JPH0143773B2 - - Google Patents

Info

Publication number
JPH0143773B2
JPH0143773B2 JP56110736A JP11073681A JPH0143773B2 JP H0143773 B2 JPH0143773 B2 JP H0143773B2 JP 56110736 A JP56110736 A JP 56110736A JP 11073681 A JP11073681 A JP 11073681A JP H0143773 B2 JPH0143773 B2 JP H0143773B2
Authority
JP
Japan
Prior art keywords
ladder
molecular weight
lower alkyl
methylpolysilsesquioxane
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56110736A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5813632A (ja
Inventor
Ikuo Nozue
Nagahiko Tomomitsu
Takashi Ukaji
Yoshio Matsumura
Taro Suminoe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Priority to JP11073681A priority Critical patent/JPS5813632A/ja
Priority to DE8181303911T priority patent/DE3173441D1/de
Priority to EP81303911A priority patent/EP0046695B1/en
Priority to US06/353,811 priority patent/US4399266A/en
Publication of JPS5813632A publication Critical patent/JPS5813632A/ja
Publication of JPH0143773B2 publication Critical patent/JPH0143773B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Silicon Polymers (AREA)
  • Formation Of Insulating Films (AREA)
JP11073681A 1980-08-26 1981-07-17 耐熱性薄膜形成能を有するラダ−状低級アルキルポリシルセスキオキサン Granted JPS5813632A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP11073681A JPS5813632A (ja) 1981-07-17 1981-07-17 耐熱性薄膜形成能を有するラダ−状低級アルキルポリシルセスキオキサン
DE8181303911T DE3173441D1 (en) 1980-08-26 1981-08-26 Ladder-like lower alkylpolysilsesquioxanes and process for their preparation
EP81303911A EP0046695B1 (en) 1980-08-26 1981-08-26 Ladder-like lower alkylpolysilsesquioxanes and process for their preparation
US06/353,811 US4399266A (en) 1980-08-26 1982-03-02 Laddery lower alkylpolysilsesquioxane having heat-resistant thin film-formability and process for preparing same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11073681A JPS5813632A (ja) 1981-07-17 1981-07-17 耐熱性薄膜形成能を有するラダ−状低級アルキルポリシルセスキオキサン

Publications (2)

Publication Number Publication Date
JPS5813632A JPS5813632A (ja) 1983-01-26
JPH0143773B2 true JPH0143773B2 (enrdf_load_html_response) 1989-09-22

Family

ID=14543210

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11073681A Granted JPS5813632A (ja) 1980-08-26 1981-07-17 耐熱性薄膜形成能を有するラダ−状低級アルキルポリシルセスキオキサン

Country Status (1)

Country Link
JP (1) JPS5813632A (enrdf_load_html_response)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6959408B2 (en) 1989-06-30 2005-10-25 Texas Instruments Incorporated IC with serial scan path, protocol memory, and event circuit
US6975980B2 (en) 1998-02-18 2005-12-13 Texas Instruments Incorporated Hierarchical linking module connection to access ports of embedded cores
US7058862B2 (en) 2000-05-26 2006-06-06 Texas Instruments Incorporated Selecting different 1149.1 TAP domains from update-IR state
US8007860B2 (en) 2008-10-08 2011-08-30 Showa Denko K.K. Method for manufacturing magnetic recording medium, and magnetic recording and reproducing apparatus

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5914641A (ja) * 1982-07-16 1984-01-25 Tokyo Denshi Kagaku Kabushiki シリコ−ン系被覆の形成方法
JPS613120A (ja) * 1984-06-15 1986-01-09 Dainippon Ink & Chem Inc カラ−液晶表示用装置
JPS613124A (ja) * 1984-06-15 1986-01-09 Dainippon Ink & Chem Inc カラ−液晶表示装置
JPS61201430A (ja) * 1985-03-04 1986-09-06 Fujitsu Ltd 半導体装置用シリコ−ン樹脂膜及びその形成方法
GB8520100D0 (en) * 1985-08-09 1985-09-18 Unilever Plc Article for wiping surfaces
US4999397A (en) * 1989-07-28 1991-03-12 Dow Corning Corporation Metastable silane hydrolyzates and process for their preparation
JP4571838B2 (ja) * 2004-08-10 2010-10-27 新日本製鐵株式会社 耐熱接着性絶縁皮膜付き電磁鋼板及びその製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6017312B2 (ja) * 1977-12-16 1985-05-02 ジェイエスアール株式会社 シリコ−ン樹脂組成物
JPS5950182B2 (ja) * 1977-12-16 1984-12-06 ジェイエスアール株式会社 シリコ−ン樹脂の組成物
JPS6046826B2 (ja) * 1979-06-21 1985-10-18 富士通株式会社 半導体装置

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6959408B2 (en) 1989-06-30 2005-10-25 Texas Instruments Incorporated IC with serial scan path, protocol memory, and event circuit
US6990620B2 (en) 1989-06-30 2006-01-24 Texas Instruments Incorporated Scanning a protocol signal into an IC for performing a circuit operation
US6996761B2 (en) 1989-06-30 2006-02-07 Texas Instruments Incorporated IC with protocol selection memory coupled to serial scan path
US7058871B2 (en) 1989-06-30 2006-06-06 Texas Instruments Incorporated Circuit with expected data memory coupled to serial input lead
US6975980B2 (en) 1998-02-18 2005-12-13 Texas Instruments Incorporated Hierarchical linking module connection to access ports of embedded cores
US7058862B2 (en) 2000-05-26 2006-06-06 Texas Instruments Incorporated Selecting different 1149.1 TAP domains from update-IR state
US8007860B2 (en) 2008-10-08 2011-08-30 Showa Denko K.K. Method for manufacturing magnetic recording medium, and magnetic recording and reproducing apparatus

Also Published As

Publication number Publication date
JPS5813632A (ja) 1983-01-26

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