JPH0159733B2 - - Google Patents

Info

Publication number
JPH0159733B2
JPH0159733B2 JP54087462A JP8746279A JPH0159733B2 JP H0159733 B2 JPH0159733 B2 JP H0159733B2 JP 54087462 A JP54087462 A JP 54087462A JP 8746279 A JP8746279 A JP 8746279A JP H0159733 B2 JPH0159733 B2 JP H0159733B2
Authority
JP
Japan
Prior art keywords
light
optical system
mark
illumination light
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54087462A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5612729A (en
Inventor
Kyoichi Suwa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kogaku KK filed Critical Nippon Kogaku KK
Priority to JP8746279A priority Critical patent/JPS5612729A/ja
Priority to US06/166,794 priority patent/US4390279A/en
Publication of JPS5612729A publication Critical patent/JPS5612729A/ja
Publication of JPH0159733B2 publication Critical patent/JPH0159733B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Projection-Type Copiers In General (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP8746279A 1979-07-12 1979-07-12 ?alignmening device for ic projection exposure equipment Granted JPS5612729A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP8746279A JPS5612729A (en) 1979-07-12 1979-07-12 ?alignmening device for ic projection exposure equipment
US06/166,794 US4390279A (en) 1979-07-12 1980-07-08 Alignment device in an IC projection exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8746279A JPS5612729A (en) 1979-07-12 1979-07-12 ?alignmening device for ic projection exposure equipment

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP62013341A Division JPS62216231A (ja) 1987-01-24 1987-01-24 アライメント装置

Publications (2)

Publication Number Publication Date
JPS5612729A JPS5612729A (en) 1981-02-07
JPH0159733B2 true JPH0159733B2 (en, 2012) 1989-12-19

Family

ID=13915539

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8746279A Granted JPS5612729A (en) 1979-07-12 1979-07-12 ?alignmening device for ic projection exposure equipment

Country Status (1)

Country Link
JP (1) JPS5612729A (en, 2012)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5825638A (ja) * 1981-08-08 1983-02-15 Canon Inc 露光装置
JPS5927526A (ja) * 1982-08-06 1984-02-14 Hitachi Ltd 縮小投影露光装置
JPS6232615A (ja) * 1985-08-06 1987-02-12 Canon Inc 投影露光装置
US7433018B2 (en) * 2005-12-27 2008-10-07 Asml Netherlands B.V. Pattern alignment method and lithographic apparatus
TWI401529B (zh) * 2008-06-27 2013-07-11 Au Optronics Corp 光罩上的對位標尺及應用對位標尺的遮蔽件位置確認方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5212577A (en) * 1975-07-21 1977-01-31 Nippon Kogaku Kk <Nikon> Automatic location device
NL7606548A (nl) * 1976-06-17 1977-12-20 Philips Nv Werkwijze en inrichting voor het uitrichten van een i.c.-patroon ten opzichte van een halfgelei- dend substraat.
JPS5332759A (en) * 1976-09-08 1978-03-28 Nippon Telegr & Teleph Corp <Ntt> Precision coordinate position detection and position control unit by composite diffration grating method
US4200395A (en) * 1977-05-03 1980-04-29 Massachusetts Institute Of Technology Alignment of diffraction gratings

Also Published As

Publication number Publication date
JPS5612729A (en) 1981-02-07

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