JPH01321074A - Production of tip for soldering - Google Patents
Production of tip for solderingInfo
- Publication number
- JPH01321074A JPH01321074A JP15575788A JP15575788A JPH01321074A JP H01321074 A JPH01321074 A JP H01321074A JP 15575788 A JP15575788 A JP 15575788A JP 15575788 A JP15575788 A JP 15575788A JP H01321074 A JPH01321074 A JP H01321074A
- Authority
- JP
- Japan
- Prior art keywords
- plating layer
- iron plating
- swaging
- tip
- chip
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005476 soldering Methods 0.000 title claims description 9
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 69
- 229910052742 iron Inorganic materials 0.000 claims abstract description 35
- 238000007747 plating Methods 0.000 claims abstract description 32
- 239000000463 material Substances 0.000 claims abstract description 14
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 9
- 229910052802 copper Inorganic materials 0.000 claims abstract description 9
- 239000010949 copper Substances 0.000 claims abstract description 9
- 238000005260 corrosion Methods 0.000 abstract description 7
- 230000007797 corrosion Effects 0.000 abstract description 7
- 238000005242 forging Methods 0.000 abstract description 2
- 238000003754 machining Methods 0.000 abstract description 2
- 238000004140 cleaning Methods 0.000 abstract 1
- 150000002505 iron Chemical class 0.000 abstract 1
- 229910000679 solder Inorganic materials 0.000 description 16
- 238000000034 method Methods 0.000 description 8
- 239000000758 substrate Substances 0.000 description 5
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 241000252254 Catostomidae Species 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 235000000396 iron Nutrition 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、電気半田ごてのこて先、自動機用半田チップ
あるいは半田吸取器用ノズル等の半田用チップの製造方
法に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for manufacturing solder tips such as tips for electric soldering irons, solder tips for automatic machines, and nozzles for solder suckers.
[従来の技術]
一般に、電気半田ごてにおいては、そのこて光材料とし
て、熱伝導が良好で半田の濡れ性にも優れている銅金属
を用いるのが通例である。[Prior Art] Generally, in an electric soldering iron, copper metal, which has good thermal conductivity and excellent solder wettability, is usually used as the soldering iron material.
ところで近年、半田付は作業においてもベルトコンベア
システムによる連続作業が取り入れられるようになって
きている。このような半田付は連続作業に前記銅製のこ
て先を用いる場合には、半田あるいはフラックスの侵蝕
作用により非常に速い速度でこて先が減ってしまうため
、こて先の表面に、50〜500ミクロン厚程度の鉄メ
ッキを施して減りを防止することが行われている。Incidentally, in recent years, continuous soldering work using a belt conveyor system has been adopted. When using the above-mentioned copper tip for continuous soldering work, the soldering iron tip wears off at a very rapid rate due to the corrosive action of the solder or flux. Iron plating with a thickness of ~500 microns is applied to prevent wear.
このように耐蝕性を有する半田用チップを製造する場合
、従来は、銅製の基体を所望のチップ形状に成形加工し
、次いでこの基体表面に鉄メ・ツキを施して鉄メッキ層
を形成している。Conventionally, when manufacturing a solder chip with corrosion resistance, a copper base is formed into the desired chip shape, and then an iron plating layer is formed on the surface of the base. There is.
[発明が解決しようとする課題]
ところで、上記のように鉄メッキを施すには、通常電解
処理で行うため、基体の端部あるいは角部の電流密度が
高くなり、鉄メッキ層がこの部分だけ盛り上がってしま
う。この盛り上がった部分のメッキは材質が固く脆いた
め除去する必要があり、そのために、鉄メッキを施した
後、旋盤、フライス盤、あるいはグラインダ等により切
削・研磨して、鉄メッキ層の表面を平滑にしている。[Problems to be Solved by the Invention] By the way, iron plating as described above is usually carried out by electrolytic treatment, so the current density is high at the edges or corners of the substrate, and the iron plating layer is only formed in these areas. I get excited. The plating on this raised part needs to be removed because the material is hard and brittle. Therefore, after applying iron plating, it is cut and polished using a lathe, milling machine, or grinder to smooth the surface of the iron plating layer. ing.
ところが、このような仕上げ加工は、作業に熟練を要す
るとともに非能率的であり、また、製品にばらつきが生
じ、安定した耐蝕性、熱伝導性が得られないといった不
具合がある。However, such finishing processing requires skill and is inefficient, and also has problems such as variations in the product and the inability to obtain stable corrosion resistance and thermal conductivity.
[課題を解決するための手段]
本発明は上記課題を解決するためになされたものであっ
て、所望のチップ形状に成形した銅製の基体表面に鉄メ
ッキ層を形成してチップ基材を得、次いで、前記鉄メッ
キ層をスウェージング加工により成形することを特徴と
している。[Means for Solving the Problems] The present invention has been made to solve the above problems, and includes forming an iron plating layer on the surface of a copper base formed into a desired chip shape to obtain a chip base material. Then, the iron plating layer is formed by swaging.
[作用]
本発明の半田用チップの製造方法によれば、あらかじめ
所望のチップ形状に成形された基体表面の鉄メッキ層を
、スウェージング加工により成形することから、鉄メッ
キ層の表面に生じる凹凸を容易に平滑にすることができ
、このため、耐蝕性および熱伝導性が均一な半田用チッ
プを容易に量産できる。[Function] According to the method of manufacturing a soldering chip of the present invention, since the iron plating layer on the surface of the substrate, which has been previously formed into a desired chip shape, is formed by swaging processing, the unevenness that occurs on the surface of the iron plating layer is reduced. This makes it easy to mass-produce solder chips with uniform corrosion resistance and thermal conductivity.
[実施例]
以下、第1図ないし第3図を参照して本発明方法にもと
づいて半田用チップを製造する一実施例を説明する。[Example] Hereinafter, an example of manufacturing a solder chip based on the method of the present invention will be described with reference to FIGS. 1 to 3.
ま°ず、機械加工あるいは種々の鍛圧加工等により、銅
製の丸棒状部材の一端を鋭利に形成し、第1図に示す基
体lを得る。First, one end of a round rod-shaped member made of copper is sharpened by machining or various forging processes to obtain the base 1 shown in FIG.
続いて、基体1を化学的に清浄するとともに水洗し、そ
の後、第2図に示すように、電解処理により、その表面
に2008v以下の軟らかい鉄メッキを50〜500ミ
クロン厚に施して鉄メッキ層2を形成し、チップ基材3
を得る。このメ、ツキ形成は、前記のごとく電解処理に
より行うから、チップ基材3の端部および角部の電流密
度が高くなり鉄メッキ層2はこれらの部分だけ厚く盛り
上がっている。Next, the substrate 1 is chemically cleaned and washed with water, and then, as shown in FIG. 2, a soft iron plating of 2008 V or less is applied to the surface to a thickness of 50 to 500 microns by electrolytic treatment to form an iron plating layer. 2 and chip base material 3
get. Since this layer formation is performed by electrolytic treatment as described above, the current density is high at the ends and corners of the chip base material 3, and the iron plating layer 2 is thickened only at these parts.
次いで、最終的な形状および寸法を成形し得る金型を用
いて前記チップ基材3をスウェージング加工することに
より、鉄メッキ層2の盛り上がり部分をつぶして除去し
、その表面を平滑にする。Next, the chip base material 3 is swaged using a mold capable of shaping the final shape and dimensions, thereby crushing and removing the raised portions of the iron plating layer 2 and smoothing its surface.
すなわち、このスウェージング加工は鉄メッキ層2のみ
に対して行われる。このスウエージング加工の際に、基
体1の変形を避けるため、あらかじめ基体1表面の硬化
処理を施してお(ことが好ましい。That is, this swaging process is performed only on the iron plating layer 2. In order to avoid deformation of the substrate 1 during this swaging process, the surface of the substrate 1 is preferably hardened in advance.
以上により、第3図に示す半田用チップ4を得る。Through the above steps, the solder chip 4 shown in FIG. 3 is obtained.
上記方法によれば、鉄メッキ層2の表面を平滑にする作
業を、熟練を要することなく容易に行え、また、鉄メッ
キ層2のみをスウェージング加工するので、スウェージ
ング加工用機械の負担も少ないことから、高品質の製品
を量産することができる。According to the above method, the surface of the iron plating layer 2 can be easily smoothed without requiring any skill, and since only the iron plating layer 2 is swaged, the load on the swaging machine is reduced. Because it is small, it is possible to mass-produce high-quality products.
また、鉄メッキ層2の厚さを略均−にすることができる
ので、得られた半田用チップ4は耐蝕性および熱伝導性
が均一なものとなる。Further, since the thickness of the iron plating layer 2 can be made approximately uniform, the obtained solder chip 4 has uniform corrosion resistance and thermal conductivity.
なお、上記実施例方法において、チップ基材3を鉄の分
子の変態点である約740℃まで加熱した後焼鈍し、そ
の後スウェージング加工を施すようにしてもよい。これ
によれば、熱処理により鉄の分子の配列構造が良好とな
り、金属組織が緻密になってより耐蝕性の優れた半田用
チップを得ることができる。In the method of the above embodiment, the chip base material 3 may be annealed after being heated to approximately 740° C., which is the transformation point of iron molecules, and then subjected to swaging processing. According to this, the heat treatment improves the arrangement structure of iron molecules, and the metal structure becomes dense, making it possible to obtain a solder chip with better corrosion resistance.
[発明の効果]
以上説明したように、本発明の半田用チップの製造方法
によれば、所望のチップ形状に成形した銅製の基体表面
に鉄メッキ層を形成してチップ基材を得、次いで、前記
鉄メッキ層をスウェージング加工により成形することを
特徴とし、鉄メッキ層の表面を容易に平滑にすることが
できるので、耐蝕性および熱伝導性が均一な半田用チッ
プを得ることができ、また、鉄メッキ層のみをスウェー
ジング加工するので、加工機械の負担も少なく、したが
って、高品質の半田用チップを量産することができると
いった効果を奏する。[Effects of the Invention] As explained above, according to the method for manufacturing a solder chip of the present invention, an iron plating layer is formed on the surface of a copper base formed into a desired chip shape to obtain a chip base material, and then a chip base material is obtained. , characterized in that the iron plating layer is formed by swaging processing, and since the surface of the iron plating layer can be easily smoothed, a solder chip with uniform corrosion resistance and thermal conductivity can be obtained. Moreover, since only the iron plating layer is swaged, the load on the processing machine is reduced, and therefore high-quality solder chips can be mass-produced.
第1図ないし第3図は本発明に係る半田用チップを製造
手順にしたがって順次示す断面図である。
1・・・・・・基体、 2・・・・・・鉄メッキ層
、3・・・・・・チップ基材、4・・・・・・半田用チ
ップ。1 to 3 are sectional views sequentially showing solder chips according to the present invention according to the manufacturing procedure. 1...Base body, 2...Iron plating layer, 3...Chip base material, 4...Solder chip.
Claims (1)
層を形成してチップ基材を得、次いで、このチップ基材
の前記鉄メッキ層をスウェージング加工により成形する
ことを特徴とする半田用チップの製造方法。For soldering, the chip base material is obtained by forming an iron plating layer on the surface of a copper base molded into a desired chip shape, and then the iron plating layer of the chip base material is shaped by swaging processing. Chip manufacturing method.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15575788A JPH01321074A (en) | 1988-06-23 | 1988-06-23 | Production of tip for soldering |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15575788A JPH01321074A (en) | 1988-06-23 | 1988-06-23 | Production of tip for soldering |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01321074A true JPH01321074A (en) | 1989-12-27 |
Family
ID=15612747
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15575788A Pending JPH01321074A (en) | 1988-06-23 | 1988-06-23 | Production of tip for soldering |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01321074A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0417974A (en) * | 1990-05-10 | 1992-01-22 | Hakko Kk | Chip for solder and its manufacture |
KR100864670B1 (en) * | 2007-04-30 | 2008-10-23 | 박인덕 | Manufacturing method soldering iron tip for lread free |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5911386A (en) * | 1982-07-09 | 1984-01-20 | Hitachi Ltd | Liquid crystal display element |
-
1988
- 1988-06-23 JP JP15575788A patent/JPH01321074A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5911386A (en) * | 1982-07-09 | 1984-01-20 | Hitachi Ltd | Liquid crystal display element |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0417974A (en) * | 1990-05-10 | 1992-01-22 | Hakko Kk | Chip for solder and its manufacture |
KR100864670B1 (en) * | 2007-04-30 | 2008-10-23 | 박인덕 | Manufacturing method soldering iron tip for lread free |
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