JPH019152Y2 - - Google Patents
Info
- Publication number
- JPH019152Y2 JPH019152Y2 JP14734484U JP14734484U JPH019152Y2 JP H019152 Y2 JPH019152 Y2 JP H019152Y2 JP 14734484 U JP14734484 U JP 14734484U JP 14734484 U JP14734484 U JP 14734484U JP H019152 Y2 JPH019152 Y2 JP H019152Y2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- mask
- holder
- front surface
- thick substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 40
- 238000004381 surface treatment Methods 0.000 claims description 12
- 230000008020 evaporation Effects 0.000 claims description 4
- 238000001704 evaporation Methods 0.000 claims description 4
- 239000010409 thin film Substances 0.000 description 8
- 239000000463 material Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 3
- 238000005452 bending Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009760 electrical discharge machining Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 230000009191 jumping Effects 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Landscapes
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14734484U JPH019152Y2 (en, 2012) | 1984-10-01 | 1984-10-01 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14734484U JPH019152Y2 (en, 2012) | 1984-10-01 | 1984-10-01 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6163831U JPS6163831U (en, 2012) | 1986-04-30 |
| JPH019152Y2 true JPH019152Y2 (en, 2012) | 1989-03-13 |
Family
ID=30705573
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14734484U Expired JPH019152Y2 (en, 2012) | 1984-10-01 | 1984-10-01 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH019152Y2 (en, 2012) |
-
1984
- 1984-10-01 JP JP14734484U patent/JPH019152Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6163831U (en, 2012) | 1986-04-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US20210231610A1 (en) | Sample support body | |
| US11355333B2 (en) | Sample support body | |
| US20200273689A1 (en) | Laser desorption/ionization method and mass spectrometry method | |
| CN1151611A (zh) | 形成电子元件电极的设备和方法 | |
| JPH019152Y2 (en, 2012) | ||
| CN100540726C (zh) | 用于镀覆表面的模块化装置 | |
| US11658018B2 (en) | Sample support body | |
| JPS59170270A (ja) | 膜形成装置 | |
| JPS5976873A (ja) | 装飾品の部分被覆方法 | |
| JPS63153265A (ja) | スパツタ装置 | |
| JPS60204878A (ja) | スパツタリングタ−ゲツト | |
| CN112095084B (zh) | 镀膜设备 | |
| JPS6179765A (ja) | レ−ザ蒸着装置 | |
| JPS62195548A (ja) | 試料保持方法および装置 | |
| JP2786787B2 (ja) | 噴射メッキ装置及び噴射メッキ方法 | |
| JPS6187871A (ja) | イオン・ビ−ム・デポジシヨン法 | |
| JPH0226936Y2 (en, 2012) | ||
| JP3303507B2 (ja) | 薄膜形成用マスク | |
| JPS61279666A (ja) | 装身具の金属被膜形成方法 | |
| JPS5680135A (en) | Substrate holder for ion etching device | |
| JPS5842441Y2 (ja) | 蒸着装置 | |
| JPS61130480A (ja) | 蒸着用マスク | |
| JPH0363569U (en, 2012) | ||
| JPH0734925Y2 (ja) | イオンビ−ムスパツタリング装置 | |
| JPH01243356A (ja) | レーザアシストイオンビームミキシング方法及び装置 |