JPH0193120A - 縮小投影露光装置および方法 - Google Patents

縮小投影露光装置および方法

Info

Publication number
JPH0193120A
JPH0193120A JP62250886A JP25088687A JPH0193120A JP H0193120 A JPH0193120 A JP H0193120A JP 62250886 A JP62250886 A JP 62250886A JP 25088687 A JP25088687 A JP 25088687A JP H0193120 A JPH0193120 A JP H0193120A
Authority
JP
Japan
Prior art keywords
wafer
reticle
tilt
inclination
wafer surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62250886A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0556014B2 (enExample
Inventor
Hisahiro Matsukawa
尚弘 松川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP62250886A priority Critical patent/JPH0193120A/ja
Priority to US07/130,215 priority patent/US4845530A/en
Priority to KR1019870014992A priority patent/KR910001524B1/ko
Publication of JPH0193120A publication Critical patent/JPH0193120A/ja
Publication of JPH0556014B2 publication Critical patent/JPH0556014B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP62250886A 1986-12-26 1987-10-05 縮小投影露光装置および方法 Granted JPH0193120A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP62250886A JPH0193120A (ja) 1987-10-05 1987-10-05 縮小投影露光装置および方法
US07/130,215 US4845530A (en) 1986-12-26 1987-12-08 Reduced projection type step- and repeat-exposure apparatus
KR1019870014992A KR910001524B1 (ko) 1986-12-26 1987-12-26 축소투영노광장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62250886A JPH0193120A (ja) 1987-10-05 1987-10-05 縮小投影露光装置および方法

Publications (2)

Publication Number Publication Date
JPH0193120A true JPH0193120A (ja) 1989-04-12
JPH0556014B2 JPH0556014B2 (enExample) 1993-08-18

Family

ID=17214483

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62250886A Granted JPH0193120A (ja) 1986-12-26 1987-10-05 縮小投影露光装置および方法

Country Status (1)

Country Link
JP (1) JPH0193120A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006145449A (ja) * 2004-11-24 2006-06-08 Matsushita Electric Ind Co Ltd 傾き測定方法及び装置
JP2007218842A (ja) * 2006-02-20 2007-08-30 Tohoku Univ ３軸角度センサ

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE376495T1 (de) 2000-09-11 2007-11-15 Zipher Ltd Bandlaufwerk und druckvorrichtung

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5918950A (ja) * 1982-07-09 1984-01-31 パ−キン−エルマ−・ツエンゾ−ル・アンシユタルト 加工片上へのマスクの投影転写装置およびその調整方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5918950A (ja) * 1982-07-09 1984-01-31 パ−キン−エルマ−・ツエンゾ−ル・アンシユタルト 加工片上へのマスクの投影転写装置およびその調整方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006145449A (ja) * 2004-11-24 2006-06-08 Matsushita Electric Ind Co Ltd 傾き測定方法及び装置
JP2007218842A (ja) * 2006-02-20 2007-08-30 Tohoku Univ ３軸角度センサ

Also Published As

Publication number Publication date
JPH0556014B2 (enExample) 1993-08-18

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Legal Events

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