DE3768274D1 - Schleudertrockner. - Google Patents
Schleudertrockner.Info
- Publication number
- DE3768274D1 DE3768274D1 DE8787903597T DE3768274T DE3768274D1 DE 3768274 D1 DE3768274 D1 DE 3768274D1 DE 8787903597 T DE8787903597 T DE 8787903597T DE 3768274 T DE3768274 T DE 3768274T DE 3768274 D1 DE3768274 D1 DE 3768274D1
- Authority
- DE
- Germany
- Prior art keywords
- spin dryer
- dryer
- spin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B11/00—Machines or apparatus for drying solid materials or objects with movement which is non-progressive
- F26B11/18—Machines or apparatus for drying solid materials or objects with movement which is non-progressive on or in moving dishes, trays, pans, or other mainly-open receptacles
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
- F26B21/14—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects using gases or vapours other than air or steam, e.g. inert gases
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B5/00—Drying solid materials or objects by processes not involving the application of heat
- F26B5/08—Drying solid materials or objects by processes not involving the application of heat by centrifugal treatment
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Molecular Biology (AREA)
- Drying Of Solid Materials (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Centrifugal Separators (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US86463486A | 1986-05-16 | 1986-05-16 | |
PCT/US1987/001082 WO1987007002A1 (en) | 1986-05-16 | 1987-05-11 | Spin drying apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3768274D1 true DE3768274D1 (de) | 1991-04-04 |
Family
ID=25343719
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8787903597T Expired - Fee Related DE3768274D1 (de) | 1986-05-16 | 1987-05-11 | Schleudertrockner. |
Country Status (8)
Country | Link |
---|---|
US (1) | US4651440A (de) |
EP (1) | EP0305402B1 (de) |
JP (1) | JPH0528761Y2 (de) |
KR (1) | KR880701357A (de) |
CN (1) | CN1008659B (de) |
CA (1) | CA1293488C (de) |
DE (1) | DE3768274D1 (de) |
WO (1) | WO1987007002A1 (de) |
Families Citing this family (51)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5168886A (en) * | 1988-05-25 | 1992-12-08 | Semitool, Inc. | Single wafer processor |
US5431421A (en) * | 1988-05-25 | 1995-07-11 | Semitool, Inc. | Semiconductor processor wafer holder |
US5168887A (en) * | 1990-05-18 | 1992-12-08 | Semitool, Inc. | Single wafer processor apparatus |
US5238500A (en) * | 1990-05-15 | 1993-08-24 | Semitool, Inc. | Aqueous hydrofluoric and hydrochloric acid vapor processing of semiconductor wafers |
US5357991A (en) * | 1989-03-27 | 1994-10-25 | Semitool, Inc. | Gas phase semiconductor processor with liquid phase mixing |
US4989345A (en) * | 1989-12-18 | 1991-02-05 | Gill Jr Gerald L | Centrifugal spin dryer for semiconductor wafer |
JPH03238819A (ja) * | 1990-02-15 | 1991-10-24 | Seiichiro Sogo | 半導体材料の乾燥方法および装置 |
US6375741B2 (en) * | 1991-03-06 | 2002-04-23 | Timothy J. Reardon | Semiconductor processing spray coating apparatus |
US5222310A (en) * | 1990-05-18 | 1993-06-29 | Semitool, Inc. | Single wafer processor with a frame |
US5174045A (en) * | 1991-05-17 | 1992-12-29 | Semitool, Inc. | Semiconductor processor with extendible receiver for handling multiple discrete wafers without wafer carriers |
JP3277404B2 (ja) * | 1993-03-31 | 2002-04-22 | ソニー株式会社 | 基板洗浄方法及び基板洗浄装置 |
US5863348A (en) * | 1993-12-22 | 1999-01-26 | International Business Machines Corporation | Programmable method for cleaning semiconductor elements |
US5784797A (en) * | 1994-04-28 | 1998-07-28 | Semitool, Inc. | Carrierless centrifugal semiconductor processing system |
US5664337A (en) * | 1996-03-26 | 1997-09-09 | Semitool, Inc. | Automated semiconductor processing systems |
US5566466A (en) * | 1994-07-01 | 1996-10-22 | Ontrak Systems, Inc. | Spindle assembly with improved wafer holder |
US5954911A (en) * | 1995-10-12 | 1999-09-21 | Semitool, Inc. | Semiconductor processing using vapor mixtures |
US6273483B1 (en) * | 1996-03-28 | 2001-08-14 | Mcmaster University | Three orthogonal directions movable fingers for holding and/or manipulating a three-dimensional object |
US5775000A (en) * | 1996-05-13 | 1998-07-07 | Ebara Corporation | Substrate gripper device for spin drying |
US5851041A (en) * | 1996-06-26 | 1998-12-22 | Ontrak Systems, Inc. | Wafer holder with spindle assembly and wafer holder actuator |
US6645355B2 (en) | 1996-07-15 | 2003-11-11 | Semitool, Inc. | Semiconductor processing apparatus having lift and tilt mechanism |
US6091498A (en) | 1996-07-15 | 2000-07-18 | Semitool, Inc. | Semiconductor processing apparatus having lift and tilt mechanism |
US5980706A (en) * | 1996-07-15 | 1999-11-09 | Semitool, Inc. | Electrode semiconductor workpiece holder |
US6358388B1 (en) * | 1996-07-15 | 2002-03-19 | Semitool, Inc. | Plating system workpiece support having workpiece-engaging electrodes with distal contact-part and dielectric cover |
US5778554A (en) * | 1996-07-15 | 1998-07-14 | Oliver Design, Inc. | Wafer spin dryer and method of drying a wafer |
US5960555A (en) * | 1996-07-24 | 1999-10-05 | Applied Materials, Inc. | Method and apparatus for purging the back side of a substrate during chemical vapor processing |
US5884412A (en) * | 1996-07-24 | 1999-03-23 | Applied Materials, Inc. | Method and apparatus for purging the back side of a substrate during chemical vapor processing |
US5857475A (en) * | 1997-03-03 | 1999-01-12 | Volk Optical, Inc. | Optical component cleaning apparatus |
US5974681A (en) * | 1997-09-10 | 1999-11-02 | Speedfam-Ipec Corp. | Apparatus for spin drying a workpiece |
US5953827A (en) * | 1997-11-05 | 1999-09-21 | Applied Materials, Inc. | Magnetron with cooling system for process chamber of processing system |
US6013316A (en) * | 1998-02-07 | 2000-01-11 | Odme | Disc master drying cover assembly |
US6207026B1 (en) | 1999-10-13 | 2001-03-27 | Applied Materials, Inc. | Magnetron with cooling system for substrate processing system |
TW452917B (en) * | 1999-10-29 | 2001-09-01 | Winbond Electronics Corp | Holder |
US6415804B1 (en) * | 1999-12-23 | 2002-07-09 | Lam Research Corporation | Bowl for processing semiconductor wafers |
US6363623B1 (en) | 2000-06-02 | 2002-04-02 | Speedfam-Ipec Corporation | Apparatus and method for spinning a work piece |
US6481447B1 (en) | 2000-09-27 | 2002-11-19 | Lam Research Corporation | Fluid delivery ring and methods for making and implementing the same |
US6578853B1 (en) | 2000-12-22 | 2003-06-17 | Lam Research Corporation | Chuck assembly for use in a spin, rinse, and dry module and methods for making and implementing the same |
US6827092B1 (en) * | 2000-12-22 | 2004-12-07 | Lam Research Corporation | Wafer backside plate for use in a spin, rinse, and dry module and methods for making and implementing the same |
US6742279B2 (en) * | 2002-01-16 | 2004-06-01 | Applied Materials Inc. | Apparatus and method for rinsing substrates |
US6665951B1 (en) | 2002-08-22 | 2003-12-23 | Jeffrey B. Kuhl | Method and apparatus for drying a stack of flats |
US6892472B2 (en) * | 2003-03-18 | 2005-05-17 | Novellus Systems, Inc. | Method and apparatus for cleaning and drying a workpiece |
US7171762B2 (en) * | 2004-10-19 | 2007-02-06 | Gala Industries, Inc. | Self-cleaning centrifugal pellet dryer and method thereof |
WO2007084952A2 (en) | 2006-01-18 | 2007-07-26 | Akrion Technologies, Inc. | Systems and methods for drying a rotating substrate |
CN102062524B (zh) * | 2010-11-22 | 2012-11-21 | 烟台睿创微纳技术有限公司 | 一种用于mems器件圆片的自动干燥设备 |
US9421617B2 (en) | 2011-06-22 | 2016-08-23 | Tel Nexx, Inc. | Substrate holder |
US8613474B2 (en) | 2011-07-06 | 2013-12-24 | Tel Nexx, Inc. | Substrate loader and unloader having a Bernoulli support |
CN105466172B (zh) * | 2015-12-31 | 2018-06-19 | 上饶市中科云健康科技有限公司 | 一种磁力驱动的真空滚筒玻态干燥机 |
JP7041011B2 (ja) * | 2018-06-22 | 2022-03-23 | 株式会社スギノマシン | 乾燥機 |
CN112611168B (zh) * | 2018-07-19 | 2022-10-25 | 曾庆发 | 一种基于离心甩水和空气流动的韭菜甩水设备及使用方法 |
KR102634455B1 (ko) * | 2020-12-02 | 2024-02-06 | 세메스 주식회사 | 클리닝 유닛 및 이를 포함하는 기판 처리 장치 |
CN113606881A (zh) * | 2021-08-31 | 2021-11-05 | 青岛大厨四宝餐料有限公司 | 一种调味料加工用干燥装置 |
CN115096063B (zh) * | 2022-05-25 | 2023-06-02 | 广州市通四海生物科技有限公司 | 一种酒厂废弃物资源再利用流水生产线及控制方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3152875A (en) * | 1962-06-15 | 1964-10-13 | Jr William L Davis | Football drier |
US4064635A (en) * | 1976-06-17 | 1977-12-27 | Kuhl Henry Y | Apparatus for drying plastic trays |
JPS5691431A (en) * | 1979-12-25 | 1981-07-24 | Toshiba Corp | Automatic drying device |
JPS56118347A (en) * | 1980-02-22 | 1981-09-17 | Hitachi Ltd | Drying device |
US4313266A (en) * | 1980-05-01 | 1982-02-02 | The Silicon Valley Group, Inc. | Method and apparatus for drying wafers |
US4517752A (en) * | 1983-06-27 | 1985-05-21 | Machine Technology, Inc. | Splash retarder |
US4559718A (en) * | 1983-08-02 | 1985-12-24 | Oki Electric Industry Co., Ltd. | Method and apparatus for drying semiconductor wafers |
-
1986
- 1986-05-16 US US06/664,634 patent/US4651440A/en not_active Expired - Fee Related
-
1987
- 1987-05-11 JP JP1989600017U patent/JPH0528761Y2/ja not_active Expired - Lifetime
- 1987-05-11 KR KR1019870701246A patent/KR880701357A/ko not_active IP Right Cessation
- 1987-05-11 WO PCT/US1987/001082 patent/WO1987007002A1/en active IP Right Grant
- 1987-05-11 EP EP87903597A patent/EP0305402B1/de not_active Expired - Lifetime
- 1987-05-11 DE DE8787903597T patent/DE3768274D1/de not_active Expired - Fee Related
- 1987-05-15 CA CA000537249A patent/CA1293488C/en not_active Expired - Fee Related
- 1987-05-16 CN CN87103644A patent/CN1008659B/zh not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPH0528761Y2 (de) | 1993-07-23 |
US4651440A (en) | 1987-03-24 |
WO1987007002A1 (en) | 1987-11-19 |
JPH01500008U (de) | 1989-11-02 |
CN1008659B (zh) | 1990-07-04 |
KR880701357A (ko) | 1988-07-26 |
EP0305402B1 (de) | 1991-02-27 |
EP0305402A1 (de) | 1989-03-08 |
CA1293488C (en) | 1991-12-24 |
CN87103644A (zh) | 1987-12-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |