JPH0193120A - 縮小投影露光装置および方法 - Google Patents
縮小投影露光装置および方法Info
- Publication number
- JPH0193120A JPH0193120A JP62250886A JP25088687A JPH0193120A JP H0193120 A JPH0193120 A JP H0193120A JP 62250886 A JP62250886 A JP 62250886A JP 25088687 A JP25088687 A JP 25088687A JP H0193120 A JPH0193120 A JP H0193120A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- reticle
- tilt
- inclination
- wafer surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000001514 detection method Methods 0.000 claims description 20
- 230000003287 optical effect Effects 0.000 claims description 12
- 239000004065 semiconductor Substances 0.000 claims description 6
- 239000011159 matrix material Substances 0.000 claims description 2
- 238000000034 method Methods 0.000 abstract description 4
- 230000008602 contraction Effects 0.000 abstract 1
- 230000007423 decrease Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 241000276457 Gadidae Species 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62250886A JPH0193120A (ja) | 1987-10-05 | 1987-10-05 | 縮小投影露光装置および方法 |
US07/130,215 US4845530A (en) | 1986-12-26 | 1987-12-08 | Reduced projection type step- and repeat-exposure apparatus |
KR1019870014992A KR910001524B1 (ko) | 1986-12-26 | 1987-12-26 | 축소투영노광장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62250886A JPH0193120A (ja) | 1987-10-05 | 1987-10-05 | 縮小投影露光装置および方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0193120A true JPH0193120A (ja) | 1989-04-12 |
JPH0556014B2 JPH0556014B2 (enrdf_load_stackoverflow) | 1993-08-18 |
Family
ID=17214483
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62250886A Granted JPH0193120A (ja) | 1986-12-26 | 1987-10-05 | 縮小投影露光装置および方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0193120A (enrdf_load_stackoverflow) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006145449A (ja) * | 2004-11-24 | 2006-06-08 | Matsushita Electric Ind Co Ltd | 傾き測定方法及び装置 |
JP2007218842A (ja) * | 2006-02-20 | 2007-08-30 | Tohoku Univ | 3軸角度センサ |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ES2330154T5 (es) | 2000-09-11 | 2017-10-25 | Videojet Technologies, Inc. | Dispositivo de accionamiento de cinta y aparato de impresión |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5918950A (ja) * | 1982-07-09 | 1984-01-31 | パ−キン−エルマ−・ツエンゾ−ル・アンシユタルト | 加工片上へのマスクの投影転写装置およびその調整方法 |
-
1987
- 1987-10-05 JP JP62250886A patent/JPH0193120A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5918950A (ja) * | 1982-07-09 | 1984-01-31 | パ−キン−エルマ−・ツエンゾ−ル・アンシユタルト | 加工片上へのマスクの投影転写装置およびその調整方法 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006145449A (ja) * | 2004-11-24 | 2006-06-08 | Matsushita Electric Ind Co Ltd | 傾き測定方法及び装置 |
JP2007218842A (ja) * | 2006-02-20 | 2007-08-30 | Tohoku Univ | 3軸角度センサ |
Also Published As
Publication number | Publication date |
---|---|
JPH0556014B2 (enrdf_load_stackoverflow) | 1993-08-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP3181050B2 (ja) | 投影露光方法およびその装置 | |
JP2679186B2 (ja) | 露光装置 | |
JP2785146B2 (ja) | 自動焦点調整制御装置 | |
JP7147738B2 (ja) | 計測装置及び計測方法、並びに露光装置 | |
JPH1055946A (ja) | 露光条件測定方法 | |
US6018395A (en) | Alignment system | |
JP3316706B2 (ja) | 投影露光装置、及び該装置を用いる素子製造方法 | |
JP2580668B2 (ja) | 露光方法、露光条件測定方法及ぴパターン測定方法 | |
JPH09223650A (ja) | 露光装置 | |
KR910001524B1 (ko) | 축소투영노광장치 | |
US20050041235A1 (en) | Exposure apparatus, method of controlling same, and method of manufacturing devices | |
JPH0193120A (ja) | 縮小投影露光装置および方法 | |
JP3428825B2 (ja) | 面位置検出方法および面位置検出装置 | |
JP2705778B2 (ja) | 投影露光装置 | |
US11243480B2 (en) | System for making accurate grating patterns using multiple writing columns each making multiple scans | |
JPH07219243A (ja) | 露光装置の評価方法 | |
JP2626076B2 (ja) | 位置検出装置 | |
JP2556074B2 (ja) | 投影露光装置、投影露光方法及び水平位置検出装置 | |
JP2830003B2 (ja) | 投影露光装置及び投影露光方法 | |
JPS63107139A (ja) | 感光基板のアライメント方法 | |
JP2004184994A (ja) | 露光方法および露光装置ならびに処理装置 | |
JP3237150B2 (ja) | 露光方法、デバイス製造方法、および露光装置 | |
JPH06236837A (ja) | 面位置検出方法及びそれを用いた投影露光装置 | |
JP2775988B2 (ja) | 位置検出装置 | |
JPH0564450B2 (enrdf_load_stackoverflow) |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |