JPH0160533U - - Google Patents
Info
- Publication number
- JPH0160533U JPH0160533U JP15529987U JP15529987U JPH0160533U JP H0160533 U JPH0160533 U JP H0160533U JP 15529987 U JP15529987 U JP 15529987U JP 15529987 U JP15529987 U JP 15529987U JP H0160533 U JPH0160533 U JP H0160533U
- Authority
- JP
- Japan
- Prior art keywords
- reaction tube
- cvd apparatus
- vertical cvd
- reaction chamber
- internal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010453 quartz Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Description
第１図は本考案反応室構造の一実施例を適用し
た縦形ＣＶＤ装置の縦断面図、第２図は本考案に
おける下方に窪む球状キヤツプの一例を示す斜視
図、第３図は従来の縦形ＣＶＤ装置の一例を示す
縦断面図である。
１……外部（石英）反応管、２……内部（石英
）反応管、１０……ヒータ、１１……下方に窪む
球状（石英）キヤツプ、１２……支持部。
Fig. 1 is a vertical sectional view of a vertical CVD apparatus to which an embodiment of the reaction chamber structure of the present invention is applied, Fig. 2 is a perspective view showing an example of the downwardly recessed spherical cap of the present invention, and Fig. 3 is a conventional one. FIG. 1 is a vertical cross-sectional view showing an example of a vertical CVD apparatus. DESCRIPTION OF SYMBOLS 1...External (quartz) reaction tube, 2...Internal (quartz) reaction tube, 10...Heater, 11...Downwardly recessed spherical (quartz) cap, 12...Support part.
Claims (1)
りなる反応室を有する縦形ＣＶＤ装置において、
内部反応管２の上部に、下方に窪む球状キヤツプ
１１の支持部１２を固定してなる縦形ＣＶＤ装置
の反応室構造。 In a vertical CVD apparatus having a reaction chamber consisting of an external reaction tube 1 and an internal reaction tube 2 in a heater 10,
This is a reaction chamber structure of a vertical CVD apparatus in which a supporting part 12 of a downwardly recessed spherical cap 11 is fixed to the upper part of an internal reaction tube 2.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15529987U JPH0530357Y2 (en) | 1987-10-09 | 1987-10-09 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15529987U JPH0530357Y2 (en) | 1987-10-09 | 1987-10-09 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0160533U true JPH0160533U (en) | 1989-04-17 |
| JPH0530357Y2 JPH0530357Y2 (en) | 1993-08-03 |
Family
ID=31432805
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15529987U Expired - Lifetime JPH0530357Y2 (en) | 1987-10-09 | 1987-10-09 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0530357Y2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002280310A (en) * | 2001-03-19 | 2002-09-27 | Tokyo Electron Ltd | Vertical heat treatment device |
-
1987
- 1987-10-09 JP JP15529987U patent/JPH0530357Y2/ja not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002280310A (en) * | 2001-03-19 | 2002-09-27 | Tokyo Electron Ltd | Vertical heat treatment device |
| JP4593814B2 (en) * | 2001-03-19 | 2010-12-08 | 東京エレクトロン株式会社 | Vertical heat treatment equipment |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0530357Y2 (en) | 1993-08-03 |