JPH01276607A - Ferromagnetic thin film and magnetic head using same - Google Patents
Ferromagnetic thin film and magnetic head using sameInfo
- Publication number
- JPH01276607A JPH01276607A JP10391488A JP10391488A JPH01276607A JP H01276607 A JPH01276607 A JP H01276607A JP 10391488 A JP10391488 A JP 10391488A JP 10391488 A JP10391488 A JP 10391488A JP H01276607 A JPH01276607 A JP H01276607A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- film
- magnetic
- alloy
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 83
- 239000010409 thin film Substances 0.000 title claims abstract description 44
- 230000005294 ferromagnetic effect Effects 0.000 title claims description 33
- 239000010408 film Substances 0.000 claims abstract description 82
- 239000000758 substrate Substances 0.000 claims abstract description 66
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 35
- 239000000956 alloy Substances 0.000 claims abstract description 35
- 229910001004 magnetic alloy Inorganic materials 0.000 claims abstract description 19
- 229910052751 metal Inorganic materials 0.000 claims abstract description 15
- 239000002184 metal Substances 0.000 claims abstract description 15
- 229910052725 zinc Inorganic materials 0.000 claims abstract description 14
- 229910052735 hafnium Inorganic materials 0.000 claims abstract description 13
- 229910052758 niobium Inorganic materials 0.000 claims abstract description 11
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 11
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 10
- 229910052748 manganese Inorganic materials 0.000 claims abstract description 8
- 150000002739 metals Chemical class 0.000 claims abstract description 8
- 229910052750 molybdenum Inorganic materials 0.000 claims abstract description 5
- 229910052715 tantalum Inorganic materials 0.000 claims abstract description 5
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 5
- 229910052720 vanadium Inorganic materials 0.000 claims abstract description 4
- 229910052742 iron Inorganic materials 0.000 abstract description 3
- 238000000034 method Methods 0.000 abstract description 2
- 229910000859 α-Fe Inorganic materials 0.000 description 23
- 230000004907 flux Effects 0.000 description 15
- 239000000853 adhesive Substances 0.000 description 10
- 230000001070 adhesive effect Effects 0.000 description 10
- 239000000463 material Substances 0.000 description 9
- 230000000694 effects Effects 0.000 description 8
- 229910001339 C alloy Inorganic materials 0.000 description 7
- 230000035699 permeability Effects 0.000 description 7
- 239000011162 core material Substances 0.000 description 6
- 239000011521 glass Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 229910017112 Fe—C Inorganic materials 0.000 description 3
- 229910001093 Zr alloy Inorganic materials 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- 238000004804 winding Methods 0.000 description 3
- 229910000640 Fe alloy Inorganic materials 0.000 description 2
- 229910000676 Si alloy Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000001659 ion-beam spectroscopy Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000009987 spinning Methods 0.000 description 2
- 241000796654 Axos Species 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000000682 scanning probe acoustic microscopy Methods 0.000 description 1
Landscapes
- Magnetic Heads (AREA)
- Thin Magnetic Films (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は高飽和磁束密度を有する強磁性膜に関し、特に
磁気ヘッドのコア材料に適した強磁性膜および磁気ディ
スク装置、ＶＴＲなどに用いる磁気ヘッドに関する。Detailed Description of the Invention [Field of Industrial Application] The present invention relates to a ferromagnetic film having a high saturation magnetic flux density, and in particular to a ferromagnetic film suitable as a core material of a magnetic head, and a magnetic film used in magnetic disk devices, VTRs, etc. Regarding the head.
磁気ヘッドの記録時における磁気飽和を防ぐために、磁
気ヘッド材料は高飽和磁束密度を有することが必要であ
る。またヘッドの再生効率の面から低保磁力、高透磁率
の特性を有することも必要、である。In order to prevent magnetic saturation during recording with a magnetic head, the magnetic head material needs to have a high saturation magnetic flux density. In addition, from the viewpoint of playback efficiency of the head, it is also necessary to have characteristics of low coercive force and high magnetic permeability.
このような高飽和磁束密度を有する磁性材料を得るため
、Ｆｅを主成分とする合金の開発が進められており、特
開昭５２−１１２７９７に論じられているように、Ｆｅ
−８ｉ系合金で高飽和磁束密度および高透磁率が得られ
ている。In order to obtain magnetic materials with such high saturation magnetic flux density, alloys containing Fe as the main component are being developed.
High saturation magnetic flux density and high magnetic permeability have been obtained with -8i alloys.
しかし、Ｆｅを主成分とする合金薄膜をＭ ｎ −Ｚｎ
フェライト、ＳｉＯｘ，ＡｌｘＯｓ等の酸化物基板上に
形成した場合、合金薄膜と基板との接着力が弱く、１μ
ｍ以上の膜厚を有する合金薄膜は上記基板よりはく離し
、形成できない等の問題があった。However, when the alloy thin film containing Fe as the main component is
When formed on an oxide substrate such as ferrite, SiOx, AlxOs, etc., the adhesive strength between the alloy thin film and the substrate is weak, and
There is a problem that an alloy thin film having a film thickness of m or more peels off from the substrate and cannot be formed.
本発明の目的は、上述の従来技術の欠点を解消し、酸化
物基板との接着力が強い強磁性膜およびこれを用いた高
密度磁気記録用の磁気ヘッドを提供することにある。SUMMARY OF THE INVENTION An object of the present invention is to eliminate the above-mentioned drawbacks of the prior art and to provide a ferromagnetic film with strong adhesion to an oxide substrate and a magnetic head for high-density magnetic recording using the same.
本発明は、Ｆｅ薄膜およびＦｅを主成分とする合金薄膜
と酸化物基板との界面にＺｒ、Ｈｆ。The present invention provides Zr and Hf at the interface between an Fe thin film or an alloy thin film mainly composed of Fe and an oxide substrate.
Ｍｏ、Ｗ、Ｖ、Ｎｂ、Ｔａ、Ａｎ、Ｍｎ、Ｚｎ。Mo, W, V, Nb, Ta, An, Mn, Zn.
Ｆｅの中から選ばれる１種以上の金属の酸化物からなる
下地層を設けたものであり、これにより合金薄膜と基板
とのはく離を防止することができる。A base layer made of an oxide of one or more metals selected from Fe is provided, which can prevent the alloy thin film from peeling off from the substrate.
また下地層の材料としては、Ｚｒ、Ｈｆ、Ｎｂ。Further, the materials for the underlayer include Zr, Hf, and Nb.
Ｔａ、Ｍｎ、Ｚｎ，Ａｌも適している。また非晶質磁性
合金を下地層とすることもはく離防止に効果がある。Ta, Mn, Zn, Al are also suitable. Furthermore, using an amorphous magnetic alloy as the underlayer is also effective in preventing peeling.
本発明者等は酸化物基板上に形成したＦｅ薄膜およびＦ
ｅを主成分とする合金薄膜について鋭意研究を重ねた結
果１合金薄膜と基板との界面に種種の下地層を設けるこ
とにより上記合金薄膜と基板との接着力が向上し、はく
離を防止できることを明らかにし、本発明を完成するに
至った。The present inventors have developed an Fe thin film formed on an oxide substrate and a Fe thin film formed on an oxide substrate.
As a result of extensive research on alloy thin films containing e as the main component, we found that by providing various types of underlayers at the interface between the alloy thin film and the substrate, the adhesion between the alloy thin film and the substrate can be improved and peeling can be prevented. This led to the completion of the present invention.
Ｆｅ薄膜あるいはＦｅを主成分とする合金薄膜と酸化物
基板との界面にＺｒ、Ｈｆｔ Ｍｏ、ＷｅＶ、Ｎｂ、Ｔ
ａ，Ａｌ、Ｍｎ、Ｚｎ、Ｆｅの中から選ばれる１種以上
の金属の酸化物または、Ｚｒ。Zr, Hft Mo, WeV, Nb, T is added to the interface between the Fe thin film or Fe-based alloy thin film and the oxide substrate.
a, an oxide of one or more metals selected from Al, Mn, Zn, and Fe, or Zr.
Ｈｆ、Ｎｂ、Ｔａ、Ｍｎ、Ｚｎ，Ａｌ、非晶質磁性合金
等からなる下地層を設けることにより、合金薄膜と基板
とのはく離を防止することができる。By providing an underlayer made of Hf, Nb, Ta, Mn, Zn, Al, an amorphous magnetic alloy, etc., peeling between the alloy thin film and the substrate can be prevented.
以下に本発明の一実施例を挙げ、図表を参照しながらさ
らに具体的に説明する。An example of the present invention will be described below in more detail with reference to figures and tables.
［実施例１コ
強磁性膜の作製にはデュアル・イオンビーム・スパッタ
リング装置を用いた。スパッタリングは以下の条件で行
った。[Example 1] A dual ion beam sputtering device was used to fabricate a ferromagnetic film. Sputtering was performed under the following conditions.
イオンガス ・・・Ａｒ装置内Ａｒ
ガス圧力 −２，５Ｘ １０−２Ｐ ａ蒸着用イオン
ガン加速電圧 ・・・１２００Ｖ蒸着用イオンガン
イオン電流 ・・・１２０ｍＡ基板照射用イオンガン
加速電圧 ・・・２００Ｖ基板照射用イオンガンイオン
電流・・・４０ｍＡターゲット・基板間距離 ・
・・１２７ｍ作製した強磁性膜の断面図を第１図に示す
。Ion gas...Ar in the Ar device
Gas pressure: -2,5 Distance between boards ・
...A cross-sectional view of a ferromagnetic film fabricated with a thickness of 127 m is shown in Fig. 1.
本実施例では磁性膜１１としてＦｅ、Ｆｅ−１２ａｔ％
Ｓｉ、Ｆａ−１０ａｔ％Ｃ薄膜、下地層１２としてＺ
ｒ Ｏｘ、 Ｈｆ Ｏｘ、 Ｍ ｏ Ｏｘ、 ＷＯｓ＋
Ｖ２０ａ、 Ｎ ｂ ｇｏｓ、 Ｔ ａ ｘｏｓ、 Ａ
Ｑ ｚｏｓ。In this embodiment, the magnetic film 11 is made of Fe, Fe-12at%
Si, Fa-10at%C thin film, Z as base layer 12
r Ox, Hf Ox, M o Ox, WOs+
V20a, N b gos, T axos, A
Q zos.
Ｆｅｚ○ａ、Ｍｎ Ｚｎフェライト、基板１３として
Ｍ ｎ −Ｚ ｎフェライトを用いた。また磁性膜１１
の膜厚を１０μｍ、下地層１２の膜厚を１００人とした
。スパッタリングに用いた基板の枚数は、それぞれの磁
性膜、下地層について２０枚である。Fez○a, MnZn ferrite, and Mn-Zn ferrite were used as the substrate 13. In addition, the magnetic film 11
The thickness of the base layer 12 was 10 μm, and the thickness of the base layer 12 was 100 μm. The number of substrates used for sputtering was 20 for each magnetic film and underlayer.
２０枚の基板上にはく離せず形成できた強磁性膜の枚数
で接着力を評価した。従って枚数が多く、２０枚に近い
程、接着力が強いとした。第１表に実験結果を示す。Adhesive strength was evaluated based on the number of ferromagnetic films that could be formed on 20 substrates without being peeled off. Therefore, the larger the number of sheets, closer to 20, the stronger the adhesive force. Table 1 shows the experimental results.
第１表
上表に示すように、種々の材料を下地層とすることによ
り、Ｍ ｎ −Ｚ ｎフェライト基板とＦｅ系合金の接
着力を向上することができた。またこれらの下地層材料
の中でＡＱｚＯａ、ＦｅｚＯａおよびＭ ｎ −Ｚ ｎ
フェライトの効果が優れていた。As shown in Table 1, the adhesive strength between the Mn-Zn ferrite substrate and the Fe-based alloy could be improved by using various materials as the base layer. Among these underlayer materials, AQzOa, FezOa and M n -Z n
The effect of ferrite was excellent.
酸化物をスパッタリングで形成した場合、若干酸素を失
い、酸化物である基板と、金属である磁性膜の中間の状
態になるためと思われる。This seems to be because when an oxide is formed by sputtering, it loses some oxygen, resulting in a state between that of an oxide substrate and a metal magnetic film.
また基板１３としてＳ ｉ Ｏｚ、 Ａ ｎ ｚｏｓ基
板を用いた実験も行ったところ、Ｍｎ−Ｚｎフェライト
基板とほぼ同様の傾向を示し、第１表に示す下地層を用
いることにより基板と磁性膜の接着力が向上した。この
場合もＡｌｇｏｓ、ＦｅｚＯａ、Ｍｎ−Ｚｎフェライト
の効果が優れていた。Experiments using SiOz and Anzos substrates as the substrate 13 showed almost the same tendency as the Mn-Zn ferrite substrate, and by using the underlayer shown in Table 1, the relationship between the substrate and the magnetic film was improved. Improved adhesion. In this case as well, the effects of Algos, FezOa, and Mn-Zn ferrite were excellent.
また磁性膜１１としてＦｅ系合金を他の組成の物質を介
して多層構造とした磁性膜を用いた場合にも、第１表に
示す下地層を用いることにより基板１３と磁性膜１１の
接着力を向上することができる１例えば、Ｆ ｅ −１
〜２０ ａ ｔ％Ｃ合金とＮ ｉ −２０ａ ｔ％Ｆｅ
合金を積層構造とした磁性膜を下地層を介さずＭ ｎ
−Ｚ ｎフェライト基板上に形成した場合、磁性膜１１
は全てはく離する。Furthermore, even when a magnetic film with a multilayer structure made of Fe-based alloy with other compositions interposed therebetween is used as the magnetic film 11, the adhesion between the substrate 13 and the magnetic film 11 can be improved by using the underlayer shown in Table 1. For example, F e −1
~20at%C alloy and Ni-20at%Fe
A magnetic film with a laminated alloy structure is formed with M n
-Z When formed on a ferrite substrate, the magnetic film 11
Peel off everything.
これに対し、Ｍ ｎ −Ｚ ｎフェライトから成る下地
層を設けると約１０枚の基板において、はく離を伴わず
に強磁性膜を形成することができる。On the other hand, if an underlayer made of Mn-Zn ferrite is provided, a ferromagnetic film can be formed on about 10 substrates without peeling.
［実施例２コ 実施例１と同様の方法でＺｒ、Ｈｆ、Ｎｂ。[Example 2 Zr, Hf, and Nb in the same manner as in Example 1.
Ｔ ａ ＋ Ｍ ｎ ｐ Ｚ ｎ ＋ Ａ ２からなる
下地層を有する強磁性膜を作製した。磁性膜の構造は実
施例１と同様とし、第１図における磁性膜１１としてＦ
ｅ −５〜１５ａｔ％Ｃ合金を用いた。基板１３とし
てＭ ｎ −Ｚ ｎフェライトを用いた。接着力の評価
は実施例１と同様に行った。結果を第２表に示す。A ferromagnetic film having an underlayer consisting of T a + M n p Z n + A 2 was produced. The structure of the magnetic film is the same as in Example 1, and F is used as the magnetic film 11 in FIG.
e -5 to 15 at% C alloy was used. Mn-Zn ferrite was used as the substrate 13. Evaluation of adhesive strength was performed in the same manner as in Example 1. The results are shown in Table 2.
第２表
第２表に示すように、上記金属を下地層とすることによ
りＦｅ−Ｃ系合金とＭ ｎ −Ｚ ｎフェライト基板と
の接着力が向上したｅ Ｆ ｅ Ｃ系合金は。Table 2 As shown in Table 2, the eFeC alloy has improved adhesive strength between the Fe-C alloy and the Mn-Zn ferrite substrate by using the above metal as a base layer.
高飽和磁束密度および高透磁率を有するが、Ｍｎ−Ｚｎ
フェライト基板との接着力が弱く、磁気ヘッドの作製が
困難であった。Ｆｅ−Ｃ系合金の磁気ヘッドの応用に対
して、本発明は有効である。Although it has high saturation magnetic flux density and high magnetic permeability, Mn-Zn
The adhesive force with the ferrite substrate was weak, making it difficult to manufacture a magnetic head. The present invention is effective for application to magnetic heads made of Fe--C alloys.
また、上記金属からなる下地層とＭ ｎ −Ｚ ｎフェ
ライト基板との界面をオージェ電子分光分析。Furthermore, the interface between the base layer made of the above metal and the Mn-Zn ferrite substrate was analyzed by Auger electron spectroscopy.
電子顕微鏡等で観察したところ、Ｚｎ、Ｈｆ。When observed with an electron microscope etc., Zn and Hf were found.
Ｎｂ、Ｔａを用いた磁性膜では、上記金属と基板との界
面に上記金属の酸化物層が形成されていることがわかっ
た。この酸化による結合が磁性膜と基板との接着力を向
上させているものと考えられる。また、Ｍｎ、Ｚｎ、Ａ
ｌ１からなる下地層を用いた強磁性膜では、基板とＭｎ
、Ｚｎ，Ａｌとの間に反応層が見られ、相互拡散してい
ることがわかった。この反応がＭｎ、Ｚｎ、ＡΩと基板
との接着力を向上させているものと考えられる。It has been found that in the magnetic film using Nb and Ta, an oxide layer of the metal is formed at the interface between the metal and the substrate. It is thought that this oxidized bond improves the adhesive force between the magnetic film and the substrate. Also, Mn, Zn, A
In a ferromagnetic film using an underlayer consisting of L1, the substrate and Mn
A reaction layer was observed between , Zn, and Al, indicating mutual diffusion. It is thought that this reaction improves the adhesive strength between Mn, Zn, AΩ and the substrate.
さらに基板１３としてＳ ｉ Ｏｘ、 Ａ Ｑ ｚｏａ
基板を用いた実験を行ったところ、これらの基板におい
ても、第２表に示す金属を下地層として用いることによ
り、磁性膜と基板との接着力が向上した。Further, as the substrate 13, S i Ox, A Q zoa
When experiments were conducted using substrates, the adhesion between the magnetic film and the substrate was improved by using the metals listed in Table 2 as the underlayer for these substrates as well.
［実施例３］ 第２図に示すような積層磁性膜を形成した。[Example 3] A laminated magnetic film as shown in FIG. 2 was formed.
本実施例では主磁性膜２１として膜厚９５０人のＦｅ−
１０ａｔ％Ｃ合金、中間層２２として膜厚５０人のＮｉ
−２０ａｔ％Ｆｅ合金、基板２４としてＳｉＯｘを用い
た。磁性膜は５０周期積層した。下地膜２３としてはＭ
ｎ −Ｚ ｎフェライトを用い、膜厚を変化した。In this embodiment, the main magnetic film 21 is made of Fe-
10 at% C alloy, Ni film thickness 50 as intermediate layer 22
-20 at% Fe alloy and SiOx were used as the substrate 24. The magnetic film was laminated 50 times. As the base film 23, M
n-Zn ferrite was used and the film thickness was varied.
Ｍ ｎ −Ｚ ｎフェライト下地膜の膜厚変化によるＦ
ｅ−Ｃ多層膜の比透磁率の変化を第３図に示す。M n -Z n F due to change in thickness of ferrite base film
FIG. 3 shows the change in relative magnetic permeability of the e-C multilayer film.
同図に示すように、下地膜の膜厚が大きくなるに従い、
比透磁率が減少する。比透磁率の減少を最小限にするた
めには下地膜の膜厚は２００Å以下が好ましい、また膜
厚２０Å以下では下地膜の効果がなく、磁性膜は基板よ
りはく離する。従ってで下地膜の膜厚は２０〜２００人
の範囲が好ましい、この膜厚依存性は第１表および第２
表に示すその他の下地膜材料でもほぼ同様であった。As shown in the figure, as the thickness of the base film increases,
Relative permeability decreases. In order to minimize the decrease in relative magnetic permeability, the thickness of the base film is preferably 200 Å or less, and if the thickness is less than 20 Å, the base film has no effect and the magnetic film separates from the substrate. Therefore, the thickness of the base film is preferably in the range of 20 to 200. This film thickness dependence is shown in Tables 1 and 2.
The results were almost the same for the other base film materials shown in the table.
［実施例４コ
第２図に示すような構造の積層磁性膜を用いてＶＴＲ用
磁気ヘッドを作製した。本実例では主磁性膜２１として
膜厚９５０人のＦ ｅ ＝ １０ ａ ｔ％Ｃ合金、中
間層２２として膜厚５０人のＮｉ −２０ａｔ％Ｆｅ合
金を用いた。磁性膜は１００周期積層し、膜厚は約１０
μｍとした。下地層２３としては膜厚１００人のＭ ｎ
−Ｚ ｎフェライトを用いた。第４図に示すＶＴＲ用
磁気ヘッド９０の作製工程を以下に述べる。[Example 4] A magnetic head for a VTR was manufactured using a laminated magnetic film having a structure as shown in FIG. In this example, the main magnetic film 21 was a 950-layer thick Fe=10 at% C alloy, and the intermediate layer 22 was a 50-layer Ni-20 at% Fe alloy. The magnetic film is laminated 100 times, and the film thickness is approximately 10
It was set as μm. The base layer 23 has a film thickness of 100 M n
-Zn ferrite was used. The manufacturing process of the VTR magnetic head 90 shown in FIG. 4 will be described below.
第４図（ａ）に示す溝８１を有するＭ ｎ −Ｚ ｎフ
ェライトからなる基板８２を用意し、第４図（ｂ）に示
すごとく基板８２の表面に膜厚約１０μｍの上記積層構
造を有する強磁性膜８３をイオンビーム・スパッタリン
グ法により作製した。A substrate 82 made of Mn-Zn ferrite having grooves 81 as shown in FIG. 4(a) is prepared, and as shown in FIG. 4(b), the above laminated structure with a thickness of about 10 μm is provided on the surface of the substrate 82. A ferromagnetic film 83 was fabricated by ion beam sputtering.
次に第４図（Ｑ）に示すとと＜ｐｂ系ガラス８４を用い
て溝８１を充填し、さらに第４図（ｄ）に示すとと＜ｐ
ｂ系ガラス８４の表面を研摩してギャップ構成面８５を
形成し、ヘッドコア半休ブロック８６を作製した。さら
に、ギャップ構成面８５にギャップ材となり５ｉｆｔ膜
をスパッタリング法により形成し、第４図（８）に示す
ごとく。Next, as shown in FIG. 4(Q), the groove 81 is filled with <pb-based glass 84, and as shown in FIG. 4(d),
The surface of the b-type glass 84 was polished to form a gap forming surface 85, and a head core semi-dead block 86 was produced. Further, a 5ift film serving as a gap material is formed on the gap forming surface 85 by sputtering, as shown in FIG. 4(8).
巻線窓８７を有するヘッドコア半休ブロック８８と上記
ヘッドコア半休ブロック８６とをギャップ材を介して重
ね合わせて５００℃の温度で３０分間加熱してｐｂ系ガ
ラス８４を再度溶融、固化して接合ブロック８９を作製
した。さらに第４図（８）に示す２点鎖線部を切断して
、第４図（ｆ）に示すＶＴＲ用磁気ヘッド９０を得た。A head core half-closed block 88 having a winding window 87 and the above-mentioned head core half-closed block 86 are stacked together via a gap material and heated at a temperature of 500° C. for 30 minutes to melt and solidify the PB glass 84 again to form a bonded block 89. was created. Furthermore, the VTR magnetic head 90 shown in FIG. 4(f) was obtained by cutting along the two-dot chain line shown in FIG. 4(8).
上述の工程によって作製した本発明の磁気ヘッドおよび
、従来材料であるＦ ｅ −Ａ Ｑ −Ｓ ｉ系合金薄
膜を用いたヘッドの記録特性を保磁力１４０（１０ｅの
メタルテープを用いて測定した。再生ヘッドにはフェラ
イトヘッドを用いた。この結果、本発明のＦｅ−Ｃ多層
膜を用いたヘッドは、Ｆ６−ＡＱ−８ｉ系合金薄膜を用
いたヘッドと比較してＩ Ｍ Ｈｚの周波数において約
４ｄＢ高い出力を示した。上述のように、磁性膜と基板
との界面にＭ ｎ −Ｚ ｎフェライトから成る下地層
を設けることにより、高飽和磁束密度を有するＦｅ系合
金薄膜を形成することができ、この結果、記録特性の優
れた磁気ヘッドが得られる、
［実施例５］
実施例１と同様の方法で第５図に示す構造の強磁性膜を
作製した。Ｆｅ系合金５１は膜厚２μｍのＦ ｅ −１
０ａ ｔ％Ｃ合金、非晶質磁性合金５２は膜厚３ｐｍの
Ｃｏ −９ａ ｔ％Ｎｂ−３８ｔ％Ｚｒ合金とした。ま
た基板５３はＭ ｎ −Ｚｎフェライトとした。The recording characteristics of the magnetic head of the present invention produced by the above-described process and a head using a Fe-AQ-Si alloy thin film, which is a conventional material, were measured using a metal tape with a coercive force of 140 (10e). A ferrite head was used as the reproducing head.As a result, the head using the Fe-C multilayer film of the present invention has a lower speed at a frequency of about 1 MHz than the head using the F6-AQ-8i alloy thin film. It showed a 4 dB higher output.As mentioned above, by providing an underlayer made of Mn-Zn ferrite at the interface between the magnetic film and the substrate, it was possible to form an Fe-based alloy thin film with a high saturation magnetic flux density. As a result, a magnetic head with excellent recording properties can be obtained. [Example 5] A ferromagnetic film having the structure shown in Fig. 5 was produced in the same manner as in Example 1. 2 μm F e −1
The 0a t%C alloy and the amorphous magnetic alloy 52 were a Co-9a t%Nb-38t%Zr alloy with a film thickness of 3 pm. Further, the substrate 53 was made of Mn-Zn ferrite.
以上の条件により、２０枚中１５枚の膜をはく離せずに
形成することができた。従って、非晶質磁性合金を下地
層とすることも接着力向上に効果がある。Under the above conditions, 15 out of 20 films could be formed without peeling. Therefore, using an amorphous magnetic alloy as the underlayer is also effective in improving adhesive strength.
さらに強磁性膜全体の膜厚を５μｍ一定としその中に占
める非晶質磁性合金５２の膜厚を変化した。その結果、
非晶質磁性合金５２の膜厚を１μｍ未満、すなわち全体
に占める割合を２０％未満とすると、非晶質磁性合金の
はく離防止効果が弱くなることがわかった。また、非晶
質磁性合金５２の膜厚を４μｍより厚く、すなわち全体
に占める割合を８０％より大きくすると、全体の飽和磁
束密度が低下し、Ｆｅ系合金を使用する利点を失う。従
って、全体に占める非晶質磁性合金の膜厚の割合は２０
〜８０％の範囲とすることにより好ましい。また基板５
３としてＳ ｉ Ｏ２，Ａ Ｑ ２０１１を使用した場
合にもほぼ同様の結果を得た。Further, the thickness of the entire ferromagnetic film was kept constant at 5 μm, and the thickness of the amorphous magnetic alloy 52 occupied therein was varied. the result,
It has been found that when the film thickness of the amorphous magnetic alloy 52 is less than 1 μm, that is, when the proportion of the entire film is less than 20%, the peeling prevention effect of the amorphous magnetic alloy becomes weak. Furthermore, if the film thickness of the amorphous magnetic alloy 52 is made thicker than 4 μm, that is, if its proportion to the whole is made larger than 80%, the overall saturation magnetic flux density decreases, and the advantage of using the Fe-based alloy is lost. Therefore, the ratio of the film thickness of the amorphous magnetic alloy to the whole is 20
It is more preferable to set it in the range of 80%. Also, the board 5
Almost similar results were obtained when S i O2, A Q 2011 was used as 3.
［実施例６コ
第５図に示す構造の強磁性膜を用いてＶＴＲ用磁気ヘッ
ドを作製した。第５図における磁性膜５１として膜厚２
μｍのＦ ｅ −Ｃ／ Ｎ ｉ −Ｆ ｓ２０層膜（周
期１０００人）、非晶質磁性合金５２として膜厚３μｍ
のＧ ｏ −９ａ ｔ％Ｎｂ−３ａｔ％Ｚｒ合金を用い
た。磁気ヘッドの構造および作製プロセスは実施例４と
同様とした。[Example 6] A magnetic head for a VTR was manufactured using a ferromagnetic film having the structure shown in FIG. The magnetic film 51 in FIG. 5 has a film thickness of 2
μm Fe-C/Ni-Fs 20-layer film (period: 1000), film thickness 3 μm as amorphous magnetic alloy 52
A Go-9at%Nb-3at%Zr alloy was used. The structure and manufacturing process of the magnetic head were the same as in Example 4.
本発明の磁気ヘッドおよび、従来材料であるＦ ｅ −
Ａ Ｑ −Ｓ ｉ系合金簿膜を用いたヘッドの記録特性
を保磁力１４０００ ｅのメタルテープを用いて測定し
た。再生ヘッドにはフェライトヘッドを用いた。この結
果、本発明のヘッドは、Ｆｅ−ＡＱ−８ｉ系合金薄膜を
用いたヘッドと比較してＩ Ｍ Ｈｚの周波数において
約３ｄＢ高い出力を示すことがわかった６本発明のヘッ
ドに用いたＣ０−９ａｔ％Ｎｂ−３ａｔ％Ｚｒ合金の飽
和磁束密度は約ＩＴであり、Ｆｅ−ＡＱ−８ｉ系合金の
飽和磁束密度と大差ない、それにもかかわらず、本発明
の磁気ヘッドが高い記録能力を示すのは、磁気ヘッドの
記録に重要な働きを示すギャップ付近の磁性膜に、高飽
和磁束密度を有するＦｅ−Ｃ系合金を用いたためと考え
られる。The magnetic head of the present invention and the conventional material Fe −
The recording characteristics of the head using the AQ-Si alloy film were measured using a metal tape with a coercive force of 14,000 e. A ferrite head was used as the playback head. As a result, it was found that the head of the present invention exhibited approximately 3 dB higher output at a frequency of I MHz compared to a head using a Fe-AQ-8i alloy thin film. The saturation magnetic flux density of the -9at%Nb-3at%Zr alloy is approximately IT, which is not much different from the saturation magnetic flux density of the Fe-AQ-8i alloy.Nevertheless, the magnetic head of the present invention exhibits high recording ability. This is thought to be due to the fact that an Fe--C alloy having a high saturation magnetic flux density was used for the magnetic film near the gap, which plays an important role in recording in the magnetic head.
一方、凝似ギャップの効果による磁気ヘッドの特性劣化
を減少させるためには１Ｍｎ−Ｚｎフェライト基板と磁
性膜との飽和磁束密度を急激に変化させないことが重要
である。この観点から、本発明の磁気ヘッドの様に、Ｆ
ｅ系合金とフェライト基板との間に、飽和磁束密度０．
８Ｔ〜１．６Ｔの非晶質磁性合金を形成することが好ま
しい。また、第５図の非晶質磁性合金の組成を基板から
の距離によって変化し、基板５３の近くでは比較的飽和
磁束密度を低く、Ｆｅ系合金５１の近くでは比較的飽和
磁束密度を高くすることはさらに好ましい。On the other hand, in order to reduce the deterioration of the characteristics of the magnetic head due to the effect of the cohesive gap, it is important not to suddenly change the saturation magnetic flux density between the 1Mn--Zn ferrite substrate and the magnetic film. From this point of view, like the magnetic head of the present invention, F
There is a saturation magnetic flux density of 0.0 between the e-based alloy and the ferrite substrate.
It is preferable to form an amorphous magnetic alloy of 8T to 1.6T. Furthermore, the composition of the amorphous magnetic alloy shown in FIG. 5 is changed depending on the distance from the substrate, so that the saturation magnetic flux density is relatively low near the substrate 53, and the saturation magnetic flux density is relatively high near the Fe-based alloy 51. It is even more preferable.
以上詳細に説明したごとく、Ｆｅ薄膜あるいはＦｅを主
成分とする合金薄膜を酸化物基板上に形成する場合、薄
膜と基板との界面にＺｒ、Ｈｆ。As explained in detail above, when forming an Fe thin film or an alloy thin film mainly composed of Fe on an oxide substrate, Zr and Hf are present at the interface between the thin film and the substrate.
Ｍｏ、Ｗ、Ｖ、Ｎｂ、Ｔａ、ＡＭ、Ｍｎ、Ｚｎ。Mo, W, V, Nb, Ta, AM, Mn, Zn.
Ｆｅの中から選ばれる１種以上の金属の酸化物の層を設
けることにより薄膜と基板との接着力を向上し、はく離
を伴わずに数μｍの膜厚の磁性膜を形成することが可能
となる。また、Ｚｒ、Ｈｆ。By providing a layer of oxide of one or more metals selected from Fe, the adhesion between the thin film and the substrate is improved, making it possible to form a magnetic film several μm thick without peeling. becomes. Also, Zr, Hf.
Ｎｂ、Ｔａ、Ｍｎ、Ｚｎ，Ａｌもはく前紡＋ｈに効果が
ある。また非晶質磁性合金からなる下地層を設けること
は、はく前紡止および磁気ヘッドの疑似ギャップ効果減
少に効果がある。以上の結果、高飽和磁束密度を有する
Ｆｅ系合金、Ｆｅ系合金多層膜を磁気ヘッドに適用する
ことが可能となり、高密度磁気記録用の磁気ヘッドを得
ることができる。Nb, Ta, Mn, Zn, and Al are also effective in pre-spinning +h. Furthermore, providing an underlayer made of an amorphous magnetic alloy is effective in reducing spinning before peeling and in reducing the pseudo gap effect of the magnetic head. As a result of the above, it becomes possible to apply an Fe-based alloy or an Fe-based alloy multilayer film having a high saturation magnetic flux density to a magnetic head, and a magnetic head for high-density magnetic recording can be obtained.
第１図は本発明の一実施例を示す下地膜を有する強磁性
膜の断面図、第２図は本発明の他の実施例を示す下地膜
を有する積層磁性膜の断面図、第３図は本発明の実施例
の強磁性膜の比透磁率の下地膜厚依存性を示すグラフ、
第４図は本発明の実施例の強磁性膜を用いたＶＴＲ用磁
気ヘッドの作製工程を示す斜視図、第５図は本発明の他
の実施例を示す非晶質合金からなる下地膜を有する強磁
性膜の断面図である。
１１・・・磁性膜、１２・・・下地層、１３・・・基板
、２１・・・主磁性膜、２２・・・中間層、２３・・・
下地層、２４・・・基板、５１・・・Ｆｅ系合金、５２
・・・非晶質磁性合金、５３・・・基板、８１・・・溝
、８２・・・基板、８３・・・強磁性膜、８４・・・ｐ
ｂ系ガラス、８５・・・ヘッドギャップ構成面、８６・
・・ヘッドコア半休ブロック、８７・・・巻線窓、８８
・・・巻線窓を有するヘッドコア半休ブロック、８９・
・・接合ブロック、９０・・・ＶＴＲ用磁気ヘッド。
ρ ／〃 λｎ ３
ρρ小−ム フエライＬ １捜７ＩＫＡＮＸノｊ＜−１
）（＾）２７茅４図 （すFIG. 1 is a cross-sectional view of a ferromagnetic film with an underlayer showing one embodiment of the present invention, FIG. 2 is a cross-sectional view of a laminated magnetic film with an underlayer showing another embodiment of the invention, and FIG. is a graph showing the dependence of the relative magnetic permeability of the ferromagnetic film of the example of the present invention on the underlying film thickness,
FIG. 4 is a perspective view showing the manufacturing process of a magnetic head for a VTR using a ferromagnetic film according to an embodiment of the present invention, and FIG. FIG. DESCRIPTION OF SYMBOLS 11... Magnetic film, 12... Base layer, 13... Substrate, 21... Main magnetic film, 22... Intermediate layer, 23...
Base layer, 24... Substrate, 51... Fe-based alloy, 52
...Amorphous magnetic alloy, 53...Substrate, 81...Groove, 82...Substrate, 83...Ferromagnetic film, 84...p
b-based glass, 85...Head gap constituent surface, 86.
・Head core half-break block, 87 ・Winding window, 88
...Head core half-closed block with winding window, 89.
...Joining block, 90...Magnetic head for VTR. ρ /〃 λn 3
ρρ小-mu Ferai L 1 search 7IKANXノj<-1
)(＾)27 蒅4 (Su
Claims
金からなる強磁性薄膜を形成した強磁性薄膜において、
上記強磁性薄膜と上記酸化物基板との界面にＺｒ，Ｈｆ
，Ｍｏ，Ｗ，Ｖ，Ｎｂ，Ｔａ，Ａｌ，Ｍｎ，Ｚｎ，Ｆｅ
の中から選ばれる１種以上の金属の酸化物からなる下地
層を設けたことを特徴とする強磁性薄膜。
金からなる強磁性薄膜を形成した強磁性薄膜において、
上記強磁性薄膜と上記酸化物基板との界面にＺｒ，Ｈｆ
，Ｎｂ，Ｔａの中から選ばれる１種以上の金属からなる
下地層を設けたことを特徴とする強磁性薄膜。
金からなる強磁性薄膜を形成した強磁性薄膜において、
上記強磁性薄膜と上記酸化物基板との界面にＭｎ，Ｚｎ
，Ａｌの中から選ばれ る１種以上の金属からなる下地
層を設けたことを特徴とする強磁性薄膜。
徴とする特許請求の範囲第１項ないし第３項のいずれか
に記載の強磁性薄膜。
金からなる強磁性薄膜を形成した強磁性薄膜において、
上記強磁性膜と上記酸化物基板との界面に非晶質磁性合
金からなる下地層を設けたことを特徴とする強磁性薄膜
。
性合金を含む強磁性皮膜全体の膜厚に対して２０〜８０
％であることを特徴とする特許請求の範囲第５項に記載
の強磁性薄膜。
載の強磁性薄膜を磁気回路の少なくとも一部に用いたこ
とを特徴とする磁気ヘッド。
Zr and Hf are present at the interface between the ferromagnetic thin film and the oxide substrate.
, Mo, W, V, Nb, Ta, Al, Mn, Zn, Fe
A ferromagnetic thin film characterized in that it has an underlayer made of an oxide of one or more metals selected from the following.
Zr and Hf are present at the interface between the ferromagnetic thin film and the oxide substrate.
, Nb, and Ta.
Mn and Zn are present at the interface between the ferromagnetic thin film and the oxide substrate.
A ferromagnetic thin film characterized by having an underlayer made of one or more metals selected from , Al, and Al.
A ferromagnetic thin film characterized in that an underlayer made of an amorphous magnetic alloy is provided at the interface between the ferromagnetic film and the oxide substrate.
% of the ferromagnetic thin film according to claim 5.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63103914A JP2675062B2 (en) | 1988-04-28 | 1988-04-28 | Ferromagnetic thin film and manufacturing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63103914A JP2675062B2 (en) | 1988-04-28 | 1988-04-28 | Ferromagnetic thin film and manufacturing method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01276607A true JPH01276607A (en) | 1989-11-07 |
| JP2675062B2 JP2675062B2 (en) | 1997-11-12 |
Family
ID=14366695
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63103914A Expired - Lifetime JP2675062B2 (en) | 1988-04-28 | 1988-04-28 | Ferromagnetic thin film and manufacturing method thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2675062B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03209607A (en) * | 1990-01-12 | 1991-09-12 | Sumitomo Special Metals Co Ltd | Mig type magnetic head |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6134707A (en) * | 1984-07-27 | 1986-02-19 | Hitachi Ltd | Magnetic head |
-
1988
- 1988-04-28 JP JP63103914A patent/JP2675062B2/en not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6134707A (en) * | 1984-07-27 | 1986-02-19 | Hitachi Ltd | Magnetic head |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03209607A (en) * | 1990-01-12 | 1991-09-12 | Sumitomo Special Metals Co Ltd | Mig type magnetic head |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2675062B2 (en) | 1997-11-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH05290317A (en) | Magnetic head and its production | |
| US5537278A (en) | Thin film laminate magnetic head with reaction prevention layers | |
| JPH01276607A (en) | Ferromagnetic thin film and magnetic head using same | |
| JPS63279404A (en) | Composite type magnetic head | |
| JPS5888814A (en) | Magnetic head | |
| JPS63254709A (en) | Laminated thin magnet film and magnetic head using the same | |
| KR100244186B1 (en) | Laminated magnetic head | |
| JP3211295B2 (en) | Stacked magnetic head | |
| JPH0192908A (en) | Magnetic head | |
| JPH01100714A (en) | Composite magnetic head | |
| JP3147434B2 (en) | Magnetic head | |
| JPH02295104A (en) | Ferromagnetic thin film and magnetic head using same | |
| JP2519554B2 (en) | MIG type magnetic head | |
| JPS63311611A (en) | Composite type magnetic head | |
| JPH02257404A (en) | Mig system magnetic head | |
| JPS6362805B2 (en) | ||
| JPH0668423A (en) | Thin-film magnetic head | |
| JPH01260615A (en) | Magnetic head | |
| JPH0253212A (en) | Joint ferrite magnetic head | |
| JPH011109A (en) | magnetic head | |
| JPH05251235A (en) | Soft magnetic alloy film and magnetic head | |
| JPH0833979B2 (en) | Magnetic head | |
| JPH0485713A (en) | Magnetic head | |
| JPH04195808A (en) | Thin film magnetic head and its manufacturing method | |
| JPH0620210A (en) | Manufacture of magnetic head |