JPH0151043B2 - - Google Patents
Info
- Publication number
- JPH0151043B2 JPH0151043B2 JP17020480A JP17020480A JPH0151043B2 JP H0151043 B2 JPH0151043 B2 JP H0151043B2 JP 17020480 A JP17020480 A JP 17020480A JP 17020480 A JP17020480 A JP 17020480A JP H0151043 B2 JPH0151043 B2 JP H0151043B2
- Authority
- JP
- Japan
- Prior art keywords
- ribbon
- thin film
- properties
- tension
- ceramic thin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000010409 thin film Substances 0.000 claims description 28
- 239000000919 ceramic Substances 0.000 claims description 26
- 229910000976 Electrical steel Inorganic materials 0.000 claims description 18
- 238000000576 coating method Methods 0.000 claims description 17
- 229910000808 amorphous metal alloy Inorganic materials 0.000 claims description 16
- 239000011248 coating agent Substances 0.000 claims description 15
- 230000007797 corrosion Effects 0.000 claims description 13
- 238000005260 corrosion Methods 0.000 claims description 13
- 238000009413 insulation Methods 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 10
- 229910000831 Steel Inorganic materials 0.000 claims description 9
- 238000004544 sputter deposition Methods 0.000 claims description 9
- 239000010959 steel Substances 0.000 claims description 9
- 238000010438 heat treatment Methods 0.000 claims description 8
- 229910052710 silicon Inorganic materials 0.000 claims description 8
- 238000005452 bending Methods 0.000 claims description 7
- 238000005229 chemical vapour deposition Methods 0.000 claims description 6
- 238000001771 vacuum deposition Methods 0.000 claims description 6
- 229910019142 PO4 Inorganic materials 0.000 claims description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims description 4
- 239000010452 phosphate Substances 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical group [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 52
- 229910052742 iron Inorganic materials 0.000 description 16
- 238000000137 annealing Methods 0.000 description 14
- 229910004298 SiO 2 Inorganic materials 0.000 description 12
- 239000011162 core material Substances 0.000 description 12
- 230000006866 deterioration Effects 0.000 description 11
- 239000000463 material Substances 0.000 description 11
- 239000010408 film Substances 0.000 description 6
- 229910045601 alloy Inorganic materials 0.000 description 5
- 239000000956 alloy Substances 0.000 description 5
- 238000000151 deposition Methods 0.000 description 5
- 239000011229 interlayer Substances 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 238000002425 crystallisation Methods 0.000 description 4
- 230000008025 crystallization Effects 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 230000004907 flux Effects 0.000 description 4
- 229910052839 forsterite Inorganic materials 0.000 description 4
- HCWCAKKEBCNQJP-UHFFFAOYSA-N magnesium orthosilicate Chemical compound [Mg+2].[Mg+2].[O-][Si]([O-])([O-])[O-] HCWCAKKEBCNQJP-UHFFFAOYSA-N 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 3
- -1 SrO2 Inorganic materials 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000000696 magnetic material Substances 0.000 description 3
- 238000005096 rolling process Methods 0.000 description 3
- 238000007738 vacuum evaporation Methods 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- 229910018619 Si-Fe Inorganic materials 0.000 description 2
- 229910008289 SiâFe Inorganic materials 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 230000005284 excitation Effects 0.000 description 2
- 238000009501 film coating Methods 0.000 description 2
- 230000005389 magnetism Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 238000010791 quenching Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- 101000993059 Homo sapiens Hereditary hemochromatosis protein Proteins 0.000 description 1
- 229910003902 SiCl 4 Inorganic materials 0.000 description 1
- 229910007926 ZrCl Inorganic materials 0.000 description 1
- GEIAQOFPUVMAGM-UHFFFAOYSA-N ZrO Inorganic materials [Zr]=O GEIAQOFPUVMAGM-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 229910000421 cerium(III) oxide Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 229910001510 metal chloride Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000005554 pickling Methods 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000010008 shearing Methods 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
- C21D8/00—Modifying the physical properties by deformation combined with, or followed by, heat treatment
- C21D8/12—Modifying the physical properties by deformation combined with, or followed by, heat treatment during manufacturing of articles with special electromagnetic properties
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F1/00—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
- H01F1/01—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials
- H01F1/03—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity
- H01F1/12—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials
- H01F1/14—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials metals or alloys
- H01F1/16—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials metals or alloys in the form of sheets
- H01F1/18—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials metals or alloys in the form of sheets with insulating coating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Thermal Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mechanical Engineering (AREA)
- Electromagnetism (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Dispersion Chemistry (AREA)
- Power Engineering (AREA)
- Soft Magnetic Materials (AREA)
- Iron Core Of Rotating Electric Machines (AREA)
- Manufacture Of Motors, Generators (AREA)
Description
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æ¹æ³ã«é¢ãããã®ã§ãããDETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for forming a coating having good insulation properties, corrosion resistance, tension imparting properties, and bending adhesion properties on electromagnetic ribbons used as laminated iron core materials for electrical equipment. .
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ã«ã¯éèŠã§ãããïŒãªã©ãæããããã Due to the recent rise in energy costs, there is a need to further reduce the energy and iron loss consumed by the iron core of electrical equipment. For this reason, iron-based amorphous alloy ribbons are attracting attention as soft magnetic materials. In particular, it contains 70at% or more of Fe, and contains vitrifying elements such as B, Si, P, and C, or
A, Va group elements such as Ti, Zr and sometimes Nb and Co
Amorphous alloys containing iron have much lower iron loss than conventional materials, and their saturation magnetic flux density is about 1.5T or higher, which is not that low. It is being considered for application as a material. In addition, recently, similar to amorphous alloy ribbons, 2 to 8 wt%
High-silicon steel sheets containing Si have been created and are attracting attention as new soft magnetic materials. especially
At a composition around 6.5wt%Si-Fe, magnetostriction almost disappears, so if a suitable texture such as a (100) cubic structure is formed by high-temperature annealing, the iron content is significantly lower than that of conventional materials. Loss characteristics can now be obtained. In order for such a new material to be actually applied as a laminated iron core material, the ribbon itself must have excellent properties such as magnetic permeability and iron loss, and a good film must be formed on the surface of the ribbon. I need to be there. The properties required for this coating vary depending on the type of equipment used, but in general, it is desirable to have insulation properties (high electrical resistance to prevent interlayer short circuits and interlayer eddy current losses. Especially for large transformers, large Laminated iron cores and wound iron cores are essential for rotating machines.) Bending adhesion (It is desirable that the coating does not peel off from the iron surface when bent, that is, the minimum bending radius without peeling is smaller. Corrosion resistance (Rust is not desirable even in electromagnetic materials.) Furthermore, heat resistance (when performing strain relief annealing after punching, shearing, or winding) It is important that annealing does not cause deterioration or peeling of the material.This is especially important when used in the wound core of a power distribution transformer.
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ãªãææã«ãããŠã¯æãŸããã In addition, tension imparting properties (applying tension to the base steel due to the difference in thermal expansion between the coating and the base steel. During core forming, tightening pressure and compressive force are applied to the steel plate surface in the longitudinal direction, and λ100 is generally positive. When it has a large value, this causes property deterioration (iron loss and magnetostrictive vibration), but if tension is applied in advance by the coating, property deterioration due to this pressure can be reduced and prevented. ) is also desirable for materials where magnetostriction cannot be ignored.
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åãçŒéãè¡ãªã€ãŠãå¯çæ§ã¯å£åããªãã Today, silicon steel sheets containing up to about 3 wt% Si are used in large quantities as laminated iron core materials for electrical equipment. Among these, grain-oriented silicon steel sheets, which have a texture accumulated in the (110) <001> direction, are used for the iron core of transformers, etc., where magnetic flux is applied only in one direction, and they do not necessarily have a specific texture. Non-oriented silicon steel sheets, which exhibit suitable properties in all directions, are used for iron cores of rotating equipment, etc. In grain-oriented silicon steel sheets, the surface oxide film and forsterite (2MgOã»SiO 2 ) produced by high-temperature annealing at 1000°C or higher after applying a release agent containing MgO as the main component causes basic damage. In order to form an insulating film and add tensile strength and corrosion resistance, a heat-resistant phosphate-based coating liquid is baked on. As a result, the interlayer insulation resistance (e.g.
When measured by the method specified in JISC2550) 50 ~
200 (Ω-cm 2 / sheet). Furthermore, even if strain relief annealing is performed at approximately 850°C, the adhesion does not deteriorate.
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ã®å Žåã«ã¯äžè¬ã«èç±æ§ã¯å£ãã On the other hand, for non-directional steel sheets, a phosphate-based inorganic coating or a coating liquid containing a resin component is baked directly onto the base steel surface. In this case, heat resistance is generally inferior.
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ã®ã§å®çšçã§ã¯ãªãã The coating formation methods known as prior art described above are not only unsuitable for the amorphous alloy ribbon or rapidly solidified high-silicon steel ribbon that is the object of the present invention, but also difficult to implement. There are quite a few points.
That is, in order to form forsterite as a base film, high-temperature annealing of 1000° C. or higher is required, but this annealing is not possible for amorphous alloys due to crystallization. In addition, as shown in Japanese Patent Application No. 164693-1987, for high-silicon steel quenched ribbon,
(100) In order to have a highly developed in-plane cubic structure and excellent magnetic properties, the bare iron surface of the surface is exposed to the atmosphere and annealed under a vacuum of 10 -2 to 10 -7 Torr. However, it is difficult to form the above-mentioned forsterite in such annealing. Also, after this vacuum annealing,
After oxidizing the surface and applying MgO,
Forsterite can be formed by high-temperature annealing, but this is not practical because the manufacturing cost increases.
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ã®çºæãå®æããããã®ã§ããã The inventors conducted various experiments in order to form coatings with good properties on amorphous alloy ribbons and high-silicon steel quenched ribbons. The present invention was completed based on the discovery that a thin ceramic film having good properties could be formed by applying a ceramic thin film by chemical vapor deposition or sputtering.
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ããããšãã§ããã In this invention, the electromagnetic material on which the film is formed is an amorphous alloy ribbon containing 70 at% or more of Fe and 2 to 8 wt% of Si produced by ultra-quenching from a liquid. High-silicon steel quenched ribbon will be used. Amorphous alloy ribbons containing 70 at% or more Fe usually have a saturation magnetic flux density of about 1.5 T or more at room temperature, so they can be used as core materials for power transformers and the like. These are known to have a composition expressed as Fe a X b Y c (subscripts are atomic %), where a75, b
+c25, X=one or more of Co, Ni, Mn, Cu, and Cr; Y=one or more of B, Si, C, P, and Ge. Typically , Fe81B13Si4C2 ,
It is known that Fe 78 B 20 P 1 Ge 1 , Fe 78 Co 3 Si 5 B 14 , and the like have a relatively large saturation magnetic flux density, are thermally stable, and have excellent magnetic properties. In addition to the above-mentioned amorphous alloy ribbon, this invention also uses Fe a Co b (Ti, Zr) c (where a>70, b<15,
An amorphous alloy ribbon having the formula 5<c<20) can be used.
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ã§ããã On the other hand, high-silicon steel quenched ribbons containing 2 to 8 wt% Si, especially quenched ribbons with in-plane non-directional structures accumulated in the (100) [OKl] orientation, have excellent excitation and iron loss characteristics. It can be used as a core material not only for power transformers but also for rotating machines.
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Thin film coatings of corrosion-resistant ceramics such as ThO 2 and ZrO 2 are formed by vacuum deposition, chemical vapor deposition or sputtering.
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åã«åªããç£æ°ç¹æ§ãåŸãããã In vacuum evaporation, the ceramic is heated by electron beam irradiation or the like under a vacuum of about 10 -2 or higher to form a ceramic thin film on the surface of the substrate (thin ribbon). A good thin film can be formed on the substrate (thin ribbon) without particular heating, but generally, if it is heated to 200 to 400°C, a thin film with higher density and better adhesion will be formed. In this case, a crystalline high-silicon steel ribbon can be heated to any temperature to deposit ceramics, but in the case of an amorphous alloy ribbon, the heating temperature is lower than the crystallization temperature of the alloy. It is necessary to do so. The amorphous alloy of Fe75-85 (B, Si, C, P) 25-15 has a crystallization temperature ranging from 300 to 500 °C. In general, amorphous alloy ribbons have poor magnetic properties when they are produced by quenching from a liquid, so they are annealed at a crystallization temperature above the Curie point to improve their properties. At this time, when a magnetic field is applied in the longitudinal direction of the ribbon to cool it, uniaxial anisotropy occurs in the longitudinal direction, and particularly excellent magnetic properties can be obtained in the longitudinal direction.
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ãã In the present invention, in the case of an amorphous alloy ribbon, it is desirable that the heat treatment for improving magnetism and the formation of the ceramic thin film be performed simultaneously in the same process.
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ãã In addition, the inventors found that when applying tension in the longitudinal direction of the ribbon during continuous ceramic deposition in vacuum evaporation, the magnetic properties of the ribbon in the final product improve, especially compressive stress due to curvature etc. It has been found that even in such cases, deterioration of magnetic properties is reduced.
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å£åã®æå¶ãçãããšèããããã Figure 1 shows an example of the characteristics. SiO 2 and MgO were deposited on a 25 ÎŒm thick Fe 80 B 20 amorphous ribbon prepared by a single roll method in a vacuum chamber at 10 â2 Torr by electron beam irradiation heating. At this time, the ribbon was heated to 290°C. After this, after further annealing in a magnetic field of 50 Oe at 325° C., the Hc value (DC, Bm = 1.2 T) was measured in a flat plate shape and in a toroidal shape with various curvatures. As shown in Figure 1, as the diameter of the toroid is reduced, the Hc value deteriorates and the merits of the material as a soft magnetic material are lost. This is thought to be due to compressive force being generated locally on the plate due to the curvature.
This is particularly noticeable in materials like this example, which have a high Fe content and a large positive value of magnetostriction λ100. However, as shown in Figure 1, SiO 2 or MgO is
When deposited, the degradation of Hc due to curvature is much smaller. The coefficient of thermal expansion of Fe 80 B 20 amorphous ribbon is approximately
10 Ã 10 -6 K -1 , whereas that of SiO 2 and MgO is about 1 Ã 10 -6 K -1 or less, so the difference in thermal expansion coefficient is caused by cooling after heating during vapor deposition. tension is exerted on the ribbon. This is thought to have alleviated the compressive force caused by the curvature and suppressed the deterioration of the Hc value as shown in Figure 1.
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å°ãããªãã Furthermore, a similar example of 4.5wt% silicon steel is shown in the second example.
As shown in the figure. A silicon steel ribbon containing 4.5wt%Si prepared by the twin roll method was continuously annealed at 1000â. The surface roughness of this ribbon was an average roughness Ra=1.0 ÎŒm. This thin film is coated with SiO 2 in the same way as in Figure 1.
MgO was deposited, and the Hc value (DC, Bm=1.2T) was measured in a toroidal shape with various curvatures.
As shown in FIG. 2, the Hc value deteriorates due to curvature, but this deterioration is reduced in the case of SiO 2 or MgO deposited.
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ç¹æ§å£åã®æå¶ã¯å®çšçã«ã¯å€§ããªå¹æããã€ã Suppressing the deterioration of ceramic properties by forming a ceramic thin film as described above has a great practical effect.
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è¯ãããã®ã§ããã The amorphous alloys and high-silicon steel quenched ribbons that are the subject of this invention are usually wound into a toroidal shape to form an iron core and used in power transformers and electronic devices, so if the magnetic properties are significantly degraded due to curvature, , it is flat and has excellent properties, but cannot be put to practical use. This invention has the effect of suppressing deterioration due to curvature, and therefore sufficiently improves the characteristics particularly in actual machines.
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çæã«ä»å ãã匵åã¯0.5KgïŒmm2以äžãšããã Next, Figure 3 shows the iron loss measured using the same amorphous ribbon sample in a flat plate shape and a 35 mmÏ toroidal shape after vacuum-depositing SiO 2 to a thickness of 0.8 ÎŒm.
W 12/50 (Iron loss at 50Hz with 1.2T excitation) is shown. In vacuum evaporation, there are cases where the ribbon is not heated and cases where the ribbon is not heated.
SiO 2 was vapor-deposited while applying tension in each case of heating to 350°C, and then at 350°C.
Annealing was performed in a magnetic field of 50 Oe. If the deposition is performed under tension, the iron loss will be lowered. This tendency is particularly noticeable when measuring a curved ribbon. The effect of such additional tension becomes apparent from a tension of approximately 0.5 Kg/mm 2 . Therefore, in the present invention, the tension applied during vapor deposition is set to 0.5 Kg/mm 2 or more.
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A silicon steel ribbon with a thickness of 120 ÎŒm is heated at 1140â to approx.
After annealing for 20 minutes in a vacuum of 10 -2 Torr, MgO was deposited in the same vacuum chamber. During this deposition, tension was applied in the longitudinal direction of the ribbon. Figure 4 shows the iron loss values of these thin strips in a flat plate shape and a 35 mmÏ toroidal shape. When made toroidal, the iron loss value deteriorates. This tendency is more pronounced for low-Si materials with higher magnetostriction, but this deterioration can be alleviated by applying tension during deposition. This tension becomes effective at 0.5Kg/mm 2 or more.
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ãã奜ãŸããã As can be seen from the results of the above test examples, it is more preferable to apply a ceramic thin film coating to the surface of the ribbon by vacuum deposition because it alleviates magnetic deterioration during application.
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ããããããšãšãªãã Ceramics have high insulation properties and high corrosion resistance, so if the surface of the ribbon is covered with a sufficiently thick ceramic thin film, insulation and corrosion resistance will inevitably be satisfied.
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ã®åã¿ã3ÎŒïœä»¥äžãšããã In this invention, when ceramics are coated as a thin film with a thickness of 0.1 ÎŒm or more, approximately 10
An interlayer electrical insulation resistance of (Ω-cm 2 /sheet) or more was obtained. Further, if the thickness is 0.1 ÎŒm or more, sufficient corrosion resistance can be obtained as a core material for electrical equipment. Therefore, in this invention, the thickness of the ceramic thin film is set to 0.1 ÎŒm or more. However, on the other hand, if the thickness of the ceramic thin film becomes 3 ÎŒm or more, it is preferable in terms of magnetism, insulation, and corrosion resistance, but the non-magnetic portion of the finished product ribbon increases and the space factor deteriorates, which is disadvantageous in terms of application. At the same time, the bending adhesion deteriorates, and peeling occurs, for example, at a curvature of about 20 mmÏ. Further, as a matter of course, vapor deposition of 3 ÎŒm or more requires a long time and is not preferred from an industrial perspective. Therefore, in this invention, the thickness of the ceramic thin film is set to 3 ÎŒm or less.
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ããã Next, in the present invention, the ceramic thin film may be applied by chemical vapor deposition. Typically
Vapors of metal chlorides such as AlCl 3 , SiCl 4 , ZrCl 4
A gas such as H 2 or Co 2 is applied to the ribbon as a carrier to form a ceramic thin film of Al 2 O 3 , SiO 2 , ZrO 2 or the like on its surface. In this case, a thin strip is usually used.
Heating to 700-1050°C will form a thin film with higher density and better adhesion. This method is not suitable for amorphous alloy ribbons that cannot be heated at high temperatures. This method can be applied to high-silicon steel ribbons, and as described above, if tension is applied during thin film formation, deterioration due to magnetic curvature is alleviated.
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šãåæ§ã«ã¹ããã¿ãªã³ã°ã®æéäžã«è
垯ãå ç±ããŠãããšåæã«0.5KgïŒmm2以äžã®åŒµå
ãä»å ããŠããã®ãè¯ãã Further, in the present invention, good results can be obtained even when sputtering is used to form a thin film. In this method, ceramics such as SiO 2 are usually sputtered with argon or the like under vacuum to form a thin film on the surface of the ribbon. In this case, as in the case of vacuum deposition, it is preferable to heat the ribbon during sputtering and at the same time apply a tension of 0.5 kg/mm 2 or more.
以äžã«è¿°ã¹ãç空èžçãååŠèžçããã³ã¹ãã
ã¿ãªã³ã°æ³ã«ãã€ãŠè¡šé¢ã«èé£æ§ã絶çžæ§ããã³
匵åä»äžæ§ããã«æ²ãå¯çæ§ã®è¯å¥œãªã»ã©ããã¯
ã¹èèããæã被èã圢æãããéæ¶è³ªåéè垯
ããã³é«ããçŽ éŒè垯ã¯ããã®ãŸãŸã®ç¶æ
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æ°æ©åšã®ã³ã¢ãŒææãšããŠå¿çšã§ãããç¹ã«ã匵
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éè¯ææãªã©ã«å¿çšãããšãã®ç¹æ§ãçºæ®ãã
ãã Amorphous alloy ribbons and high silicone alloys are produced using the vacuum deposition, chemical vapor deposition, and sputtering methods described above to form coatings consisting of ceramic thin films with corrosion resistance, insulation properties, tension imparting properties, and good bending adhesion. Raw steel ribbon can be used as a core material for electrical equipment in its original state. In particular, the product of the present invention, which has excellent tension imparting properties, exhibits its properties when applied to wound core iron core materials.
ãŸããå¿çšã«ãã€ãŠã¯ããã«é«åºŠã®çµ¶çžæ§ãè
é£æ§ãããã¯åŒµåä»äžæ§ãèŠæ±ãããå Žåãã
ãããã®ãããªå Žåã«ã¯ãã»ã©ããã¯ã¹èèã圢
æãããããšãåŒç¶ããŠãªã³é
žå¡©ãäž»æåãšãã
ã³ãŒãã³ã°æ¶²ãå¡åžãã800âçšåºŠã®æž©åºŠã§çŒä»
ããŠåŒµåä»äžåã®äžå¡ã被èã圢æãããã®ãè¯
ãããã®åŒµåä»äžåã®è¢«èã¯åŸæ¥å
¬ç¥ã®ããã«è
垯ã®ç£æªâå§çž®ç¹æ§ãäžå±€æ¹è¯ããã Furthermore, depending on the application, even higher levels of insulation, corrosion resistance, or tension imparting properties may be required. In such cases, after forming a ceramic thin film, a coating liquid containing phosphate as the main component is applied and baked at a temperature of about 800°C to form a tension-applied top coat. is good. This tensioning coating further improves the magnetostrictive-compressive properties of the ribbon, as is known in the art.
ãã®ããã«ããŠè¢«èãã³ãŒãã³ã°ããè垯ã¯åª
æã»ææãããã³ã¢ãŒã«çµã¿ç«ãŠãããããã®çº
æã®è¢«èã¯800âçšåºŠã®æªåãçŒéã«å
åã«èã
ãããšãã§ããã The thus coated ribbon is sheared and punched and assembled into a core. The coating of this invention can sufficiently withstand strain relief annealing at about 800°C.
以äžå®æœäŸã«ã€ããŠè¿°ã¹ãã Examples will be described below.
å®æœäŸ ïŒ
85ÎŒïœåã®6.4wtïŒ
SiâFeæ¥å·è垯ãšã25ÎŒïœå
ã®éæ¶è³ªæ¥å·è垯ïŒFe81B13.5Si3.5C2ïŒããè¡šé¢é
ž
åç©é€å»ã®ããã«ãããã軜床ã®H2SO4é
žæŽã«
äŸããããšããããã®è垯é¢äžã«SiO2ãšAl2O3ã®
æ··åèè2ÎŒïœãã¹ããã¿ãªã³ã°ã§åœ¢æãããã
ã¹ããã¿ãªã³ã°ã¯ã¢ã«ãŽã³ã€ãªã³ã§è¡ãªãå§åã
ïŒÃ10-4Torrã«ãããExample 1 An 85 ÎŒm thick 6.4wt% Si-Fe quenched ribbon and a 25 ÎŒm thick amorphous quenched ribbon (Fe 81 B 13.5 Si 3.5 C 2 ) were each treated with mild H 2 to remove surface oxides. After being subjected to SO 4 pickling, a mixed thin film of 2 ÎŒm of SiO 2 and Al 2 O 3 was formed on the ribbon surface by sputtering.
Sputtering was performed using argon ions at a pressure of 3Ã10 â4 Torr.
ãã®èèã¯10mmÏã®æ¹Ÿæ²ããããªã€ãŠãå¥é¢ã
ãªãã€ãããŸãå±€é絶çžæµæã¯70ã100Ωã»cm2ïŒ
æã§ãã€ããããã«ããã®è垯ã湿床80ïŒ
ã35â
ã®ç©ºæ°äžã«30æ¥éæŽé²ãããè
é£ã®çºçã¯èªãã
ããªãã€ãã This thin film did not peel off even after being bent to a diameter of 10 mm. Also, the interlayer insulation resistance is 70 to 100Ωã»cm 2 /
It was hot. Furthermore, this thin strip was heated at 80% humidity and 35°C.
No corrosion was observed after exposure to the air for 30 days.
第ïŒå³ã第ïŒå³ã¯çš®ã
ãªæ²çäžã§Hcã®å£åã®
ããããŸã瀺ãå³è¡šã第ïŒå³ã第ïŒå³ã¯èžçæã®
ä»å 匵åãšéæã®é¢ä¿ã°ã©ãã§ããã
Figures 1 and 2 are graphs showing how Hc deteriorates under various curvatures, and Figures 3 and 4 are graphs of the relationship between added tension during vapor deposition and iron loss.
Claims (1)
垯ãããã¯æº¶éŒããã®çŽæ¥è£œæ¿æ³ã«ãã€ãŠäœãã
ãSi2ã8wtïŒ ãå«æããé«çªçŽ éŒæ¥å·è垯ã®è¡š
é¢ã«ç空èžçãååŠèžçãããã¯ã¹ããã¿ãªã³ã°
ã«ãã€ãŠ0.1ÎŒïœä»¥äž3ÎŒm以äžã®åã¿ã®ã»ã©ããã¯
ã¹èèãæœããããšãç¹åŸŽãšããé»ç£è垯ã«è¯å¥œ
ãªçµ¶çžæ§ã匵åä»äžæ§ãèé£æ§ããã³æ²ãå¯çæ§
ãæãã被èã圢æããæ¹æ³ã ïŒ ç¹èš±è«æ±ã®ç¯å²ç¬¬ïŒé èšèŒã®æ¹æ³ã«ãããŠã
ã»ã©ããã¯ã¹èèãæœããå·¥çšããè垯ã®å ç±ãš
0.5KgïŒmm2以äžã®åŒµåä»äžãšã®ãã¡å°ãªããšãäž
æ¹ã®æ¡ä»¶äžã§ããããšã ïŒ Feã70atïŒ ä»¥äžå«æããéæ¶è³ªåéæ¥å·è
垯ãããã¯æº¶éŒããã®çŽæ¥è£œæ¿æ³ã«ãã€ãŠäœãã
ãSi2ã8wtïŒ ãå«æããé«çªçŽ éŒæ¥å·è垯ã®è¡š
é¢ã«ç空èžçãååŠèžçãããã¯ã¹ããã¿ãªã³ã°
ã«ãã€ãŠ0.1ÎŒïœä»¥äž3ÎŒm以äžã®åã¿ã®ã»ã©ããã¯
ã¹èèãæœããããšãšãã®ã»ã©ããã¯ã¹èèãæœ
ãããåŸããªã³é žå¡©ãäž»æåãšãã匵åä»äžåœ¢äœ
ç±èšåŒµçµ¶çžè¢«èãæœããããšãšã®çµåãç¹åŸŽãšã
ãé»ç£è垯ã«è¯å¥œãªçµ¶çžæ§ã匵åä»äžæ§ãèé£æ§
ããã³æ²ãå¯çæ§ãæãã被èã圢æããæ¹æ³ã[Scope of Claims] 1. The surface of a quenched amorphous alloy ribbon containing 70 at% or more Fe or a quenched high silicon steel ribbon containing 2 to 8 wt% Si made by direct plate manufacturing from molten steel. A coating having good insulation properties, tension imparting properties, corrosion resistance and bending adhesion for electromagnetic thin strips, characterized in that a ceramic thin film with a thickness of 0.1 ÎŒm or more and 3 ÎŒm or less is applied to the electromagnetic ribbon by vacuum deposition, chemical vapor deposition or sputtering. How to form. 2. In the method described in claim 1,
The process of applying a ceramic thin film involves heating the ribbon and
Must be under at least one of the following conditions: applying a tension of 0.5Kg/mm 2 or more. 3. Vacuum deposition or chemical vapor deposition on the surface of an amorphous alloy quenched ribbon containing 70at% or more of Fe or a quenched high silicon steel ribbon containing 2 to 8wt% Si made by direct plate manufacturing from molten steel. Alternatively, a ceramic thin film with a thickness of 0.1 ÎŒm or more and 3 ÎŒm or less is applied by sputtering, and after this ceramic thin film is applied, a tension-applied low thermal expansion insulation coating containing phosphate as a main component is applied. A method for forming a coating having good insulation properties, tension imparting properties, corrosion resistance, and bending adhesion properties on an electromagnetic ribbon characterized by bonding.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17020480A JPS5795608A (en) | 1980-12-04 | 1980-12-04 | Method for forming film having excellent insulating property, tension imparting property, corrosion resistance, and bending adhesion in thin electromagnetic band |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17020480A JPS5795608A (en) | 1980-12-04 | 1980-12-04 | Method for forming film having excellent insulating property, tension imparting property, corrosion resistance, and bending adhesion in thin electromagnetic band |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5795608A JPS5795608A (en) | 1982-06-14 |
JPH0151043B2 true JPH0151043B2 (en) | 1989-11-01 |
Family
ID=15900589
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17020480A Granted JPS5795608A (en) | 1980-12-04 | 1980-12-04 | Method for forming film having excellent insulating property, tension imparting property, corrosion resistance, and bending adhesion in thin electromagnetic band |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5795608A (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61296703A (en) * | 1985-06-26 | 1986-12-27 | Kawasaki Steel Corp | Iron loss reduction method for single directional grain oriented silicon steel plate |
AU4693099A (en) * | 1998-06-18 | 2000-01-05 | Allied-Signal Inc. | Amorphous metal stator for a radial-flux electric motor |
JP6033834B2 (en) * | 2014-12-25 | 2016-11-30 | æ±èäžè±é»æ©ç£æ¥ã·ã¹ãã æ ªåŒäŒç€Ÿ | Cage rotor manufacturing method |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53144419A (en) * | 1977-05-23 | 1978-12-15 | Kawasaki Steel Co | Method of making one directional silicon steel plate with extremely low core loss |
-
1980
- 1980-12-04 JP JP17020480A patent/JPS5795608A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53144419A (en) * | 1977-05-23 | 1978-12-15 | Kawasaki Steel Co | Method of making one directional silicon steel plate with extremely low core loss |
Also Published As
Publication number | Publication date |
---|---|
JPS5795608A (en) | 1982-06-14 |
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