JPH02108335U - - Google Patents
Info
- Publication number
- JPH02108335U JPH02108335U JP1687789U JP1687789U JPH02108335U JP H02108335 U JPH02108335 U JP H02108335U JP 1687789 U JP1687789 U JP 1687789U JP 1687789 U JP1687789 U JP 1687789U JP H02108335 U JPH02108335 U JP H02108335U
- Authority
- JP
- Japan
- Prior art keywords
- electrodes
- wafer
- electrode
- view
- utility
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005268 plasma chemical vapour deposition Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989016877U JPH0648834Y2 (ja) | 1989-02-17 | 1989-02-17 | プラズマｃｖｄ装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989016877U JPH0648834Y2 (ja) | 1989-02-17 | 1989-02-17 | プラズマｃｖｄ装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02108335U true JPH02108335U (US06521211-20030218-C00004.png) | 1990-08-29 |
| JPH0648834Y2 JPH0648834Y2 (ja) | 1994-12-12 |
Family
ID=31230188
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1989016877U Expired - Fee Related JPH0648834Y2 (ja) | 1989-02-17 | 1989-02-17 | プラズマｃｖｄ装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0648834Y2 (US06521211-20030218-C00004.png) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60258924A (ja) * | 1984-06-06 | 1985-12-20 | Hitachi Ltd | プラズマ処理装置 |
| JPS6115321A (ja) * | 1984-07-02 | 1986-01-23 | Kanegafuchi Chem Ind Co Ltd | 成膜方法 |
| JPS6257213A (ja) * | 1985-09-06 | 1987-03-12 | Fuji Electric Corp Res & Dev Ltd | プラズマｃｖｄ装置 |
| JPH01127237U (US06521211-20030218-C00004.png) * | 1988-02-24 | 1989-08-31 |
-
1989
- 1989-02-17 JP JP1989016877U patent/JPH0648834Y2/ja not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60258924A (ja) * | 1984-06-06 | 1985-12-20 | Hitachi Ltd | プラズマ処理装置 |
| JPS6115321A (ja) * | 1984-07-02 | 1986-01-23 | Kanegafuchi Chem Ind Co Ltd | 成膜方法 |
| JPS6257213A (ja) * | 1985-09-06 | 1987-03-12 | Fuji Electric Corp Res & Dev Ltd | プラズマｃｖｄ装置 |
| JPH01127237U (US06521211-20030218-C00004.png) * | 1988-02-24 | 1989-08-31 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0648834Y2 (ja) | 1994-12-12 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |