JPH0198164U - - Google Patents
Info
- Publication number
- JPH0198164U JPH0198164U JP19248587U JP19248587U JPH0198164U JP H0198164 U JPH0198164 U JP H0198164U JP 19248587 U JP19248587 U JP 19248587U JP 19248587 U JP19248587 U JP 19248587U JP H0198164 U JPH0198164 U JP H0198164U
- Authority
- JP
- Japan
- Prior art keywords
- target
- sputtering
- reactive
- magnetron cathode
- reactive gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007789 gas Substances 0.000 claims description 3
- 238000005546 reactive sputtering Methods 0.000 claims description 3
- 238000002347 injection Methods 0.000 claims description 2
- 239000007924 injection Substances 0.000 claims description 2
- 239000011261 inert gas Substances 0.000 claims 1
- 238000004544 sputter deposition Methods 0.000 claims 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987192485U JPH0527490Y2 (enExample) | 1987-12-17 | 1987-12-17 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987192485U JPH0527490Y2 (enExample) | 1987-12-17 | 1987-12-17 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0198164U true JPH0198164U (enExample) | 1989-06-30 |
| JPH0527490Y2 JPH0527490Y2 (enExample) | 1993-07-13 |
Family
ID=31483342
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1987192485U Expired - Lifetime JPH0527490Y2 (enExample) | 1987-12-17 | 1987-12-17 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0527490Y2 (enExample) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53114787A (en) * | 1977-03-18 | 1978-10-06 | Ulvac Corp | Target for high profitable sputtering apparatus |
| JPS58110673A (ja) * | 1981-12-23 | 1983-07-01 | Hitachi Ltd | 反応性スパツタリング装置 |
-
1987
- 1987-12-17 JP JP1987192485U patent/JPH0527490Y2/ja not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53114787A (en) * | 1977-03-18 | 1978-10-06 | Ulvac Corp | Target for high profitable sputtering apparatus |
| JPS58110673A (ja) * | 1981-12-23 | 1983-07-01 | Hitachi Ltd | 反応性スパツタリング装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0527490Y2 (enExample) | 1993-07-13 |
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