JPH0130905B2 - - Google Patents
Info
- Publication number
- JPH0130905B2 JPH0130905B2 JP5395580A JP5395580A JPH0130905B2 JP H0130905 B2 JPH0130905 B2 JP H0130905B2 JP 5395580 A JP5395580 A JP 5395580A JP 5395580 A JP5395580 A JP 5395580A JP H0130905 B2 JPH0130905 B2 JP H0130905B2
- Authority
- JP
- Japan
- Prior art keywords
- nitrides
- nitriding
- cemented carbide
- layer
- thin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 150000004767 nitrides Chemical class 0.000 claims description 28
- 239000002184 metal Substances 0.000 claims description 13
- 229910052751 metal Inorganic materials 0.000 claims description 13
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 11
- 238000005121 nitriding Methods 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 8
- 150000002739 metals Chemical class 0.000 claims description 6
- 239000012299 nitrogen atmosphere Substances 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 claims description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical group [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 2
- 230000000737 periodic effect Effects 0.000 claims 1
- 239000000463 material Substances 0.000 description 11
- 238000005520 cutting process Methods 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 239000007789 gas Substances 0.000 description 3
- 125000004433 nitrogen atom Chemical group N* 0.000 description 3
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000010953 base metal Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 150000001247 metal acetylides Chemical class 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 238000005245 sintering Methods 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 239000011195 cermet Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5395580A JPS56150184A (en) | 1980-04-22 | 1980-04-22 | Nitriding treatment of wc base super hard alloy |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5395580A JPS56150184A (en) | 1980-04-22 | 1980-04-22 | Nitriding treatment of wc base super hard alloy |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS56150184A JPS56150184A (en) | 1981-11-20 |
| JPH0130905B2 true JPH0130905B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1989-06-22 |
Family
ID=12957125
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5395580A Granted JPS56150184A (en) | 1980-04-22 | 1980-04-22 | Nitriding treatment of wc base super hard alloy |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS56150184A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0621360B2 (ja) * | 1988-03-28 | 1994-03-23 | 東芝タンガロイ株式会社 | 耐剥離性にすぐれたダイヤモンド被覆燒結合金及びその製造方法 |
| JP6569376B2 (ja) * | 2015-08-13 | 2019-09-04 | 日本製鉄株式会社 | 超硬工具及びその製造方法 |
| CN111118441B (zh) * | 2020-01-07 | 2022-02-25 | 汇专科技集团股份有限公司 | 一种硬质合金表面氮化处理的方法 |
-
1980
- 1980-04-22 JP JP5395580A patent/JPS56150184A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS56150184A (en) | 1981-11-20 |