I. Direct Blue 86'' (-57/30/10/3 parts by weight) pH-8.02)
}120/diethylene glycol/N-methyl-2-
Pyrrolidone/G. I. Direct Black 154” (
・55/30/10/5 parts by weight) pH-9.0: ])
H20/diethylene glycol/polyethylene glycol@400/N-methyl-2-pyrrolidone/C. I
．． Direct Yellow 8693 (-65/10/10/10/5 parts by weight) pH-7.
04) I120 / ethylene glycol / triethylene glycol / triethylene glycol monomethyl ether / C.I. I. Hood black 2m4 (-67/IO/
15/5/3 parts by weight) pH~10.0 Note) 11~
94 is a water-soluble dye, and caustic soda was used to adjust the pH.

After the durability test, we observed the state of bonding between the substrate and the cured dry film film for each head that underwent the test. As a result, no peeling or damage was observed in any of the recording heads, indicating good adhesion. .

Separately, each of the 10 recording heads obtained was attached to a recording device, and a 10' pulse recording signal was continuously applied to the recording head for 14 hours using a surface recording liquid. A printing test was conducted in which printing was performed using

With respect to any of the recording heads, almost no deterioration in performance was observed in both recording liquid ejection performance and printing condition immediately after printing started and after 14 hours had elapsed, indicating that the recording heads had excellent durability.

〔Effect of the invention〕

As explained above, the active energy ray-curable resin composition used in the structure of the liquid jet recording head of the present invention is
Since the graft copolymer polymer (A) is used as a constituent component, it has sufficient adhesion to various members without the addition of additives, etc., and the linear polymer (B) is used as a constituent component. Since it is contained as a compound, it has excellent development characteristics during pattern formation. Also,
At the same time, the cured film has sufficient chemical resistance, durability, etc.

Furthermore, since the composition uses a graft copolymer polymer and a linear polymer in combination as its constituent polymer substances, only the graft copolymer polymer is used as the polymer substance. With less active energy ray irradiation than in the case of the conventional method, the developer becomes solvent resistant to the developer. As a result, the properties of the patterning process, such as high sensitivity, increased resolution, and ability to form patterns regardless of the type or condition of the member, are improved, and the range of work conditions is expanded.

Therefore, by using the cured product of the composition as a part of its structure, the recording head of the present invention is inexpensive, precise, highly reliable, and has excellent durability. Further, if the liquid passage wall is formed of a cured film of the composition, a recording head having a finely machined liquid passage with high precision and high yield can be obtained.

Furthermore, since the recording head of the present invention has the above-described configuration, it has high reliability and excellent durability even when it is configured with multiple orifices.

[Brief explanation of drawings]

FIGS. 1 to M6 are schematic diagrams for explaining the liquid jet recording head of the present invention and its manufacturing method, and FIGS.
Figure O is a partial cross-sectional view taken in a plane perpendicular to the liquid path of the recording head, showing the portion where the cured resin film is used, and Figures 8 (a) and (b).
) and FIG. 9 are diagrams showing other configurations of the recording head. 12 substrates 2: Discharge energy generating element 3: Resin layer 311: Cured resin film (liquid passage wall) 4: Old photomask): Mask pattern 6-1 = Liquid chamber 6-2 = Liquid passage 7: Cover B, tjr Through hole 9: Orifice 0: Supply pipe! Two electrodes 2: -F section protective layer 3: heating resistance layer 4: adhesive layer

Claims (1)

[Scope of Claims] 1) A liquid jet recording head having a cured product of an active energy ray-curable resin composition as part of its structure, wherein the composition comprises (A) alkyl methacrylate, acrylonitrile, and styrene. A backbone mainly consisting of a structural unit derived from one or more monomers selected from the group consisting of a monomer represented by the following general formula (x) and a monomer represented by the following general formula (y). A graft copolymer polymer having a branched chain having a structural unit derived from at least one monomer derived from the above, and having a number average molecular weight of 5,000 or more and a weight average molecular weight of 50,000 or less; , chemical formulas, tables, etc.▼...(x) ▲Mathematical formulas, chemical formulas, tables, etc.▼...(y) [However, R^1 is hydrogen or has 1 to 3 carbon atoms.
represents an alkyl group or a hydroxyalkyl group, R
^2 represents hydrogen, or an alkyl group or acyl group having 1 to 4 carbon atoms which may have a hydroxy group, and R^3 represents an alkyl group having 2 to 6 carbon atoms, or a halogen-substituted alkyl group. Alkyl groups, ▲There are mathematical formulas, chemical formulas, tables, etc.▼ (However, 2≦m+n≦6, n≠0, m≠0) Alkyl ether groups, ▲There are mathematical formulas, chemical formulas, tables, etc.▼ (However, 2≦m+n≦4, including cases where n=0 or m=0). ] (B) Methyl methacrylate, ethyl methacrylate, isobutyl methacrylate, t-butyl methacrylate,
Benzyl methacrylate, acrylonitrile, isobornyl methacrylate, isobornyl acrylate,
Having a structural unit derived from one or more monomers selected from the group consisting of tricyclodecane acrylate, tricyclodecane methacrylate, tricyclodecaneoxyethyl methacrylate, styrene, dimethylaminoethyl methacrylate, and cyclohexyl methacrylate,
and has a structural unit derived from at least one monomer selected from the group consisting of monomers represented by the general formula (x) and the general formula (y), and has a number average molecular weight of 50,000 or more, and has a weight (C) an epoxy resin comprising at least one compound having one or more epoxy groups in the molecule; (D) A liquid jet recording head comprising: (D) a polymerization initiator that generates a Lewis acid upon irradiation with active energy rays. 2) The weight ratio of the graft copolymer polymer (A) and the linear polymer (B) is (A):(B)=80:20 to 50.
2. The liquid jet recording head according to claim 1, wherein: :50. 3) The weight ratio of the total weight (A) + (B) of the graft copolymer polymer (A) and the linear polymer (B) to the epoxy resin (C) is {(A) + (B)} :(C)=10
3. The liquid jet recording head according to claim 1, wherein the ratio is 0:50 to 100:200. 4) Total weight (A) of the graft copolymer polymer (A), the linear polymer (B), and the epoxy resin (C)
The weight ratio of +(B)+(C) and the polymerization initiator (D) is {(
A)+(B)+(C)}:(D)=100:1-100
The liquid jet recording head according to any one of claims 1 to 3, wherein: :10. 5) The polymerization initiator (D) is one selected from the group consisting of aromatic halonium salt compounds and photosensitive aromatic onium salt compounds containing elements belonging to Group VIa or Group Va of the periodic table. The liquid jet recording head according to any one of claims 1 to 4, which is the above.