JPH01500008U - - Google Patents

Info

Publication number
JPH01500008U
JPH01500008U JP1989600017U JP60001789U JPH01500008U JP H01500008 U JPH01500008 U JP H01500008U JP 1989600017 U JP1989600017 U JP 1989600017U JP 60001789 U JP60001789 U JP 60001789U JP H01500008 U JPH01500008 U JP H01500008U
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1989600017U
Other languages
Japanese (ja)
Other versions
JPH0528761Y2 (https=
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPH01500008U publication Critical patent/JPH01500008U/ja
Application granted granted Critical
Publication of JPH0528761Y2 publication Critical patent/JPH0528761Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0408—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B11/00—Machines or apparatus for drying solid materials or objects with movement which is non-progressive
    • F26B11/18—Machines or apparatus for drying solid materials or objects with movement which is non-progressive on or in moving dishes, trays, pans, or other mainly-open receptacles
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B21/00—Arrangements for supplying or controlling air or other gases for drying solid materials or objects
    • F26B21/40—Arrangements for supplying or controlling air or other gases for drying solid materials or objects using gases other than air
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B5/00—Drying solid materials or objects by processes not involving the application of heat
    • F26B5/08—Drying solid materials or objects by processes not involving the application of heat by centrifugal treatment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Molecular Biology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Drying Of Solid Materials (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Centrifugal Separators (AREA)
JP1989600017U 1986-05-16 1987-05-11 Expired - Lifetime JPH0528761Y2 (https=)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US86463486A 1986-05-16 1986-05-16
PCT/US1987/001082 WO1987007002A1 (en) 1986-05-16 1987-05-11 Spin drying apparatus

Publications (2)

Publication Number Publication Date
JPH01500008U true JPH01500008U (https=) 1989-11-02
JPH0528761Y2 JPH0528761Y2 (https=) 1993-07-23

Family

ID=25343719

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1989600017U Expired - Lifetime JPH0528761Y2 (https=) 1986-05-16 1987-05-11

Country Status (8)

Country Link
US (1) US4651440A (https=)
EP (1) EP0305402B1 (https=)
JP (1) JPH0528761Y2 (https=)
KR (1) KR880701357A (https=)
CN (1) CN1008659B (https=)
CA (1) CA1293488C (https=)
DE (1) DE3768274D1 (https=)
WO (1) WO1987007002A1 (https=)

Families Citing this family (51)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5168886A (en) * 1988-05-25 1992-12-08 Semitool, Inc. Single wafer processor
US5168887A (en) * 1990-05-18 1992-12-08 Semitool, Inc. Single wafer processor apparatus
US5431421A (en) * 1988-05-25 1995-07-11 Semitool, Inc. Semiconductor processor wafer holder
US5238500A (en) * 1990-05-15 1993-08-24 Semitool, Inc. Aqueous hydrofluoric and hydrochloric acid vapor processing of semiconductor wafers
US5357991A (en) * 1989-03-27 1994-10-25 Semitool, Inc. Gas phase semiconductor processor with liquid phase mixing
US4989345A (en) * 1989-12-18 1991-02-05 Gill Jr Gerald L Centrifugal spin dryer for semiconductor wafer
JPH03238819A (ja) * 1990-02-15 1991-10-24 Seiichiro Sogo 半導体材料の乾燥方法および装置
US6375741B2 (en) * 1991-03-06 2002-04-23 Timothy J. Reardon Semiconductor processing spray coating apparatus
US5222310A (en) * 1990-05-18 1993-06-29 Semitool, Inc. Single wafer processor with a frame
US5174045A (en) * 1991-05-17 1992-12-29 Semitool, Inc. Semiconductor processor with extendible receiver for handling multiple discrete wafers without wafer carriers
JP3277404B2 (ja) * 1993-03-31 2002-04-22 ソニー株式会社 基板洗浄方法及び基板洗浄装置
US5863348A (en) * 1993-12-22 1999-01-26 International Business Machines Corporation Programmable method for cleaning semiconductor elements
US5664337A (en) * 1996-03-26 1997-09-09 Semitool, Inc. Automated semiconductor processing systems
US5784797A (en) * 1994-04-28 1998-07-28 Semitool, Inc. Carrierless centrifugal semiconductor processing system
US5566466A (en) * 1994-07-01 1996-10-22 Ontrak Systems, Inc. Spindle assembly with improved wafer holder
US5954911A (en) * 1995-10-12 1999-09-21 Semitool, Inc. Semiconductor processing using vapor mixtures
US6273483B1 (en) * 1996-03-28 2001-08-14 Mcmaster University Three orthogonal directions movable fingers for holding and/or manipulating a three-dimensional object
US5775000A (en) * 1996-05-13 1998-07-07 Ebara Corporation Substrate gripper device for spin drying
US5851041A (en) * 1996-06-26 1998-12-22 Ontrak Systems, Inc. Wafer holder with spindle assembly and wafer holder actuator
US6358388B1 (en) 1996-07-15 2002-03-19 Semitool, Inc. Plating system workpiece support having workpiece-engaging electrodes with distal contact-part and dielectric cover
US5778554A (en) * 1996-07-15 1998-07-14 Oliver Design, Inc. Wafer spin dryer and method of drying a wafer
US6645355B2 (en) 1996-07-15 2003-11-11 Semitool, Inc. Semiconductor processing apparatus having lift and tilt mechanism
US6091498A (en) 1996-07-15 2000-07-18 Semitool, Inc. Semiconductor processing apparatus having lift and tilt mechanism
US5980706A (en) * 1996-07-15 1999-11-09 Semitool, Inc. Electrode semiconductor workpiece holder
US5884412A (en) * 1996-07-24 1999-03-23 Applied Materials, Inc. Method and apparatus for purging the back side of a substrate during chemical vapor processing
US5960555A (en) * 1996-07-24 1999-10-05 Applied Materials, Inc. Method and apparatus for purging the back side of a substrate during chemical vapor processing
US5857475A (en) * 1997-03-03 1999-01-12 Volk Optical, Inc. Optical component cleaning apparatus
US5974681A (en) * 1997-09-10 1999-11-02 Speedfam-Ipec Corp. Apparatus for spin drying a workpiece
US5953827A (en) * 1997-11-05 1999-09-21 Applied Materials, Inc. Magnetron with cooling system for process chamber of processing system
US6013316A (en) * 1998-02-07 2000-01-11 Odme Disc master drying cover assembly
US6207026B1 (en) 1999-10-13 2001-03-27 Applied Materials, Inc. Magnetron with cooling system for substrate processing system
TW452917B (en) * 1999-10-29 2001-09-01 Winbond Electronics Corp Holder
US6415804B1 (en) 1999-12-23 2002-07-09 Lam Research Corporation Bowl for processing semiconductor wafers
US6363623B1 (en) 2000-06-02 2002-04-02 Speedfam-Ipec Corporation Apparatus and method for spinning a work piece
US6481447B1 (en) 2000-09-27 2002-11-19 Lam Research Corporation Fluid delivery ring and methods for making and implementing the same
US6827092B1 (en) 2000-12-22 2004-12-07 Lam Research Corporation Wafer backside plate for use in a spin, rinse, and dry module and methods for making and implementing the same
US6578853B1 (en) 2000-12-22 2003-06-17 Lam Research Corporation Chuck assembly for use in a spin, rinse, and dry module and methods for making and implementing the same
US6742279B2 (en) * 2002-01-16 2004-06-01 Applied Materials Inc. Apparatus and method for rinsing substrates
US6665951B1 (en) 2002-08-22 2003-12-23 Jeffrey B. Kuhl Method and apparatus for drying a stack of flats
US6892472B2 (en) * 2003-03-18 2005-05-17 Novellus Systems, Inc. Method and apparatus for cleaning and drying a workpiece
US7171762B2 (en) * 2004-10-19 2007-02-06 Gala Industries, Inc. Self-cleaning centrifugal pellet dryer and method thereof
US7644512B1 (en) 2006-01-18 2010-01-12 Akrion, Inc. Systems and methods for drying a rotating substrate
CN102062524B (zh) * 2010-11-22 2012-11-21 烟台睿创微纳技术有限公司 一种用于mems器件圆片的自动干燥设备
US9421617B2 (en) 2011-06-22 2016-08-23 Tel Nexx, Inc. Substrate holder
US9117856B2 (en) 2011-07-06 2015-08-25 Tel Nexx, Inc. Substrate loader and unloader having an air bearing support
CN105466172B (zh) * 2015-12-31 2018-06-19 上饶市中科云健康科技有限公司 一种磁力驱动的真空滚筒玻态干燥机
JP7041011B2 (ja) * 2018-06-22 2022-03-23 株式会社スギノマシン 乾燥機
CN112611168B (zh) * 2018-07-19 2022-10-25 曾庆发 一种基于离心甩水和空气流动的韭菜甩水设备及使用方法
KR102634455B1 (ko) * 2020-12-02 2024-02-06 세메스 주식회사 클리닝 유닛 및 이를 포함하는 기판 처리 장치
CN113606881A (zh) * 2021-08-31 2021-11-05 青岛大厨四宝餐料有限公司 一种调味料加工用干燥装置
CN115096063B (zh) * 2022-05-25 2023-06-02 广州市通四海生物科技有限公司 一种酒厂废弃物资源再利用流水生产线及控制方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3152875A (en) * 1962-06-15 1964-10-13 Jr William L Davis Football drier
US4064635A (en) * 1976-06-17 1977-12-27 Kuhl Henry Y Apparatus for drying plastic trays
JPS5691431A (en) * 1979-12-25 1981-07-24 Toshiba Corp Automatic drying device
JPS56118347A (en) * 1980-02-22 1981-09-17 Hitachi Ltd Drying device
US4313266A (en) * 1980-05-01 1982-02-02 The Silicon Valley Group, Inc. Method and apparatus for drying wafers
US4517752A (en) * 1983-06-27 1985-05-21 Machine Technology, Inc. Splash retarder
US4559718A (en) * 1983-08-02 1985-12-24 Oki Electric Industry Co., Ltd. Method and apparatus for drying semiconductor wafers

Also Published As

Publication number Publication date
CA1293488C (en) 1991-12-24
JPH0528761Y2 (https=) 1993-07-23
EP0305402A1 (en) 1989-03-08
CN87103644A (zh) 1987-12-02
KR880701357A (ko) 1988-07-26
US4651440A (en) 1987-03-24
DE3768274D1 (de) 1991-04-04
EP0305402B1 (en) 1991-02-27
WO1987007002A1 (en) 1987-11-19
CN1008659B (zh) 1990-07-04

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