JPH021225B2 - - Google Patents

Info

Publication number
JPH021225B2
JPH021225B2 JP5404981A JP5404981A JPH021225B2 JP H021225 B2 JPH021225 B2 JP H021225B2 JP 5404981 A JP5404981 A JP 5404981A JP 5404981 A JP5404981 A JP 5404981A JP H021225 B2 JPH021225 B2 JP H021225B2
Authority
JP
Japan
Prior art keywords
crystal
sample
shielding plate
vacuum
vapor deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP5404981A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57169086A (en
Inventor
Toshiki Suganuma
Toshio Hayashi
Yasuo Nomura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nihon Dempa Kogyo Co Ltd
Original Assignee
Nihon Dempa Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nihon Dempa Kogyo Co Ltd filed Critical Nihon Dempa Kogyo Co Ltd
Priority to JP5404981A priority Critical patent/JPS57169086A/ja
Publication of JPS57169086A publication Critical patent/JPS57169086A/ja
Publication of JPH021225B2 publication Critical patent/JPH021225B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
  • Physical Vapour Deposition (AREA)
JP5404981A 1981-04-10 1981-04-10 Vacuum vapor-depositing device of crystal resonator Granted JPS57169086A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5404981A JPS57169086A (en) 1981-04-10 1981-04-10 Vacuum vapor-depositing device of crystal resonator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5404981A JPS57169086A (en) 1981-04-10 1981-04-10 Vacuum vapor-depositing device of crystal resonator

Publications (2)

Publication Number Publication Date
JPS57169086A JPS57169086A (en) 1982-10-18
JPH021225B2 true JPH021225B2 (enExample) 1990-01-10

Family

ID=12959746

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5404981A Granted JPS57169086A (en) 1981-04-10 1981-04-10 Vacuum vapor-depositing device of crystal resonator

Country Status (1)

Country Link
JP (1) JPS57169086A (enExample)

Also Published As

Publication number Publication date
JPS57169086A (en) 1982-10-18

Similar Documents

Publication Publication Date Title
US3760471A (en) Method of making an electromechanical filter
GB2227601A (en) "Preparing a micro-section in a sample for observation"
JP2002515178A (ja) 電子多層素子の製造方法
JP6712384B2 (ja) 膜厚監視装置
JPH021225B2 (enExample)
JP3720846B2 (ja) 複数の電子多層構成部品の製造方法
JPH025818B2 (enExample)
US4631197A (en) Apparatus and method for adjusting the frequency of a resonator by laser
JPH021224B2 (enExample)
JP2002105621A (ja) 金属板とその製造方法及び露光装置
US4833430A (en) Coupled-dual resonator crystal
JPH11222670A (ja) 膜厚モニター及びこれを用いた成膜装置
JP3498950B2 (ja) スパッタリング用マルチターゲット装置
JPS5812336B2 (ja) ジヨウチヤクマクアツソクテイホウホウ
JP2003073823A (ja) スパッタ方法及びスパッタ装置
KR20000024501A (ko) 인시츄 물리기상 증착기
JPS61284569A (ja) 眞空蒸着装置
JPH0638111Y2 (ja) 成膜装置の試料台保持機構
JP2004221816A (ja) 水晶振動子の製造方法
JPH06172998A (ja) 薄膜製造方法および装置
JPH0238921Y2 (enExample)
JP2518582Y2 (ja) 圧電片の整列装置
KR910006920Y1 (ko) 저항가열 진공증착장치
JPH02305438A (ja) 真空蒸着装置
JPH0414840A (ja) 半導体装置の製造方法