JPH02122926A - Flexible copper-clad board - Google Patents
Flexible copper-clad boardInfo
- Publication number
- JPH02122926A JPH02122926A JP27442788A JP27442788A JPH02122926A JP H02122926 A JPH02122926 A JP H02122926A JP 27442788 A JP27442788 A JP 27442788A JP 27442788 A JP27442788 A JP 27442788A JP H02122926 A JPH02122926 A JP H02122926A
- Authority
- JP
- Japan
- Prior art keywords
- copper
- copper foil
- heat
- alloy
- oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 53
- 239000011889 copper foil Substances 0.000 claims abstract description 43
- 239000000463 material Substances 0.000 claims abstract description 35
- 229910000881 Cu alloy Inorganic materials 0.000 claims abstract description 13
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 13
- 239000000956 alloy Substances 0.000 claims abstract description 13
- 229910052802 copper Inorganic materials 0.000 claims abstract description 10
- 239000010949 copper Substances 0.000 claims abstract description 10
- YOCUPQPZWBBYIX-UHFFFAOYSA-N copper nickel Chemical compound [Ni].[Cu] YOCUPQPZWBBYIX-UHFFFAOYSA-N 0.000 claims abstract description 7
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 claims abstract description 6
- 239000005751 Copper oxide Substances 0.000 claims abstract description 6
- 229910000431 copper oxide Inorganic materials 0.000 claims abstract description 6
- TVZPLCNGKSPOJA-UHFFFAOYSA-N copper zinc Chemical compound [Cu].[Zn] TVZPLCNGKSPOJA-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229920000642 polymer Polymers 0.000 claims description 26
- 229920006254 polymer film Polymers 0.000 claims description 14
- 229910052751 metal Inorganic materials 0.000 claims description 10
- 239000002184 metal Substances 0.000 claims description 10
- 239000000853 adhesive Substances 0.000 abstract description 10
- 230000001070 adhesive effect Effects 0.000 abstract description 10
- 238000004381 surface treatment Methods 0.000 abstract description 7
- 230000015572 biosynthetic process Effects 0.000 abstract description 6
- 239000000126 substance Substances 0.000 abstract 4
- 239000010410 layer Substances 0.000 description 19
- 239000010408 film Substances 0.000 description 17
- 238000011282 treatment Methods 0.000 description 12
- 229920001721 polyimide Polymers 0.000 description 8
- 239000004642 Polyimide Substances 0.000 description 7
- 239000004962 Polyamide-imide Substances 0.000 description 5
- 229920005575 poly(amic acid) Polymers 0.000 description 5
- 229920002312 polyamide-imide Polymers 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- 125000000623 heterocyclic group Chemical group 0.000 description 4
- 239000012299 nitrogen atmosphere Substances 0.000 description 4
- 239000002253 acid Substances 0.000 description 3
- 239000012790 adhesive layer Substances 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- NDKWCCLKSWNDBG-UHFFFAOYSA-N zinc;dioxido(dioxo)chromium Chemical compound [Zn+2].[O-][Cr]([O-])(=O)=O NDKWCCLKSWNDBG-UHFFFAOYSA-N 0.000 description 3
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical compound CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- 239000004693 Polybenzimidazole Substances 0.000 description 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
- 150000004984 aromatic diamines Chemical class 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 229910000423 chromium oxide Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 229920003192 poly(bis maleimide) Polymers 0.000 description 2
- 229920002480 polybenzimidazole Polymers 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 150000003918 triazines Chemical class 0.000 description 2
- 239000002966 varnish Substances 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical group O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 1
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 1
- DKKYOQYISDAQER-UHFFFAOYSA-N 3-[3-(3-aminophenoxy)phenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=C(OC=3C=C(N)C=CC=3)C=CC=2)=C1 DKKYOQYISDAQER-UHFFFAOYSA-N 0.000 description 1
- VQVIHDPBMFABCQ-UHFFFAOYSA-N 5-(1,3-dioxo-2-benzofuran-5-carbonyl)-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)=O)=C1 VQVIHDPBMFABCQ-UHFFFAOYSA-N 0.000 description 1
- OWYWGLHRNBIFJP-UHFFFAOYSA-N Ipazine Chemical compound CCN(CC)C1=NC(Cl)=NC(NC(C)C)=N1 OWYWGLHRNBIFJP-UHFFFAOYSA-N 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
- 229910001297 Zn alloy Inorganic materials 0.000 description 1
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- HSCPDMJPJJSHDA-UHFFFAOYSA-N benzylbenzene;pyrrole-2,5-dione Chemical compound O=C1NC(=O)C=C1.O=C1NC(=O)C=C1.C=1C=CC=CC=1CC1=CC=CC=C1 HSCPDMJPJJSHDA-UHFFFAOYSA-N 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000013039 cover film Substances 0.000 description 1
- CZZYITDELCSZES-UHFFFAOYSA-N diphenylmethane Chemical compound C=1C=CC=CC=1CC1=CC=CC=C1 CZZYITDELCSZES-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 239000003822 epoxy resin Chemical group 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000005065 mining Methods 0.000 description 1
- 210000003739 neck Anatomy 0.000 description 1
- QELJHCBNGDEXLD-UHFFFAOYSA-N nickel zinc Chemical compound [Ni].[Zn] QELJHCBNGDEXLD-UHFFFAOYSA-N 0.000 description 1
- 239000005022 packaging material Substances 0.000 description 1
- 229920000647 polyepoxide Chemical group 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000002335 surface treatment layer Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、電子工業分野において普及しつつあるフレキ
シブル銅張り積層板(Flexible Copper
Clad Lam1nate 、以下FCLとも略す)
および、フレキシブルプリント配線板(Flexibl
e Pr1ntedC4rcuit 、以下FPCとも
略す)に関するものである。[Detailed Description of the Invention] [Industrial Application Field] The present invention is applied to flexible copper-clad laminates that are becoming popular in the electronics industry.
Clad Lam1nate (hereinafter also abbreviated as FCL)
And, flexible printed wiring board (Flexible)
e Pr1ntedC4rcuit (hereinafter also abbreviated as FPC).
[従来の技術]
FCLは、主として可撓性を有するプリント配線板用の
基材として使用されるが、その他面発熱体、電磁波シー
ルド用材料、フラットケーブル、包装材料等に使用され
る。[Prior Art] FCL is mainly used as a base material for flexible printed wiring boards, but is also used for surface heating elements, electromagnetic shielding materials, flat cables, packaging materials, and the like.
近年においては、プリント配線板が収容されるケース頚
がコンパクトになるなどのために、FCLのプリント配
線板用の基材としての利用が増大している。In recent years, the use of FCL as a base material for printed wiring boards has increased because case necks in which printed wiring boards are housed have become more compact.
このようなFCLの中でも接着剤を用いず、耐熱性重合
体ベースフィルムと銅箔が直接固着しているFCLは、
接着剤を使用して銅箔と耐熱性重合体を張り合わせたF
CLに比べ、耐熱性の面で極めて優れている。Among these FCLs, FCLs in which the heat-resistant polymer base film and copper foil are directly bonded without using adhesives are
F made by pasting copper foil and heat-resistant polymer together using adhesive
It has extremely superior heat resistance compared to CL.
このFCLは、銅箔上に耐熱性重合体を形成して銅箔と
耐熱性重合体ベースフィルムからなるFCLとして得ら
れた後、回路を形成され、フレキシブルプリント配線板
(FPC)となる。This FCL is obtained by forming a heat-resistant polymer on a copper foil to obtain an FCL consisting of a copper foil and a heat-resistant polymer base film, and then a circuit is formed thereon to form a flexible printed wiring board (FPC).
このFPCは、回路の保護のために回路上にカバー材と
称される重合体フィルムを形成させることが多い、カバ
ー材は、重合体フィルムを熱プレス等でFPCと張り合
わせたり、重合体含有のワニスをFPC上に塗布し、乾
燥する等して形成される。接着剤不使用のFCLから製
造されたFPCは、前述のように優れた耐熱性を有して
いるために、このカバー材も優れた耐熱性を有すること
が必要である。しかし、従来から検討されてきた耐熱性
のカバー材は銅箔との接着力が不十分であり、実用化に
は到っていない。For this FPC, a polymer film called a cover material is often formed on the circuit to protect the circuit.The cover material is made by pasting a polymer film with the FPC using a heat press or the like, or by using a polymer-containing material. It is formed by applying varnish onto the FPC and drying it. Since the FPC manufactured from adhesive-free FCL has excellent heat resistance as described above, it is necessary that this cover material also has excellent heat resistance. However, the heat-resistant cover materials that have been considered so far have insufficient adhesion to copper foil, and have not been put into practical use.
[発明が解決しようとする課題]
銅F!上に耐熱性重合体ベースフィルムを直接形成した
、接着剤層の存在しないFCLは、耐熱性の点では銅箔
と耐熱性重合体ベースフィルムを接着剤を用いて張り合
わせた、接着剤層の存在するFCLに比べて極めて優れ
ているが、回路形成後に回路の保護のために固着される
耐熱性のカバー材と銅箔との接着力は要求水準に達して
いない。[Problem to be solved by the invention] Copper F! FCL, which has a heat-resistant polymer base film directly formed on top and does not have an adhesive layer, has the advantage of heat resistance due to the presence of an adhesive layer, which is made by laminating a copper foil and a heat-resistant polymer base film together using an adhesive. However, the adhesive strength between the copper foil and the heat-resistant cover material that is fixed to protect the circuit after the circuit is formed does not reach the required level.
かかる状況に鑑み、本発明は耐熱性重合体の優れた特性
が活用される状況を維持しながら、回路形成後に形成さ
れる耐熱性カバー材と銅箔との接着力の優れたFPCを
製造するのに通したFCLを提供しようとするものであ
り、このようなFCLは産業上、特に電子工業上極めて
有用なものである。In view of this situation, the present invention manufactures an FPC with excellent adhesive strength between the heat-resistant cover material and the copper foil formed after circuit formation, while maintaining the situation where the excellent properties of the heat-resistant polymer are utilized. The purpose of this invention is to provide an FCL that can be passed through the FCL, and such an FCL is extremely useful in industry, particularly in the electronics industry.
[課題を解決するための手段]
すなわち、本発明は、
重合体フィルム層と、咳重合体フィルム層の少なくとも
一方に銅箔を有するフレキシブル銅張り積層板において
、少なくとも一方の咳銅箔層の耐熱性重合体フィルム層
に接していない面に金属単体あるいはその酸化物あるい
はその合金を固着させてあるフレキシブル銅張り積層板
、であり、また特に、
重合体フィルム層が耐熱性重合体フィルム層である積層
板、であり、また特に、
金属単体あるいはその酸化物あるいはその合金が、銅単
体、酸化銅、ニッケル−銅合金、亜鉛銅合金から選ばれ
る一種または二種以上である積層板、であり、また、
斯くして得られたフレキシブル銅張り積層板の銅箔層に
回路を形成させてなるフレキシブルプリント配線板、で
あり、また、
斯くして得られたフレキシブル銅張り積層板の銅箔層に
回路を形成させた後、該回路面上に耐熱性重合体からな
るカバー材を形成させてなるフレキシブルプリント配線
板、である。[Means for Solving the Problems] That is, the present invention provides a flexible copper-clad laminate having copper foil on at least one of the polymer film layer and the polymer film layer, wherein the heat resistance of at least one of the copper foil layers is A flexible copper-clad laminate in which an elemental metal, its oxide, or its alloy is fixed to the surface not in contact with a heat-resistant polymer film layer, and in particular, the polymer film layer is a heat-resistant polymer film layer. A laminate, and especially a laminate in which the elemental metal, its oxide, or its alloy is one or more selected from elemental copper, copper oxide, nickel-copper alloy, and zinc-copper alloy, Further, it is a flexible printed wiring board in which a circuit is formed on the copper foil layer of the flexible copper-clad laminate thus obtained, and a circuit is formed on the copper foil layer of the flexible copper-clad laminate thus obtained. This is a flexible printed wiring board in which a circuit is formed and then a cover material made of a heat-resistant polymer is formed on the circuit surface.
すなわち、本発明の要旨は、要するに、銅箔の二つの面
のうち好ましくは、耐熱性重合体フィルム(ベースフィ
ルム)と接していない表面上に特定の表面処理を施すこ
とにより、回路形成後に形成させる耐熱性カバー材と銅
箔との接着力を顕著に向上させることができ、斯くして
、前述の問題点が解決されたFCLおよびFPCが提供
されるものである。That is, the gist of the present invention is, in short, to perform a specific surface treatment on the two surfaces of the copper foil, preferably the surface that is not in contact with the heat-resistant polymer film (base film), so that the circuit formed after the circuit is formed is The present invention provides FCL and FPC in which the adhesive strength between the heat-resistant cover material and the copper foil can be significantly improved, and the above-mentioned problems have been solved.
以下、本発明の詳細な説明する。The present invention will be explained in detail below.
本発明においてベースフィルムとして使用する重合体フ
ィルム層は、好ましくは、後に詳記するような、耐熱性
重合体ベースフィルムであるが、容易に理解できるよう
に、本発明の基本的なコンセプトからは、必ずしも耐熱
性重合体に限定されるものではない。The polymeric film layer used as a base film in the present invention is preferably a heat-resistant polymeric base film, as described in detail below, but as can be easily understood, from the basic concept of the present invention However, it is not necessarily limited to heat-resistant polymers.
本発明は、かかる重合体フィルム層の少なくとも一方に
銅箔を有するフレキシブル銅張り積層板を対象とするも
のであるが、本発明においては、この!r!箔上に銅単
体をはじめ、酸化銅、ニッケル−m合金、亜鉛−銅合金
等を形成させる。この表面処理した銅箔の上に耐熱性カ
バー材を形成した場合には、銅箔と耐熱性カバー材との
接着性が優れ、半田浸漬、高温連続処理、高温高温処理
等の過酷な条件を経ても大きな引き剥がし強度を保ち続
けることを本発明者らは見出した。The present invention is directed to a flexible copper-clad laminate having copper foil on at least one of the polymer film layers. r! Copper alone, copper oxide, nickel-m alloy, zinc-copper alloy, etc. are formed on the foil. When a heat-resistant cover material is formed on this surface-treated copper foil, the adhesion between the copper foil and the heat-resistant cover material is excellent, and it can withstand harsh conditions such as solder immersion, high-temperature continuous processing, and high-temperature high-temperature processing. The present inventors have discovered that it continues to maintain high peel strength even after aging.
本発明において、銅箔の厚さは任意に選択可能であるが
、通常lO〜100μmの範囲内であり、好ましくは1
0〜50μmの範囲内のものである。In the present invention, the thickness of the copper foil can be arbitrarily selected, but is usually within the range of 10 to 100 μm, preferably 1
It is within the range of 0 to 50 μm.
また、本発明においては、回路形成後に形成される耐熱
性カバー材と銅箔との接着性を高めるために銅箔上に表
面処理を施すものであるが、ベースとなる好ましくは耐
熱性重合体と銅箔との接着性も高いことが好ましい、そ
のため該耐熱性重合体ベースフィルムと直接接着してい
る銅箔面も銅単体、酸化銅、ニッケル−亜鉛合金、亜鉛
−銅合金等の表面処理を施されることも好ましい、これ
らの表面処理の中でも、特にニッケル−銅合金処理はそ
の耐熱性、耐湿性の点から好ましい。Furthermore, in the present invention, a surface treatment is performed on the copper foil in order to improve the adhesion between the heat-resistant cover material formed after circuit formation and the copper foil, but preferably the heat-resistant polymer as a base is It is preferable that the adhesion between the heat-resistant polymer base film and the copper foil is also high. Therefore, the surface of the copper foil that is directly bonded to the heat-resistant polymer base film may also be surface-treated with copper alone, copper oxide, nickel-zinc alloy, zinc-copper alloy, etc. Among these surface treatments, nickel-copper alloy treatment is particularly preferred in terms of its heat resistance and moisture resistance.
本発明において、銅箔層上に金属単体またはその酸化物
またはその合金を形成させる方法には特に限定はないが
、金属または合金を電解メツキや無電解メツキにより銅
箔上に形成したり、真空蒸着やスパッタリングで形成す
ることができる。この際生成した金属または合金の厚み
は0.1〜2μmであることが好ましい、0.1μm未
満の場合は耐熱性カバー材との接着力および耐熱性が不
十分となり、2μmを越えると表面処理層の脱落、電気
特性の低下、表面処理層の銅エツチング後の残留等の問
題が生じ、好ましくない。In the present invention, there are no particular limitations on the method of forming a single metal, its oxide, or its alloy on a copper foil layer, but metals or alloys may be formed on a copper foil by electrolytic plating or electroless plating, or by vacuum plating. It can be formed by vapor deposition or sputtering. The thickness of the metal or alloy produced at this time is preferably 0.1 to 2 μm. If it is less than 0.1 μm, the adhesive strength and heat resistance with the heat-resistant cover material will be insufficient, and if it exceeds 2 μm, the surface treatment This is undesirable because problems such as layer drop-off, deterioration of electrical properties, and residual surface treatment layer after copper etching occur.
さらにこの表面処理の後、酸化亜鉛処理、酸化クロム処
理、亜鉛−クロメート処理等各種公知の防錆処理を行な
うことも好ましい0例えば、ニッケル−銅合金処理の後
、亜鉛−クロメート処理を行ない防錆層を設けるとニッ
ケル−銅合金処理層の耐久性をより一層良くすることが
できる。Furthermore, after this surface treatment, it is also preferable to perform various known rust prevention treatments such as zinc oxide treatment, chromium oxide treatment, zinc-chromate treatment, etc. For example, after nickel-copper alloy treatment, zinc-chromate treatment is performed to prevent rust. Providing this layer can further improve the durability of the nickel-copper alloy treated layer.
また、銅単体、酸化銅、ニッケル−銅合金、亜鉛−銅合
金から選ばれる一種または二種以上の表面処理をしない
で酸化亜鉛処理、亜鉛−クロメート処理、酸化クロム処
理等の防錆処理をしただけの銅箔上に重合体カバー材を
形成させたものの引き剥がし強度は、実質上FCLとし
ては十分なものではなく、特に高温下、高温高湿下での
劣化が大きく、耐久性に劣ることがわかった。In addition, rust prevention treatments such as zinc oxide treatment, zinc-chromate treatment, and chromium oxide treatment are applied without surface treatment of one or more selected from copper alone, copper oxide, nickel-copper alloy, and zinc-copper alloy. The peel strength of a polymer cover material formed on copper foil is not practically sufficient for FCL, and the deterioration is particularly large under high temperature and high temperature and high humidity conditions, resulting in poor durability. I understand.
また、本発明において使用される耐熱性重合体ベースフ
ィルム層は、イミド結合を有する耐熱ポリマー、および
/またはイミド結合以外の複素環を有する耐熱ポリマー
からなるものであり、イミド結合を有するポリマーとし
ては、ポリイミド、ポリアミドイミド、ポリヒダントイ
ン、ポリパラバン酸、ポリオキサジンジオンなどであり
、またイミド結合以外の複素環保有耐熱ポリマーとして
はポリベンゾイミダゾール、ポリイミダゾピロロン、ト
リアジン誘導体等が挙げられる。Furthermore, the heat-resistant polymer base film layer used in the present invention is made of a heat-resistant polymer having an imide bond and/or a heat-resistant polymer having a heterocycle other than an imide bond. , polyimide, polyamideimide, polyhydantoin, polyparabanic acid, polyoxazinedione, etc. Heat-resistant polymers having heterocycles other than imide bonds include polybenzimidazole, polyimidazopyrrolone, triazine derivatives, etc.
この発明においては、イミド結合を有する耐熱ポリマー
のフィルムが好ましく、さらに好ましくはポリイミド、
ポリアミドイミドと称されるもののフィルムであり、こ
れらは複合フィルムとされてもよい。In this invention, a film of a heat-resistant polymer having an imide bond is preferable, and more preferably a film of polyimide,
These are films of what is called polyamideimide, and these may be made into composite films.
ポリイミドの代表的なものは、 その構造式(反 復単位)が次に示されるものである。Typical polyimides are Its structural formula (anti- unit) is shown below.
また、
ポリアミドイミドとしては、
その構造式
%式%
また、構造式(1)あるいは(2)にて衷される反復単
位を有する3、3’、4.4’−ベンゾフェノンテトラ
カルボン酸二無水物と芳香族ジアミンとから得られる重
合体、構造式(3)あるいは(4)にて表される反復単
位を存する3、3’ 4.4’−ビスフェニルテトラカ
ルボン酸二無水物も適している。In addition, as polyamideimide, 3,3',4,4'-benzophenonetetracarboxylic dianhydride having a repeating unit represented by the structural formula (1) or (2) and an aromatic diamine, 3,3'4,4'-bisphenyltetracarboxylic dianhydride containing repeating units represented by structural formula (3) or (4) are also suitable. .
上記の構造式において、χはo、so、 、s、C01
CHz 、C(CHsh 、C(CFz)zまたは直接
結合である。In the above structural formula, χ is o, so, , s, C01
CHz, C(CHsh, C(CFz)z or a direct bond.
上記の構造式にて表される芳香族ジアミンの例としては
、4,4°−ジアミノジフェニルメタン、4゜4゛−ジ
アミノジフェニル−チル、4.4°−ジアミノジフェニ
ルスルホン、3,3゛−ジアミノジフェニルメタン、3
.3°−ジアミノジフェニルエーテル、33″−ジアミ
ノジフェニルスルホンなどを挙げることができる。Examples of aromatic diamines represented by the above structural formula include 4,4°-diaminodiphenylmethane, 4゜4゛-diaminodiphenyl-thyl, 4.4°-diaminodiphenyl sulfone, 3,3゛-diamino diphenylmethane, 3
.. Examples include 3°-diaminodiphenyl ether and 33″-diaminodiphenyl sulfone.
芳香族ポリイミド、および/またはポリアミドイミドは
、単一のものである必要はなく、二種以上の混合物であ
って−もよい。The aromatic polyimide and/or polyamideimide need not be a single type, and may be a mixture of two or more types.
本発明で得られたFCLは、回路形成され、これまた本
発明で規定するFPCとなることが多いが、回路形成後
に形成される耐熱性カバー材としては以下のものが好ま
しい、すなわち、本発明で得られたFCLに好適な耐熱
性カバー材層は、イミド結合を有する耐熱ポリマー、お
よび/またはイミド結合以外の複素環を有する耐熱ポリ
マーからなるものであり、イミド結合を有するポリマー
としては、ポリイミド、ポリアミドイミド、ポリエーテ
ルイミド、ポリヒダントイン、ポリパラバン酸、ポリオ
キサジンジオンなどであり、これらのポリマーはビスマ
レイミドやエポキシ樹脂等で変成させられてもよい、ま
たイミド結合以外の複素環保有耐熱ポリマーとしてはポ
リベンゾイミダゾール、ポリイミダゾピロロン、トリア
ジン誘導体等が挙げられる。The FCL obtained in the present invention is often formed with a circuit and becomes an FPC as specified in the present invention. However, as the heat-resistant cover material formed after the circuit is formed, the following are preferable. The heat-resistant cover material layer suitable for the FCL obtained in is made of a heat-resistant polymer having an imide bond and/or a heat-resistant polymer having a heterocycle other than an imide bond. As the polymer having an imide bond, polyimide , polyamideimide, polyetherimide, polyhydantoin, polyparabanic acid, polyoxazinedione, etc. These polymers may be modified with bismaleimide, epoxy resin, etc., and can also be used as heat-resistant polymers with heterocycles other than imide bonds. Examples include polybenzimidazole, polyimidazopyrrolone, and triazine derivatives.
次に実施例を示してさらに本発明を説明する。Next, the present invention will be further explained by showing examples.
実施例1
(1)アミド酸ワニスの合成
攪拌機、還流冷却器および窒素導入管を備えた容器中に
おいて4,4″−ジアミノジフェニルエーテル421g
(2,1モル)を、N−メチルピロリドン4000Ii
に溶解した。この溶液に窒素雰囲気下においてピロメリ
ット酸二無水物458g (2,1モル)を加えて、室
温にて24時間反応させた。Example 1 (1) Synthesis of amic acid varnish 421 g of 4,4''-diaminodiphenyl ether was added in a container equipped with a stirrer, a reflux condenser, and a nitrogen inlet tube.
(2.1 mol), N-methylpyrrolidone 4000Ii
dissolved in 458 g (2.1 mol) of pyromellitic dianhydride was added to this solution under a nitrogen atmosphere, and the mixture was reacted at room temperature for 24 hours.
こうして得られたポリアミド酸溶液の対数粘度は1.8
dl/gであった。The logarithmic viscosity of the polyamic acid solution thus obtained was 1.8.
It was dl/g.
このポリアミド酸溶液を、N−メチルピロリドンで16
%まで希釈し、回転粘度を100.0OOcpsに調節
した。This polyamic acid solution was diluted with N-methylpyrrolidone for 16
% and the rotational viscosity was adjusted to 100.0OOcps.
(2)FCLの作成
(1)で得られたポリアミド酸溶液を、すでに両面の銅
箔上に銅メツキ処理の施しである電解銅箔(三井金属鉱
業(株)製、3EC−DT、厚さ35μm)上に均一に
流延塗布し、135°Cで5分間、さらに180°Cで
4分間加熱乾燥した後、250°Cの窒素雰囲気中で3
分間、さらに350°Cの窒素雰囲気中で5分間加熱し
て銅箔とポリイミドからなるフレキシブル基板を得た。(2) Creation of FCL The polyamic acid solution obtained in (1) is applied to electrolytic copper foil (manufactured by Mitsui Mining & Mining Co., Ltd., 3EC-DT, thickness 35 μm), heated and dried at 135°C for 5 minutes, then at 180°C for 4 minutes, and then heated in a nitrogen atmosphere at 250°C for 3 minutes.
A flexible substrate made of copper foil and polyimide was obtained by heating for 5 minutes in a nitrogen atmosphere at 350°C.
こうして得られたフレキシブル基板のポリイミド層の膜
厚は35μmであった。The thickness of the polyimide layer of the flexible substrate thus obtained was 35 μm.
(3)耐熱性カバー材の作成
攪拌機、還流冷却器および窒素導入管を備えた容器中に
おいて1,3−ビス(3−アミノフェノキシ)ベンゼン
584g(2,0モル)を、N、N−ジメチルアセトア
ミド3700−に挿入し、室温で窒素雰囲気下において
33°、4.4°−ベンゾフェノンテトラカルボン酸二
無水物644g(2,0モル)を、溶液温度の上昇に注
意しながら4分割して加え、室温にて約24時間反応さ
せた。(3) Preparation of heat-resistant cover material In a container equipped with a stirrer, a reflux condenser, and a nitrogen inlet tube, 584 g (2.0 mol) of 1,3-bis(3-aminophenoxy)benzene was added to N,N-dimethyl Inserted into 3700-mL acetamide, 644 g (2.0 mol) of 33°, 4.4°-benzophenone tetracarboxylic dianhydride was added in 4 portions at room temperature under a nitrogen atmosphere while being careful not to increase the solution temperature. , and allowed to react at room temperature for about 24 hours.
こうして得られたポリアミド酸溶液の対数粘度は1 、
2 a / gであった。The logarithmic viscosity of the polyamic acid solution thus obtained is 1,
It was 2 a/g.
このポリアミド酸溶ti、loOgにチバ・ガイギー社
製ビスマレイミド−3(4,4°ビスマレイミドジフエ
ニルメタン)10gを添加して2時間攪拌した。10 g of bismaleimide-3 (4,4° bismaleimide diphenylmethane) manufactured by Ciba Geigy was added to this polyamic acid solution ti, loOg and stirred for 2 hours.
このポリアミド酸−ビスマレイミド溶液を、ガラス讐反
上にキャストした後、100’C1200°Cおよび3
00°Cで各々1時間加熱して、膜厚20μmのビスマ
レイミド変成ポリイミドフィルムを得た。この耐熱性カ
バー材のガラス転移温度は153°Cであった。After casting this polyamic acid-bismaleimide solution onto a glass substrate, it was heated at 100°C and 1200°C for 3
Each film was heated at 00°C for 1 hour to obtain a bismaleimide-modified polyimide film with a thickness of 20 μm. The glass transition temperature of this heat-resistant cover material was 153°C.
(4)FCL上への耐熱性カバーフィルムの形成(2)
で得られたFCLの銅箔面上に(3)で得られた耐熱性
カバー材を乗せ、240’C150Kg/c−2で30
分間プレスしてFCL上に耐熱性カバー材を形成した。(4) Formation of heat-resistant cover film on FCL (2)
The heat-resistant cover material obtained in (3) was placed on the copper foil surface of the FCL obtained in (3), and the heat-resistant cover material obtained in (3) was
A heat-resistant cover material was formed on the FCL by pressing for a minute.
このようにして得られたカバー材の付いたFCLのカバ
ー材と銅箔の間の引き剥がし強度は、0゜95Kg/c
m”であった。The peel strength between the cover material and the copper foil of the FCL with the cover material obtained in this way was 0°95Kg/c.
It was "m".
比較例1
実施例1において銅箔として片面にのみ銅メツキ 処理
を施しである電解銅箔(三井金属鉱業(株)製、3EC
,厚さ35μm)を用いたことを除いて実施例1と同様
の操作を行ない、カバー材の付いたFCLを得た。Comparative Example 1 An electrolytic copper foil (manufactured by Mitsui Metal Mining Co., Ltd., 3EC) which was subjected to copper plating treatment on only one side as the copper foil in Example 1.
An FCL with a cover material was obtained by carrying out the same operation as in Example 1, except that a material (with a thickness of 35 μm) was used.
このようにして得られたカバー材の付いたFCLのカバ
ー材と銅箔の間の引き剥がし強度は、0、10Kg/c
+s”であった、これは勿論、33 F CLから形成
されるFPCとカバー材と銅箔の間の引き剥がし強度が
基本的に同様に大きいことを示している。The peel strength between the cover material and the copper foil of the FCL with the cover material obtained in this way is 0.10 kg/c.
+s'', which of course shows that the peel strength between the FPC formed from 33 F CL, the cover material and the copper foil is basically the same.
[発明の効果]
本発明により提案された銅箔層の耐熱性重合体ベースフ
ィルム層に接していない面に銅、ニッケル、クロム等の
金属単体あるいはその酸化物あるいはその合金等を固着
させてあるフレキシブル銅張り積層板は、耐熱性重合体
フィルムと銅箔との間の接着力が増大し、引き剥がし強
度は0.7kg/cm以上が確保される。なお、−船釣
に、引き剥がし強度が0.7kg/Ωあれば、充分とさ
れていることは勿論であり、また、その上限は特に規定
されるものではなく、強ければ、強いほど好ましいもの
である。[Effects of the invention] An elemental metal such as copper, nickel, or chromium, or an oxide thereof or an alloy thereof is fixed to the surface of the copper foil layer proposed by the present invention that is not in contact with the heat-resistant polymer base film layer. The flexible copper-clad laminate has increased adhesive strength between the heat-resistant polymer film and the copper foil, and has a peel strength of 0.7 kg/cm or more. It goes without saying that a peeling strength of 0.7 kg/Ω is considered sufficient for boat fishing, and the upper limit is not particularly stipulated; the stronger the better. It is.
このようなFCLは、接着剤層を有さないために耐熱性
は良好であり、銅、ニッケル、クロム等の金属単体ある
いはその合金、酸化物等の効果により、FCL、を回路
形成させた後に形成されるFPCと耐熱性カバー材との
接着性、またその熱劣化性において非常に良好である。This type of FCL has good heat resistance because it does not have an adhesive layer, and due to the effects of single metals such as copper, nickel, and chromium, or their alloys, oxides, etc., after FCL is formed into a circuit. It has very good adhesion between the formed FPC and the heat-resistant cover material, and its thermal deterioration resistance.
このように本発明によれば、優れた特性のフレキシブル
銅張り積層板およびフレキシブルプリント配線板を提供
することができる。As described above, according to the present invention, it is possible to provide a flexible copper-clad laminate and a flexible printed wiring board with excellent characteristics.
Claims (5)
とも一方に銅箔を有するフレキシブル銅張り積層板にお
いて、少なくとも一方の該銅箔層の耐熱性重合体フィル
ム層に接していない面に金属単体あるいはその酸化物あ
るいはその合金を固着させてあるフレキシブル銅張り積
層板。1. In a flexible copper-clad laminate having a polymer film layer and a copper foil on at least one of the polymer film layers, a single metal or its Flexible copper-clad laminate with fixed oxide or its alloy.
請求項1記載の積層板。2. A laminate according to claim 1, wherein the polymer film layer is a heat-resistant polymer film layer.
るいはその合金が、銅単体、酸化銅、ニッケル−銅合金
、亜鉛−銅合金から選ばれる一種または二種以上である
積層板。3. 2. The laminate according to claim 1, wherein the elemental metal, its oxide, or its alloy is one or more selected from elemental copper, copper oxide, nickel-copper alloy, and zinc-copper alloy.
板の銅箔層に回路を形成させてなるフレキシブルプリン
ト配線板。4. A flexible printed wiring board obtained by forming a circuit on the copper foil layer of the flexible copper-clad laminate obtained in claim 1.
板の銅箔層に回路を形成させた後、該回路面上に耐熱性
重合体からなるカバー材を形成させてなるフレキシブル
プリント配線板。5. A flexible printed wiring board obtained by forming a circuit on the copper foil layer of the flexible copper-clad laminate obtained in claim 1, and then forming a cover material made of a heat-resistant polymer on the circuit surface.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27442788A JPH02122926A (en) | 1988-11-01 | 1988-11-01 | Flexible copper-clad board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27442788A JPH02122926A (en) | 1988-11-01 | 1988-11-01 | Flexible copper-clad board |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02122926A true JPH02122926A (en) | 1990-05-10 |
Family
ID=17541523
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP27442788A Pending JPH02122926A (en) | 1988-11-01 | 1988-11-01 | Flexible copper-clad board |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02122926A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5304428A (en) * | 1990-06-05 | 1994-04-19 | Fukuda Metal Foil And Powder Co., Ltd. | Copper foil for printed circuit boards |
WO2005069706A1 (en) * | 2004-01-16 | 2005-07-28 | Dept Corporation | Circuit board and method for producing the same |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6247908A (en) * | 1985-08-27 | 1987-03-02 | 日本写真印刷株式会社 | Conducting film |
JPS62181488A (en) * | 1986-02-05 | 1987-08-08 | 尾池工業株式会社 | Film material for flexible printed circuit |
-
1988
- 1988-11-01 JP JP27442788A patent/JPH02122926A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6247908A (en) * | 1985-08-27 | 1987-03-02 | 日本写真印刷株式会社 | Conducting film |
JPS62181488A (en) * | 1986-02-05 | 1987-08-08 | 尾池工業株式会社 | Film material for flexible printed circuit |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5304428A (en) * | 1990-06-05 | 1994-04-19 | Fukuda Metal Foil And Powder Co., Ltd. | Copper foil for printed circuit boards |
WO2005069706A1 (en) * | 2004-01-16 | 2005-07-28 | Dept Corporation | Circuit board and method for producing the same |
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