JPH0131454B2 - - Google Patents
Info
- Publication number
- JPH0131454B2 JPH0131454B2 JP7035380A JP7035380A JPH0131454B2 JP H0131454 B2 JPH0131454 B2 JP H0131454B2 JP 7035380 A JP7035380 A JP 7035380A JP 7035380 A JP7035380 A JP 7035380A JP H0131454 B2 JPH0131454 B2 JP H0131454B2
- Authority
- JP
- Japan
- Prior art keywords
- trichlorosilane
- silicon tetrachloride
- hydrogen
- volume
- silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 claims description 33
- 239000005049 silicon tetrachloride Substances 0.000 claims description 33
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 32
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 claims description 28
- 239000005052 trichlorosilane Substances 0.000 claims description 28
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 21
- 229910052739 hydrogen Inorganic materials 0.000 claims description 21
- 239000001257 hydrogen Substances 0.000 claims description 21
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 19
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 150000002431 hydrogen Chemical class 0.000 claims description 3
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 description 20
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 19
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 19
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 19
- 229910052710 silicon Inorganic materials 0.000 description 15
- 239000010703 silicon Substances 0.000 description 15
- 239000000203 mixture Substances 0.000 description 14
- 238000000034 method Methods 0.000 description 9
- 239000006227 byproduct Substances 0.000 description 8
- 239000007789 gas Substances 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 239000007795 chemical reaction product Substances 0.000 description 4
- 238000004817 gas chromatography Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 239000011863 silicon-based powder Substances 0.000 description 4
- 239000003054 catalyst Substances 0.000 description 3
- 230000003197 catalytic effect Effects 0.000 description 3
- 238000006722 reduction reaction Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910018594 Si-Cu Inorganic materials 0.000 description 1
- 229910008465 Si—Cu Inorganic materials 0.000 description 1
- 229910001297 Zn alloy Inorganic materials 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000012733 comparative method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 230000009931 harmful effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910001510 metal chloride Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 229910021484 silicon-nickel alloy Inorganic materials 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
Landscapes
- Silicon Compounds (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7035380A JPS56169119A (en) | 1980-05-27 | 1980-05-27 | Manufacture of trichlorosilane |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7035380A JPS56169119A (en) | 1980-05-27 | 1980-05-27 | Manufacture of trichlorosilane |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56169119A JPS56169119A (en) | 1981-12-25 |
JPH0131454B2 true JPH0131454B2 (ko) | 1989-06-26 |
Family
ID=13428974
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7035380A Granted JPS56169119A (en) | 1980-05-27 | 1980-05-27 | Manufacture of trichlorosilane |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56169119A (ko) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2008062632A1 (fr) * | 2006-11-21 | 2008-05-29 | Mitsubishi Materials Corporation | Appareil de production de trichlorosilane |
JP5160181B2 (ja) * | 2006-11-21 | 2013-03-13 | 三菱マテリアル株式会社 | トリクロロシラン製造装置 |
KR100984942B1 (ko) * | 2010-07-27 | 2010-10-01 | 전북대학교산학협력단 | 삼염화실란의 제조를 위한 사염화규소의 탈염소수소화 반응에 사용되는 촉매 및 그 제조방법 |
-
1980
- 1980-05-27 JP JP7035380A patent/JPS56169119A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS56169119A (en) | 1981-12-25 |
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