JPH0183256U - - Google Patents
Info
- Publication number
- JPH0183256U JPH0183256U JP1987179296U JP17929687U JPH0183256U JP H0183256 U JPH0183256 U JP H0183256U JP 1987179296 U JP1987179296 U JP 1987179296U JP 17929687 U JP17929687 U JP 17929687U JP H0183256 U JPH0183256 U JP H0183256U
- Authority
- JP
- Japan
- Prior art keywords
- ions
- electrostatic
- tube
- accelerator
- accelerates
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005468 ion implantation Methods 0.000 claims description 3
- 150000002500 ions Chemical class 0.000 claims 9
- 230000001133 acceleration Effects 0.000 claims 2
- 238000006243 chemical reaction Methods 0.000 claims 1
- 230000005684 electric field Effects 0.000 claims 1
- 230000005686 electrostatic field Effects 0.000 claims 1
- 239000000284 extract Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
Landscapes
- Electron Sources, Ion Sources (AREA)
Description
第1図は、この考案の一実施例に係るイオン注
入装置を示す概略図である。第2図は、従来のイ
オン注入装置の一例を示す概略図である。
2…イオン源、4…イオン、6…集束系、8…
線形加速器、16…高周波電源、28…分析器、
30…ターゲツト、32…荷電変換器、40…静
電加速管、42…加速電源。
FIG. 1 is a schematic diagram showing an ion implantation apparatus according to an embodiment of this invention. FIG. 2 is a schematic diagram showing an example of a conventional ion implantation apparatus. 2...Ion source, 4...Ion, 6...Focusing system, 8...
Linear accelerator, 16...high frequency power supply, 28...analyzer,
30... Target, 32... Charge converter, 40... Electrostatic accelerator tube, 42... Accelerating power source.
Claims (1)
する装置であつて、イオンを引き出すためのイオ
ン源、イオン源からのイオンを高周波電場によつ
て加速する線形加速器および線形加速器からのイ
オンの荷電変換を行う荷電変換器であつていずれ
も高電位部に搭載されたものと、荷電変換器から
のイオンを静電場によつて加速する静電加速管と
、静電加速管に直流で電圧可変の加速電圧を印加
する加速電源と、静電加速管からのイオンを選択
的に導出する分析器とを備えることを特徴とする
イオン注入装置。 This is a device that injects accelerated ions into a target in a vacuum, and includes an ion source for extracting ions, a linear accelerator that accelerates ions from the ion source using a high-frequency electric field, and charge conversion of ions from the linear accelerator. There is a charge converter mounted on a high potential section, an electrostatic accelerator tube that accelerates the ions from the charge converter using an electrostatic field, and an electrostatic accelerator tube that uses direct current to accelerate the ions with a variable voltage. An ion implantation device comprising an acceleration power supply that applies voltage and an analyzer that selectively extracts ions from an electrostatic acceleration tube.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1987179296U JPH0183256U (en) | 1987-11-24 | 1987-11-24 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1987179296U JPH0183256U (en) | 1987-11-24 | 1987-11-24 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0183256U true JPH0183256U (en) | 1989-06-02 |
Family
ID=31470856
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1987179296U Pending JPH0183256U (en) | 1987-11-24 | 1987-11-24 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0183256U (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20220285126A1 (en) * | 2021-03-04 | 2022-09-08 | Sumitomo Heavy Industries Ion Technology Co., Ltd. | Ion implanter and ion implantation method |
-
1987
- 1987-11-24 JP JP1987179296U patent/JPH0183256U/ja active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20220285126A1 (en) * | 2021-03-04 | 2022-09-08 | Sumitomo Heavy Industries Ion Technology Co., Ltd. | Ion implanter and ion implantation method |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS58110956U (en) | Charged particle irradiation device | |
JPH0183256U (en) | ||
JPS6421073A (en) | Ion implanting device | |
JPH0435344U (en) | ||
ATE140560T1 (en) | ION PUMP AND VACUUM PUMP SYSTEM THEREOF | |
JPH0250952U (en) | ||
JPS6253558U (en) | ||
JPS62193662U (en) | ||
JPH0277843U (en) | ||
JPS5974659U (en) | Ion generator of ion implanter | |
JPH0282871U (en) | ||
JPH0390100U (en) | ||
JPH01137061U (en) | ||
JPH01122252U (en) | ||
JPS6433200U (en) | ||
JPS62175559U (en) | ||
JPH0163062U (en) | ||
JPS63174200U (en) | ||
JPH01152445U (en) | ||
DE69505702D1 (en) | Method and device for accelerating missiles | |
JPS61199860U (en) | ||
JPH0165132U (en) | ||
ROVANG et al. | Ion extraction capabilities of two-grid accelerator systems[M. S. Thesis] | |
JPH0455752U (en) | ||
JPS6234755U (en) |