JPH0128455B2 - - Google Patents

Info

Publication number
JPH0128455B2
JPH0128455B2 JP55127709A JP12770980A JPH0128455B2 JP H0128455 B2 JPH0128455 B2 JP H0128455B2 JP 55127709 A JP55127709 A JP 55127709A JP 12770980 A JP12770980 A JP 12770980A JP H0128455 B2 JPH0128455 B2 JP H0128455B2
Authority
JP
Japan
Prior art keywords
anode
discharge device
cathode
discharge
surface analysis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55127709A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5752844A (en
Inventor
Katsuhiro Kageyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP55127709A priority Critical patent/JPS5752844A/ja
Publication of JPS5752844A publication Critical patent/JPS5752844A/ja
Publication of JPH0128455B2 publication Critical patent/JPH0128455B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E30/00Energy generation of nuclear origin
    • Y02E30/10Nuclear fusion reactors

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Plasma Technology (AREA)
  • Electron Sources, Ion Sources (AREA)
JP55127709A 1980-09-13 1980-09-13 Surface analysis device Granted JPS5752844A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55127709A JPS5752844A (en) 1980-09-13 1980-09-13 Surface analysis device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55127709A JPS5752844A (en) 1980-09-13 1980-09-13 Surface analysis device

Publications (2)

Publication Number Publication Date
JPS5752844A JPS5752844A (en) 1982-03-29
JPH0128455B2 true JPH0128455B2 (enrdf_load_stackoverflow) 1989-06-02

Family

ID=14966763

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55127709A Granted JPS5752844A (en) 1980-09-13 1980-09-13 Surface analysis device

Country Status (1)

Country Link
JP (1) JPS5752844A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS5752844A (en) 1982-03-29

Similar Documents

Publication Publication Date Title
US8101923B2 (en) System and method for spatially-resolved chemical analysis using microplasma desorption and ionization of a sample
US7459677B2 (en) Mass spectrometer for trace gas leak detection with suppression of undesired ions
US4581533A (en) Mass spectrometer and method
EP1994546B1 (en) High sensitivity slitless ion source mass spectrometer for trace gas leak detection
US11764026B2 (en) Electron source
JP3500323B2 (ja) サイクロイド質量分析計に使用されるイオナイザー
US3939344A (en) Prefilter-ionizer apparatus for use with quadrupole type secondary-ion mass spectrometers
JP2006526881A (ja) マススペクトロメータと、それに関係するイオナイザ及び方法
US7858933B2 (en) Mass spectrometer
US5561292A (en) Mass spectrometer and electron impact ion source thereof
JP3300602B2 (ja) 大気圧イオン化イオントラップ質量分析方法及び装置
WO2007102204A1 (ja) 質量分析装置
JP2002150992A (ja) 質量分析のためのイオン化装置およびイオン化方法
JP6717429B2 (ja) イオン検出装置及び質量分析装置
JPH0128455B2 (enrdf_load_stackoverflow)
US6617771B2 (en) Electron ionization ion source
CN115483088A (zh) 质量分析装置
JPH0746594B2 (ja) 誘導結合プラズマをイオン源とする質量分析装置
JP7497779B2 (ja) 質量分析装置
JPH06302295A (ja) 質量分析装置および差動排気装置
US20090294652A1 (en) Electron Generation Apparatuses, Mass Spectrometry Instruments, Methods of Generating Electrons, and Mass Spectrometry Methods
JPH0135469B2 (enrdf_load_stackoverflow)
JPS586259B2 (ja) イオン発生装置
HK1131255B (en) Mass spectrometer for trace gas leak detection with suppression of undesired ions
HK1131256B (en) High sensitivity slitless ion source mass spectrometer for trace gas leak detection