JPH0198110A - Production of thin film magnetic head - Google Patents
Production of thin film magnetic headInfo
- Publication number
- JPH0198110A JPH0198110A JP25462787A JP25462787A JPH0198110A JP H0198110 A JPH0198110 A JP H0198110A JP 25462787 A JP25462787 A JP 25462787A JP 25462787 A JP25462787 A JP 25462787A JP H0198110 A JPH0198110 A JP H0198110A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- thin film
- magnetic head
- axis
- head
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 title claims abstract description 31
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 11
- 239000010408 film Substances 0.000 claims abstract description 16
- 229910000889 permalloy Inorganic materials 0.000 claims abstract description 16
- 230000035699 permeability Effects 0.000 claims abstract description 13
- 230000005415 magnetization Effects 0.000 claims abstract description 12
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 7
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 claims abstract description 3
- 239000011229 interlayer Substances 0.000 claims abstract description 3
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 3
- 239000011241 protective layer Substances 0.000 claims abstract description 3
- 239000000758 substrate Substances 0.000 claims abstract description 3
- 229910052742 iron Inorganic materials 0.000 claims abstract 2
- 238000000034 method Methods 0.000 claims description 7
- -1 coils Substances 0.000 claims 1
- 230000005381 magnetic domain Effects 0.000 abstract description 10
- 238000010992 reflux Methods 0.000 abstract description 4
- 239000012212 insulator Substances 0.000 abstract 2
- 238000007747 plating Methods 0.000 description 7
- 230000000694 effects Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 238000009713 electroplating Methods 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 229910003271 Ni-Fe Inorganic materials 0.000 description 1
- 241000282376 Panthera tigris Species 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3109—Details
- G11B5/3113—Details for improving the magnetic domain structure or avoiding the formation or displacement of undesirable magnetic domains
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Heads (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は、高密度記録を実現するための狭トラツクを
備え、高出力を得ることができる高性能な薄膜磁気ヘッ
ドの製造方法に関するものである。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for manufacturing a high-performance thin film magnetic head that is equipped with a narrow track for realizing high-density recording and that can obtain high output. be.
ことが要求されることから、Ｎｉ−Ｆｅ系の高透磁率合
金であるパーマロイがよく知られておシ、従来は、例え
ば、特開昭５５−８２７９３号公報に示された電気メツ
キ法によシ、高透磁率を得るために一定の方向で一定の
大きさの磁場を印加した状態で電気メツキを行い、−輪
具方向を誘起して薄膜を形成していた。第３図はかかる
電気メツキ法によって形成したパーマロイ薄膜のＢ−Ｈ
ループ（印加磁界は５ ｏｅ）であり、同図（ａ）はメ
ツキ時の外部磁場方向（′ｔＩｉ化容易軸方向）のＢ−
Ｈループ、同図（ｂ）はメツキ時の外部磁場に対して垂
直な方向（磁化困難軸方向）のＢ−Ｈループである。Therefore, permalloy, which is a Ni-Fe based high magnetic permeability alloy, is well known. In order to obtain high magnetic permeability, electroplating was performed while applying a magnetic field of a certain magnitude in a certain direction, and a thin film was formed by inducing a -ring direction. Figure 3 shows B-H of the permalloy thin film formed by such electroplating method.
(applied magnetic field is 5 oe), and the figure (a) shows B- in the external magnetic field direction ('tIi easy axis direction) during plating.
The H loop in the same figure (b) is a B-H loop in the direction perpendicular to the external magnetic field (difficult magnetization axis direction) during plating.
また、第４図は、ナショナル テクニカル レポート（
Ｎａｔｉｏｎａｌ Ｔｅｃｈｎｉｃａｌ Ｒｅｐｏｒｔ
）第３１巻、第２号（１９８５年４月）１５２〜ｌｅ
ｔページに記載された方法によって得られたパーマロイ
薄膜を用いて形成した薄膜磁気ヘッドの磁極パターンに
おいて観察される磁区パターンであり、磁化容易軸方向
（１）、磁壁（２）、環流磁区（３）およびトラック幅
（４）からなっている。In addition, Figure 4 is from the National Technical Report (
National Technical Report
) Volume 31, No. 2 (April 1985) 152-le
This is a magnetic domain pattern observed in the magnetic pole pattern of a thin film magnetic head formed using a permalloy thin film obtained by the method described on page t. ) and track width (4).
さて、近年の磁気ディスク装置の高密度化にともない、
高密度記録を実現するための狭トラツク磁気ヘツド（ト
ラック幅（４）が狭いヘッド）、すなわち、狭トラツク
領域において高出力を実現できる高性能薄膜磁気ヘッド
の必要性が高まってきている。従来の薄膜磁気ヘッドで
は、磁極を形成しているパーマロイのメツキ膜に一軸異
方性が誘起されているため、磁極には、磁壁（２）およ
び環流磁区（３）が発生する。還流磁区（３）はヘッド
の使用周波数域（＞ Ｉ ＭＨｚ ）では透磁率が極め
て低く、磁路としてほとんど機能しないので、ヘッドと
して機能するトラック幅は第４図に示したトラック幅（
４）よシも小さくなる。従って、情報を書き込む際、媒
体における記録領域が狭くなり（媒体の直径方向の記録
領域が短くなる）、十分な書き込み特性が得られないば
かりでなく、情報を読み出す前のヘッドの有効なトラッ
ク幅が、加工寸法（トラック幅（４））よシも小さくな
り、ヘッドの出力がトラック幅に比例することから、結
果的に、十分な再生特性が得られない。Now, with the recent increase in the density of magnetic disk devices,
In order to realize high-density recording, there is an increasing need for narrow track magnetic heads (heads with a narrow track width (4)), that is, high-performance thin film magnetic heads that can realize high output in narrow track areas. In a conventional thin film magnetic head, uniaxial anisotropy is induced in the permalloy plating film forming the magnetic pole, so that a domain wall (2) and a circulating magnetic domain (3) are generated in the magnetic pole. The reflux magnetic domain (3) has extremely low magnetic permeability in the frequency range used by the head (> I MHz) and hardly functions as a magnetic path. Therefore, the track width that functions as a head is the track width (
4) The size will also become smaller. Therefore, when writing information, the recording area on the medium becomes narrower (the recording area in the diametrical direction of the medium becomes shorter), and not only sufficient writing characteristics cannot be obtained, but also the effective track width of the head before reading information. However, the processing dimension (track width (4)) is also smaller, and the output of the head is proportional to the track width, so as a result, sufficient reproduction characteristics cannot be obtained.
以上のような従来の薄膜の気ヘッドの製造方法では、磁
極が以上のようにメツキ成膜され、−軸十分な記録再生
特性が得られないという問題点があった。In the conventional method of manufacturing a thin film magnetic head as described above, the magnetic pole is formed with a plating film as described above, and there is a problem in that sufficient recording and reproducing characteristics in the -axis cannot be obtained.
この発明は上記のような問題点を解消するためになされ
たもので、高記録密度領域の狭トラツク幅ヘッドにおい
ても十分な記録再生特性を実現できる薄膜磁気ヘッドの
製造方法を得ることを目的とする。This invention was made to solve the above-mentioned problems, and its purpose is to provide a method for manufacturing a thin-film magnetic head that can realize sufficient recording and reproducing characteristics even in narrow track width heads in high recording density areas. do.
この発明に係る薄膜磁気ヘッドの製造方法は、磁化容易
軸方向の透磁率が磁化困難軸方向の透磁率の少なくとも
ｌ／２の大きさを有し、磁気的に等方的な磁性薄膜によ
って磁極を形成する。In the method for manufacturing a thin film magnetic head according to the present invention, a magnetic thin film having a magnetic permeability in the direction of the easy axis of magnetization that is at least 1/2 of the magnetic permeability in the direction of the hard axis of magnetization and is magnetically isotropic is used to form magnetic poles. form.
この発明による薄膜磁気ヘッドは、ａ極が磁気的に等方
的な磁性薄膜によって形成されるので、環流磁区が発生
せず、高記録密度領域の狭トラツク幅においても、良好
な記録再生特性を示す。In the thin film magnetic head according to the present invention, since the a-pole is formed of a magnetically isotropic thin film, no circulating magnetic domain is generated and good recording and reproducing characteristics are achieved even in narrow track widths in high recording density areas. show.
以下、この発明の一実施例について説明する。 An embodiment of the present invention will be described below.
この発明は、絶縁体膜を表面に被着した基板上に、上、
下磁極、ギャップ、層間絶縁体膜、コイル、保護層等を
形成するもので、特に、磁化容易軸方向の透磁率が、磁
化困難軸方向の透磁率の少なくとも１／２の大きさを有
し、磁気的に等方的な薄膜によって磁極をスパッタによ
シ形成する。In this invention, on a substrate having an insulating film on the surface,
It forms the lower magnetic pole, the gap, the interlayer insulating film, the coil, the protective layer, etc., and in particular, the magnetic permeability in the direction of the easy axis of magnetization is at least 1/2 of the magnetic permeability in the direction of the difficult axis. , the magnetic pole is formed by sputtering using a magnetically isotropic thin film.
薄膜の材質としては１例えば、鉄−ニッケル合金でなる
パーマロイが好適であシ、さらに具体的には、重量比で
ニッケル（Ｎｉ ） ａ ｕ、０％〜８３．０％、鉄（
Ｆｅ） ｌ ７．ｏ％〜２０．０％でなるパーマロイが
適している。For example, permalloy made of iron-nickel alloy is suitable as the material of the thin film.More specifically, nickel (Ni) au, 0% to 83.0%, iron (
Fe) l 7. Permalloy consisting of 0% to 20.0% is suitable.
第１図はこの発明の一実施例によるパーマロイ・スパッ
タ膜の磁気特性を示すＢ−Ｈループ、第２図は、狭トラ
ツク領域における従来ヘッドとこの発明の一実施例によ
るヘッドとの出力特性の比較図である。FIG. 1 shows a B-H loop showing the magnetic characteristics of a permalloy sputtered film according to an embodiment of the present invention, and FIG. 2 shows the output characteristics of a conventional head and a head according to an embodiment of the present invention in a narrow track region. It is a comparison diagram.
次に、作用について説明する。上記実施例によるパーマ
ロイ・スパッタ膜は、磁気的に等方的であり、その磁気
特性を示すＢ−Ｈループは、磁場印加方向に関係なく同
じである。従って、従来のもので見られる磁区パターン
（第４図）も、この発明による薄膜では観察されなかっ
た。Next, the effect will be explained. The permalloy sputtered film according to the above embodiment is magnetically isotropic, and the B-H loop indicating its magnetic properties is the same regardless of the direction of magnetic field application. Therefore, the magnetic domain pattern seen in the conventional one (FIG. 4) was not observed in the thin film according to the present invention.
また、第２図には、ヘッドのトラック幅−出力特性をそ
れぞれ従来のパーマロイ・メツキ膜によって磁極を形成
したものと５上記実施例によるパーマロイ・スパッタ膜
によって磁極を形成したものとを示しているが、同一ト
ラック幅で比較すると、この実施例によるヘッドの方が
高出力であることがわかる。これは、本実施例で示した
ヘッドの磁極が、還流磁区の発生しない磁気的に等方的
な磁性膜によって構成されているので、ヘッドとして機
能するトラック幅は第４図に示したトラック幅（４）と
等しくなり、書き込み特性として、媒体における記録領
域が従来のヘッドよりも広くなり、媒体の直径方向の記
録領域が長くなる。また、読み込み特性としてヘッドの
出力がトラック幅に比例することから、出力が従来のも
のよりも太きくなっていると考えられる。従って、この
発明によるヘッドは、高記録密度領域の狭トラツク幅に
おいて、良好な記録再生特性を示すことがわかる。Furthermore, FIG. 2 shows the track width-output characteristics of the head for a head whose magnetic pole was formed using a conventional permalloy plating film and for a head whose magnetic pole was formed using a permalloy sputtered film according to the above embodiment. However, when compared with the same track width, it can be seen that the head according to this embodiment has a higher output. This is because the magnetic pole of the head shown in this example is composed of a magnetically isotropic magnetic film in which no free-flow magnetic domain occurs, so the track width that functions as the head is the track width shown in FIG. (4), and as a writing characteristic, the recording area on the medium is wider than that of the conventional head, and the recording area in the diametrical direction of the medium is longer. Furthermore, since the output of the head is proportional to the track width as a reading characteristic, it is thought that the output is thicker than that of the conventional one. Therefore, it can be seen that the head according to the present invention exhibits good recording and reproducing characteristics in a narrow track width in a high recording density area.
例えば、ヘッドに要求される出力レベルを０．５ｍＶと
すると、従来のヘッドではトランク幅が１２μｍが限界
であるのに対して、この発明によるヘッドでは１０μｍ
まで可能となシ、トラック幅を２μｍ小さくすることが
できる。For example, if the output level required for a head is 0.5 mV, the trunk width of a conventional head is limited to 12 μm, whereas the trunk width of the head according to the present invention is 10 μm.
It is possible to reduce the track width by 2 μm.
また、磁化容易軸方向と磁化困難軸方向の透磁率比に関
しては、磁極のトランク幅の加工寸法精度（±０，５μ
ｍ）を考慮すると、その比が１以上のとき、この発明が
有効であることがわかる。すなわち、従来のものでは、
トラック幅１２μｍ、加工寸法精度を考慮すると、でき
あがり寸法１２±０．６μｍに対し、この発明では、上
記の透磁率比が、１および１／２でトラック幅が１０μ
ｍおよび１１μｍとすると、加工寸法精度を考慮した最
終のトランク幅はそれぞれｌｏ±０．６μ乳および１１
±０．５μｍとなる。In addition, regarding the magnetic permeability ratio in the easy magnetization axis direction and the hard magnetization axis direction, the machining dimensional accuracy of the trunk width of the magnetic pole (±0.5μ
Considering m), it can be seen that the present invention is effective when the ratio is 1 or more. In other words, in the conventional one,
The track width is 12 μm, and considering the machining dimensional accuracy, the finished size is 12 ± 0.6 μm, but in this invention, the above magnetic permeability ratio is 1 and 1/2, and the track width is 10 μm.
m and 11μm, the final trunk width considering processing dimensional accuracy is lo±0.6μ and 11μm, respectively.
It becomes ±0.5 μm.
以上のように、この発明によれば、薄膜磁気ヘッドの磁
極を磁気的に等方向に磁性薄膜によって形成し、還流磁
区の発生を防止したので、高記録密度領域の狭トラツク
幅においても、良好な記録再生特性を示す性能の高いも
のを歩留りよく製造することができる効果がある。As described above, according to the present invention, the magnetic poles of the thin-film magnetic head are formed magnetically in the same direction by a magnetic thin film to prevent the generation of freewheeling magnetic domains, so that even in narrow track widths in high recording density areas This has the effect of making it possible to manufacture high-performance products with excellent recording and reproducing characteristics at a high yield.
第１図はこの発明の一実施例によるパーマロイ・スパッ
タ膜の磁気特性を示すＢ−Ｈループ曲線図、第２図は狭
トラツク領域における従来ヘッドと当該実施例によるヘ
ッドとの出力特性の比較線図、第３図は従来のパーマロ
イ・メツキ膜の磁気特性を示すＢ−Ｈループ曲線図、第
４図は従来のパーマロイ・メツキ膜を用いて形成した薄
膜磁気ヘッドの磁極パターンにおいて発生する還流磁区
の模式図である。
＠ １ 図
第２図
トラ７７幅≠ｍ）
第３図
（ａ）
（ｂ）
第 ４ 図
手続補正書
昭和６３年１月６日FIG. 1 is a B-H loop curve diagram showing the magnetic characteristics of a permalloy sputtered film according to an embodiment of the present invention, and FIG. 2 is a comparison line of output characteristics between a conventional head and a head according to this embodiment in a narrow track region. Figure 3 is a B-H loop curve diagram showing the magnetic properties of a conventional permalloy plating film, and Fig. 4 is a reflux magnetic domain generated in the magnetic pole pattern of a thin film magnetic head formed using a conventional permalloy plating film. FIG. @ 1 Figure 2 Tiger 77 width≠m) Figure 3 (a) (b) Figure 4 Procedural amendment January 6, 1988
Claims (3)
、ギャップ、層間絶縁体膜、コイル、保護層をそれぞれ
形成する薄膜磁気ヘッドの製造方法において、 磁化容易軸方向の透磁率が磁化困難軸方向の透磁率の少
なくとも１／２の大きさを有し、磁気的に等方的な薄膜
によつて前記磁極を形成することを特徴とする薄膜磁気
ヘッドの製造方法。(1) In a method for manufacturing a thin-film magnetic head in which upper and lower magnetic poles, gaps, interlayer insulating films, coils, and protective layers are formed on a substrate with an insulating film on the surface, transparency in the direction of the axis of easy magnetization is used. A method of manufacturing a thin film magnetic head, characterized in that the magnetic pole is formed of a magnetically isotropic thin film having a magnetic permeability at least half as large as a magnetic permeability in the direction of the hard axis of magnetization.
を形成する特許請求の範囲第１項記載の薄膜磁気ヘッド
の製造方法。(2) A method of manufacturing a thin-film magnetic head according to claim 1, wherein the magnetic pole is formed of a permalloy thin film of an iron-nickel alloy.
１７．０％〜２０．０％でなるパーマロイを用いる特許
請求の範囲第２項記載の薄膜磁気ヘッドの製造方法。(3) A method for manufacturing a thin film magnetic head according to claim 2, using permalloy consisting of 80.0% to 83.0% nickel and 17.0% to 20.0% iron by weight.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25462787A JPH0198110A (en) | 1987-10-12 | 1987-10-12 | Production of thin film magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25462787A JPH0198110A (en) | 1987-10-12 | 1987-10-12 | Production of thin film magnetic head |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0198110A true JPH0198110A (en) | 1989-04-17 |
Family
ID=17267651
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP25462787A Pending JPH0198110A (en) | 1987-10-12 | 1987-10-12 | Production of thin film magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0198110A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0324118U (en) * | 1989-07-17 | 1991-03-13 | ||
| EP0455359A2 (en) * | 1990-04-30 | 1991-11-06 | Seagate Technology International | Thin film magnetic head and method of manufacture thereof |
| JPH05266423A (en) * | 1990-10-12 | 1993-10-15 | Fujitsu Ltd | Thin-film magnetic head |
-
1987
- 1987-10-12 JP JP25462787A patent/JPH0198110A/en active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0324118U (en) * | 1989-07-17 | 1991-03-13 | ||
| JPH0525607Y2 (en) * | 1989-07-17 | 1993-06-29 | ||
| EP0455359A2 (en) * | 1990-04-30 | 1991-11-06 | Seagate Technology International | Thin film magnetic head and method of manufacture thereof |
| US5170303A (en) * | 1990-04-30 | 1992-12-08 | Seagate Technology Inc. | Inductive thin film head having improved readback characteristics |
| USRE35228E (en) * | 1990-04-30 | 1996-05-07 | Seagate Technology, Inc. | Inductive thin film head having improved readback characteristics |
| JPH05266423A (en) * | 1990-10-12 | 1993-10-15 | Fujitsu Ltd | Thin-film magnetic head |
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