JPH0150117B2 - - Google Patents
Info
- Publication number
- JPH0150117B2 JPH0150117B2 JP15244388A JP15244388A JPH0150117B2 JP H0150117 B2 JPH0150117 B2 JP H0150117B2 JP 15244388 A JP15244388 A JP 15244388A JP 15244388 A JP15244388 A JP 15244388A JP H0150117 B2 JPH0150117 B2 JP H0150117B2
- Authority
- JP
- Japan
- Prior art keywords
- carbide
- cathode
- mec
- composition
- gas laser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000007789 gas Substances 0.000 claims description 30
- 238000000034 method Methods 0.000 claims description 19
- 239000000203 mixture Substances 0.000 claims description 18
- 229910052751 metal Inorganic materials 0.000 claims description 13
- 239000002184 metal Substances 0.000 claims description 13
- 238000004519 manufacturing process Methods 0.000 claims description 12
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 9
- 150000001247 metal acetylides Chemical class 0.000 claims description 8
- 229910002804 graphite Inorganic materials 0.000 claims description 7
- 239000010439 graphite Substances 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 7
- 229910052715 tantalum Inorganic materials 0.000 claims description 7
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 7
- 150000002739 metals Chemical class 0.000 claims description 5
- 229910052758 niobium Inorganic materials 0.000 claims description 5
- 239000010955 niobium Substances 0.000 claims description 5
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 5
- 230000000737 periodic effect Effects 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 claims description 3
- 239000012300 argon atmosphere Substances 0.000 claims description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical class O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 6
- 239000003870 refractory metal Substances 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 229910002092 carbon dioxide Inorganic materials 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000010849 ion bombardment Methods 0.000 description 3
- UNASZPQZIFZUSI-UHFFFAOYSA-N methylidyneniobium Chemical compound [Nb]#C UNASZPQZIFZUSI-UHFFFAOYSA-N 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 238000010000 carbonizing Methods 0.000 description 1
- 238000005255 carburizing Methods 0.000 description 1
- 238000005056 compaction Methods 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000007770 graphite material Substances 0.000 description 1
- CPBQJMYROZQQJC-UHFFFAOYSA-N helium neon Chemical compound [He].[Ne] CPBQJMYROZQQJC-UHFFFAOYSA-N 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000011866 long-term treatment Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000013028 medium composition Substances 0.000 description 1
- 229910001510 metal chloride Inorganic materials 0.000 description 1
- NFFIWVVINABMKP-UHFFFAOYSA-N methylidynetantalum Chemical compound [Ta]#C NFFIWVVINABMKP-UHFFFAOYSA-N 0.000 description 1
- YHBDIEWMOMLKOO-UHFFFAOYSA-I pentachloroniobium Chemical compound Cl[Nb](Cl)(Cl)(Cl)Cl YHBDIEWMOMLKOO-UHFFFAOYSA-I 0.000 description 1
- 238000010587 phase diagram Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000004663 powder metallurgy Methods 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910003468 tantalcarbide Inorganic materials 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
Landscapes
- Lasers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15244388A JPS6427283A (en) | 1988-06-22 | 1988-06-22 | Gas laser cathode and manufacture of the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15244388A JPS6427283A (en) | 1988-06-22 | 1988-06-22 | Gas laser cathode and manufacture of the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6427283A JPS6427283A (en) | 1989-01-30 |
| JPH0150117B2 true JPH0150117B2 (enrdf_load_stackoverflow) | 1989-10-27 |
Family
ID=15540638
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15244388A Granted JPS6427283A (en) | 1988-06-22 | 1988-06-22 | Gas laser cathode and manufacture of the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6427283A (enrdf_load_stackoverflow) |
-
1988
- 1988-06-22 JP JP15244388A patent/JPS6427283A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6427283A (en) | 1989-01-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4467240A (en) | Ion beam source | |
| US7160532B2 (en) | Carbon nanotube array and method for forming same | |
| Wada | Preparation of fine metal particles by the gas evaporation method with plasma jet flame | |
| JP5562336B2 (ja) | アーク蒸発のためのターゲットの使用および前記使用に適したターゲットの製造方法 | |
| KR101849997B1 (ko) | 철계 합금의 코팅 방법 및 이에 의하여 제조된 고경도 및 저마찰 특성을 갖는 제품 | |
| JP4023964B2 (ja) | 熱伝導率が小さい断熱被膜、断熱被膜により保護される金属部品、および断熱被膜の堆積方法 | |
| Zhang et al. | Controlled fabrication of core–shell TiO2/C and TiC/C nanofibers on Ti foils and their field-emission properties | |
| US5807433A (en) | Multilayer system comprising a diamond layer, an interphase and a metallic substrate, and a method for obtaining these layers | |
| JPS643350B2 (enrdf_load_stackoverflow) | ||
| JPH0150117B2 (enrdf_load_stackoverflow) | ||
| CN115992338B (zh) | 过渡金属表面盐浴碳化制备碳化物涂层的方法 | |
| US7799374B2 (en) | Method for manufacturing field emission cathode | |
| JPH0864110A (ja) | 炭化物膜被覆電子放射材料およびその製造方法 | |
| SU1051611A1 (ru) | Катод отпа нного газового лазера и способ его изготовлени "(варианты) | |
| US3742282A (en) | Electrodes | |
| Dinca-Balan et al. | Correlation study of nanocrystalline carbon doped thin films prepared by a thermionic vacuum arc deposition technique | |
| JPS60177528A (ja) | 耐久性の優れたタンタルフイラメント及びその製造法 | |
| Okuyama | Growth of Cr needle crystals induced by field electron emission | |
| JP3557455B2 (ja) | 窒素炭素珪素系硬質材料、その製造方法及びその用途 | |
| JP2014038858A (ja) | イオン源原及びプラズマ源 | |
| JPH0465361A (ja) | 炭化珪素ヒーター及びその製造方法 | |
| JPS62113782A (ja) | 高温、非酸化性雰囲気用断熱材 | |
| Takeuchi et al. | Preparation of Fluorine‐Containing Indium Tin Oxide Sputtering Targets using Spark Plasma Sintering Process | |
| Liu et al. | Corrosion behaviors of Ti3SiC2/Cu composites in molten salts | |
| Parashchuk et al. | Desorption of gases from cathode materials in electrovacuum devices during the production process |