JPS6437034U - - Google Patents
Info
- Publication number
- JPS6437034U JPS6437034U JP13169587U JP13169587U JPS6437034U JP S6437034 U JPS6437034 U JP S6437034U JP 13169587 U JP13169587 U JP 13169587U JP 13169587 U JP13169587 U JP 13169587U JP S6437034 U JPS6437034 U JP S6437034U
- Authority
- JP
- Japan
- Prior art keywords
- reaction tube
- lower ends
- utility
- model registration
- vertical diffusion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000009792 diffusion process Methods 0.000 claims 2
- 238000010586 diagram Methods 0.000 description 1
Description
第１図は本考案を適用した２重反応管構造を有
する縦型ＣＶＤ装置の一例を示す概略断面図、第
２図は従来による縦形ＣＶＤ装置の一例を示す概
略断面図、第３図は縦形炉における温度分布を示
す説明図、第４図は横形炉における温度分布を示
す説明図である。
１……ヒータ、２……外側反応管（アウターチ
ユーブ）、３……内側反応管（インナーチユーブ
）、４……ボート、５……ウエーハ、Ａ，Ｂ……
上、下端部。
Fig. 1 is a schematic sectional view showing an example of a vertical CVD device having a double reaction tube structure to which the present invention is applied, Fig. 2 is a schematic sectional view showing an example of a conventional vertical CVD device, and Fig. 3 is a vertical type CVD device. FIG. 4 is an explanatory diagram showing temperature distribution in a horizontal furnace. 1...Heater, 2...Outer reaction tube (outer tube), 3...Inner reaction tube (inner tube), 4...Boat, 5...Wafer, A, B...
Upper and lower ends.
Claims (1)
上、下端部の肉厚を厚くした構成とする縦形拡散
・ＣＶＤ装置における反応管。 (2) 反応管は２重構造とし、その内側反応管の
上、下端部の肉厚部分に穏やかな曲線や勾配の面
を付与した実用新案登録請求の範囲第１項記載の
縦形拡散・ＣＶＤ装置における反応管。[Claims for Utility Model Registration] (1) A reaction tube in a vertical diffusion/CVD apparatus, which has a structure in which the upper and lower ends of the reaction tube are thickened. (2) Vertical diffusion/CVD according to claim 1 of the utility model registration claim, in which the reaction tube has a double structure, and the thick walled portions of the upper and lower ends of the inner reaction tube are provided with gentle curves and sloped surfaces. Reaction tube in the device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13169587U JPS6437034U (en) | 1987-08-28 | 1987-08-28 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13169587U JPS6437034U (en) | 1987-08-28 | 1987-08-28 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6437034U true JPS6437034U (en) | 1989-03-06 |
Family
ID=31388003
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13169587U Pending JPS6437034U (en) | 1987-08-28 | 1987-08-28 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6437034U (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60245215A (en) * | 1984-05-21 | 1985-12-05 | Fujitsu Ltd | Vertical furnace |
| JPS61114522A (en) * | 1984-11-09 | 1986-06-02 | Hitachi Ltd | Heater for semiconductor wafer |
-
1987
- 1987-08-28 JP JP13169587U patent/JPS6437034U/ja active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60245215A (en) * | 1984-05-21 | 1985-12-05 | Fujitsu Ltd | Vertical furnace |
| JPS61114522A (en) * | 1984-11-09 | 1986-06-02 | Hitachi Ltd | Heater for semiconductor wafer |