JPS62191868U - - Google Patents
Info
- Publication number
- JPS62191868U JPS62191868U JP8066286U JP8066286U JPS62191868U JP S62191868 U JPS62191868 U JP S62191868U JP 8066286 U JP8066286 U JP 8066286U JP 8066286 U JP8066286 U JP 8066286U JP S62191868 U JPS62191868 U JP S62191868U
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- chamber
- quartz glass
- plasma chamber
- waveguide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 6
- 238000005268 plasma chemical vapour deposition Methods 0.000 claims description 3
- 238000000151 deposition Methods 0.000 claims description 2
- 230000008021 deposition Effects 0.000 claims description 2
Landscapes
- Chemical Vapour Deposition (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8066286U JPS62191868U (enExample) | 1986-05-28 | 1986-05-28 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8066286U JPS62191868U (enExample) | 1986-05-28 | 1986-05-28 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62191868U true JPS62191868U (enExample) | 1987-12-05 |
Family
ID=30931672
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8066286U Pending JPS62191868U (enExample) | 1986-05-28 | 1986-05-28 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62191868U (enExample) |
-
1986
- 1986-05-28 JP JP8066286U patent/JPS62191868U/ja active Pending