JPH0183256U - - Google Patents

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Publication number
JPH0183256U
JPH0183256U JP1987179296U JP17929687U JPH0183256U JP H0183256 U JPH0183256 U JP H0183256U JP 1987179296 U JP1987179296 U JP 1987179296U JP 17929687 U JP17929687 U JP 17929687U JP H0183256 U JPH0183256 U JP H0183256U
Authority
JP
Japan
Prior art keywords
ions
electrostatic
tube
accelerator
accelerates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1987179296U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1987179296U priority Critical patent/JPH0183256U/ja
Publication of JPH0183256U publication Critical patent/JPH0183256U/ja
Pending legal-status Critical Current

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  • Electron Sources, Ion Sources (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、この考案の一実施例に係るイオン注
入装置を示す概略図である。第2図は、従来のイ
オン注入装置の一例を示す概略図である。 2…イオン源、4…イオン、6…集束系、8…
線形加速器、16…高周波電源、28…分析器、
30…ターゲツト、32…荷電変換器、40…静
電加速管、42…加速電源。
FIG. 1 is a schematic diagram showing an ion implantation apparatus according to an embodiment of this invention. FIG. 2 is a schematic diagram showing an example of a conventional ion implantation apparatus. 2...Ion source, 4...Ion, 6...Focusing system, 8...
Linear accelerator, 16...high frequency power supply, 28...analyzer,
30... Target, 32... Charge converter, 40... Electrostatic accelerator tube, 42... Accelerating power source.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 加速されたイオンを真空中でターゲツトに注入
する装置であつて、イオンを引き出すためのイオ
ン源、イオン源からのイオンを高周波電場によつ
て加速する線形加速器および線形加速器からのイ
オンの荷電変換を行う荷電変換器であつていずれ
も高電位部に搭載されたものと、荷電変換器から
のイオンを静電場によつて加速する静電加速管と
、静電加速管に直流で電圧可変の加速電圧を印加
する加速電源と、静電加速管からのイオンを選択
的に導出する分析器とを備えることを特徴とする
イオン注入装置。
This is a device that injects accelerated ions into a target in a vacuum, and includes an ion source for extracting ions, a linear accelerator that accelerates ions from the ion source using a high-frequency electric field, and charge conversion of ions from the linear accelerator. There is a charge converter mounted on a high potential section, an electrostatic accelerator tube that accelerates the ions from the charge converter using an electrostatic field, and an electrostatic accelerator tube that uses direct current to accelerate the ions with a variable voltage. An ion implantation device comprising an acceleration power supply that applies voltage and an analyzer that selectively extracts ions from an electrostatic acceleration tube.
JP1987179296U 1987-11-24 1987-11-24 Pending JPH0183256U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1987179296U JPH0183256U (en) 1987-11-24 1987-11-24

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1987179296U JPH0183256U (en) 1987-11-24 1987-11-24

Publications (1)

Publication Number Publication Date
JPH0183256U true JPH0183256U (en) 1989-06-02

Family

ID=31470856

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1987179296U Pending JPH0183256U (en) 1987-11-24 1987-11-24

Country Status (1)

Country Link
JP (1) JPH0183256U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20220285126A1 (en) * 2021-03-04 2022-09-08 Sumitomo Heavy Industries Ion Technology Co., Ltd. Ion implanter and ion implantation method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20220285126A1 (en) * 2021-03-04 2022-09-08 Sumitomo Heavy Industries Ion Technology Co., Ltd. Ion implanter and ion implantation method

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