JPH0186054U - - Google Patents
Info
- Publication number
- JPH0186054U JPH0186054U JP18065487U JP18065487U JPH0186054U JP H0186054 U JPH0186054 U JP H0186054U JP 18065487 U JP18065487 U JP 18065487U JP 18065487 U JP18065487 U JP 18065487U JP H0186054 U JPH0186054 U JP H0186054U
- Authority
- JP
- Japan
- Prior art keywords
- vacuum chamber
- cathode
- electron microscope
- vacuum
- evaporation device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 4
- 229910052760 oxygen Inorganic materials 0.000 claims description 4
- 239000001301 oxygen Substances 0.000 claims description 4
- 238000007738 vacuum evaporation Methods 0.000 claims description 3
- 238000004380 ashing Methods 0.000 claims 1
- 238000010000 carbonizing Methods 0.000 claims 1
- 150000002500 ions Chemical class 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 239000005416 organic matter Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Description
第１図は、本考案の一実施例の電子顕微鏡用真
空蒸着装置を示すブロツク図である。
１……真空チヤンバー、２……蒸着用ターゲツ
ト（陰極に対応する。）、３……試料台（陽極に
対応する。）、４……試料、５，１１……プラズ
マ発生用高周波電極、６……酸素供給ノズル、７
……蒸着制御部、８……プラズマ発生用高周波電
極制御部、９……酸素流量調整器、１０……真空
排気系。
FIG. 1 is a block diagram showing a vacuum evaporation apparatus for an electron microscope according to an embodiment of the present invention. DESCRIPTION OF SYMBOLS 1... Vacuum chamber, 2... Target for evaporation (corresponding to the cathode), 3... Sample stage (corresponding to the anode), 4... Sample, 5, 11... High frequency electrode for plasma generation, 6 ...Oxygen supply nozzle, 7
... Vapor deposition control section, 8 ... High frequency electrode control section for plasma generation, 9 ... Oxygen flow rate regulator, 10 ... Vacuum exhaust system.
Claims (1)
かけてイオンを前記陰極に衝突させ、飛散した金
属を前記陽極側の試料の表面に蒸着させる電子顕
微鏡用真空蒸着装置において、前記試料の表面に
付着した有機物を炭化処理して除去するプラズマ
アツシング装置が備えてあり、プラズマを発生さ
せる一対のプラズマ発生用高周波電極が前記真空
チヤンバー内で対向配置してあり、前記真空チヤ
ンバー内に酸素を供給する酸素供給ノズルが設け
てあることを特徴とする電子顕微鏡用真空蒸着装
置。 In a vacuum evaporation device for an electron microscope, in which a voltage is applied between an anode and a cathode in a vacuum chamber, ions collide with the cathode, and the scattered metal is deposited on the surface of the sample on the anode side. A plasma ashing device is provided for carbonizing and removing adhered organic matter, and a pair of high frequency electrodes for generating plasma are arranged opposite each other in the vacuum chamber to supply oxygen to the vacuum chamber. A vacuum evaporation device for an electron microscope, characterized in that it is provided with an oxygen supply nozzle.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18065487U JPH0186054U (en) | 1987-11-26 | 1987-11-26 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18065487U JPH0186054U (en) | 1987-11-26 | 1987-11-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0186054U true JPH0186054U (en) | 1989-06-07 |
Family
ID=31472164
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18065487U Pending JPH0186054U (en) | 1987-11-26 | 1987-11-26 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0186054U (en) |
-
1987
- 1987-11-26 JP JP18065487U patent/JPH0186054U/ja active Pending
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