JPH0140494B2 - - Google Patents

Info

Publication number
JPH0140494B2
JPH0140494B2 JP17267580A JP17267580A JPH0140494B2 JP H0140494 B2 JPH0140494 B2 JP H0140494B2 JP 17267580 A JP17267580 A JP 17267580A JP 17267580 A JP17267580 A JP 17267580A JP H0140494 B2 JPH0140494 B2 JP H0140494B2
Authority
JP
Japan
Prior art keywords
charged beam
exposed
wafer
pattern
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP17267580A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5796525A (en
Inventor
Toshihiko Osada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP17267580A priority Critical patent/JPS5796525A/ja
Publication of JPS5796525A publication Critical patent/JPS5796525A/ja
Publication of JPH0140494B2 publication Critical patent/JPH0140494B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/026—Means for avoiding or neutralising unwanted electrical charges on tube components

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP17267580A 1980-12-09 1980-12-09 Method of charged beam exposure Granted JPS5796525A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17267580A JPS5796525A (en) 1980-12-09 1980-12-09 Method of charged beam exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17267580A JPS5796525A (en) 1980-12-09 1980-12-09 Method of charged beam exposure

Publications (2)

Publication Number Publication Date
JPS5796525A JPS5796525A (en) 1982-06-15
JPH0140494B2 true JPH0140494B2 (enrdf_load_stackoverflow) 1989-08-29

Family

ID=15946279

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17267580A Granted JPS5796525A (en) 1980-12-09 1980-12-09 Method of charged beam exposure

Country Status (1)

Country Link
JP (1) JPS5796525A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6258620A (ja) * 1985-09-09 1987-03-14 Nippon Telegr & Teleph Corp <Ntt> 荷電ビ−ム装置

Also Published As

Publication number Publication date
JPS5796525A (en) 1982-06-15

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