JPH02126528A - Semiconductor integrated circuit - Google Patents

Semiconductor integrated circuit

Info

Publication number
JPH02126528A
JPH02126528A JP27976888A JP27976888A JPH02126528A JP H02126528 A JPH02126528 A JP H02126528A JP 27976888 A JP27976888 A JP 27976888A JP 27976888 A JP27976888 A JP 27976888A JP H02126528 A JPH02126528 A JP H02126528A
Authority
JP
Japan
Prior art keywords
conductor
thermal expansion
movable part
movable
wiring layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP27976888A
Other languages
Japanese (ja)
Inventor
Atsuya Ooishi
大石 篤哉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP27976888A priority Critical patent/JPH02126528A/en
Publication of JPH02126528A publication Critical patent/JPH02126528A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01HELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
    • H01H1/00Contacts
    • H01H1/0036Switches making use of microelectromechanical systems [MEMS]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01HELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
    • H01H37/00Thermally-actuated switches
    • H01H2037/008Micromechanical switches operated thermally
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01HELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
    • H01H37/00Thermally-actuated switches
    • H01H37/02Details
    • H01H37/32Thermally-sensitive members
    • H01H37/52Thermally-sensitive members actuated due to deflection of bimetallic element

Landscapes

  • Thermally Actuated Switches (AREA)
  • Semiconductor Integrated Circuits (AREA)

Abstract

PURPOSE:To eliminate a limit to an applicable scope and prevent an influence on other circuits by using such a structure that at least one wiring layer is film in two layers made up of conductors whose thermal expansion coefficients are different and a part of the film is movable and the conductor of another wiring layer is exposed at an upper part or a lower part of at least one portion of the movable part. CONSTITUTION:A part of a conductor layer made up of a high thermal expansion conductor 13 and a low thermal expansion conductor 12 formed on a semiconductor substrate 11 is a movable part 15, and at the upper part thereof, the conductor 14 of another wiring layer is exposed. The low thermal expansion conductor 22 and the high thermal expansion conductor 23 are different in thermal expansion coefficient, so that a movable part 25 moves up and down depending on a temperature change. A switching movement occurs between the movable part 25 and a conductor 24 by heating or cooling a conductor including the movable part 25. Thereby, it is possible to cause a nonelectric switching movement; and this is applicable to any portion in the circuit, and also can realize such a switch that no influence is exerted on any other circuits.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は半導体集積回路装置用スイッチに関し、特にメ
カニカルスイッチに関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a switch for a semiconductor integrated circuit device, and particularly to a mechanical switch.

〔従来の技術〕[Conventional technology]

従来、この種の半導体集積回路装置用スイッチは、複数
のトランジスタや抵抗を用いた電子回路によっていた。
Conventionally, this type of switch for a semiconductor integrated circuit device has been made up of an electronic circuit using a plurality of transistors and resistors.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

上述した従来の半導体集積回路装置用り1インチは電子
回路で構成しているため、適用範囲が制限されると共に
スイッチング動作以外の影唇を本来の回路に与えてしま
うという欠点がある。
Since the above-mentioned conventional 1-inch semiconductor integrated circuit device is composed of electronic circuits, it has the disadvantage that its applicable range is limited and that it affects the original circuit other than the switching operation.

〔課題を解決するための手段〕[Means to solve the problem]

本発明の半導体集積回路装置用スイッチは、多層配線構
造を有する半導体集積回路装置において、少なくとも1
つの配線層が熱膨張率の異なる導体からなる二層膜であ
りかつその一部が可動であり、その可動部の少なくとも
一部分の上部または下部に別の配線層の導体が露出して
いるという構造を有している。
The switch for a semiconductor integrated circuit device of the present invention is a semiconductor integrated circuit device having a multilayer wiring structure.
A structure in which one wiring layer is a two-layer film consisting of conductors with different coefficients of thermal expansion, a part of which is movable, and a conductor of another wiring layer is exposed above or below at least a part of the movable part. have.

〔実施例〕〔Example〕

次に本発明について図面を参照して説明する。 Next, the present invention will be explained with reference to the drawings.

第1図は本発明の一実施例の断面図である。多層配線構
造を有する半導体集積回路装置において半導体基板11
上に形成した高熱膨張導体13と低熱膨張導体12から
なる導体層はその一部分が可動部15となっており、そ
の上部には別の配線層の導体14が露出している。高熱
膨張導体13とし1μm厚のA、f2膜低熱膨張導体1
2として1μm厚のCr膜を用い、導体14は2μm厚
のAf!膜を用いた。配線層間膜は誘電体であり可動部
15は等方性ドライエッチで作成した。
FIG. 1 is a sectional view of an embodiment of the present invention. In a semiconductor integrated circuit device having a multilayer wiring structure, a semiconductor substrate 11
A part of the conductor layer formed on the top formed of the high thermal expansion conductor 13 and the low thermal expansion conductor 12 becomes the movable part 15, and the conductor 14 of another wiring layer is exposed above the movable part 15. High thermal expansion conductor 13 and 1 μm thick A, f2 film low thermal expansion conductor 1
2 is a 1 μm thick Cr film, and the conductor 14 is a 2 μm thick Af! film. A membrane was used. The wiring interlayer film was a dielectric material, and the movable part 15 was created by isotropic dry etching.

第2図を用いて動作を説明する。低熱膨張導体22と高
熱膨張導体23は熱膨張率−一が異なI  Δす るため温度により可動部25が上下する。可動部25を
含む導体を加熱・冷却することにより可動部25と導体
24の間でスイッチング動作する。
The operation will be explained using FIG. Since the low thermal expansion conductor 22 and the high thermal expansion conductor 23 have different coefficients of thermal expansion IΔ, the movable part 25 moves up and down depending on the temperature. By heating and cooling the conductor including the movable part 25, a switching operation is performed between the movable part 25 and the conductor 24.

第3図は本発明の実施例2の断面図である。多層配線構
造を有する半導体集積回路装置において半導体基板31
上に形成した高熱膨張導体35と低熱膨張導体34の2
層からなる導体層と高熱膨張導体32と低熱膨張導体3
3の2層からなる導体層がそれぞれ可動部36と可動部
37を有している。熱が加わると可動部36は上方へ、
可動部37は下方へ動く可動部間の距離を単一の可動部
の可動距離以上に広く設定することにより、それぞれの
可動部が共に動作したときのみスイッチが○Nの状態に
なり、一種のAND動作をする。
FIG. 3 is a sectional view of Example 2 of the present invention. In a semiconductor integrated circuit device having a multilayer wiring structure, a semiconductor substrate 31
2 of the high thermal expansion conductor 35 and the low thermal expansion conductor 34 formed above.
A conductor layer consisting of a high thermal expansion conductor 32 and a low thermal expansion conductor 3
Each of the two conductor layers of No. 3 has a movable portion 36 and a movable portion 37. When heat is applied, the movable part 36 moves upward,
In the movable part 37, by setting the distance between the movable parts that move downward to be wider than the movable distance of a single movable part, the switch is in the ○N state only when each movable part operates together, a kind of Performs an AND operation.

〔発明の効果〕〔Effect of the invention〕

以上説明したように本発明は可動二層膜を用いることに
より非電気的なスイッチング動作が可能になり、回路中
のいかなる部分にも適用可能でしかも他の回路には全く
影響を与えないスイッチを実現できる効果がある。
As explained above, the present invention enables non-electrical switching operation by using a movable two-layer film, and can be applied to any part of a circuit, while creating a switch that does not affect other circuits at all. There are effects that can be achieved.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例の断面図、第2図は本発明の
一実施例の動作状態図、第3図は本発明の実施例2の断
面図である。 11・・・・・・半導体基板、12・・・・・・低熱膨
張導体、13・・・・・・高熱膨張導体、14・・・・
・・導体、15・・・・・・可動部、21・・・・・・
半導体基板、22・・・・・・高熱膨張導体、23・・
・・・・低熱膨張導体・、24・・・・・・導体、25
・・・・・・可動部、31・・・・・・半導体基板、3
2・・・・・・高熱膨張導体、33・・・・・・低熱膨
張導体、34・・・・・・低熱膨張導体、35・・・・
・・高熱膨張導体、36・・・・・・可動部、 ・・・・・可動部。
FIG. 1 is a sectional view of an embodiment of the present invention, FIG. 2 is an operating state diagram of an embodiment of the invention, and FIG. 3 is a sectional view of a second embodiment of the invention. 11... Semiconductor substrate, 12... Low thermal expansion conductor, 13... High thermal expansion conductor, 14...
...Conductor, 15...Movable part, 21...
Semiconductor substrate, 22... High thermal expansion conductor, 23...
...Low thermal expansion conductor, 24...Conductor, 25
......Movable part, 31...Semiconductor substrate, 3
2... High thermal expansion conductor, 33... Low thermal expansion conductor, 34... Low thermal expansion conductor, 35...
...High thermal expansion conductor, 36...Movable part, ...Movable part.

Claims (1)

【特許請求の範囲】[Claims] 多層配線構造を有する半導体集積回路装置において、少
なくとも1つの配線層が熱膨張率の異なる導体からなる
二層膜でありかつその一部分が可動であり、該可動部の
少なくとも1部分の上部または下部に別の配線層の導体
が露出しているという構造のスイッチを有する半導体集
積回路装置。
In a semiconductor integrated circuit device having a multilayer wiring structure, at least one wiring layer is a two-layer film made of conductors having different coefficients of thermal expansion, a part of which is movable, and an upper or lower part of at least one part of the movable part. A semiconductor integrated circuit device having a switch having a structure in which a conductor of another wiring layer is exposed.
JP27976888A 1988-11-04 1988-11-04 Semiconductor integrated circuit Pending JPH02126528A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27976888A JPH02126528A (en) 1988-11-04 1988-11-04 Semiconductor integrated circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27976888A JPH02126528A (en) 1988-11-04 1988-11-04 Semiconductor integrated circuit

Publications (1)

Publication Number Publication Date
JPH02126528A true JPH02126528A (en) 1990-05-15

Family

ID=17615640

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27976888A Pending JPH02126528A (en) 1988-11-04 1988-11-04 Semiconductor integrated circuit

Country Status (1)

Country Link
JP (1) JPH02126528A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5461867A (en) * 1994-05-31 1995-10-31 Insta-Heat, Inc. Container with integral module for heating or cooling the contents
WO2004010449A1 (en) * 2002-07-22 2004-01-29 Advantest Corporation Bimorph switch, method of producing the bimorph switch, electronic circuit, and method of producing the electronic circuit
US7025055B2 (en) 2004-03-15 2006-04-11 Ontech Delaware Inc. Tray for selectably heating or cooling the contents
JP2006254359A (en) * 2005-03-14 2006-09-21 Ricoh Co Ltd Microstrip antenna and wireless system using same
US7117684B2 (en) 2004-03-15 2006-10-10 Ontech Delaware Inc. Container with integral module for heating or cooling the contents
JP2008270224A (en) * 2008-05-30 2008-11-06 Advantest Corp Bimorph switch, electronic circuit, and electronic circuit manufacturing method
CN110767618A (en) * 2019-11-01 2020-02-07 芜湖市智行天下工业设计有限公司 Heat dissipation and protection architecture to power module

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5461867A (en) * 1994-05-31 1995-10-31 Insta-Heat, Inc. Container with integral module for heating or cooling the contents
WO2004010449A1 (en) * 2002-07-22 2004-01-29 Advantest Corporation Bimorph switch, method of producing the bimorph switch, electronic circuit, and method of producing the electronic circuit
US7170216B2 (en) 2002-07-22 2007-01-30 Advantest Corporation Bimorph switch, bimorph switch manufacturing method, electronic circuitry and electronic circuitry manufacturing method
US7466065B2 (en) 2002-07-22 2008-12-16 Advantest Corporation Bimorph switch, bimorph switch manufacturing method, electronic circuitry and electronic circuitry manufacturing method
US7025055B2 (en) 2004-03-15 2006-04-11 Ontech Delaware Inc. Tray for selectably heating or cooling the contents
US7117684B2 (en) 2004-03-15 2006-10-10 Ontech Delaware Inc. Container with integral module for heating or cooling the contents
JP2006254359A (en) * 2005-03-14 2006-09-21 Ricoh Co Ltd Microstrip antenna and wireless system using same
JP2008270224A (en) * 2008-05-30 2008-11-06 Advantest Corp Bimorph switch, electronic circuit, and electronic circuit manufacturing method
CN110767618A (en) * 2019-11-01 2020-02-07 芜湖市智行天下工业设计有限公司 Heat dissipation and protection architecture to power module

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