JPH02102724U - - Google Patents

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Publication number
JPH02102724U
JPH02102724U JP1056789U JP1056789U JPH02102724U JP H02102724 U JPH02102724 U JP H02102724U JP 1056789 U JP1056789 U JP 1056789U JP 1056789 U JP1056789 U JP 1056789U JP H02102724 U JPH02102724 U JP H02102724U
Authority
JP
Japan
Prior art keywords
region
plasma
processing
plasma generation
processing apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1056789U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0749792Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1989010567U priority Critical patent/JPH0749792Y2/ja
Publication of JPH02102724U publication Critical patent/JPH02102724U/ja
Application granted granted Critical
Publication of JPH0749792Y2 publication Critical patent/JPH0749792Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Drying Of Semiconductors (AREA)
JP1989010567U 1989-01-31 1989-01-31 マイクロ波プラズマ処理装置 Expired - Lifetime JPH0749792Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1989010567U JPH0749792Y2 (ja) 1989-01-31 1989-01-31 マイクロ波プラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1989010567U JPH0749792Y2 (ja) 1989-01-31 1989-01-31 マイクロ波プラズマ処理装置

Publications (2)

Publication Number Publication Date
JPH02102724U true JPH02102724U (enExample) 1990-08-15
JPH0749792Y2 JPH0749792Y2 (ja) 1995-11-13

Family

ID=31218344

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1989010567U Expired - Lifetime JPH0749792Y2 (ja) 1989-01-31 1989-01-31 マイクロ波プラズマ処理装置

Country Status (1)

Country Link
JP (1) JPH0749792Y2 (enExample)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58170536A (ja) * 1982-03-31 1983-10-07 Fujitsu Ltd プラズマ処理方法及びその装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58170536A (ja) * 1982-03-31 1983-10-07 Fujitsu Ltd プラズマ処理方法及びその装置

Also Published As

Publication number Publication date
JPH0749792Y2 (ja) 1995-11-13

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