JPH0156542B2 - - Google Patents

Info

Publication number
JPH0156542B2
JPH0156542B2 JP60037432A JP3743285A JPH0156542B2 JP H0156542 B2 JPH0156542 B2 JP H0156542B2 JP 60037432 A JP60037432 A JP 60037432A JP 3743285 A JP3743285 A JP 3743285A JP H0156542 B2 JPH0156542 B2 JP H0156542B2
Authority
JP
Japan
Prior art keywords
layer
type
semiconductor
electron
molecular beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP60037432A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61198783A (ja
Inventor
Tomonori Ishikawa
Masahiko Sasa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP60037432A priority Critical patent/JPS61198783A/ja
Publication of JPS61198783A publication Critical patent/JPS61198783A/ja
Publication of JPH0156542B2 publication Critical patent/JPH0156542B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/60Impurity distributions or concentrations
    • H10D62/605Planar doped, e.g. atomic-plane doped or delta-doped
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/40FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels
    • H10D30/47FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels having 2D charge carrier gas channels, e.g. nanoribbon FETs or high electron mobility transistors [HEMT]
    • H10D30/471High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT]
    • H10D30/475High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT] having wider bandgap layer formed on top of lower bandgap active layer, e.g. undoped barrier HEMTs such as i-AlGaN/GaN HEMTs
    • H10D30/4755High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT] having wider bandgap layer formed on top of lower bandgap active layer, e.g. undoped barrier HEMTs such as i-AlGaN/GaN HEMTs having wide bandgap charge-carrier supplying layers, e.g. modulation doped HEMTs such as n-AlGaAs/GaAs HEMTs

Landscapes

  • Junction Field-Effect Transistors (AREA)
JP60037432A 1985-02-28 1985-02-28 電界効果型半導体装置 Granted JPS61198783A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60037432A JPS61198783A (ja) 1985-02-28 1985-02-28 電界効果型半導体装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60037432A JPS61198783A (ja) 1985-02-28 1985-02-28 電界効果型半導体装置

Publications (2)

Publication Number Publication Date
JPS61198783A JPS61198783A (ja) 1986-09-03
JPH0156542B2 true JPH0156542B2 (enrdf_load_stackoverflow) 1989-11-30

Family

ID=12497350

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60037432A Granted JPS61198783A (ja) 1985-02-28 1985-02-28 電界効果型半導体装置

Country Status (1)

Country Link
JP (1) JPS61198783A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS61198783A (ja) 1986-09-03

Similar Documents

Publication Publication Date Title
JPH0156543B2 (enrdf_load_stackoverflow)
US4845049A (en) Doping III-V compound semiconductor devices with group VI monolayers using ALE
US5561302A (en) Enhanced mobility MOSFET device and method
Martinez et al. On the mobility of polycrystalline semiconductors
EP1644986B1 (en) Semiconductor device, method of manufacturing a quantum well structure and a semiconductor device comprising such a quantum well structure
US5448084A (en) Field effect transistors on spinel substrates
EP0249371B1 (en) Semiconductor device including two compound semiconductors, and method of manufacturing such a device
JP2764049B2 (ja) 化合物半導体装置の製造方法、化合物半導体装置及び電界効果トランジスタ
JPS639388B2 (enrdf_load_stackoverflow)
JPH0156542B2 (enrdf_load_stackoverflow)
US4550031A (en) Control of Si doping in GaAs, (Al,Ga)As and other compound semiconductors during MBE growth
JPH0732247B2 (ja) 半導体装置
US4885619A (en) HgCdTe MIS device having a CdTe heterojunction
JPH0156541B2 (enrdf_load_stackoverflow)
EP0196245B1 (en) Compound semiconductor layer having high carrier concentration and method of forming same
JP2994863B2 (ja) ヘテロ接合半導体装置
JPH0230182B2 (enrdf_load_stackoverflow)
CN108565285B (zh) 一种GaAs基高电子迁移率晶体管材料及其制备方法
JPS63136672A (ja) トンネル・トランジスタ
KR940002019Y1 (ko) 바이폴라 핫전자 트랜지스터
JP2555885B2 (ja) ゲルマニウム・砒化ガリウム接合の製造方法
JP2905008B2 (ja) 半導体装置の製造方法
Nishizawa et al. Monomolecular layer epitaxy of GaAs for ideal static induction transistor
JPH01120871A (ja) 半導体装置
JPS594085A (ja) 半導体装置

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term