JPH02108296U - - Google Patents
Info
- Publication number
- JPH02108296U JPH02108296U JP1684589U JP1684589U JPH02108296U JP H02108296 U JPH02108296 U JP H02108296U JP 1684589 U JP1684589 U JP 1684589U JP 1684589 U JP1684589 U JP 1684589U JP H02108296 U JPH02108296 U JP H02108296U
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- film
- insulating layer
- back electrode
- insulating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 claims description 5
- 239000010408 film Substances 0.000 claims description 4
- 239000011521 glass Substances 0.000 claims description 2
- 239000000758 substrate Substances 0.000 claims description 2
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 claims 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- 230000002950 deficient Effects 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims 1
Description
第１図はこの考案に係る薄膜ＥＬ素子の構造の
実施例を示す断面図である。第２図は従来の実施
例の断面図である。
主要部分の符号の説明、１：ガラス基板、２：
第１の電極、３：第１の絶縁層、４：発光層、５
：第２の絶縁層、６：第２の電極、７：黒色絶縁
膜。
FIG. 1 is a sectional view showing an embodiment of the structure of a thin film EL element according to this invention. FIG. 2 is a sectional view of a conventional embodiment. Explanation of symbols of main parts, 1: Glass substrate, 2:
first electrode, 3: first insulating layer, 4: light emitting layer, 5
: second insulating layer, 6: second electrode, 7: black insulating film.
Claims (1)
層と、発光層と、第２の絶縁層と、背面電極とを
順次積層した薄膜ＥＬ素子において、 前記背面電極と第２の絶縁層との間に黒色絶縁
膜を形成したことを特徴とする薄膜ＥＬ素子の構
造。 ２ 黒色絶縁膜は五酸化タンタルの酸素欠乏膜（
Ｔａ２Ｏ５−Ｘ）であることを特徴とする請求項
１記載の薄膜ＥＬ素子の構造。[Claims for Utility Model Registration] 1. A thin film EL device in which a transparent electrode, a first insulating layer, a light emitting layer, a second insulating layer, and a back electrode are sequentially laminated on a glass substrate, comprising: A structure of a thin film EL element characterized in that a black insulating film is formed between a back electrode and a second insulating layer. 2 The black insulating film is an oxygen-deficient film of tantalum pentoxide (
The structure of a thin film EL device according to claim 1, wherein the thin film EL element is made of Ta2O5 - X).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1684589U JPH02108296U (en) | 1989-02-17 | 1989-02-17 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1684589U JPH02108296U (en) | 1989-02-17 | 1989-02-17 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02108296U true JPH02108296U (en) | 1990-08-28 |
Family
ID=31230126
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1684589U Pending JPH02108296U (en) | 1989-02-17 | 1989-02-17 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02108296U (en) |
-
1989
- 1989-02-17 JP JP1684589U patent/JPH02108296U/ja active Pending